CN106066580B - A kind of adaptive levelling device of workbench - Google Patents
A kind of adaptive levelling device of workbench Download PDFInfo
- Publication number
- CN106066580B CN106066580B CN201610378576.0A CN201610378576A CN106066580B CN 106066580 B CN106066580 B CN 106066580B CN 201610378576 A CN201610378576 A CN 201610378576A CN 106066580 B CN106066580 B CN 106066580B
- Authority
- CN
- China
- Prior art keywords
- elastic
- leveling board
- elastic mechanism
- workbench
- elastic support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Machine Tool Units (AREA)
- Accommodation For Nursing Or Treatment Tables (AREA)
Abstract
The invention discloses a kind of adaptive levelling device of workbench, including moving mechanism and elastic mechanism, the moving mechanism includes leveling board, the elastic mechanism includes elastic support, elastic mechanism rotating shaft, multiple elastic mechanism elastomeric elements, the multiple elastic mechanism part is respectively arranged at the different forced positions of the elastic support, the leveling board applies pressure in the state of stress to the elastic mechanism elastomeric element of certain corresponding forced position on the elastic support, the forced position beyond certain described forced position on the elastic support can be rotated around the elastic mechanism rotating shaft towards the leveling board, and elastic force is applied to the leveling board by corresponding elastic mechanism elastomeric element.Its small volume of the invention, light weight, Stability Analysis of Structures is reliable, is related to contact photoetching machine equipment technical field, and manual alignment positioning and automatic alignment positioning are applicable.
Description
【Technical field】
The present invention relates to a kind of adaptive levelling device of workbench.
【Background technology】
The workbench of lithography machine contact adaptive levelling gear of photoetching is the pass in the core component Alignment stage of litho machine
Key mechanism, the mechanism directly embodies the technical merits such as development, production, manufacture, the assembling of litho machine, is the core skill of litho machine
Art.
The basic application principle of litho machine contact photolithography:Adaptive levelling gear is installed on Z workbench, adaptive leveling
The slide holder for placing wafer is installed in mechanism.Mask blank is fixed on above workbench;During work, by controlling Z to work
Platform rises contact mask blank, it is desirable to which wafer is in close contact mask blank, then by the lithography of mask to crystalline substance
On the coated face of disk;Require that wafer coated face is in close contact completely with mask graph face during lithography, could be in crystalline substance
The figure on preferable mask is obtained on disk coated face, otherwise, is duplicated to the figure on the figure and mask on wafer
Shape deviant causes waste product than larger.Due to the plane error of manufacture, rigging error and mask blank, it is impossible to ensure brilliant
Disk contacts complete laminating firmly with lithography mask version, and wafer coated face has a key groove with mask graph face, in order to
Eliminate this key groove, workbench must possess adaptive levelling function, make up manufacture, processing equal error, it is ensured that wafer with
Lithography mask version is in close contact.
The levelling gear of country's litho machine configuration, complicated at present, and volume is big, quality weight, and it is right manually to can be only applied to
Certainly position litho machine, is not suitable on automatic alignment positioning litho machine.Automatic alignment positioning litho machine, its levelling gear is installed on
On the XY worktable platform of Electronic control movement.
【The content of the invention】
In order to overcome the deficiencies in the prior art, the invention provides a kind of adaptive leveling dress of reliable and stable workbench
Put.
A kind of adaptive levelling device of workbench, including moving mechanism and elastic mechanism, the moving mechanism include leveling
Plate, the elastic mechanism includes elastic support, elastic mechanism rotating shaft, multiple elastic mechanism elastomeric elements, the multiple elastic machine
Structure part is respectively arranged at the different forced positions of the elastic support, and the leveling board is in the state of stress to the elasticity
The elastic mechanism elastomeric element of certain corresponding forced position applies certain described stress position on pressure, the elastic support on bearing
Forced position beyond putting can be rotated around the elastic mechanism rotating shaft towards the leveling board, and pass through corresponding elastic mechanism elasticity
Part applies elastic force to the leveling board.
In one embodiment,
Also include leveling board limiting component, the leveling board limiting component is flat in setting height for limiting the leveling board
On face.
In one embodiment,
The angle that the elastic support is included between three elastic support arms, each elastic support arm is identical, the elasticity
Mechanism elastomeric element is respectively arranged at the same position of each elastic support arm.
In one embodiment,
The moving mechanism also includes elastic mechanism guiding parts, and the guiding parts is used to prevent the elastic support from existing
Rotated in the plane parallel with the leveling board.
In one embodiment,
The moving mechanism also includes elastic mechanism guiding parts, and the elastic support is provided with pilot hole, the leveling
The elastic mechanism guiding parts is installed, the elastic mechanism guiding parts is located in the pilot hole, prevents the bullet on plate
Property bearing rotates in the plane parallel with the leveling board.
In one embodiment,
Also include substrate, the moving mechanism also includes angular contact bearing, and the substrate is provided with bearing guide type shoe, institute
State elastic mechanism to be arranged between the substrate and leveling board, the angular contact bearing is installed in the leveling board and substrate phase
To one side, the bearing guide type shoe to the angular contact bearing make roll be oriented to.
In one embodiment,
Also include leveling board limiting component, the leveling board limiting component is flat in setting height for limiting the leveling board
On face, the leveling board limiting component includes upper limit position block and lower position block, and the lower position block is fixed on the substrate, institute
State upper limit position block to be fixed on the leveling board, the upper limit position block stretches into the lower section of the lower position block.
In one embodiment,
The angular contact bearing includes three angular contact bearings being evenly distributed on the circumference of leveling board, and the bearing is led
Include three bearing guide type shoes corresponding with three angular contact bearings respectively to bearing.
In one embodiment,
The elastic mechanism elastomeric element is included on ball stud, guide pin bushing, compression spring, spring end cap, the elastic support
Provided with guide pin bushing mounting hole, the guide pin bushing is fixed in guide pin bushing mounting hole, and the main body of the ball stud is located in the guide pin bushing and head
The guide pin bushing is stretched out in portion, and the compression spring is arranged between the ball stud and spring end cap, and the spring end cap is fixed on
On the elastic support.
In one embodiment,
Also include upper bulb plunger and lower bulb plunger, the upper bulb plunger is fixed on the lower position block, described
Lower bulb plunger is fixed on the substrate, the upper table of the upper bulb plunger and lower bulb plunger respectively with the upper limit position block
Face and lower surface are relative.
The beneficial effects of the invention are as follows:
Its small volume of the invention, light weight, Stability Analysis of Structures is reliable, is related to contact photoetching machine equipment technical field, opponent
Dynamic alignment positioning and automatic alignment positioning are applicable.Present apparatus compact conformation, easy care;Through experimental test, adaptive leveling is steady
It is fixed reliable.
【Brief description of the drawings】
Fig. 1 is the exploded perspective view of the adaptive levelling device of workbench of an embodiment of the present invention
Fig. 2 is Fig. 1 adaptive levelling device structural representation of workbench
Fig. 3 is another visual angle exploded perspective view of Fig. 1 adaptive levelling device of workbench
Fig. 4 is the moving mechanism exploded perspective view of Fig. 1 adaptive levelling device of workbench
Fig. 5 is the pedestal exploded perspective view of Fig. 1 adaptive levelling device of workbench
Fig. 6 is the elastic mechanism exploded perspective view of Fig. 1 adaptive levelling device of workbench
Fig. 7 is Fig. 6 elastic mechanism structural representation
Fig. 8 is Fig. 7 another viewing angle constructions schematic diagram of elastic mechanism
Fig. 9 is Fig. 6 viewing angle constructions schematic diagram of elastic mechanism one
Figure 10 is the A-A diagrammatic cross-sections of Fig. 9 elastic mechanism structure
Figure 11 is Fig. 1 adaptive levelling device partial structural diagram of workbench
Figure 12 is Fig. 1 adaptive levelling device structural representation of workbench
Figure 13 is Figure 12 adaptive levelling device B-B cross-sectional views of workbench
【Embodiment】
The preferred embodiment to invention is described in further detail below.
As shown in Fig. 1 to 13, a kind of adaptive levelling device of the workbench of embodiment includes:Pedestal 3, moving mechanism 1, bullet
Property mechanism 2 and slide holder 4.
Pedestal 3 includes substrate 31, upper bulb plunger 35, lower bulb plunger 34, lower limit fixed block 33, locking screw
37th, lock screw 38, pad 39 and bearing guide type shoe 32.Lower bulb plunger 34 is installed on substrate 31, upper bulb plunger 35
It is installed on lower limit fixed block 33, in one embodiment, lower limit fixed block 33 has 3, is evenly distributed on substrate 31
Some circumference on (into 120 ° between adjacent lower limit fixed block 33), (will also adjust for opposing connection motivation structure to be spacing about 1
Flat board 11 is limited to setting height), the moving amplitude of control moving mechanism 1;, can by the regulation up and down of 3 upper bulb plungers 35
Opposing connection motivation structure 1 carries out preliminary plane leveling;Simultaneously by lower regulation bulb plunger upwards, change the upper and lower displacement of moving mechanism
Amount, controls the reactive spring force of the opposing connection motivation structure 1 of elastic mechanism 2, that is, realizes the contact of the original state of regulation moving mechanism 1
Power.
Locking screw 37 is installed on lower limit fixed block 33, and upper bulb plunger 35 is carried out certainly by its head
Lock, the loosening for the upper bulb plunger 35 that prevents from working long hours.
Bearing guide type shoe 32 can have 3, be individually fixed on substrate 31, centered on substrate axis, into 120 degree
Uniformly, its into 60 ° of angles, (bulb plunger 35 is located at a certain group of adjacent bearing guide type shoe i.e. on some with upper bulb plunger 35
Between 32).Bearing 12 on the medial surface opposing connection motivation structure 1 of bearing guide type shoe 32 makees scroll-up/down guiding.Bearing is oriented to branch
The mounting hole of seat 32 is waist-shaped hole, can be adjusted inwards during installation, between the bearing 12 on elimination spigot surface and moving mechanism 1
Gap, it is to avoid moving mechanism 1 is in moving process because gap is rotated.
Lock screw 38 is locked by compress gasket 39 to bearing guide type shoe 32, it is to avoid process axis is used for a long time
Guide type shoe 32 is held to be subjected to displacement.
Moving mechanism 1 includes leveling board 11, bearing block 18, eccentric head screw 19, alignment pin 111, interior hexagonal cylindrical head spiral shell
Silk 110, bearing latch 16, angular contact bearing 12, bearing spacer 17, locking nut 15, upper limit position block 13 and the (bullet of guide finger 14
Property mechanism guiding parts).
There are 3 groups of step surfaces on leveling board 11, it is uniform into 120 ° centered on the axis of leveling board 11, for installing bearing block
18.Precision positioning bearing block 18 is carried out by step side and alignment pin 111, interior hexagonal cylindrical head screw 110 and bias is used
Head screw 19 is locked, the limited bearing 18 all directions frees degree of seat.Paired angular contact bearing 12 passes through bearing latch 16, axle
Spacer 17 is held to be installed on bearing block 18;Locked using locking nut 15, angular contact bearings 12 axially carry out prestretching, disappear
Except bearing clearance;In addition three groups of bearing setting height(from bottom)s are consistent, it is to avoid moving process causes precision unstable because there is guiding clearance.
Upper limit position block is installed on leveling board, and 120 degree uniform, with angular contact bearing into 60 degree of angles;Transferred and pacified by upper limit position block 13
Dress mode carries out carrying out leveling board 11 in spacing, the simplified structure of leveling board 11 and compression integral installation space.Guide finger 14 is installed
In on leveling board 11,120 ° centered on the axis of leveling board 11 uniform, with the spacing contact point on upper limit position block 13 in leveling
Same angle on plate 11.The tilted upward that guide finger 14 is used for elastic mechanism 2 is oriented to, and prevents elastic mechanism 2 when being pressurized
Rotation, causes the stability under loading of leveling board 11.
Elastic mechanism 2 includes elastic support 21, guide pin bushing 24, ball stud 25, compression spring 26, spring end cap 27, rotary shaft
29th, spherical bearing block 28, spherical bearing 22, bearing (ball) cover 210, spacer 212 and packing washer 211.Wherein, ball stud 25 and pressure
Contracting spring 26 constitutes elastomeric element.The angle that elastic support 2 is included between 3 elastic support arms, each elastic support arm is identical
(being 120 °).
Main body, the compression spring 26 of ball stud 25 are installed in guide pin bushing 24, and ball stud 25 can be flexible up and down, ball stud 25
Head stretch out guide pin bushing 24;Compression spring 26, ball stud 25, guide pin bushing 24 are fixed on elastic support 21 by spring end cap 27
Guide pin bushing mounting hole 23 in;3 groups of ball studs are uniform into 120 degree, namely are respectively distributed to the stress of each elastic support arm and (come from
The pressure that leveling board 11 applies) position.Spherical bearing 22 is installed in spherical bearing block 28, and ball is compressed by bearing (ball) cover 210
The outer ring of spherical bearing 22.Rotary shaft 29 is connected elastic support 21 with the inner ring interference fits of spherical bearing 22, and centre is by spacer 212
Separate;Elastic support 21 is fixed in rotary shaft 29 by packing washer 211, makes whole elastic support 29 can be with rotary shaft 29
Moving rotates.Spherical bearing block 28 on elastic mechanism 2 is fixed on the leveling board 11 of pedestal 1;The now bullet on elastic mechanism 2
Property bearing 21 up and down moving and rotation.
Moving mechanism 1 is installed on the top of elastic mechanism 2;Now 3 balls of the lower surface of moving mechanism 1 on elastic mechanism 2
Head pin 25 is supported, while by the upward reaction force of compression spring 26 below.Three groups are installed on the lower position block 33 of pedestal 1
The upper downward opposing connection motivation structure 1 of bulb plunger 35 carries out spacing.Guide finger 14 in moving mechanism 1 and the elasticity on elastic mechanism 2
Waist-shaped hole gap in bearing 21 coordinates, and limitation elastic mechanism 2 radially (is rotating) rotation in the plane parallel with the leveling board
Turn, the stress of moving mechanism 1 otherwise can be caused unstable.On pedestal 3 between three groups of bearing guide type shoes 32 and angular contact bearing 12 0
Gap is contacted, 120 degree of uniform positioning, the horizontal-shift of limitation moving mechanism 1 and radial rotary.
When the 11 upper surface certain point stress extruding of leveling board of moving mechanism 1, the run-off the straight of moving mechanism leveling board 11,
The elastic mechanism elastomeric element for being located at correspondence forced position of elastic mechanism 2 is squeezed below certain point simultaneously;It is former according to lever
Reason, when the current elastic mechanism elastomeric element stress of elastic mechanism 2 is tilted down, elastic support is fulcrum with spherical bearing 22,
Remaining end of elastic support will be inclined upwardly, and relevant pressure is applied to leveling board 11.Because the top of moving mechanism 1 is by upper ball head column
Fill in 35 spacing, moving mechanism 1 can not be shifted up so that each strong point of elastic mechanism 2 (elastic mechanism elastic force apparatus) by
Identical active force, i.e., every group compression spring 26 is identical with the stress of ball stud 25, and elastic mechanism 2 remains flat with moving mechanism 1
Row state.It is experimentally confirmed, no matter any point applies pressure on opposing connection motivation structure 1, and all of its upper surface stress value is equal
Approximately.
Slide holder 4 is installed in moving mechanism 1, with the moving of moving mechanism 1, replaceable different size wafer-supporting platforms.
The present apparatus is installed on Z workbench;During work, control Z axis rises, the high point and light of wafer upper surface coated face
Mask contact is carved, now contact force is delivered in moving mechanism 1, and the extruding force suffered by moving mechanism 1 is transferred to elastic mechanism 2
On, while the elastomeric element of elastic mechanism 2 is also with generation elastic deformation;Z axis continues to rise, and wafer coated face is covered with photoetching
The key groove of film version is less and less, until key groove is 0;In Z axis uphill process, according to lever principle, three on elastic mechanism 2
The individual strong point (elastomeric element) to leveling board 11 and spherical bearing 22 are fulcrum, automatic adjusument, realize three strong points by
Dynamic balance.Moving mechanism 1 is oriented to using bearing, and bearing is rolling friction, and coefficient of friction is small, the frictional force produced in moving process
It can ignore.
Above content is to combine specific preferred embodiment further description made for the present invention, it is impossible to assert
The specific implementation of the present invention is confined to these explanations.For general technical staff of the technical field of the invention,
On the premise of not departing from present inventive concept, some simple deduction or replace can also be made, should all be considered as belonging to the present invention by
The scope of patent protection that the claims submitted are determined.
Claims (9)
1. a kind of adaptive levelling device of workbench, it is characterized in that, including moving mechanism and elastic mechanism, moving mechanism bag
Leveling board is included, the elastic mechanism includes elastic support, elastic mechanism rotating shaft, multiple elastic mechanism elastomeric elements, the multiple
Elastic mechanism part is respectively arranged at the different forced positions of the elastic support, and the elastic support includes three elastic supports
Angle between arm, each elastic support arm is identical, and the elastic mechanism elastomeric element is respectively arranged at each elastic support arm
Same position, elastic mechanism of the leveling board in the state of stress to certain corresponding forced position on the elastic support
The forced position that elastomeric element applies beyond certain described forced position on pressure, the elastic support can be around the elastic mechanism
Rotating shaft is rotated towards the leveling board, and applies elastic force to the leveling board by corresponding elastic mechanism elastomeric element.
2. the adaptive levelling device of workbench as claimed in claim 1, it is characterized in that, in addition to leveling board limiting component, institute
Stating leveling board limiting component is used to limit the leveling board in setting height plane.
3. the adaptive levelling device of workbench as claimed in claim 1, it is characterized in that, the moving mechanism also includes elastic machine
Structure guiding parts, the guiding parts is used to prevent the elastic support from rotating in the plane parallel with the leveling board.
4. the adaptive levelling device of workbench as claimed in claim 1, it is characterized in that, the moving mechanism also includes elastic machine
Structure guiding parts, the elastic support is provided with pilot hole, the leveling board and installs the elastic mechanism guiding parts, described
Elastic mechanism guiding parts is located in the pilot hole, prevents the elastic support from being revolved in the plane parallel with the leveling board
Turn.
5. the adaptive levelling device of workbench as claimed in claim 1, it is characterized in that, in addition to substrate, the moving mechanism
Also include angular contact bearing, the substrate is provided with bearing guide type shoe, and the elastic mechanism is arranged on the substrate and leveling
Between plate, the angular contact bearing is arranged on the one side relative with substrate of the leveling board, and the bearing guide type shoe is to institute
Angular contact bearing is stated to make to roll guiding.
6. the adaptive levelling device of workbench as claimed in claim 5, it is characterized in that, in addition to leveling board limiting component, institute
Stating leveling board limiting component is used to limit the leveling board in setting height plane, and the leveling board limiting component includes the upper limit
Position block and lower position block, the lower position block are fixed on the substrate, and the upper limit position block is fixed on the leveling board, institute
State the lower section that upper limit position block stretches into the lower position block.
7. the adaptive levelling device of workbench as claimed in claim 5, it is characterized in that, the angular contact bearing includes three
The even angular contact bearing being distributed on the circumference of leveling board, the bearing guide type shoe include three respectively with three angular contact axles
Hold corresponding bearing guide type shoe.
8. the adaptive levelling device of workbench as claimed in claim 1, it is characterized in that, the elastic mechanism elastomeric element includes
Ball stud, guide pin bushing, compression spring, spring end cap, the elastic support are provided with guide pin bushing mounting hole, and the guide pin bushing is fixed on guide pin bushing
In mounting hole, the main body of the ball stud is located in the guide pin bushing and the guide pin bushing is stretched out on head, and the compression spring is arranged on
Between ball stud and the spring end cap, the spring end cap is fixed on the elastic support.
9. the adaptive levelling device of workbench as claimed in claim 6, it is characterized in that, in addition to upper bulb plunger and lower bulb
Plunger, the upper bulb plunger is fixed on the lower position block, and the lower bulb plunger is fixed on the substrate, it is described on
Bulb plunger and lower bulb plunger are relative with the upper and lower surface of the upper limit position block respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610378576.0A CN106066580B (en) | 2016-05-31 | 2016-05-31 | A kind of adaptive levelling device of workbench |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610378576.0A CN106066580B (en) | 2016-05-31 | 2016-05-31 | A kind of adaptive levelling device of workbench |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106066580A CN106066580A (en) | 2016-11-02 |
CN106066580B true CN106066580B (en) | 2017-10-31 |
Family
ID=57420433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610378576.0A Active CN106066580B (en) | 2016-05-31 | 2016-05-31 | A kind of adaptive levelling device of workbench |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106066580B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109050009A (en) * | 2018-09-14 | 2018-12-21 | 昆明理工大学 | A kind of packing tough cathode automatic code-spraying equipment |
US20220196525A1 (en) * | 2020-12-18 | 2022-06-23 | Vishal Khosla | Method and apparatus for maintaining constancy of force in contact between a test probe and test object, which are in a state of relative motion |
CN112649032B (en) * | 2021-01-08 | 2022-08-23 | 上海艾默优科技有限公司 | Automatic leveling base |
CN112936203A (en) * | 2021-02-03 | 2021-06-11 | 大族激光科技产业集团股份有限公司 | Motion platform |
CN116909108A (en) * | 2023-07-31 | 2023-10-20 | 苏州天准科技股份有限公司 | Non-contact exposure equipment and exposure method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3035472B2 (en) * | 1995-09-04 | 2000-04-24 | ウシオ電機株式会社 | Mask and work gap setting device |
KR20040085983A (en) * | 2003-04-02 | 2004-10-08 | (주)네스디스플레이 | Mask align chamber |
KR100738995B1 (en) * | 2006-06-21 | 2007-07-12 | 오에프티 주식회사 | Substrate stage leveling device for exposure device |
CN104465449B (en) * | 2013-09-18 | 2017-08-29 | 上海微电子装备(集团)股份有限公司 | One kind rotation exchanges hand self-adaptive protector and its guard method |
-
2016
- 2016-05-31 CN CN201610378576.0A patent/CN106066580B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN106066580A (en) | 2016-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106066580B (en) | A kind of adaptive levelling device of workbench | |
CN109211064A (en) | A kind of bearings synthesis measuring device for windage | |
CN108695228A (en) | Levelling mechanism, wafer lift mechanism and the reaction chamber of wafer carrier | |
CN106895830A (en) | A kind of Wedge-type precision levelling gear for optics load light axial adjustment | |
CN104062854B (en) | Leveling and focusing device for lithographic equipment | |
CN202533636U (en) | Connecting mechanism used for focusing and leveling | |
JP7564564B2 (en) | Apparatus and method for internal support air suspension static balancing of high precision rotating ring-like components | |
CN202572123U (en) | Wafer bonder for grinding and polishing | |
CN106371292A (en) | Double-sided photoetching workpiece table | |
CN115613002B (en) | Vapor deposition apparatus | |
CN209700984U (en) | A kind of solar wing stent car pose adjustment device for satellite ground experimental stage | |
CN106706292A (en) | Snap spring pressing and detection equipment | |
CN217859716U (en) | Rotating bracket for sensor assembly bridge | |
CN206527717U (en) | Rotary workbench | |
CN210567294U (en) | Height-adjustable's support frame for three-coordinate instrument | |
CN115399899A (en) | Medical microscope system and method of use thereof | |
CN203587431U (en) | Upper pressure plate ball head pair structure of pressure testing machine | |
CN211387688U (en) | Platform is used in brake disc processing | |
CN103983518B (en) | The suction mechanic property test method of concrete substrate under wind action | |
CN220134989U (en) | Foot pad capable of adjusting | |
CN221111620U (en) | Vacuum pump assembly fixture | |
CN215895065U (en) | Flexible two-dimensional adjusting mechanism for translational motion of adjusted piece | |
CN206843581U (en) | Levelling gear, reaction chamber and the semiconductor processing equipment of rotating basis | |
CN221871633U (en) | Diamond pen adjusting mechanism | |
CN115096552B (en) | Device and method for testing and adjusting inner direction of space camera |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: Longgang District of Shenzhen City, Guangdong province 518000 city street in the center city City Industrial Park Road No. 3 building E Tefalongfei business building two floor Patentee after: Silicon electric semiconductor equipment (Shenzhen) Co., Ltd Address before: Longgang District of Shenzhen City, Guangdong province 518000 city street in the center city City Industrial Park Road No. 3 building E Tefalongfei business building two floor Patentee before: SHENZHEN SIDEA SEMICONDUCTOR EQUIPMENT Co.,Ltd. |
|
CP01 | Change in the name or title of a patent holder |