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CN106449498B - For shifting the transposition head of microcomponent and the transfer method of microcomponent - Google Patents

For shifting the transposition head of microcomponent and the transfer method of microcomponent Download PDF

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Publication number
CN106449498B
CN106449498B CN201610865728.XA CN201610865728A CN106449498B CN 106449498 B CN106449498 B CN 106449498B CN 201610865728 A CN201610865728 A CN 201610865728A CN 106449498 B CN106449498 B CN 106449498B
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China
Prior art keywords
microcomponent
free
air path
access
component
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Active
Application number
CN201610865728.XA
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Chinese (zh)
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CN106449498A (en
Inventor
徐宸科
郑建森
邵小娟
时军朋
林科闯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hubei San'an Photoelectric Co ltd
Original Assignee
Xiamen Sanan Optoelectronics Technology Co Ltd
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Application filed by Xiamen Sanan Optoelectronics Technology Co Ltd filed Critical Xiamen Sanan Optoelectronics Technology Co Ltd
Priority to CN201610865728.XA priority Critical patent/CN106449498B/en
Priority to PCT/CN2016/104868 priority patent/WO2018058748A1/en
Publication of CN106449498A publication Critical patent/CN106449498A/en
Priority to US15/859,659 priority patent/US10916458B2/en
Application granted granted Critical
Publication of CN106449498B publication Critical patent/CN106449498B/en
Priority to US17/139,976 priority patent/US11631601B2/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833Details of electrostatic chucks

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)

Abstract

The invention discloses a kind of for shifting the transposition head of microcomponent and the transfer method of microcomponent, it include: the cavity with free-air path, and the external member with several suction nozzles He several free-air path components, the suction nozzle is configured to communicate with the free-air path component respectively, the free-air path component is formed to communicate with the free-air path being formed in the cavity respectively, and the suction nozzle uses vacuum pressure absorption microcomponent or release microcomponent, the vacuum pressure via in each access free-air path component and free-air path transmit, it is characterized by: when the external member is installed to the cavity, the upper surface of external member is provided with optical switch component, for controlling the on or off of free-air path component and free-air path in each access, to control the microcomponent needed for suction nozzle is adsorbed or discharged using vacuum pressure.

Description

For shifting the transposition head of microcomponent and the transfer method of microcomponent
Technical field
The present invention relates to the microcomponent for display, more particularly, to a kind of transposition head for shifting microcomponent and The transfer method of microcomponent.
Background technique
Microcomponent technology refers on substrate with the element arrays of the microsize of High Density Integration.Currently, micro- spacing hair Optical diode (Micro LED) technology is increasingly becoming research hot topic, and industry expectation has the microcomponent product of high-quality to enter city ?.It is deep that the micro- spacing light emitting diode product of high-quality can show that product generates to the tradition of existing such as LCD/OLED in the market Carving influences.
During manufacturing microcomponent, microcomponent is formed on donor substrate first, then microcomponent is transferred to and is connect It receives on substrate.Receiving substrate is, for example, display screen.Difficulty during manufacturing microcomponent is: how by microcomponent from It is transferred to and is received on substrate on donor substrate.
The method of tradition transfer microcomponent is to engage (Wafer Bonding) by substrate to turn microcomponent from transfer base substrate Move to reception substrate.One of implementation method of transfer method is directly transfer, that is, directly by microcomponent array rotation It moves substrate and is bonded to reception substrate, later again remove transfer base substrate.Another implementation method is indirect branch.The method includes The step of engaging/removing twice, firstly, transfer base substrate extracts microcomponent array from donor substrate, then transfer base substrate again will be micro- Element arrays are bonded to reception substrate, and finally transfer base substrate is removed again.Wherein, microcomponent array is extracted generally to pick up by electrostatic The mode that takes executes.It is needed during electrostatic picks up using transfer head array.The structure for shifting head array is relative complex, And need to consider its reliability.Manufacture transfer head array needs additional cost.Before the pickup using transfer head array It needs to generate phase change.In addition, microcomponent is used for the heat budget of phase change in the manufacturing process using transfer head array It is restricted, usually less than 350 DEG C, or more specifically, less than 200 DEG C;Otherwise, the performance of microcomponent can deteriorate.
Summary of the invention
In view of the above-mentioned problems, the transposition head that the invention proposes a kind of for shifting microcomponent and the transfer side of microcomponent Method.
According to the first aspect of the invention, a kind of for shifting the transposition head of microcomponent, comprising: with free-air path Cavity, and the external member with several suction nozzles He several free-air path components, the suction nozzle be configured to respectively with it is described Free-air path component communicates, the free-air path component be formed respectively with the free-air path phase that is formed in the cavity It is logical, and the suction nozzle, using vacuum pressure absorption microcomponent or release microcomponent, the vacuum pressure is via true in each access Empty path components and free-air path transmission, it is characterised in that: when the external member is installed to the cavity, the upper surface of external member is set It is equipped with optical switch component, for controlling the on or off of free-air path component and free-air path in each access, to control suction Mouth adsorbs using vacuum pressure or discharges required microcomponent.
Preferably, the optical switch component includes DMD(digital micro-mirror) chip.
Preferably, the dmd chip includes micro-reflector, by changing the folder between micro-reflector and the upper surface of external member Angle, to control the on or off of free-air path component and free-air path in each access.
Preferably, the angle is less than or equal to 12 °.
Preferably, when the angle is zero, free-air path component and free-air path in each access are closed;When the folder When angle is not zero, free-air path component and free-air path in each access are opened.
According to the second aspect of the invention, a kind of transfer method of microcomponent is provided, it is characterised in that: the infinitesimal The transfer method of part includes step:
(1) at least one microcomponent is placed on the first substrate;
(2) transposition head described in claim 1 is used, direction simultaneously contacts the microcomponent, and the suction nozzle uses vacuum pressure Power adsorbs the microcomponent, by optical switch component control free-air path component in each access and free-air path open or It closes, to extract required microcomponent;And
(3) transposition head described in claim 1 is used, towards a second substrate, the suction nozzle is discharged using vacuum pressure Microcomponent controls the on or off of the free-air path component and free-air path in each access, by optical switch component to discharge The microcomponent needed is in the second substrate.
Preferably, the quantity of the microcomponent is multiple, and wherein step (2) only adsorbs the part microcomponent, to mention Take required microcomponent.
Preferably, the quantity of the microcomponent is multiple, and wherein only the part microcomponent is desorbed for step (3), to release Put required microcomponent.
Preferably, the optical switch component includes dmd chip.
Preferably, the dmd chip includes micro-reflector, by changing the folder between micro-reflector and the upper surface of external member Angle, to control the on or off of free-air path component and free-air path in each access.
Preferably, the angle is less than or equal to 12 °.
Preferably, when the angle is zero, free-air path component and free-air path in each access are closed;When the folder When angle is not zero, free-air path component and free-air path in each access are opened.
Preferably, the first substrate is growth substrate or bearing substrate.
Preferably, the second substrate is active component array base board or passive device array substrate.
In addition, it will be appreciated by those skilled in the art that although many problems exist in the prior art, it is of the invention The technical solution of each embodiment or claim can be improved only at one or several aspects, existing without solving simultaneously The whole technical problems for having in technology or being listed in background technique.It will be appreciated by those skilled in the art that for a right The content that do not mention in it is required that should not be taken as the limitation for the claim.
Detailed description of the invention
Attached drawing is used to provide further understanding of the present invention, and constitutes part of specification, with reality of the invention It applies example to be used to explain the present invention together, not be construed as limiting the invention.In addition, attached drawing data be description summary, be not by Ratio is drawn.
Fig. 1 is the flow chart of the transfer method for the microcomponent implemented according to the present invention.
Fig. 2 ~ Fig. 6 is the process schematic according to the transfer method of the microcomponent of the embodiment of the present invention.
It is indicated in figure: 100: first substrate;200: microcomponent;300: transposition head;301: the cavity with free-air path; 302: external member;303: suction nozzle;304: free-air path component;305: optical switch component;400: the second substrate.
Specific embodiment
Carry out the various exemplary embodiments of detailed description of the present invention now with reference to attached drawing.It should also be noted that unless in addition having Body explanation, the unlimited system of component and the positioned opposite of step, numerical expression and the numerical value otherwise illustrated in these embodiments is originally The range of invention.
Specific embodiment
It present embodiments describes the transposition head for shifting microcomponent and transfer infinitesimal is carried out using the transposition head The method of part.Wherein, microcomponent can be miniature LED component, diode, transistor, integrated circuit (IC) chip etc., ruler Very little is 1 ~ 100 μm, but is not necessarily limited to this, and some aspects of embodiment are applicable to bigger and smaller size.
Fig. 1 shows a kind of transfer method of microcomponent, mainly includes processing step S100 ~ S300, below with reference to Fig. 2 ~ 6 are illustrated.
As shown in Fig. 2, providing a first substrate 100, which can be growth substrate or bearing substrate, the present embodiment It is preferred that bearing substrate, the material of bearing substrate can be glass, silicon, polycarbonate (Polycarbonate), acrylonitrile-butadiene- Styrene (Acrylonitrile Butadiene Styrene) or any combination thereof.It should be appreciated that carrying provided above The specific embodiment of substrate is only to illustrate, and is not intended to limit the invention, and has usually know in the technical field of the invention The knowledgeable should regard actual needs, the specific embodiment of flexible choice first substrate 100.Several are placed on first substrate 100 Microcomponent 200, microcomponent can be the wafer for not yet carrying out wafer dicing processes or light emitting diode or laser diode, The preferred microcomponent of the present embodiment is thin-film led (Thin Light-emitting Diode), and thickness can be about 0.5 μm To about 100 μm.The shape of microcomponent 200 can be cylindrical body, and the radius of cylindrical body can be about 0.5 μm to about 500 μm, but not It is limited to this, microcomponent 200 can also be for triangulo column, cube, cuboid, hexagonal cylinder, octagonal cylinder or other are polygonal Cylinder.
As shown in Figures 3 and 4, a transposition head 300 is provided, direction simultaneously contacts the microcomponent 200 being located on first substrate 100. Transposition head 300 includes: the cavity 301 with free-air path, and has several suction nozzles 303 and several free-air path components 304 external member 302, suction nozzle 303 are configured to communicate with free-air path component 304 respectively, and free-air path component 304 is formed It is communicated respectively with the free-air path being formed in cavity 301, and suction nozzle 303 uses vacuum pressure absorption microcomponent or release infinitesimal Part, vacuum pressure via in each access free-air path component and free-air path transmit.When external member 302 is installed to vacuum road When the cavity 301 of diameter, the upper surface of external member is provided with optical switch component 305, for controlling the free-air path portion in each access The on or off of part and free-air path, to control the microcomponent needed for suction nozzle is adsorbed or discharged using vacuum pressure.The present embodiment Suction nozzle, free-air path component, microcomponent number be 3, define suction nozzle/free-air path component/microcomponent in Fig. 3 from a left side It is the 1st, the 2nd and the 3rd to the right side.It such as needs adsorption potential in the 1st and the 3rd microcomponent on bearing substrate 100, only needs It is in an open state (ON) by the access that optical switch component 305 controls the 1st free-air path component and free-air path, the 2nd The access of free-air path component and free-air path is in off state (OFF), the access of the 3rd free-air path component and free-air path It is in an open state (ON).Specifically, optical switch component 305 preferably includes dmd chip, and dmd chip has micro-reflector, leads to The angle changed between micro-reflector and the upper surface of external member is crossed, to control free-air path component and the free-air path in each access On or off.Preferably, the angle is less than or equal to 12 °, when the angle is zero, the 2nd free-air path component and vacuum The path blockade in path;When the angle is α=8 °, the access of the 1st free-air path component and free-air path is opened;Work as institute When to state angle be β=12 °, the access of the 3rd free-air path component and free-air path is opened.It should be noted that micro- by changing Angle between reflecting mirror and the upper surface of external member, can control the free-air path component and free-air path in each access open or It closes, also can control the size of vacuum pressure.
As described above, transposition head 300 towards and contact be located at first substrate 100 on microcomponent 200, suction nozzle use vacuum Pressure adsorption microcomponent controls the on or off of the free-air path component and free-air path in each access by optical switch component, To extract required microcomponent.
As it can be seen in figures 5 and 6, providing a second substrate 400, transposition head 300 is towards the second substrate 400.The second substrate is made For receive substrate, vehicle glass, sheet glass, flexible electronic substrate can be selected all if any the flexible membrane of circuit, display backplane, Solar energy glass, metal, polymer, polymer complex and glass fibre.Suction nozzle 303 discharges infinitesimal using vacuum pressure Part 200 controls the on or off of the free-air path component and free-air path in each access by optical switch component 305, with release Required microcomponent is in the second substrate 400.
The second substrate 400 can be active component array base board or passive device array substrate, in the present embodiment, excellent Active component array base board is selected, therefore the second substrate 400 and microcomponent 200 will form active display panels, but it is not limited to this. The second substrate 400 and microcomponent 200 can also form light emitting device.
It should be noted that above-mentioned microcomponent disposably can be extracted all, only extracting section also can according to need.Into One step, it can be shifted with extracting section qualification microcomponent, leave remaining unqualified microcomponent;Unqualified infinitesimal can also be extracted Part, and qualified microcomponent is left on the first substrate, it can so promote efficiency and yield in microcomponent transfer process.
The microcomponent transfer method of the present embodiment can be used for making electronic device, can be widely applied in electronic equipment, The electronic equipment can be mobile phone, tablet computer etc..
Although exemplary embodiment of the present invention has been described, it is understood that, the present invention should not necessarily be limited by these examples Property embodiment but those skilled in the art can be in the spirit and scope of the present invention as required by claim above Interior carry out variations and modifications.

Claims (7)

1. for shifting the transposition head of microcomponent, comprising: the cavity with free-air path, and there are several suction nozzles and several The external member of a free-air path component, the suction nozzle are configured to communicate with the free-air path component respectively, the free-air path Component is formed to communicate with the free-air path being formed in the cavity respectively, and the suction nozzle adsorbed using vacuum pressure it is micro- Element or release microcomponent, the vacuum pressure via in each access free-air path component and free-air path transmit, feature Be: when the external member is installed to the cavity, the upper surface of external member is provided with optical switch component, the optical switch group Part includes dmd chip, and the dmd chip includes micro-reflector, by changing the folder between micro-reflector and the upper surface of external member Angle, for controlling the on or off of free-air path component and free-air path in each access, so that controlling suction nozzle uses vacuum pressure Microcomponent needed for absorption or release.
2. according to claim 1 for shifting the transposition head of microcomponent, it is characterised in that: the angle is less than or equal to 12°。
3. according to claim 1 for shifting the transposition head of microcomponent, it is characterised in that: when the angle is zero, Free-air path component and free-air path in each access are closed;Free-air path portion when the angle is not zero, in each access Part and free-air path are opened.
4. the transfer method of microcomponent, it is characterised in that: the transfer method of the microcomponent includes step:
(1) at least one microcomponent is placed on the first substrate;
(2) transposition head described in claim 1 is used, direction simultaneously contacts the microcomponent, and the suction nozzle uses vacuum pressure absorbing The attached microcomponent controls the on or off of the free-air path component and free-air path in each access by optical switch component, with Microcomponent needed for extracting;And
(3) transposition head described in claim 1 is used, towards a second substrate, the suction nozzle discharges infinitesimal using vacuum pressure Part controls the on or off of the free-air path component and free-air path in each access by optical switch component, needed for release Microcomponent is in the second substrate;
Wherein the optical switch component in step (2) or step (3) includes dmd chip, and the dmd chip includes micro-reflector, By changing the angle between micro-reflector and the upper surface of external member, to control the free-air path component in each access and vacuum road The on or off of diameter.
5. the transfer method of microcomponent according to claim 4, it is characterised in that: the quantity of the microcomponent be it is multiple, Wherein step (2) only adsorbs the part microcomponent, and to extract required microcomponent, step (3) is only by the part infinitesimal Part desorption, to discharge required microcomponent.
6. the transfer method of microcomponent according to claim 4, it is characterised in that: the angle is less than or equal to 12 °.
7. the transfer method of microcomponent according to claim 4, it is characterised in that: when the angle is zero, each access In free-air path component and free-air path close;When the angle is not zero, free-air path component in each access and true Dead circuit diameter is opened.
CN201610865728.XA 2016-09-30 2016-09-30 For shifting the transposition head of microcomponent and the transfer method of microcomponent Active CN106449498B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201610865728.XA CN106449498B (en) 2016-09-30 2016-09-30 For shifting the transposition head of microcomponent and the transfer method of microcomponent
PCT/CN2016/104868 WO2018058748A1 (en) 2016-09-30 2016-11-07 Pick-and-place head for use in transfer of micro-component and method for transferring micro-component
US15/859,659 US10916458B2 (en) 2016-09-30 2017-12-31 Transfer head for transferring micro element and transferring method of micro element
US17/139,976 US11631601B2 (en) 2016-09-30 2020-12-31 Transfer head for transferring micro element and transferring method of micro element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610865728.XA CN106449498B (en) 2016-09-30 2016-09-30 For shifting the transposition head of microcomponent and the transfer method of microcomponent

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CN106449498B true CN106449498B (en) 2019-01-04

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Publication number Priority date Publication date Assignee Title
CN107818931B (en) 2017-09-30 2021-10-19 厦门市三安光电科技有限公司 Transfer method and transfer device for semiconductor micro-component
KR102424246B1 (en) * 2018-03-30 2022-07-25 (주)포인트엔지니어링 Transfer system for micro led with transfer head
JP7193062B2 (en) * 2018-08-01 2022-12-20 Thk株式会社 Actuator sensing device and actuator control system
CN109360883B (en) * 2018-09-29 2020-02-14 惠州雷通光电器件有限公司 Light emitting diode die bonding device and method and display panel manufacturing device and method
CN111244009B (en) * 2018-11-29 2022-10-28 成都辰显光电有限公司 Transfer device for micro-components
CN109927403B (en) * 2019-04-19 2021-06-29 成都辰显光电有限公司 Transfer printing device, manufacturing method of transfer printing device and transfer printing method
CN111987193B (en) * 2019-05-22 2021-06-11 成都辰显光电有限公司 Micro light emitting diode transfer device and manufacturing method thereof
CN112786514B (en) * 2019-11-11 2023-01-03 成都辰显光电有限公司 Temporary transfer substrate of micro-component and preparation method thereof

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JPH06115687A (en) * 1992-10-02 1994-04-26 Shindengen Electric Mfg Co Ltd Mechanism for reversing top and back of polar electronic parts
JP2009188052A (en) * 2008-02-04 2009-08-20 Yamaha Motor Co Ltd Electronic component transferring apparatus
CN101920247A (en) * 2009-06-11 2010-12-22 泰克元有限公司 Pick-and-place module for test handler
CN102610535A (en) * 2011-01-21 2012-07-25 三星半导体(中国)研究开发有限公司 Ball attachment device, solder ball picking method and solder ball mounting method

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Publication number Priority date Publication date Assignee Title
JPH06115687A (en) * 1992-10-02 1994-04-26 Shindengen Electric Mfg Co Ltd Mechanism for reversing top and back of polar electronic parts
JP2009188052A (en) * 2008-02-04 2009-08-20 Yamaha Motor Co Ltd Electronic component transferring apparatus
CN101920247A (en) * 2009-06-11 2010-12-22 泰克元有限公司 Pick-and-place module for test handler
CN102610535A (en) * 2011-01-21 2012-07-25 三星半导体(中国)研究开发有限公司 Ball attachment device, solder ball picking method and solder ball mounting method

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Effective date of registration: 20231019

Address after: 436000 No. 18, Gaoxin fifth road, Gedian Development Zone, Ezhou City, Hubei Province

Patentee after: Hubei San'an photoelectric Co.,Ltd.

Address before: 361009 No. 1721, Luling Road, Siming District, Xiamen City, Fujian Province

Patentee before: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY Co.,Ltd.