CN106289068B - A kind of two degrees of freedom heterodyne grating interferometer displacement measurement method - Google Patents
A kind of two degrees of freedom heterodyne grating interferometer displacement measurement method Download PDFInfo
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- 238000006073 displacement reaction Methods 0.000 title claims abstract description 49
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
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Abstract
A kind of two degrees of freedom heterodyne grating interferometer displacement measurement method, the measuring system that the measurement method uses include reading head, measure grating, electronic signal process component.The two degrees of freedom measurement method is：Reading head provides two beams measurement light and is incident to measurement grating with Littrow angle, two beam diffraction lights are generated along backtracking, reading head provides a heterodyne reference electrical signal and two heterodyne measurement electric signals are input to electronic signal process component, realizes that the displacement of two degree of freedom exports through resolving.The measurement method avoids polarization aliasing, can realize the even higher resolution ratio of nanometer and precision, and measures the big travel displacement of two degrees of freedom simultaneously.Have many advantages, such as insensitive to environment, compact-sized, small, light weight using the measuring system of the measurement method, needs the occasion that multiple degrees of freedom accurate displacement measures suitable for Ultra-precision Stages of Lithography, precision machine tool etc..
Description
Technical field
The present invention relates to a kind of grating measuring method, more particularly to a kind of two degrees of freedom heterodyne grating interferometer measurement side
Method belongs to displacement measurement technology field.
Background technology
Optical grating measuring system is widely used in numerous electromechanical equipments as a kind of typical displacement sensor.Grating measuring system
The measuring principle of system is based primarily upon Moire fringe principle and diffraction interference principle.Optical grating measuring system based on Moire fringe principle
It is long, at low cost with its ranging as a kind of displacement sensor of mature, be easy to many merits such as adjustment become numerous electromechanics
The first choice of equipment displacement measurement, but precision is common in general industry application usually in micron dimension.
Ultraprecise displacement measuring technology is in three coordinate measuring machine, ultra-precision table system, meter level grating manufacturing apparatus etc.
There is important application in industry measurement equipment.Litho machine in semiconductor manufacturing equipment is set in semiconductor chip fabrication
It is standby, as the motion control of the development of semiconductor processing industry, the ultra-precision table system applied to litho machine is particularly important.
Ultra-precision table system becomes ultraprecise kinetic system with the movement characteristics such as its high speed, high acceleration, big stroke, ultraprecise, multiple degrees of freedom
Most representative a kind of system in system.To realize that above-mentioned movement, ultra-precision table system generally use two-frequency laser interferometer are surveyed
Measure systematic survey ultra-precision table system multiple degrees of freedom displacement.Refer to however as movements such as measurement accuracy, measurement distance, measuring speeds
Target is continuously improved, two-frequency laser interferometer is difficult to improve with environmental sensitivity, measuring speed, occupied space, it is expensive, survey
A series of problems, such as amount target workpiece platform is difficult to manufacture and design control is difficult to meet measurement demand.
In view of the above-mentioned problems, each major company and research institution in ultra precise measurement field expand a series of grind in the world
Study carefully, research focuses primarily upon the optical grating measuring system based on diffraction interference principle, and achievement in research has in many patent papers
It discloses.Dutch ASML companies United States Patent (USP) US7,102,729 B2 (publication date 2005 on August 4), US7,483,120 B2 are (public
Open on November 2007 day 15), US7,940,392 B2 (publication date on December 24th, 2009), publication number US2010/
0321665 A1 (publication date on December 23rd, 2010) discloses a kind of plane grating applied to Ultra-precision Stages of Lithography
Measuring system and arrangement, the measuring system mainly measure work stage using one-dimensional or two-dimensional plane grating cooperation reading head
Horizontal big travel displacement, short transverse displacement measurement is using height sensors such as current vortex or interferometers, but multiple sensors
Using limitation work stage measurement accuracy.ZYGO companies of U.S. U.S. Patent Publication No. US2011/0255096 A1 (publication date 2011
On October 20, in) a kind of optical grating measuring system applied to Ultra-precision Stages of Lithography is disclosed, which uses two
Tieing up grating coordinates specific reading head to realize displacement measurement, can be carried out at the same time horizontal direction and vertical deviation measures, but is large-sized
Two-dimensional grating cost is extremely expensive；Japanese CANON companies U.S. Patent Publication No. US2011/0096334 A1 (publication date 2011
On April 28, in) a kind of heterodyne ineterferometer is disclosed, using grating as target mirror in the interferometer, but the interferometer is only capable of reality
Existing one-dimensional measurement.Japanese scholars GAOWEI is in research paper " Design and construction of a two-degree-
of‐freedom linear encoder for nanometric measurement of stage position and
It is proposed in straightness.Precision Engineering 34 (2010) 145-155 " a kind of former using diffraction interference
The single-frequency two-dimensional grating measuring system of reason, the optical grating measuring system can be achieved at the same time it is horizontal and vertical to displacement measurement, but by
In using single-frequency laser, measuring signal is easily disturbed, and precision is difficult to ensure.Chinese patent literature publication number CN103759657A
(publication date on 04 30th, 2014) and CN103759656A (publication date on 04 30th, 2014) individually disclose a kind of heterodyne
Grating interferometer measuring system, in the reading header structure in two kinds of interferometer measuring systems so that its again to vertical measure when
Stroke it is very small, the measurement of larger stroke cannot be carried out to catenary motion, application range is restricted.
In view of the limitation of above-mentioned technical proposal, it is dry to seek a kind of two degrees of freedom heterodyne grating using optical beat principle
Interferometer measurement method will have simple for structure, small, light weight using the measuring system of the measurement method, be easily installed, side
Just the advantages that applying.The measurement method can realize the even higher resolution ratio of sub-nanometer and precision, and can measure two simultaneously
The big travel displacement of degree of freedom.The two degrees of freedom heterodyne grating interferometer displacement measurement method can be applied to litho machine ultraprecise work
Part platform, precision machine tool, three coordinate measuring machine, semiconductor detection etc. need the occasion that multiple degrees of freedom accurate displacement measures.
Invention content
The object of the present invention is to provide a kind of two degrees of freedom heterodyne grating interferometer measurement methods, which can be real
The existing even higher resolution ratio of sub-nanometer and precision, and the big travel displacement of two degree of freedom can be measured simultaneously.
Technical scheme is as follows：
A kind of two degrees of freedom heterodyne grating interferometer displacement measurement method, it is characterised in that this method comprises the following steps：
1) measuring system is built：The measuring system includes reading head, measures grating and electronic signal process component；
The reading head includes double-frequency laser generator, interferometer, the first photoelectric conversion unit, the second opto-electronic conversion list
Member, third photoelectric conversion unit；The double-frequency laser generator includes laser tube, pin hole, collimation lens, spectroscope, the first sound
Optical modulator, second sound-optic modulator, the first light trap, the second light trap, the first speculum, the second speculum, the first polarizing film,
Two polarizing films, the first highly transmissive spectroscope, the second highly transmissive spectroscope, reference signal synthesis unit；The interferometer includes the
One interferometer spectroscope, the second interferometer spectroscope, the first reflector, the second reflector；
2) measuring system of step 1) is utilized to measure：
A) laser tube of double-frequency laser generator is emitted a branch of single-frequency laser, and the single-frequency laser is through needle passing hole and collimation lens
After collimation, the light that power is identical, the direction of propagation is vertical is divided into two bundles through spectroscope, two-beam respectively through first sound-optic modulator and
Diffraction light, including two beam zero-order diffraction lights and two beam first-order diffraction light, two beam zero-order diffraction lights are generated after second sound-optic modulator
It is intercepted respectively by the first light trap and the second light trap, two beam first-order diffraction light are respectively through the first speculum, the first polarizing film and second
After speculum, the second polarizing film, it is incident to the first highly transmissive spectroscope and the second highly transmissive spectroscope；
B) the smaller light of the first highly transmissive spectroscope and the second highly transmissive spectroscope reflect two beam powers, is incident to ginseng
Examine signal synthesis unit, synthetic heterodyne reference optical signal, what the first highly transmissive spectroscope and the second highly transmissive spectroscope transmitted
The larger light of two beam powers forms non co axial double-frequency laser, is emitted to interferometer, and the non co axial double-frequency laser is polarization side
To identical, the direction of propagation is consistent, and light path is parallel, and there are two beam laser of certain frequency difference；
C) heterodyne reference optical signal is emitted to third photoelectric conversion unit, is converted to heterodyne reference electrical signal, defeated through cable
Go out to electronic signal process component；
D) incident beam of laser is divided into the first reference light and the first measurement light by the first interferometer spectroscope of interferometer,
First reference light is incident to the second photoelectric conversion unit through the second interferometer spectroscope；First measure light after the first reflector with
Littrow angle, which is incident to, to be measured grating and diffraction occurs, and diffraction light backtracking is generated, through the first reflector, the first interferometer point
The first photoelectric conversion unit is incident to after light microscopic；
E) incident beam of laser is divided into the second reference light and the second measurement light by the second interferometer spectroscope of interferometer,
Second reference light is incident to the first photoelectric conversion unit through the first interferometer spectroscope；Second measure light after the second reflector with
Littrow angle, which is incident to, to be measured grating and diffraction occurs, and diffraction light backtracking is generated, through the second reflector, the second interferometer point
The second photoelectric conversion unit is incident to after light microscopic；
F) diffraction light of the first reference light and the second measurement light is overlapped and is interfered before the second photoelectric conversion unit, shape
At the first beat frequency optical signal I1, it is expressed as：
Wherein, Er1Indicate the light vector of the first reference light, Em2Indicate the light vector for the diffraction light that second measures light, IDC1Table
Show the amplitude of the DC component in light intensity signal, IAC1Indicate that the amplitude of the AC compounent in light intensity signal, f indicate double-frequency laser
Frequency difference,Indicate the phase change value caused by measurement grating in the x and z directions displacement；
The diffraction light of second reference light and the first measurement light is overlapped and is interfered before the first photoelectric conversion unit, is formed
Second beat frequency optical signal I2, it is expressed as：
Wherein, Er2Indicate the light vector of the second reference light, Em1Indicate the light vector for the diffraction light that first measures light, IDC2Table
Show the amplitude of the DC component in light intensity signal, IAC2Indicate that the amplitude of the AC compounent in light intensity signal, f indicate double-frequency laser
Frequency difference,Indicate the phase change value caused by measurement grating in the x and z directions displacement.
g)I1And I2Heterodyne measurement electric signal is converted to by the second photoelectric conversion unit and the first photoelectric conversion unit respectively,
It is exported to electronic signal process component through cable；
H) by a) to g), electronic signal process component obtains a heterodyne reference electrical signal and two heterodyne measurement telecommunications
Number, do signal demodulation processing, obtain include X and Z both direction displacement informations phase change valueWithIt is expressed as：
Wherein, d is the pitch for measuring grating, λ1And λ2For the wavelength of double-frequency laser, θ1It is λ for wavelength1Laser light incident extremely
Measure the Littrow angle of grating, θ2It is λ for wavelength2Laser light incident to the Littrow angle for measuring grating, Δ x is X-direction to be asked
Shift value, Δ z are Z-direction shift value to be asked；
By known parameter value d, λ1、λ2、θ1、θ2It brings into above-mentionedWithExpression formula, obtain a simple binary
Linear function group, solve equation group, to must measure grating X-direction and Z-direction shift value Δ x and Δ z, to realize
Two degrees of freedom displacement measurement.
In the above-mentioned technical proposal of the present invention, the measurement grating is one-dimensional reflecting grating.Reference signal synthesis unit
Including the first reference signal speculum, the second reference signal speculum and transmission grating.
The skill of a kind of the advantages of two degrees of freedom heterodyne grating interferometer displacement measurement method of the present invention and high-lighting
Art effect：
1. significantly avoiding polarization aliasing error, the even higher resolution ratio of sub-nanometer and precision are realized；
2. measurement accuracy is affected by the external environment small；
3. the big travel displacement of two degree of freedom can be measured simultaneously；
4. used measuring system reading head is small, light weight, is easily installed, facilitate application；
5. can be applied to Ultra-precision Stages of Lithography, precision machine tool, three coordinate measuring machine, semiconductor detection etc.
In the accurate measurement of work stage multiple degrees of freedom displacement.
Description of the drawings
Fig. 1 is the measuring system signal that a kind of two degrees of freedom heterodyne grating interferometer displacement measurement method of the present invention uses
Figure.
Fig. 2 is a kind of reference signal synthesis unit schematic diagram of the present invention.
Fig. 3 is the principle schematic that the present invention measures Z-direction displacement.
In figure, 1 --- reading head, 2 --- measurement grating, 3 --- electronic signal process component；11 --- double-frequency laser is sent out
Raw device, 12 --- interferometer, 13 --- the first photoelectric conversion unit, 14 --- the second photoelectric conversion unit, 15 --- third light
Electric converting unit；111 --- laser tube, 112 --- pin hole, 113 --- collimation lens, 114 --- spectroscope, 115 ---
One acousto-optic modulator, 115' --- second sound-optic modulator, 116 --- the first light trap, 116' --- the second light trap, 117 ---
First speculum, 117' --- the second speculum, 118 --- the first polarizing film, 118' --- the second polarizing film, 119 --- the
One highly transmissive spectroscope, 119' --- the second highly transmissive spectroscope, 110 --- reference signal synthesis unit；121 --- first is dry
Interferometer spectroscope, 122 --- the second interferometer spectroscope, 123 --- the first reflector, 124 --- the second reflector；
1101 --- the first reference signal speculum, 1102 --- the second reference signal speculum, 1103 --- transmission grating.
Specific implementation mode
Structure, principle and the specific implementation mode of the present invention are described in further detail below in conjunction with the accompanying drawings.
Referring to FIG. 1, the survey that a kind of two degrees of freedom heterodyne grating interferometer displacement measurement method that Fig. 1 is the present invention uses
System schematic is measured, which includes reading head 1, measures grating 2, electronic signal process component 3.
The reading head 1 includes double-frequency laser generator 11, interferometer 12, the first photoelectric conversion unit 13, the second photoelectricity
Converting unit 14, third photoelectric conversion unit 15；The double-frequency laser generator 11 includes laser tube 111, pin hole 112, collimation
Lens 113, spectroscope 114, first sound-optic modulator 115, second sound-optic modulator 115', the first light trap 116, the second light trap
116', the first speculum 117, the second speculum 117', the first polarizing film 118, the second polarizing film 118', the first highly transmissive light splitting
Mirror 119, the second highly transmissive spectroscope 119', reference signal synthesis unit 110；The interferometer 12 is divided including the first interferometer
Mirror 121, the second interferometer spectroscope 122, the first reflector 123, the second reflector 124.
Two degrees of freedom heterodyne grating interferometer displacement measurement method described in Fig. 1 comprises the following steps：
1) laser tube 111 of double-frequency laser generator 11 is emitted a branch of single-frequency laser, and the single-frequency laser is through 112 He of needle passing hole
After collimation lens 113 collimates, the light that power is identical, the direction of propagation is vertical is divided into two bundles through spectroscope 114, two-beam is respectively through the
Diffraction light, including two beam zero-order diffraction lights and two beam first-order diffraction light are generated after one acousto-optic modulator and second sound-optic modulator,
Two beam zero-order diffraction lights are intercepted by the first light trap 116 and the second light trap 116' respectively, and two beam first-order diffraction light are anti-through first respectively
After penetrating mirror 117, the first polarizing film 118 and the second speculum 117', the second polarizing film 118', it is incident to the first highly transmissive spectroscope
The 119 and second highly transmissive spectroscope 119'；
2) the smaller light of the first highly transmissive spectroscope and the second highly transmissive spectroscope reflect two beam powers, is incident to ginseng
Examine signal synthesis unit 110, synthetic heterodyne reference optical signal, the first highly transmissive spectroscope 119 and the second highly transmissive spectroscope
The larger light of two beam powers that 119' is transmitted, forms non co axial double-frequency laser, is emitted to interferometer 12, and the non co axial is double
Frequency laser is that polarization direction is identical, and the direction of propagation is consistent, and light path is parallel, and there are two beam laser of certain frequency difference；
3) heterodyne reference optical signal is emitted to third photoelectric conversion unit 15, heterodyne reference electrical signal is converted to, through cable
It exports to electronic signal process component 3；
4) incident beam of laser is divided into the first reference light and first and measured by the first interferometer spectroscope 121 of interferometer
Light, the first reference light are incident to the second photoelectric conversion unit 14 through the second interferometer spectroscope 122；First measurement light is anti-through first
It is incident to Littrow angle after emitter 123 and measures grating and diffraction occurs, diffraction light backtracking is generated, through the first reflector
123, it is incident to the first photoelectric conversion unit 13 after the first interferometer spectroscope 121；
5) incident beam of laser is divided into the second reference light and the second measurement light by the second interferometer spectroscope of interferometer,
Second reference light is incident to the first photoelectric conversion unit through the first interferometer spectroscope；Second measure light after the second reflector with
Littrow angle, which is incident to, to be measured grating and diffraction occurs, and diffraction light backtracking is generated, through the second reflector, the second interferometer point
The second photoelectric conversion unit is incident to after light microscopic；
6) diffraction light of the first reference light and the second measurement light is overlapped and is interfered before the second photoelectric conversion unit, shape
At the first beat frequency optical signal I1, it is expressed as：
Wherein, Er1Indicate the light vector of the first reference light, Em2Indicate the light vector for the diffraction light that second measures light, IDC1Table
Show the amplitude of the DC component in light intensity signal, IAC1Indicate that the amplitude of the AC compounent in light intensity signal, f indicate double-frequency laser
Frequency difference,Indicate the phase change value caused by measurement grating in the x and z directions displacement.
The diffraction light of second reference light and the first measurement light is overlapped and is interfered before the first photoelectric conversion unit, is formed
Second beat frequency optical signal I2, it is expressed as：
Wherein, Er2Indicate the light vector of the second reference light, Em1Indicate the light vector for the diffraction light that first measures light, IDC2Table
Show the amplitude of the DC component in light intensity signal, IAC2Indicate that the amplitude of the AC compounent in light intensity signal, f indicate double-frequency laser
Frequency difference,Indicate the phase change value caused by measurement grating in the x and z directions displacement.
7)I1And I2Heterodyne measurement electric signal is converted to by the second photoelectric conversion unit and the first photoelectric conversion unit respectively,
It is exported to electronic signal process component through cable；
8) by 1) to 7), electronic signal process component obtains a heterodyne reference electrical signal and two heterodyne measurement telecommunications
Number, do signal demodulation processing, obtain include X and Z both direction displacement informations phase change valueWithIt is expressed as：
Wherein, d is the pitch for measuring grating, λ1And λ2For the wavelength of double-frequency laser, θ1It is λ for wavelength1Laser light incident extremely
Measure the Littrow angle of grating, θ2It is λ for wavelength2Laser light incident to the Littrow angle for measuring grating, Δ x is X-direction to be asked
Shift value, Δ z are Z-direction shift value to be asked.
By known parameter value d, λ1、λ2、θ1、θ2It brings into above-mentionedWithExpression formula, obtain a simple binary
Linear function group solves equation group, to measure grating in the shift value Δ x and Δ z of X-direction and Z-direction, realizes two certainly
By degree displacement measurement.
Referring to FIG. 2, Fig. 2 is a kind of reference signal synthesis unit schematic diagram of the present invention, reference signal synthesis unit includes
First reference signal speculum 1101, the second reference signal speculum 1102, transmission grating 1103.
The principle of reference signal synthesis unit described in Fig. 2 comprises the following steps：
First reference signal speculum and the second reference signal speculum are high by the first highly transmissive spectroscope and second respectively
The two beam laser that transmission spectroscope reflects reflex to the same position of transmission grating at a certain angle, generate two beams of coincidence
Diffraction light, the diffraction light beat frequency that two beams overlap form heterodyne reference optical signal.
Referring to FIG. 3, Fig. 3 is the principle schematic that the present invention measures Z-direction displacement, when measurement grating is only along Z-direction displacement
When, the light path of the measurement light changes, and changing value is
Wherein, Δ L1To measure the change in optical path length value of light, Δ z is the shift value for measuring grating along Z-direction, and θ is the measurement
Light is incident to the Littrow angle for measuring grating.
Meanwhile the inswept grating grid of measurement light, generate corresponding Doppler shift frequency, the change in displacement of inswept grating grid
Value is
ΔL2=Δ z × tan (θ)
Wherein, Δ L2For the changing value of the inswept grating of negative one order diffraction light.
So when measuring grating along Z-direction displacement, the phase change value finally resolved contains the light path for measuring light
The change in displacement value of changing value and inswept grating grid.
Above-mentioned two degrees of freedom heterodyne grating interferometer displacement measurement method can not only realize the even higher resolution of sub-nanometer
Rate and precision, and can measure the big travel displacement of two degree of freedom simultaneously, more have both that the measuring system used is small, quality
The many merits such as gently, environmental sensitivity is weak.Can be applied to Ultra-precision Stages of Lithography, precision machine tool, three coordinate measuring machine,
In the accurate measurement of the work stage multiple degrees of freedom displacement of semiconductor detection etc..
Claims (3)
1. a kind of two degrees of freedom heterodyne grating interferometer displacement measurement method, it is characterised in that this method comprises the following steps：
1) measuring system is built：The measuring system includes reading head (1), measures grating (2) and electronic signal process component
(3)；
The reading head (1) includes double-frequency laser generator (11), interferometer (12), the first photoelectric conversion unit (13), second
Photoelectric conversion unit (14) and third photoelectric conversion unit (15)；The double-frequency laser generator (11) include laser tube (111),
Pin hole (112), collimation lens (113), spectroscope (114), first sound-optic modulator (115), second sound-optic modulator (115'),
First light trap (116), the second light trap (116'), the first speculum (117), the second speculum (117'), the first polarizing film
(118), the second polarizing film (118'), the first highly transmissive spectroscope (119), the second highly transmissive spectroscope (119') and reference signal
Synthesis unit (110)；The interferometer (12) include the first interferometer spectroscope (121), the second interferometer spectroscope (122),
First reflector (123), the second reflector (124)；
2) measuring system of step 1) is utilized to measure：
A) laser tube (111) of double-frequency laser generator (11) is emitted a branch of single-frequency laser, and the single-frequency laser is through needle passing hole (112)
After being collimated with collimation lens (113), the light that power is identical, the direction of propagation is vertical, two-beam point are divided into two bundles through spectroscope (114)
Diffraction light, including two beam zero-order diffraction lights are not generated after first sound-optic modulator (115) and second sound-optic modulator (115')
With two beam first-order diffraction light, two beam zero-order diffraction lights are intercepted by the first light trap (116) and the second light trap (116') respectively, two beams one
Order diffraction light is respectively through the first speculum (117), the first polarizing film (118) and the second speculum (117'), the second polarizing film
After (118'), it is incident to the first highly transmissive spectroscope (119) and the second highly transmissive spectroscope (119')；
B) the smaller light of the first highly transmissive spectroscope (119) and the second highly transmissive spectroscope (119') reflect two beam powers,
It is incident to reference signal synthesis unit (110), synthetic heterodyne reference optical signal, the first highly transmissive spectroscope (119) and second high
The larger light of transmission spectroscope (119') two beam powers for transmiting, forms non co axial double-frequency laser, is emitted to interferometer (12)；
C) heterodyne reference optical signal is emitted to third photoelectric conversion unit (15), is converted to heterodyne reference electrical signal, defeated through cable
Go out to electronic signal process component (3)；
D) incident beam of laser is divided into the first reference light and first and surveyed by the first interferometer spectroscope (121) of interferometer (12)
Light is measured, the first reference light is incident to the second photoelectric conversion unit (14) through the second interferometer spectroscope (122)；First measures light warp
It is incident to Littrow angle after first reflector (123) and measures grating (2) and diffraction occurs, generate diffraction light backtracking, warp
It is incident to the first photoelectric conversion unit (13) after first reflector (123), the first interferometer spectroscope (121)；
E) incident beam of laser is divided into the second reference light and second and surveyed by the second interferometer spectroscope (122) of interferometer (12)
Light is measured, the second reference light is incident to the first photoelectric conversion unit (13) through the first interferometer spectroscope (121)；Second measures light warp
It is incident to Littrow angle after second reflector (124) and measures grating (2) and diffraction occurs, generate diffraction light backtracking, warp
It is incident to the second photoelectric conversion unit (14) after second reflector (124), the second interferometer spectroscope (122)；
F) diffraction light of the first reference light and the second measurement light is overlapped before the second photoelectric conversion unit (14) and is interfered, shape
At the first beat frequency optical signal I1, diffraction light coincidence before the first photoelectric conversion unit (13) of the second reference light and the first measurement light
And interfere, form the second beat frequency optical signal I2；
g)I1And I2Heterodyne measurement telecommunications is converted to by the second photoelectric conversion unit (14) and the first photoelectric conversion unit (13) respectively
Number, it is exported to electronic signal process component (3) through cable；
H) by a) to g), electronic signal process component (3) obtains a heterodyne reference electrical signal and two heterodyne measurement electric signals,
Do signal demodulation processing, obtain include X and Z both direction displacement informations phase change valueWithIt is expressed as：
Wherein, d is the pitch for measuring grating (2), λ1And λ2For two wavelength of double-frequency laser, θ1It is λ for wavelength1Laser light incident
To the Littrow angle for measuring grating (2), θ2It is λ for wavelength2Laser light incident to the Littrow angle for measuring grating (2), Δ x is to wait for
The X-direction shift value asked, Δ z are Z-direction shift value to be asked；
By known parameter value d, λ1、λ2、θ1、θ2It brings into above-mentionedWithExpression formula, it is primary to obtain a simple binary
Equation group solves equation group, to measure grating (2) respectively in the shift value Δ x and Δ z in X-direction and Z-direction, realizes
Two degrees of freedom displacement measurement.
2. a kind of two degrees of freedom heterodyne grating interferometer displacement measurement method according to claim 1, it is characterised in that：It surveys
It is one-dimensional reflecting grating to measure grating (2).
3. a kind of two degrees of freedom heterodyne grating interferometer displacement measurement method according to claim 1, it is characterised in that：Ginseng
It includes the first reference signal speculum (1101), the second reference signal speculum (1102) and saturating to examine signal synthesis unit (110)
Penetrate grating (1103).
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| CN107655411B (en) * | 2017-08-24 | 2019-10-15 | 中国科学院长春光学精密机械与物理研究所 | The grating displacement measuring system of long stroke, high-acruracy survey |
| CN107462166B (en) * | 2017-08-24 | 2019-10-15 | 中国科学院长春光学精密机械与物理研究所 | Long stroke, high precision displacement measurement method based on diffraction grating |
| CN107607045B (en) * | 2017-08-24 | 2019-12-13 | 中国科学院长春光学精密机械与物理研究所 | Long-stroke and high-precision displacement measuring system based on diffraction grating |
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| CN111947580B (en) * | 2020-08-24 | 2021-06-01 | 中国科学院长春光学精密机械与物理研究所 | Multi-spliced sub-mirror multi-degree-of-freedom displacement monitoring system |
| CN112504131B (en) * | 2020-11-17 | 2022-01-28 | 中国科学院长春光学精密机械与物理研究所 | Heterodyne one-dimensional grating displacement measuring device |
| CN112484648B (en) * | 2020-11-18 | 2022-06-10 | 北京华卓精科科技股份有限公司 | Displacement measurement system and method for heterodyne optical fiber interferometer |
| CN113865480A (en) * | 2021-09-18 | 2021-12-31 | 桂林电子科技大学 | Heterodyne grating interferometer reading head system signal analysis method based on ZEMAX simulation |
| CN115390364A (en) * | 2022-07-22 | 2022-11-25 | 北京华卓精科科技股份有限公司 | Exposure period adjusting device and method |
| CN117948897B (en) * | 2024-03-27 | 2024-06-04 | 中国科学院长春光学精密机械与物理研究所 | Mixed displacement measuring device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201653358U (en) * | 2009-12-31 | 2010-11-24 | 范光照 | Novel linear diffraction grating interferometer structure |
| CN102944176A (en) * | 2012-11-09 | 2013-02-27 | 清华大学 | Displacement measuring system of heterodyne grating interferometer |
| CN103673892A (en) * | 2013-11-21 | 2014-03-26 | 清华大学 | Symmetric-type grating heterodyne interference secondary diffraction measuring device |
| CN104359411A (en) * | 2014-12-01 | 2015-02-18 | 清华大学 | Displacement measurement system capable of measuring by virtue of grating |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0587528A (en) * | 1991-09-27 | 1993-04-06 | Canon Inc | Method and device for measuring optical heterodyne interference |
| JP2011220890A (en) * | 2010-04-12 | 2011-11-04 | Canon Inc | Heterodyne interferometric displacement measurement apparatus |
-
2016
- 2016-07-22 CN CN201610587101.2A patent/CN106289068B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201653358U (en) * | 2009-12-31 | 2010-11-24 | 范光照 | Novel linear diffraction grating interferometer structure |
| CN102944176A (en) * | 2012-11-09 | 2013-02-27 | 清华大学 | Displacement measuring system of heterodyne grating interferometer |
| CN103673892A (en) * | 2013-11-21 | 2014-03-26 | 清华大学 | Symmetric-type grating heterodyne interference secondary diffraction measuring device |
| CN104359411A (en) * | 2014-12-01 | 2015-02-18 | 清华大学 | Displacement measurement system capable of measuring by virtue of grating |
Non-Patent Citations (2)
| Title |
|---|
| A NOVEL HETERODYNE GRATING INTERFEROMTER SYSTEM FOR IN一PLANE AND OUT-OF-PLANE DISPLACEMENT MEASUREMENT WITH NANOMETER RESOLUTION;Lei J. Wang等;《ResearchGate》;20141231;第173-177 * |
| 衍射光栅外差干涉测量的研究;赵斌等;《江西科学》;20030331;第21卷(第1期);第46-49页 * |
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