CN106795640B - 自润滑复合涂层 - Google Patents
自润滑复合涂层 Download PDFInfo
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- CN106795640B CN106795640B CN201580054197.XA CN201580054197A CN106795640B CN 106795640 B CN106795640 B CN 106795640B CN 201580054197 A CN201580054197 A CN 201580054197A CN 106795640 B CN106795640 B CN 106795640B
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- 238000000576 coating method Methods 0.000 title claims abstract description 49
- 239000011248 coating agent Substances 0.000 title claims abstract description 46
- 239000002131 composite material Substances 0.000 title claims abstract description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 49
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 44
- 239000002245 particle Substances 0.000 claims abstract description 22
- 239000007787 solid Substances 0.000 claims abstract description 15
- 239000011159 matrix material Substances 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910021645 metal ion Inorganic materials 0.000 claims description 4
- 238000005498 polishing Methods 0.000 claims description 4
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- QHFVYZUHGGZWCC-UHFFFAOYSA-J S([O-])(O)=O.[Mo+4].S([O-])(O)=O.S([O-])(O)=O.S([O-])(O)=O Chemical compound S([O-])(O)=O.[Mo+4].S([O-])(O)=O.S([O-])(O)=O.S([O-])(O)=O QHFVYZUHGGZWCC-UHFFFAOYSA-J 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 239000012790 adhesive layer Substances 0.000 claims description 2
- 238000004220 aggregation Methods 0.000 claims description 2
- 230000002776 aggregation Effects 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- 230000009467 reduction Effects 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 150000001336 alkenes Chemical class 0.000 claims 1
- 238000003763 carbonization Methods 0.000 claims 1
- 230000005518 electrochemistry Effects 0.000 claims 1
- 239000004615 ingredient Substances 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 15
- 239000000314 lubricant Substances 0.000 description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 9
- 229910052737 gold Inorganic materials 0.000 description 9
- 239000010931 gold Substances 0.000 description 9
- 238000000151 deposition Methods 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 238000005461 lubrication Methods 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002848 electrochemical method Methods 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 239000007866 anti-wear additive Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- RZVXOCDCIIFGGH-UHFFFAOYSA-N chromium gold Chemical compound [Cr].[Au] RZVXOCDCIIFGGH-UHFFFAOYSA-N 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- QRJOYPHTNNOAOJ-UHFFFAOYSA-N copper gold Chemical compound [Cu].[Au] QRJOYPHTNNOAOJ-UHFFFAOYSA-N 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002173 cutting fluid Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- -1 platinum ion Chemical class 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M103/00—Lubricating compositions characterised by the base-material being an inorganic material
- C10M103/04—Metals; Alloys
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M125/00—Lubricating compositions characterised by the additive being an inorganic material
- C10M125/02—Carbon; Graphite
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/005—Jewels; Clockworks; Coins
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
- C10M2201/04—Elements
- C10M2201/041—Carbon; Graphite; Carbon black
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
- C10M2201/04—Elements
- C10M2201/05—Metals; Alloys
- C10M2201/053—Metals; Alloys used as base material
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- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/06—Instruments or other precision apparatus, e.g. damping fluids
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B15/00—Escapements
- G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
- G04B31/08—Lubrication
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- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
- G04D3/0087—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the escapement mechanism, e.g. lever escapement, escape wheel
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- Engineering & Computer Science (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Inorganic Chemistry (AREA)
- Lubricants (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemically Coating (AREA)
Abstract
本发明涉及特别是应用于钟表机构的自润滑固体复合涂层,特征在于其包含分布在金属基体(4)中的石墨烯和/或石墨烯氧化物颗粒(3)。
Description
本发明涉及特别是应用于钟表机构的固体自润滑复合涂层。
在钟表机构中存在许多彼此摩擦接触的运动部件。必须尽可能减少这些摩擦情况,因为他们可影响机构的精确度和/或自主性。
实际上,摩擦情况导致部件磨损,增加部件运动的能耗,和使运动减慢。
因此,已知使用液体润滑剂(油)或糊状润滑剂(润滑脂)。这些润滑剂以合适的量保守地用于限定好的区域。这类润滑剂必须能够在两个部件之间滑动以使摩擦最小化,或者必须在装配期间沉积。能够在两个部件之间滑动的不利影响是它也可以从它沉积的地方滑出来。此外,它对温度和相对湿度环境条件非常敏感,因为它的粘度根据这些变化。
因此,注意两个缺点:
·这些液体或粘性润滑剂发生变化,在某种意义上它们例如由于负载有灰尘或变得更粘或因氧化失去其润滑能力而降低品质;
·由于这类润滑剂为液体或糊形式,部件的运动趋于将润滑剂从接触区域移向不经受摩擦的区域。
因此,需要定期进行由清洁受摩擦的部件和在合适部位用新润滑剂替换用过的润滑剂组成的维护操作。
这些润滑剂通过可包含具有摩擦学性能的颗粒如碳的液体或粘性基础物形成。例如,文献WO2012/128714描述了含石墨烯的液体。石墨烯由AndréGeim在2004年分离出来。这是一种二维的碳晶体,其在堆叠时得到石墨。它看起来具有有趣的摩擦学性能。
除了液体或粘性润滑剂,减少摩擦的干涂层是已知的。这些涂层对于待保护的部件是不可或缺的,且损失或化学降解的风险较小。此外,这些涂层对环境条件较不敏感。例如,基于分散在镍基体中的碳纳米管的涂层是已知的。所述涂层例如描述于文献US-A-20081323475中。
在文献WO2013/150028中,涂层金属为金,但是这种涂层由包含一定百分比镉的浴得到,该百分比要比欧洲规定允许的百分比高得多,这引起了问题。
在电镀复合涂层中还使石墨作为抗磨剂。
钟表的难题在于其需求与一般机械领域的需求十分不同,特别是由于钟表组件的小尺寸而必须限定涂层的厚度时。因此,所寻找的涂层必须是薄且非常有效的。
为此,本发明涉及一种具有自润滑性能的固体复合金属涂层,特征在于其包含分布在金属基体中的石墨烯和/或石墨烯氧化物颗粒。
本发明结合附图借助作为非限定性实施例提供的以下描述更清楚地理解,其中:
图1为涂覆有复合金属石墨烯的基底的示意剖面图;
图2显示具有本发明涂层的钟表机构(a)和不具有涂层的钟表机构(b)相对于用油润滑的钟表机构的相对振幅的变化;
图3为额外涂覆有金层的载体的剖面图。
附图显示来自涂覆有本发明固体自润滑复合金属涂层2的钟表机构的载体1的剖面图。
该涂层2包含分布在金属基体4中的石墨烯和/或氧化石墨烯的颗粒3。
优选使用纤维或片(纤维或颗粒聚集体)形式的石墨烯或石墨烯氧化物的颗粒3。
该涂层的厚度通常为0.2-20微米,但是优选0.5-2微米。
在一些情况下,在沉积涂层前,将附着层5沉积在载体1上。该层例如由镍或铬-金或金形成。
如果待涂覆的部件是导电的,则通过电镀进行涂层的沉积。如果不是导电部件,则将进行纯化学方法,例如,使用氧化剂(一种或多种金属阳离子)、还原剂和催化剂的所谓“无电”方法。
在电镀方法的情况下,使用包含金属离子和石墨烯和/或石墨烯氧化物颗粒的浴,将待涂覆的物体浸入其中,其中后者形成电化学浴沉积的传统装置中的阴极。
除了石墨烯和/或石墨烯氧化物颗粒,该浴可包含其它类型的颗粒6,例如铝、氮化硼、碳化钨、金刚石、亚硫酸氢钼、PTFE和/或纯形式的硅、碳化硅、氮化硅或氧化硅的颗粒,以及实际上包封的油滴(例如氟化油),包括它们的混合物。
如果需要的话,可以将金属离子结合至电化学方法中公知的络合剂如金浴情况中的氰化物。可以根据浴的化学性质,使用缓冲剂将浴的pH调节至固定值,例如在镍浴中使用硼酸缓冲至酸性pH值。
如果需要的话,浴还可以包含电化学方法中公知的添加剂,例如均化剂、增白剂和还原剂。
为了使颗粒在浴中良好分散,浴还可以包含表面活性剂,其与上述颗粒结合,包围它们,防止其溶液聚集。
为了防止颗粒沉降和促进形成均匀和均相的沉积物,将使浴经受机械和/或超声搅拌,以最好地分布不同组分。
如果使用化学沉积方法(在非导电部件上),遵循以下相同的原则形成复合涂层:将颗粒3和6加入具有表面活性剂的浴中,利用浴的机械和/或超声搅拌使颗粒3和6与金属4共沉积到待涂覆的物体上。
沉积的金属可以是纯金属如纯镍,或金属合金如具有磷的镍或铜、锡和锌的合金(青铜)。金属材料的选择取决于各自所需的结果。例如,镍磷能够获得不具磁性的涂层,青铜能够获得装饰性涂层。还可以将金和/或铜的离子与石墨烯或石墨烯氧化物沉积,以提供具有金或铜-金基础物基体的涂层。也可以用于生产这种基础物基体的其它金属离子例如为贵金属的离子,例如钯或铂离子。
例如,可以在含镍(III)离子和亚磷酸的浴中将石墨烯或石墨烯氧化物颗粒共沉积到镍和磷上。另一例子是在金和铜离子的存在下共沉积石墨烯或石墨烯氧化物。
需要注意的是,如果在浴中使用石墨烯氧化物,其可在电化学沉积方法期间共还原,并可转化成还原的石墨烯氧化物。
如果在浴中包含其它颗粒6,这些与石墨烯或石墨烯氧化物颗粒3同时共沉积在金属基体4中。
在这些各种组分沉积后,例如可进行热固化处理以改善沉积层的均匀性和/或优化机械性能如硬度。
同样,在涂层2沉积后,可进行涂层的精细抛光以降低其粗糙度。
同样,可通过电镀方法或其它方法(气相沉积或阴极溅散)在电化学沉积或无电沉积并抛光之后的涂层上形成具有5-100nm(纳米)厚度的金沉积物7(见图3)。
该金薄层7经受摩擦力,其导致金渗透含有石墨烯和/或石墨烯氧化物的金属基体的表面。
这种固体涂层对于纯石墨烯是不可想象的,特别是因为材料成本和太小的厚度。
所选择的方案能够使石墨烯与金属和其它组分的效果结合。可以选择一种涂层,其具有通过提高石墨烯的比例来大大降低摩擦的性能或通过将选自由铝、金刚石、氮化硼、碳化钨及其混合物组成的组的硬颗粒加入石墨烯获得较硬表面,由此限制磨损。
因此,感兴趣的是将特定金属或合金颗粒或结合的石墨烯簇和如果需要的话其它无机或有机颗粒结合在金属基体中,以满足各自具体的需求。这不是化学结合的问题,而是存在分布在金属基体中的各种颗粒的问题。
此外,涂层对于钟表部件是不可或缺的,这保证长寿命和对环境条件的更好耐性。
涂层沉积可限定在经受摩擦的区域,在该沉积过程中可将部件的其余部分罩住。
作为本发明的实例,可描述包含镍金属基体的复合涂层,石墨烯或石墨烯氧化物的聚集体分散在其中。
实施例1
由包含150-600g/L硫酸镍、4-40g/L氯化镍、30-50g/L硼酸和0.5-5g/L粉末形式石墨烯氧化物的浴制备涂层。浴的pH为3-4,浴的温度保持在50至70℃之间。应用1-20A/dm2的流量密度将涂层直接沉积在钟表部件上。
实施例2
另一实施例是由包含60-150g/L硫酸镍形式的镍、5-30g/L亚磷酸、30-50g/L硼酸和0.1-5g/L粉末形式石墨烯氧化物的浴获得的涂层。在pH为1-2时,可以应用0.5-10A/dm2、更特别地1-5A/dm2的流动密度获得基于镍磷和石墨烯氧化物的复合涂层。以这种方式形成的涂层导致例如图2中所述那些的性能(曲线(a)),其中厚度为0.5-5微米。
图2显示在24小时持续期间钟表运动的摆轮的相对振幅的变化。
曲线(a)对应于带有具有本发明涂层的擒纵轮的标准运动的摆轮的振幅值除以具有根据现有技术润滑的擒纵机构(擒纵轮和杠杆擒纵叉瓦的齿)的相同类型运动的摆轮的振幅值之间的百分数的关系。
曲线(b)对应于具有不带涂层或未润滑的擒纵轮和杠杆擒纵叉瓦的平衡的振幅值除以根据现有技术润滑的擒纵机构(擒纵轮和杠杆擒纵叉瓦的齿)的振幅值之间的百分数的关系。
应当理解,本发明涂层降低摩擦的能力等同于以前使用的液体润滑(曲线(a))。曲线(b)显示不使用润滑剂,摆轮的振幅降低。
Claims (12)
1.具有特别是应用于钟表机构的固体自润滑复合涂层的钟表的钟表机构,特征在于其包含分布在金属基体(4)中的石墨烯和/或石墨烯氧化物,石墨烯和/或石墨烯氧化物为纤维、颗粒或聚集体的形式,其中后者由固体元素形成。
2.根据权利要求1的钟表机构,其特征在于石墨烯氧化物为还原的石墨烯氧化物。
3.根据权利要求1的钟表机构,其特征在于石墨烯和/或石墨烯氧化物与来自纯金属或金属合金的金属离子结合。
4.根据权利要求1的钟表机构,其特征在于固体自润滑复合涂层已经受热固化处理。
5.根据权利要求1的钟表机构,其特征在于固体自润滑复合涂层具有抛光或磨光的表面。
6.根据权利要求1的钟表机构,其特征在于固体自润滑复合涂层覆盖有5-100nm的金膜7。
7.根据权利要求1的钟表机构,其特征在于固体自润滑复合涂层的厚度为0.2-20微米。
8.根据权利要求7的钟表机构,其特征在于固体自润滑复合涂层的厚度为0.5-2微米。
9.根据权利要求1的钟表机构,其特征在于在形成固体自润滑复合涂层前沉积附着层(5)。
10.根据权利要求1的钟表机构,其特征在于固体自润滑复合涂层被电化学或化学(无电)沉积,其中固体自润滑复合涂层的组分悬浮在浴中。
11.根据权利要求1的钟表机构,其特征在于它还包含选自由铝、金刚石、氮化硼、碳化钨、纯形式的硅、碳化硅、氮化硅或氧化硅、及其混合物组成的组的颗粒。
12.根据权利要求1的钟表机构,其特征在于还包含选自由钛、亚硫酸氢钼和聚四氟乙烯(PTFE)及其混合物组成的组的颗粒。
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JP6360973B2 (ja) | 2018-07-18 |
EP3204535B1 (fr) | 2021-07-21 |
US20170298528A1 (en) | 2017-10-19 |
EP3204535A1 (fr) | 2017-08-16 |
US10047450B2 (en) | 2018-08-14 |
JP2017531714A (ja) | 2017-10-26 |
CN106795640A (zh) | 2017-05-31 |
WO2016055409A1 (fr) | 2016-04-14 |
EP3006605A1 (fr) | 2016-04-13 |
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