CN106947292A - A kind of preparation method for the nano silicon that surface is modified - Google Patents
A kind of preparation method for the nano silicon that surface is modified Download PDFInfo
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- CN106947292A CN106947292A CN201710339876.2A CN201710339876A CN106947292A CN 106947292 A CN106947292 A CN 106947292A CN 201710339876 A CN201710339876 A CN 201710339876A CN 106947292 A CN106947292 A CN 106947292A
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- nano silicon
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/006—Combinations of treatments provided for in groups C09C3/04 - C09C3/12
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/04—Physical treatment, e.g. grinding, treatment with ultrasonic vibrations
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Abstract
A kind of preparation method for the nano silicon being modified the invention discloses surface, nano silicon is delivered to surface processing trough, then tristerin dispersant and water are added, temperature is controlled at 50 70 DEG C, it is that 300 500r/min stir 10 20min in rotating speed, obtains nano silicon dioxide dispersion;Above-mentioned nano silicon dioxide dispersion is added into supersonic generator, add alkylnaphthalene sulfonate and cocoanut fatty acid diethanolamide composite modifier, temperature be 50 70 DEG C, frequency be ultrasonic 30 60min under 50 70KHz, obtain modified manometer silicon dioxide liquid;Modified manometer silicon dioxide liquid dry, pulverize through filtering again, sieve, that is, complete the surface treatment of nano silicon.Nano silicon after this method surface treatment not only good dispersion, good stability, good with the compatibility of organic matter, moreover it is possible to improve the light resistance and weatherability of silica, the opacity and gloss retention of facing paper can be improved for a long time.
Description
Technical field
The present invention relates to inorganic material-modified technical field, the preparation for the nano silicon that specifically a kind of surface is modified
Method.
Background technology
Nano silicon has extensive use in many fields, including filling, increment, thickens and strengthen various organic
Material, such as plastics, resin, rubber, oil.There is undersaturated key and various hydroxyl bases in nano-silica surface
Group, thus surface is in hydrophily, polarity is strong, easily absorbing water is interconnected to space network, and this space network
Intermolecular active force is very strong, so that easily producing agglomeration between silicon dioxide granule, is not easy in organic solvent
Disperse with rubber matrix, and because nano-silicon dioxide particle is small, specific surface area big, surface energy is high, it is unstable in energy
State, it is easy to flock together and form aggregate, particularly easily reunite in organic polymer, poor compatibility, because
This nano silicon needs to be modified it processing.
Many correlative studys have been done how to improve dispersive property of the nano material in organic polymer.Mainly
Functional group is introduced on nano-silicon dioxide particle surface, so as to improve the dispersiveness of nano silicon, weatherability and automatically cleaning
Property.The method being surface-treated to nano silicon has following several:A kind of method is beaten by physical mechanical method
The broken scattered nano particle reunited, such as by ultrasonically treated, but such a method effect is extremely limited, inorganic nanoparticles with
Interaction between organic polymer is very limited compared with the interaction between inorganic nanoparticles.Another method is
Graft Method is chemically bonded, nano grain surface is modified, the interaction between enhancing nano particle and polymer chain subtracts
Reunion between few nano particle, promotes nano particle scattered in polymeric matrix, while having good photocatalytic
Energy.But the technique of this kind of processing method is more complicated, control process is difficult, and cost is higher, it is difficult to realize industrialized production.
Silica can improve the opacity and gloss retention of facing paper, be the important raw and processed materials of facing paper, and it is used
Amount accounts for 30-40% of facing paper yield or so.But when existing silica is irradiated with, the electronics inspired is by two
The titanic of silicon oxide surface is reduced into titanous, and product is showed canescence, even grey black when serious, and resists this
The ability for planting discoloration is known as the light resistance of silica.
The content of the invention
The problem of present invention exists for the processing of current nano-silica surface there is provided a kind of technique it is simple, be easy to behaviour
Nano silicon good dispersion after work, low cost, processing, with organic matter compatibility is good, the table of light resistance and good weatherability
Face processing method.
In order to realize the above object the technical solution adopted by the present invention is as follows:
A kind of preparation method for the nano silicon that surface is modified, comprises the following steps:
(1)Nano silicon is delivered to surface processing trough, tristerin dispersant and water is then added, temperature is controlled
At 50-70 DEG C, it is that 300-500r/min stirs 10-20min in rotating speed, obtains nano silicon dioxide dispersion;
(2)Above-mentioned nano silicon dioxide dispersion is added into supersonic generator, alkylnaphthalene sulfonate and coconut grease is added
Fat acid diglycollic amide composite modifier, temperature be 50-70 DEG C, frequency be ultrasound 30-60min under 50-70KHz, obtain modification
Nanometer titanium dioxide silicon liquid;
(3)Modified manometer silicon dioxide liquid dry, pulverize through filtering again, sieve, that is, at the surface for completing nano silicon
Reason.
Further, the addition of the tristerin dispersant is the 0.5-0.8% of nano silicon weight.
Further, the mass concentration of the nano silicon dioxide dispersion is 20-30%.
Further, the alkylnaphthalene sulfonate is sodium butylnaphthalenesulfonate or ethyl sodium naphthalene sulfonate.
Further, the mass ratio of the alkylnaphthalene sulfonate and cocoanut fatty acid diethanolamide is 1-2:1.
Further, the addition of alkylnaphthalene sulfonate and the cocoanut fatty acid diethanolamide composite modifier is
The 1.0-2.0% of nano silicon weight.
Further, it in temperature is that the moisture content dried at 80-100 DEG C to nano silicon is 8- that the drying, which is,
12%。
Compared with prior art, beneficial effects of the present invention are:
1st, the not only good dispersion, good stability, good with the compatibility of organic matter of the nano silicon after this method surface treatment,
The light resistance and weatherability of silica can also be improved.
2nd, the present invention breaks the nano particle of scattered reunion using physical agitation and ultrasonic method, and ultrasonic wave energy is produced
Cavitation, makes liquid be in higher-order of oscillation state;It can be in nano-silicon dioxide particle using the effect of ultrasonic wave good
Dispersity, mitigate the agglomeration between nano-silicon dioxide particle, while reactant can be accelerated in the mixed of micro-scale
Close and react.
3rd, this method technique is simple, easily operated, low cost, production efficiency are high, easily realizes industrialized production.
Embodiment
Below in conjunction with specific embodiment, the present invention is described in more detail, but is not limited to protection scope of the present invention.
Embodiment 1
A kind of preparation method for the nano silicon that surface is modified, comprises the following steps:
(1)Nano silicon is delivered to surface processing trough, tristerin dispersant and water is then added, temperature is controlled
At 60 DEG C, it is that 300r/min stirs 20min in rotating speed, obtains the nano silicon dioxide dispersion that mass concentration is 25%;The tristearin
The addition of acid glyceride dispersant is the 0.6% of nano silicon weight;
(2)Above-mentioned nano silicon dioxide dispersion is added into supersonic generator, butyl naphthalene sulfonate and coconut grease is added
Fat acid diglycollic amide composite modifier, temperature be 60 DEG C, frequency be ultrasound 60min under 50KHz, obtain modified nano-silica
Silicon liquid;The mass ratio of the butyl naphthalene sulfonate and cocoanut fatty acid diethanolamide is 1:1, the addition of composite modifier
For the 1.5% of nano silicon weight
(3)Again by modified manometer silicon dioxide liquid through filtering, it is 10% to be dried at 80 DEG C to the moisture content of nano silicon,
Crush, sieving completes the surface treatment of nano silicon.
Embodiment 2
A kind of preparation method for the nano silicon that surface is modified, comprises the following steps:
(1)Nano silicon is delivered to surface processing trough, tristerin dispersant and water is then added, temperature is controlled
At 50 DEG C, it is that 500r/min stirs 10min in rotating speed, obtains the nano silicon dioxide dispersion that mass concentration is 20%;The tristearin
The addition of acid glyceride dispersant is the 0.8% of nano silicon weight;
(2)Above-mentioned nano silicon dioxide dispersion is added into supersonic generator, ethyl naphthalene sulfonate and coconut grease is added
Fat acid diglycollic amide composite modifier, temperature be 50 DEG C, frequency be ultrasound 40min under 60KHz, obtain modified nano-silica
Silicon liquid;The mass ratio of the ethyl naphthalene sulfonate and cocoanut fatty acid diethanolamide is 2:1, the addition of composite modifier
For the 1.0% of nano silicon weight
(3)Again by modified manometer silicon dioxide liquid through filtering, it is 8% to be dried at 100 DEG C to the moisture content of nano silicon,
Crush, sieving completes the surface treatment of nano silicon.
Embodiment 3
A kind of preparation method for the nano silicon that surface is modified, comprises the following steps:
(1)Nano silicon is delivered to surface processing trough, tristerin dispersant and water is then added, temperature is controlled
At 70 DEG C, it is that 300r/min stirs 15min in rotating speed, obtains the nano silicon dioxide dispersion that mass concentration is 30%;The tristearin
The addition of acid glyceride dispersant is the 0.6% of nano silicon weight;
(2)Above-mentioned nano silicon dioxide dispersion is added into supersonic generator, ethyl naphthalene sulfonate and coconut grease is added
Fat acid diglycollic amide composite modifier, temperature be 70 DEG C, frequency be ultrasound 30min under 70KHz, obtain modified nano-silica
Silicon liquid;The mass ratio of the ethyl naphthalene sulfonate and cocoanut fatty acid diethanolamide is 1.5:1, the addition of composite modifier
Measure as the 2.0% of nano silicon weight
(3)Again by modified manometer silicon dioxide liquid through filtering, it is 10% to be dried at 100 DEG C to the moisture content of nano silicon,
Crush, sieving completes the surface treatment of nano silicon.
Embodiment 4
A kind of preparation method for the nano silicon that surface is modified, comprises the following steps:
(1)Nano silicon is delivered to surface processing trough, tristerin dispersant and water is then added, temperature is controlled
At 60 DEG C, it is that 500r/min stirs 20min in rotating speed, obtains the nano silicon dioxide dispersion that mass concentration is 20%;The tristearin
The addition of acid glyceride dispersant is the 0.7% of nano silicon weight;
(2)Above-mentioned nano silicon dioxide dispersion is added into supersonic generator, butyl naphthalene sulfonate and coconut grease is added
Fat acid diglycollic amide composite modifier, temperature be 60 DEG C, frequency be ultrasound 40min under 60KHz, obtain modified nano-silica
Silicon liquid;The mass ratio of the butyl naphthalene sulfonate and cocoanut fatty acid diethanolamide is 2:1, the addition of composite modifier
For the 1.5% of nano silicon weight
(3)Again by modified manometer silicon dioxide liquid through filtering, it is 12% to be dried at 80 DEG C to the moisture content of nano silicon,
Crush, sieving completes the surface treatment of nano silicon.
Claims (7)
1. a kind of preparation method for the nano silicon that surface is modified, it is characterised in that:Comprise the following steps:
(1)Nano silicon is delivered to surface processing trough, tristerin dispersant and water is then added, temperature is controlled
At 50-70 DEG C, it is that 300-500r/min stirs 10-20min in rotating speed, obtains nano silicon dioxide dispersion;
(2)Above-mentioned nano silicon dioxide dispersion is added into supersonic generator, alkylnaphthalene sulfonate and coconut grease is added
Fat acid diglycollic amide composite modifier, temperature be 50-70 DEG C, frequency be ultrasound 30-60min under 50-70KHz, obtain modification
Nanometer titanium dioxide silicon liquid;
(3)Modified manometer silicon dioxide liquid dry, pulverize through filtering again, sieve, that is, at the surface for completing nano silicon
Reason.
2. according to claim 1 surface be modified nano silicon preparation method, it is characterised in that:The stearic acid
The addition of glyceride dispersant is the 0.5-0.8% of nano silicon weight.
3. according to claim 1 surface be modified nano silicon preparation method, it is characterised in that:The nanometer two
The mass concentration of silica dispersion liquid is 20-30%.
4. according to claim 1 surface be modified nano silicon preparation method, it is characterised in that:The alkylnaphthalene
Sulfonate is sodium butylnaphthalenesulfonate or ethyl sodium naphthalene sulfonate.
5. according to claim 4 surface be modified nano silicon preparation method, it is characterised in that:The alkylnaphthalene
The mass ratio of sulfonate and cocoanut fatty acid diethanolamide is 1-2:1.
6. according to claim 5 surface be modified nano silicon preparation method, it is characterised in that:The alkylnaphthalene
The addition of sulfonate and cocoanut fatty acid diethanolamide composite modifier is the 1.0-2.0% of nano silicon weight.
7. according to claim 1 surface be modified nano silicon preparation method, it is characterised in that:The drying is
It is that the moisture content dried at 80-100 DEG C to nano silicon is 8-12% in temperature.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107459925A (en) * | 2017-08-25 | 2017-12-12 | 安徽新骏士箱包有限公司 | A kind of coating on draw-bar box pull bar handle and preparation method thereof |
CN111634074A (en) * | 2020-06-09 | 2020-09-08 | 杭州福斯特应用材料股份有限公司 | Compound photovoltaic backplate and anti PID photovoltaic module |
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US3647495A (en) * | 1970-01-29 | 1972-03-07 | Nl Industries Inc | Titanium dioxide pigment having improved dispersibility in coating compositions |
CN1394918A (en) * | 2001-07-06 | 2003-02-05 | 韩巍 | Nano Water dispersion medium composition, its preparation method and application |
CN103194097A (en) * | 2013-04-19 | 2013-07-10 | 中国民航大学 | Method for ultrasonically carrying out surface modification on silicon dioxide |
CN104031430A (en) * | 2014-05-12 | 2014-09-10 | 谷屿 | Modified nanometer titanium dioxide with improved dispersibility and preparation method thereof |
CN104479266A (en) * | 2014-12-26 | 2015-04-01 | 天津滨浦生产力促进有限公司 | Surface modification method of inorganic nanoparticles as well as polytetrafluoroethylene/inorganic nanoparticle composite material |
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2017
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US3647495A (en) * | 1970-01-29 | 1972-03-07 | Nl Industries Inc | Titanium dioxide pigment having improved dispersibility in coating compositions |
CN1394918A (en) * | 2001-07-06 | 2003-02-05 | 韩巍 | Nano Water dispersion medium composition, its preparation method and application |
CN103194097A (en) * | 2013-04-19 | 2013-07-10 | 中国民航大学 | Method for ultrasonically carrying out surface modification on silicon dioxide |
CN104031430A (en) * | 2014-05-12 | 2014-09-10 | 谷屿 | Modified nanometer titanium dioxide with improved dispersibility and preparation method thereof |
CN104479266A (en) * | 2014-12-26 | 2015-04-01 | 天津滨浦生产力促进有限公司 | Surface modification method of inorganic nanoparticles as well as polytetrafluoroethylene/inorganic nanoparticle composite material |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107459925A (en) * | 2017-08-25 | 2017-12-12 | 安徽新骏士箱包有限公司 | A kind of coating on draw-bar box pull bar handle and preparation method thereof |
CN111634074A (en) * | 2020-06-09 | 2020-09-08 | 杭州福斯特应用材料股份有限公司 | Compound photovoltaic backplate and anti PID photovoltaic module |
CN111634074B (en) * | 2020-06-09 | 2023-03-28 | 杭州福斯特应用材料股份有限公司 | Compound photovoltaic backplate and anti PID photovoltaic module |
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Application publication date: 20170714 |