CN106867413A - 一种高浓度氧化铈抛光液及其制备方法 - Google Patents
一种高浓度氧化铈抛光液及其制备方法 Download PDFInfo
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- CN106867413A CN106867413A CN201710064997.0A CN201710064997A CN106867413A CN 106867413 A CN106867413 A CN 106867413A CN 201710064997 A CN201710064997 A CN 201710064997A CN 106867413 A CN106867413 A CN 106867413A
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- Prior art keywords
- cerium oxide
- polishing
- oxide polishing
- polishing liquid
- concentration
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- 238000005498 polishing Methods 0.000 title claims abstract description 65
- 229910000420 cerium oxide Inorganic materials 0.000 title claims abstract description 44
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims abstract description 44
- 238000002360 preparation method Methods 0.000 title claims abstract description 5
- 239000002002 slurry Substances 0.000 title 1
- 238000007613 slurry method Methods 0.000 title 1
- 239000007788 liquid Substances 0.000 claims abstract description 21
- 239000002245 particle Substances 0.000 claims abstract description 16
- 239000000230 xanthan gum Substances 0.000 claims abstract description 12
- 229920001285 xanthan gum Polymers 0.000 claims abstract description 12
- 229940082509 xanthan gum Drugs 0.000 claims abstract description 12
- 235000010493 xanthan gum Nutrition 0.000 claims abstract description 12
- 239000002270 dispersing agent Substances 0.000 claims abstract description 10
- 239000000314 lubricant Substances 0.000 claims abstract description 9
- 239000002738 chelating agent Substances 0.000 claims abstract description 8
- 239000003381 stabilizer Substances 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical group O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000002562 thickening agent Substances 0.000 claims abstract description 7
- 230000000844 anti-bacterial effect Effects 0.000 claims abstract description 5
- 239000003899 bactericide agent Substances 0.000 claims abstract description 5
- 239000008367 deionised water Substances 0.000 claims abstract description 5
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 5
- 239000007900 aqueous suspension Substances 0.000 claims abstract description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 21
- 239000000725 suspension Substances 0.000 claims description 21
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 14
- 229920000058 polyacrylate Polymers 0.000 claims description 9
- 235000011187 glycerol Nutrition 0.000 claims description 7
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical group NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 6
- 239000001768 carboxy methyl cellulose Substances 0.000 claims description 6
- 150000007530 organic bases Chemical class 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims description 5
- 229920002134 Carboxymethyl cellulose Polymers 0.000 claims description 4
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 claims description 4
- 235000010948 carboxy methyl cellulose Nutrition 0.000 claims description 4
- 235000019812 sodium carboxymethyl cellulose Nutrition 0.000 claims description 4
- 229920001027 sodium carboxymethylcellulose Polymers 0.000 claims description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 3
- BVBIQASDHXEFKW-UHFFFAOYSA-N P1(OCCCCO1)=O.C(CN)N.[Na] Chemical compound P1(OCCCCO1)=O.C(CN)N.[Na] BVBIQASDHXEFKW-UHFFFAOYSA-N 0.000 claims description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 3
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 claims description 3
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 claims description 3
- 229920005614 potassium polyacrylate Polymers 0.000 claims description 3
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical group [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 claims description 3
- HWESTPZTMUZQSZ-UHFFFAOYSA-N P1(OC(CCO1)N)=O.[Na].[Na].[Na].[Na] Chemical group P1(OC(CCO1)N)=O.[Na].[Na].[Na].[Na] HWESTPZTMUZQSZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 238000010907 mechanical stirring Methods 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- 239000008112 carboxymethyl-cellulose Substances 0.000 claims 2
- HXMVNCMPQGPRLN-UHFFFAOYSA-N 2-hydroxyputrescine Chemical compound NCCC(O)CN HXMVNCMPQGPRLN-UHFFFAOYSA-N 0.000 claims 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims 1
- 101150096185 PAAS gene Proteins 0.000 claims 1
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims 1
- -1 hydroxy ethylidene diphosphonate Chemical compound 0.000 claims 1
- GSWAOPJLTADLTN-UHFFFAOYSA-N oxidanimine Chemical compound [O-][NH3+] GSWAOPJLTADLTN-UHFFFAOYSA-N 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 12
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract description 4
- 238000004140 cleaning Methods 0.000 abstract description 2
- 238000005520 cutting process Methods 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract description 2
- 238000005054 agglomeration Methods 0.000 abstract 1
- 230000002776 aggregation Effects 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 239000006059 cover glass Substances 0.000 abstract 1
- 230000003993 interaction Effects 0.000 abstract 1
- 239000004973 liquid crystal related substance Substances 0.000 abstract 1
- 239000005304 optical glass Substances 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 12
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 230000005484 gravity Effects 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 5
- DMSMPAJRVJJAGA-UHFFFAOYSA-N benzo[d]isothiazol-3-one Chemical compound C1=CC=C2C(=O)NSC2=C1 DMSMPAJRVJJAGA-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 4
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 150000002910 rare earth metals Chemical class 0.000 description 3
- 101500021084 Locusta migratoria 5 kDa peptide Proteins 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- ZJQOPWJLCHYGJL-UHFFFAOYSA-N [Na].[Na].[Na].[Na].OCC1OP(=O)OP(=O)O1 Chemical compound [Na].[Na].[Na].[Na].OCC1OP(=O)OP(=O)O1 ZJQOPWJLCHYGJL-UHFFFAOYSA-N 0.000 description 2
- 238000005056 compaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000855 fungicidal effect Effects 0.000 description 2
- 239000000417 fungicide Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 150000000703 Cerium Chemical class 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- WQZGKKKJIJFFOK-QTVWNMPRSA-N D-mannopyranose Chemical compound OC[C@H]1OC(O)[C@@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-QTVWNMPRSA-N 0.000 description 1
- IAJILQKETJEXLJ-UHFFFAOYSA-N Galacturonsaeure Natural products O=CC(O)C(O)C(O)C(O)C(O)=O IAJILQKETJEXLJ-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CMQAMENQCKNUPB-UHFFFAOYSA-N NC1CCOP(=O)O1 Chemical compound NC1CCOP(=O)O1 CMQAMENQCKNUPB-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- IAJILQKETJEXLJ-QTBDOELSSA-N aldehydo-D-glucuronic acid Chemical group O=C[C@H](O)[C@@H](O)[C@H](O)[C@H](O)C(O)=O IAJILQKETJEXLJ-QTBDOELSSA-N 0.000 description 1
- AEMOLEFTQBMNLQ-WAXACMCWSA-N alpha-D-glucuronic acid Chemical compound O[C@H]1O[C@H](C(O)=O)[C@@H](O)[C@H](O)[C@H]1O AEMOLEFTQBMNLQ-WAXACMCWSA-N 0.000 description 1
- 229920006318 anionic polymer Polymers 0.000 description 1
- 238000004630 atomic force microscopy Methods 0.000 description 1
- 230000003385 bacteriostatic effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- 229920001222 biopolymer Polymers 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (9)
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CN201710064997.0A CN106867413B (zh) | 2017-02-06 | 2017-02-06 | 一种高浓度氧化铈抛光液及其制备方法 |
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CN201710064997.0A CN106867413B (zh) | 2017-02-06 | 2017-02-06 | 一种高浓度氧化铈抛光液及其制备方法 |
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CN106867413A true CN106867413A (zh) | 2017-06-20 |
CN106867413B CN106867413B (zh) | 2021-06-04 |
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Family Applications (1)
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108329842A (zh) * | 2018-01-22 | 2018-07-27 | 东旭科技集团有限公司 | 抛光液组合物及其制备方法和玻璃抛光方法 |
CN109096922A (zh) * | 2018-08-24 | 2018-12-28 | 甘肃稀土新材料股份有限公司 | 一种含钇的稀土抛光液及其制备方法 |
CN109929460A (zh) * | 2017-12-19 | 2019-06-25 | 蓝思科技(长沙)有限公司 | 一种玻璃抛光用水基氧化铈抛光液及其制备方法 |
CN109987854A (zh) * | 2019-04-12 | 2019-07-09 | 东莞市嘉逸光电有限公司 | 一种钢化玻璃的二次强化方法 |
CN111777987A (zh) * | 2020-07-29 | 2020-10-16 | 中国科学院兰州化学物理研究所 | 一种研磨悬浮剂及其制备方法和应用、研磨剂 |
CN112574675A (zh) * | 2019-09-27 | 2021-03-30 | 比亚迪股份有限公司 | 玻璃抛光液及其制备方法和使用其进行抛光处理的方法 |
CN112658812A (zh) * | 2020-12-18 | 2021-04-16 | 中国人民解放军国防科技大学 | 一种ccos剪切增稠抛光方法 |
CN115141548A (zh) * | 2021-03-15 | 2022-10-04 | 拓米(成都)应用技术研究院有限公司 | 一种高悬浮性氧化铈抛光液及其抛光工艺和应用 |
CN116355537A (zh) * | 2023-04-04 | 2023-06-30 | 蘅东光通讯技术(深圳)股份有限公司 | 光纤抛光研磨液、制备方法及光纤抛光研磨工艺 |
CN116970343A (zh) * | 2023-08-02 | 2023-10-31 | 包头天骄清美稀土抛光粉有限公司 | 用于曲面玻璃盖板抛光的稀土抛光液及其制备方法和应用 |
CN117327451A (zh) * | 2023-09-28 | 2024-01-02 | 中建材光芯科技有限公司 | 一种用于聚合物光纤面板抛光的抛光合剂及其制备方法和应用 |
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Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109929460A (zh) * | 2017-12-19 | 2019-06-25 | 蓝思科技(长沙)有限公司 | 一种玻璃抛光用水基氧化铈抛光液及其制备方法 |
CN108329842A (zh) * | 2018-01-22 | 2018-07-27 | 东旭科技集团有限公司 | 抛光液组合物及其制备方法和玻璃抛光方法 |
CN109096922A (zh) * | 2018-08-24 | 2018-12-28 | 甘肃稀土新材料股份有限公司 | 一种含钇的稀土抛光液及其制备方法 |
CN109987854A (zh) * | 2019-04-12 | 2019-07-09 | 东莞市嘉逸光电有限公司 | 一种钢化玻璃的二次强化方法 |
CN109987854B (zh) * | 2019-04-12 | 2022-05-03 | 东莞市嘉逸光电有限公司 | 一种钢化玻璃的二次强化方法 |
CN112574675B (zh) * | 2019-09-27 | 2021-12-07 | 比亚迪股份有限公司 | 玻璃抛光液及其制备方法和使用其进行抛光处理的方法 |
CN112574675A (zh) * | 2019-09-27 | 2021-03-30 | 比亚迪股份有限公司 | 玻璃抛光液及其制备方法和使用其进行抛光处理的方法 |
CN111777987A (zh) * | 2020-07-29 | 2020-10-16 | 中国科学院兰州化学物理研究所 | 一种研磨悬浮剂及其制备方法和应用、研磨剂 |
CN111777987B (zh) * | 2020-07-29 | 2021-06-22 | 中国科学院兰州化学物理研究所 | 一种研磨悬浮剂及其制备方法和应用、研磨剂 |
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