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CN106374028A - Quantum dot film and preparation method thereof - Google Patents

Quantum dot film and preparation method thereof Download PDF

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Publication number
CN106374028A
CN106374028A CN201610792440.4A CN201610792440A CN106374028A CN 106374028 A CN106374028 A CN 106374028A CN 201610792440 A CN201610792440 A CN 201610792440A CN 106374028 A CN106374028 A CN 106374028A
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layer
quantum dot
water
substrate
oxygen barrier
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李硕
于甄
彭娟
陈琛
程武
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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Zhangjiagang Kangdexin Optronics Material Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0361Manufacture or treatment of packages of wavelength conversion means

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Abstract

The invention discloses a quantum dot film and a preparation method therefor. The quantum dot film comprises a substrate, a quantum dot layer, a buffer layer, a protection layer, a water-oxygen blocking layer, and a curing layer, wherein the buffer layer is used for sticking and fixing the quantum dot layer with the substrate; the protection layer is formed on the quantum dot layer to seal and package the quantum dot layer so as to protect the quantum dot layer; the water-oxygen blocking layer is used for sealing and packaging the substrate, the buffer layer, the quantum dot layer and the protection layer in the interior of the water-oxygen blocking layer; and the curing layer is used for sealing and packaging the water-oxygen blocking layer in the interior of the curing layer. According to the quantum dot film provided by the invention, the quantum dot layer and the water-oxygen blocking layer are fully packaged and protected in an all-around manner, so that the quantum dot film has relatively high structural stability and relatively long service life.

Description

量子点膜及其制备方法Quantum dot film and preparation method thereof

技术领域technical field

本发明涉及显示领域,尤其是一种量子点膜及其制备方法。The invention relates to the display field, in particular to a quantum dot film and a preparation method thereof.

背景技术Background technique

目前市场上主流的显示器为LCD模式,即需要一个主动发光的光源,叠加面板上的RGB彩色滤光片,通过控制液晶的转向实现明暗及色彩的变换。该技术由于技术成熟,良率高,成本相对低受到了市场的青睐。但其色彩饱和度低也一直饱受诟病。因此,业内针对LCD色域提升技术进行了广泛的研究开发,其中包含LED自身荧光粉技术的改进,也包含在LED之外增加另外的一种机构或薄膜,比如量子点薄膜实现色域的增加。量子点材料发光原理在于收到特定波段蓝光的激发后,发出红光和绿光。由于其光转化效率高,发光波段窄,因此可以得到NTSC 100%以上的优质色域,受到了业内的追捧。但量子点材料由于其本身的耐热性及耐水氧性不足,而使得其制作就变得复杂和高成本。比如做成有上下两张水氧阻隔膜保护的量子点薄膜(其英文名称为Quantum Dot Enhancement Film,简称QDEF),整面应用于显示器背光单元或者封装在玻璃管中用于侧入式背光单元。At present, the mainstream display on the market is LCD mode, which requires an active light source, superimposed on the RGB color filter on the panel, and realizes the transformation of light and dark and color by controlling the direction of the liquid crystal. This technology is favored by the market due to its mature technology, high yield rate and relatively low cost. But its low color saturation has also been criticized. Therefore, the industry has carried out extensive research and development on LCD color gamut enhancement technology, which includes the improvement of LED's own phosphor technology, and also includes adding another mechanism or film besides LED, such as quantum dot film to increase the color gamut . The luminescent principle of quantum dot materials is to emit red and green light after being excited by blue light of a specific wavelength band. Due to its high light conversion efficiency and narrow luminous wavelength band, it can obtain a high-quality color gamut of more than 100% in NTSC, and has been sought after by the industry. However, due to the insufficient heat resistance and water and oxygen resistance of the quantum dot material, its production becomes complicated and expensive. For example, a quantum dot film (its English name is Quantum Dot Enhancement Film, referred to as QDEF) protected by two upper and lower water-oxygen barrier films is made, and the entire surface is applied to the display backlight unit or encapsulated in a glass tube for side-entry backlight units. .

现有量子点产品的发光器件主要有两种被广泛量产使用。There are two main types of light-emitting devices for existing quantum dot products that are widely used in mass production.

其一是On surface应用模式的量子点薄膜产品(QDEF),由上下两张水氧阻隔膜对量子点进行上下方向的水氧保护。这种发光器件主要缺点在于:第一,覆盖整个显示区域,成本高;第二,QDEF侧面无水氧阻隔保护,易造成边缘区域失效;第三,整面性应用容易因为某处的点缺引起区域性失效,引起整机显示器失效,损失成倍数放大。One is the quantum dot thin film product (QDEF) in the On surface application mode. The upper and lower water and oxygen barrier films protect the quantum dots from water and oxygen in the upper and lower directions. The main disadvantages of this light-emitting device are: first, it covers the entire display area, and the cost is high; second, there is no water and oxygen barrier protection on the side of the QDEF, and it is easy to cause the edge area to fail; Cause regional failure, cause the whole machine display to fail, and the loss is multiplied.

另外一种是On Edge应用模式的QD tube.其主要结构是条状玻璃管封装量子点,用于侧入式背光结构。其主要缺点在于应用模式受到限制,只能用于侧入式。The other is the QD tube in the On Edge application mode. Its main structure is a strip glass tube encapsulating quantum dots, which is used for side-entry backlight structures. Its main disadvantage is that the application mode is limited and can only be used for side entry.

发明内容Contents of the invention

本发明的第一个目的是:针对背景技术中的问题,提供一种结构稳定性高且使用寿命长的量子点膜。The first object of the present invention is to provide a quantum dot film with high structural stability and long service life in view of the problems in the background technology.

为了达到上述第一个目的,本发明的技术方案是:In order to achieve above-mentioned first object, technical scheme of the present invention is:

一种量子点膜,包括:A quantum dot film comprising:

基板;Substrate;

量子点层;quantum dot layer;

缓冲层,其将所述量子点层与所述基板黏结固定;a buffer layer, which bonds and fixes the quantum dot layer and the substrate;

保护层,其形成于所述量子点层上并将所述量子点层封裹住,以对所述量子点层进行保护;a protective layer, which is formed on the quantum dot layer and encapsulates the quantum dot layer to protect the quantum dot layer;

水氧阻隔层,其将所述基板、所述缓冲层、所述量子点层和所述保护层全部封裹于其内;以及a water-oxygen barrier layer encapsulating the substrate, the buffer layer, the quantum dot layer and the protective layer; and

固化层,其将所述水氧阻隔层全部封裹于其内,以对所述水氧阻隔层进行保护。The solidified layer completely encapsulates the water-oxygen barrier layer to protect the water-oxygen barrier layer.

在本发明的一些实施例中,所述基板为高分子材料。更为优选地,所述基板为PET材料。In some embodiments of the present invention, the substrate is a polymer material. More preferably, the substrate is made of PET material.

在本发明的又一些优选实施例中,所述保护层为耐高温树脂。更为优选地,所述保护层为烯酸类树脂、环氧类树脂或聚酰亚胺类树脂这三种耐高温树脂中的一种。In still some preferred embodiments of the present invention, the protective layer is a high temperature resistant resin. More preferably, the protective layer is one of three high-temperature-resistant resins: acrylic resin, epoxy resin or polyimide resin.

本发明的第二个目的是:针对背景技术中的问题,提供一种上述结构的量子点膜的制备方法。The second object of the present invention is to provide a method for preparing a quantum dot film with the above structure in view of the problems in the background technology.

为了达到上述第二个目的,本发明的技术方案是:In order to achieve the above-mentioned second purpose, the technical solution of the present invention is:

一种上述结构量子点膜的制备方法,包括:A preparation method of the quantum dot film with the above structure, comprising:

提供基板;Provide the substrate;

在所述基板上形成缓冲层;forming a buffer layer on the substrate;

在所述缓冲层上形成量子点层;forming a quantum dot layer on the buffer layer;

在所述量子点层上形成将所述量子点层封裹住的保护层;forming a protective layer encapsulating the quantum dot layer on the quantum dot layer;

形成将所述基板、所述缓冲层、所述量子点层和所述保护层全部封裹于其内水氧阻隔层;forming a water and oxygen barrier layer encapsulating the substrate, the buffer layer, the quantum dot layer and the protective layer;

形成将所述水氧阻隔层封裹于其内的固化层。A cured layer encapsulating the water and oxygen barrier layer is formed.

在本发明的一些优选实施例中,所述水氧阻隔层采用原子沉积技术形成。In some preferred embodiments of the present invention, the water-oxygen barrier layer is formed by atomic deposition technology.

本发明的优点是:The advantages of the present invention are:

1、本发明这种量子点膜中的量子点层由相应的结构层进行上、下、左右的全方位封装保护,有效提升了量子点层的耐老化能力,增加了其使用寿命。1. The quantum dot layer in the quantum dot film of the present invention is encapsulated and protected from top, bottom, left and right by the corresponding structural layer, which effectively improves the aging resistance of the quantum dot layer and increases its service life.

2、本发明这种量子点膜中的水氧阻隔层由将其全面封裹的固化层进行全方位保护,从而使水氧阻隔层各处均能够免遭破坏。2. The water-oxygen barrier layer in the quantum dot film of the present invention is fully protected by the solidified layer that fully encapsulates it, so that the water-oxygen barrier layer can be protected from damage everywhere.

3、水氧阻隔层覆盖至量子点层的侧部,从而使量子点层的侧部也能够得到水氧保护。3. The water and oxygen barrier layer covers the side of the quantum dot layer, so that the side of the quantum dot layer can also be protected by water and oxygen.

4、水氧阻隔层无需整面覆盖于基板上,降低了材料成本,而且避免了传统技术中因水氧阻隔膜整面性应用而容易因为某处的点缺引起区域性失效、整机显示器失效、损失成倍数放大的问题。4. The water-oxygen barrier layer does not need to cover the entire surface of the substrate, which reduces the material cost, and avoids the regional failure caused by a point defect in the traditional technology due to the full-surface application of the water-oxygen barrier film, and the display of the whole machine Problems of failure and loss multiplied.

5、本发明这种量子点膜的以柔性的高分子材料层为基板,并在基板与量子点层之间铺设具有黏结性能的缓冲层,使该发光器件具有极佳的光学性能及抗剥离性能。5. The quantum dot film of the present invention uses a flexible polymer material layer as the substrate, and a buffer layer with bonding properties is laid between the substrate and the quantum dot layer, so that the light-emitting device has excellent optical properties and anti-stripping performance.

6、本发明这种量子点膜中的量子点层采用特殊的配方组成,色度可以实现NTSC100%以上,并实现白平衡。6. The quantum dot layer in the quantum dot film of the present invention is composed of a special formula, and the chromaticity can realize more than 100% NTSC and white balance.

附图说明Description of drawings

下面结合附图及实施例对本发明作进一步描述:The present invention will be further described below in conjunction with accompanying drawing and embodiment:

图1为本发明实施例中量子点膜的结构示意图;Fig. 1 is the structural representation of quantum dot film in the embodiment of the present invention;

图2为本发明本实施例这种量子点膜在LED蓝光光源的激发下所得到的光谱图;Fig. 2 is the spectrogram obtained under the excitation of the LED blue light source by the quantum dot film of the present embodiment of the present invention;

其中:1-基板,2-缓冲层,3-量子点层,4-保护层,5-水氧阻隔层,6-固化层。Among them: 1-substrate, 2-buffer layer, 3-quantum dot layer, 4-protective layer, 5-water oxygen barrier layer, 6-cured layer.

具体实施方式detailed description

下面通过具体实施方式结合附图对本发明作进一步详细说明。本发明可以以多种不同的形式来实现,并不限于本实施例所描述的实施方式。提供以下具体实施方式的目的是便于对本发明公开内容更清楚透彻的理解,其中上、下、左、右等指示方位的字词仅是针对所示结构在对应附图中位置而言。The present invention will be further described in detail below through specific embodiments in conjunction with the accompanying drawings. The present invention can be implemented in many different forms, and is not limited to the embodiments described in this embodiment. The purpose of providing the following specific embodiments is to facilitate a clearer and more thorough understanding of the disclosure of the present invention, wherein the words indicating orientation such as up, down, left, and right are only for the positions of the structures shown in the corresponding drawings.

然而,本领域的技术人员可能会意识到其中的一个或多个的具体细节描述可以被省略,或者还可以采用其他的方法、组件或材料。在一些例子中,一些实施方式并没有描述或没有详细的描述。However, those skilled in the art may recognize that description of one or more of the specific details may be omitted, or other methods, components or materials may also be used. In some instances, some implementations were not described or described in detail.

此外,本文中记载的技术特征、技术方案还可以在一个或多个实施例中以任意合适的方式组合。对于本领域的技术人员来说,易于理解与本文提供的实施例有关的方法的步骤或操作顺序还可以改变。因此,附图和实施例中的任何顺序仅仅用于说明用途,并不暗示要求按照一定的顺序,除非明确说明要求按照某一顺序。In addition, the technical features and technical solutions described herein can also be combined in any suitable manner in one or more embodiments. It is readily understood by those skilled in the art that the steps or sequence of operations of methods related to the embodiments provided herein can also be changed. Therefore, any order in the figures and examples is for illustrative purposes only and does not imply a certain order unless explicitly stated to do so.

图1示出了本发明这种量子点膜的一个具体实施例,其包括紧密结合在一起的基板1、缓冲层2、量子点层3、保护层4、水氧阻隔层5和固化层6。其中:Fig. 1 shows a specific embodiment of this quantum dot film of the present invention, and it comprises substrate 1, buffer layer 2, quantum dot layer 3, protective layer 4, water oxygen barrier layer 5 and cured layer 6 that are closely bonded together . in:

基板1为柔性的高分子材料,在本实施例中具体为PET材料。当然,该基板1也可以采用其他的层状材料。The substrate 1 is a flexible polymer material, specifically PET material in this embodiment. Of course, the substrate 1 can also use other layered materials.

缓冲层2相当于一层粘结剂,其用于将量子点层3与基板1黏结固定,提升量子点层3与基板1之间的剥离力。The buffer layer 2 is equivalent to a layer of adhesive, which is used to bond and fix the quantum dot layer 3 and the substrate 1 to enhance the peeling force between the quantum dot layer 3 and the substrate 1 .

量子点层3设于缓冲层2上,该量子点层3内的量子点由一定配比的红色量子点及绿色量子点构成,在蓝色光源的激发下会发出特定波段的红色和绿色光,由于其半峰宽窄,红色,绿色波段无重叠,可以有效提高显示器的色彩饱和度。The quantum dot layer 3 is arranged on the buffer layer 2. The quantum dots in the quantum dot layer 3 are composed of a certain ratio of red quantum dots and green quantum dots. Under the excitation of a blue light source, red and green light of specific wavelength bands will be emitted. , due to its narrow half-peak width, red and green bands do not overlap, which can effectively improve the color saturation of the display.

保护层4形成于量子点层3上并且将该量子点层3封裹住,从而使该量子点层3的各个部分均能够得到很好的保护。这是因为量子点层3结构不稳定,故在成膜后需要立即制作该保护层4进行预保护。显然,保护层4采用能够保护量子点层结构稳定性的材料形成。考虑到该保护层4上的水氧阻隔层5在制作时需经高温处理,故该保护层4最好采用耐高温树脂材料,比如丙烯酸类树脂、环氧类树脂以及聚酰亚胺类树脂。The protection layer 4 is formed on the quantum dot layer 3 and encapsulates the quantum dot layer 3, so that all parts of the quantum dot layer 3 can be well protected. This is because the structure of the quantum dot layer 3 is unstable, so the protective layer 4 needs to be formed immediately after film formation for pre-protection. Apparently, the protection layer 4 is formed with materials capable of protecting the stability of the quantum dot layer structure. Considering that the water-oxygen barrier layer 5 on the protective layer 4 needs to undergo high-temperature treatment during production, the protective layer 4 is preferably made of high-temperature-resistant resin materials, such as acrylic resins, epoxy resins, and polyimide resins. .

实际上,保护层4与基板1的结合性较好,并不需要利用上述缓冲层2来增强保护层4和基板1之间的剥离力,因此,也可以将图1中保护层4与基板1结合处的缓冲层部分去除,而使保护层4的下部直接与基板1(而非缓冲层)接触连接(二者之间不再通过缓冲层2间接相连)。本实施例之所以在保护层4和基板1的结合处保留了缓冲层结构,是基于简化制作工艺的考虑。In fact, the combination of the protective layer 4 and the substrate 1 is better, and it is not necessary to use the buffer layer 2 to enhance the peeling force between the protective layer 4 and the substrate 1. Therefore, the protective layer 4 and the substrate in FIG. 1, the buffer layer at the junction is partially removed, so that the lower part of the protective layer 4 is directly connected to the substrate 1 (not the buffer layer) (the two are no longer indirectly connected through the buffer layer 2). The reason why this embodiment retains the buffer layer structure at the junction of the protective layer 4 and the substrate 1 is based on the consideration of simplifying the manufacturing process.

水氧阻隔层5将基板1、所述缓冲层2、量子点层3和保护层4全部封裹于其内部,其是具有一定水氧阻隔功能的层结构。该水氧阻隔层5既可以由无机材料生成,也可以由无机材料膜和有机材料膜多层膜复合而成。该水氧阻隔层5的水氧阻隔率一般在10^-1~-2等级,也可以是更高的等级,主要以满足保护量子点层的需要为准。The water and oxygen barrier layer 5 encapsulates the substrate 1 , the buffer layer 2 , the quantum dot layer 3 and the protective layer 4 inside, and is a layer structure with a certain water and oxygen barrier function. The water and oxygen barrier layer 5 can be made of inorganic materials, or can be composed of multilayer films of inorganic materials and organic materials. The water-oxygen barrier rate of the water-oxygen barrier layer 5 is generally at the level of 10^-1 to -2, and may be higher, mainly to meet the needs of protecting the quantum dot layer.

固化层6将水氧阻隔层5全部封裹于其内部,以用于保护水氧阻隔层5的各个部分均不被破坏。显然,固化层6采用能够保护水氧阻隔层5结构稳定性的材料形成。本实施例中该固化层由树脂涂布生成,与上述保护层4不同的是,该固化层6并非必须采用耐高温树脂材料,无耐高温要求。The cured layer 6 completely encapsulates the water-oxygen barrier layer 5 inside, so as to protect all parts of the water-oxygen barrier layer 5 from being damaged. Apparently, the cured layer 6 is formed of a material capable of protecting the structural stability of the water-oxygen barrier layer 5 . In this embodiment, the cured layer is formed by resin coating. Different from the above-mentioned protective layer 4, the cured layer 6 does not have to be made of high-temperature-resistant resin material, and there is no requirement for high-temperature resistance.

我们将本实施例这种量子点膜在LED蓝光光源的激发下进行测试,得到的光谱如图2所示,从该图2中可以看出,,由该量子点膜激发而得到的红光和绿光的发光波段窄,纯度高,可以有效实现色域的增加,提高色彩饱和度。We tested the quantum dot film of this embodiment under the excitation of the LED blue light source, and the obtained spectrum is shown in Figure 2. It can be seen from Figure 2 that the red light obtained by the excitation of the quantum dot film And green light has a narrow emission band and high purity, which can effectively increase the color gamut and improve color saturation.

再参照图1所示,本实施例这种量子点膜的制备方法,包括以下步骤:Shown in Fig. 1 again, the preparation method of this quantum dot film of the present embodiment comprises the following steps:

1)提供由PET膜形成的基板1。1) A substrate 1 formed of a PET film is provided.

2)在基板1上形成缓冲层2,缓冲层2的涂布厚度优选在5~10微米之间。2) Forming a buffer layer 2 on the substrate 1, the coating thickness of the buffer layer 2 is preferably between 5-10 microns.

3)在缓冲层2上形成量子点层3。3) Forming the quantum dot layer 3 on the buffer layer 2 .

4)在量子点层3上形成将该量子点层封裹住的保护层4。4) Form a protective layer 4 on the quantum dot layer 3 to enclose the quantum dot layer.

5)采用原子沉积技术形成水氧阻隔层5,该水氧阻隔层5将基板1、缓冲层2、量子点层3和保护层4全部封裹于其内。5) The water-oxygen barrier layer 5 is formed by atomic deposition technology, and the water-oxygen barrier layer 5 encapsulates the substrate 1 , the buffer layer 2 , the quantum dot layer 3 and the protective layer 4 inside.

6)形成固化层6,而且固化层6将水氧阻隔层5全部封裹于其内部。6) Forming the solidified layer 6, and the solidified layer 6 fully encapsulates the water and oxygen barrier layer 5 inside.

在上述各个实施例中所采用的各种原料均可外购或通过常规方法制。Various raw materials adopted in each of the above-mentioned embodiments can be purchased from outside or prepared by conventional methods.

以上内容是结合具体的实施方式对本发明所作的进一步详细说明,不能认定本发明的具体实施只局限于这些说明。对于本发明所属技术领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干简单推演或替换。The above content is a further detailed description of the present invention in conjunction with specific embodiments, and it cannot be assumed that the specific implementation of the present invention is limited to these descriptions. Those of ordinary skill in the technical field to which the present invention belongs can also make some simple deduction or replacement without departing from the concept of the present invention.

Claims (7)

1.一种量子点膜,其特征在于,包括:1. A quantum dot film, characterized in that, comprising: 基板(1);Substrate (1); 量子点层(3);quantum dot layer (3); 缓冲层(2),其将所述量子点层(3)与所述基板(1)黏结固定;a buffer layer (2), which bonds and fixes the quantum dot layer (3) and the substrate (1); 保护层(4),其形成于所述量子点层(3)上并将所述量子点层(3)封裹住,以对所述量子点层(3)进行保护;A protective layer (4), which is formed on the quantum dot layer (3) and encapsulates the quantum dot layer (3), so as to protect the quantum dot layer (3); 水氧阻隔层(5),其将所述基板(1)、所述缓冲层(2)、所述量子点层(3)和所述保护层(4)全部封裹于其内;以及A water and oxygen barrier layer (5), which encapsulates the substrate (1), the buffer layer (2), the quantum dot layer (3) and the protective layer (4) therein; and 固化层(6),其将所述水氧阻隔层(5)封裹于其内,以对所述水氧阻隔层(5)进行保护。A solidified layer (6), which encapsulates the water-oxygen barrier layer (5) therein, so as to protect the water-oxygen barrier layer (5). 2.根据权利要求1所述的量子点膜,其特征在于,所述基板(1)为高分子材料。2. The quantum dot film according to claim 1, characterized in that, the substrate (1) is a polymer material. 3.根据权利要求2所述的量子点膜,其特征在于,所述基板(1)为PET材料。3. The quantum dot film according to claim 2, characterized in that the substrate (1) is a PET material. 4.根据权利要求1所述的量子点膜,其特征在于,所述保护层(4)为耐高温树脂。4. The quantum dot film according to claim 1, characterized in that, the protective layer (4) is a high temperature resistant resin. 5.根据权利要求4所述的量子点膜,其特征在于,所述保护层(4)为烯酸类树脂、环氧类树脂或聚酰亚胺类树脂。5. The quantum dot film according to claim 4, characterized in that, the protective layer (4) is an acrylic resin, an epoxy resin or a polyimide resin. 6.一种如权利要求1~5中任一权利要求所述量子点膜的制备方法,其特征在于,包括:6. A method for preparing a quantum dot film according to any one of claims 1 to 5, characterized in that, comprising: 提供基板(1);providing a substrate (1); 在所述基板(1)上形成缓冲层(2);forming a buffer layer (2) on the substrate (1); 在所述缓冲层(2)上形成量子点层(3);forming a quantum dot layer (3) on the buffer layer (2); 在所述量子点层(3)上形成将所述量子点层(3)封裹住的保护层(4);forming a protective layer (4) enclosing the quantum dot layer (3) on the quantum dot layer (3); 形成将所述基板(1)、所述缓冲层(2)、所述量子点层(3)和所述保护层(4)全部封裹于其内的水氧阻隔层(5);forming a water and oxygen barrier layer (5) encapsulating the substrate (1), the buffer layer (2), the quantum dot layer (3) and the protective layer (4) therein; 形成将所述水氧阻隔层(5)封裹于其内的固化层(6)。A cured layer (6) encapsulating the water and oxygen barrier layer (5) is formed. 7.根据权利要求6所述的制备方法,其特征在于,所述水氧阻隔层(5)采用原子沉积技术形成。7. The preparation method according to claim 6, characterized in that, the water-oxygen barrier layer (5) is formed by atomic deposition technology.
CN201610792440.4A 2016-08-31 2016-08-31 Quantum dot film and preparation method thereof Pending CN106374028A (en)

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CN109828408A (en) * 2017-11-23 2019-05-31 张家港康得新光电材料有限公司 Novel backlight module structure and its application
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