CN105514275A - 基于NiO空穴传输层的甲胺铅碘基太阳能电池制备方法 - Google Patents
基于NiO空穴传输层的甲胺铅碘基太阳能电池制备方法 Download PDFInfo
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- CN105514275A CN105514275A CN201510865011.0A CN201510865011A CN105514275A CN 105514275 A CN105514275 A CN 105514275A CN 201510865011 A CN201510865011 A CN 201510865011A CN 105514275 A CN105514275 A CN 105514275A
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- 238000002360 preparation method Methods 0.000 title claims abstract description 22
- 230000005540 biological transmission Effects 0.000 title claims abstract description 18
- IKUCKMMEQAYNPI-UHFFFAOYSA-N [Pb].CN.[I] Chemical compound [Pb].CN.[I] IKUCKMMEQAYNPI-UHFFFAOYSA-N 0.000 title abstract 3
- 238000000034 method Methods 0.000 claims abstract description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000011521 glass Substances 0.000 claims abstract description 12
- 239000007789 gas Substances 0.000 claims abstract description 11
- 239000000843 powder Substances 0.000 claims abstract description 10
- 238000000227 grinding Methods 0.000 claims abstract description 7
- 229910052786 argon Inorganic materials 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 239000011812 mixed powder Substances 0.000 claims abstract description 6
- 239000004570 mortar (masonry) Substances 0.000 claims abstract description 6
- 238000001816 cooling Methods 0.000 claims abstract description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims description 48
- 125000002346 iodo group Chemical group I* 0.000 claims description 23
- 239000010408 film Substances 0.000 claims description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- 238000004140 cleaning Methods 0.000 claims description 5
- 239000003595 mist Substances 0.000 claims description 5
- 238000002207 thermal evaporation Methods 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- 239000012071 phase Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 claims description 3
- 239000007791 liquid phase Substances 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 claims description 3
- 238000004528 spin coating Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 5
- 239000013077 target material Substances 0.000 abstract 5
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract 2
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract 2
- 230000008020 evaporation Effects 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract 1
- 229910001882 dioxygen Inorganic materials 0.000 abstract 1
- 230000031700 light absorption Effects 0.000 abstract 1
- 238000005086 pumping Methods 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 5
- 238000004549 pulsed laser deposition Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- XDXWNHPWWKGTKO-UHFFFAOYSA-N 207739-72-8 Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 XDXWNHPWWKGTKO-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical class [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- NHDHVHZZCFYRSB-UHFFFAOYSA-N pyriproxyfen Chemical compound C=1C=CC=NC=1OC(C)COC(C=C1)=CC=C1OC1=CC=CC=C1 NHDHVHZZCFYRSB-UHFFFAOYSA-N 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/10—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising heterojunctions between organic semiconductors and inorganic semiconductors
- H10K30/15—Sensitised wide-bandgap semiconductor devices, e.g. dye-sensitised TiO2
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/162—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using laser ablation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
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Priority Applications (1)
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CN201510865011.0A CN105514275B (zh) | 2015-12-01 | 2015-12-01 | 基于NiO空穴传输层的甲胺铅碘基太阳能电池制备方法 |
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CN201510865011.0A CN105514275B (zh) | 2015-12-01 | 2015-12-01 | 基于NiO空穴传输层的甲胺铅碘基太阳能电池制备方法 |
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CN105514275A true CN105514275A (zh) | 2016-04-20 |
CN105514275B CN105514275B (zh) | 2018-12-04 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107482122A (zh) * | 2017-08-23 | 2017-12-15 | 中节能万润股份有限公司 | 一种钙钛矿太阳能电池及制备方法 |
CN107565023A (zh) * | 2017-08-23 | 2018-01-09 | 中节能万润股份有限公司 | 一种钙钛矿太阳能电池及制备方法 |
CN109545985A (zh) * | 2017-09-22 | 2019-03-29 | 杭州纤纳光电科技有限公司 | 一种提高钙钛矿成膜均匀性的装置及其方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101836307A (zh) * | 2007-08-17 | 2010-09-15 | 西北大学 | p型半导体镍氧化物在体相异质结太阳能电池中作为增效阳极界面层 |
CN105070834A (zh) * | 2015-07-28 | 2015-11-18 | 华中科技大学 | 一种基于掺杂型NiO空穴传输层的钙钛矿太阳能电池及其制备方法 |
-
2015
- 2015-12-01 CN CN201510865011.0A patent/CN105514275B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101836307A (zh) * | 2007-08-17 | 2010-09-15 | 西北大学 | p型半导体镍氧化物在体相异质结太阳能电池中作为增效阳极界面层 |
CN105070834A (zh) * | 2015-07-28 | 2015-11-18 | 华中科技大学 | 一种基于掺杂型NiO空穴传输层的钙钛矿太阳能电池及其制备方法 |
Non-Patent Citations (2)
Title |
---|
JONG HOON PARK,ET AL: "Efficient CH3NH3PbI3 Perovskite Solar Cell Employing Nanostructured p-Type NiO Electrode Formed by a Pulsed Laser Deposition", 《ADVANCED MATERIALS》 * |
M.RUBIN,ET AL: "Electrochromic Lithium Nickel Oxide by Pulsed Laser Deposition and Sputtering", 《SOLAR ENERGY MATERIALS AND SOLAR CELLS》 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107482122A (zh) * | 2017-08-23 | 2017-12-15 | 中节能万润股份有限公司 | 一种钙钛矿太阳能电池及制备方法 |
CN107565023A (zh) * | 2017-08-23 | 2018-01-09 | 中节能万润股份有限公司 | 一种钙钛矿太阳能电池及制备方法 |
CN107565023B (zh) * | 2017-08-23 | 2019-07-30 | 中节能万润股份有限公司 | 一种钙钛矿太阳能电池及制备方法 |
CN107482122B (zh) * | 2017-08-23 | 2019-12-17 | 中节能万润股份有限公司 | 一种钙钛矿太阳能电池及制备方法 |
CN109545985A (zh) * | 2017-09-22 | 2019-03-29 | 杭州纤纳光电科技有限公司 | 一种提高钙钛矿成膜均匀性的装置及其方法 |
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Inventor after: Gong Haibo Inventor after: Yao Penggang Inventor after: Zhang Yongxing Inventor after: Xu Zanyang Inventor after: Fan Fan Inventor before: Gong Haibo Inventor before: Huang Tao Inventor before: Zhang Yongxing Inventor before: Zhang Yongjie Inventor before: Xiang Chaoyu |
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Effective date of registration: 20160804 Address after: 817000 building two, office building, Delingha Industrial Park, Haixi, Qinghai Applicant after: ZONERGY (QINGHAI) CO.,LTD. Address before: Kunshan Industrial Park Enterprise Incubation Center 845350 the Xinjiang Uygur Autonomous Region autonomous Kezilesukeerkezi Atux city 5 floor Applicant before: XINJIANG ZTE ENERGY CO.,LTD. |
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Effective date of registration: 20200915 Address after: 643000 No.19, East Ring Road, Bancang Industrial Park, Yantan District, Zigong City, Sichuan Province Patentee after: ZONERGY Co.,Ltd. Address before: 817000 building two, office building, Delingha Industrial Park, Haixi, Qinghai Patentee before: ZONERGY (QINGHAI) Co.,Ltd. |
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Address after: 643030 No. 68, Fucang Road, Yantan District, Zigong City, Sichuan Province Patentee after: Xingchu Century Technology Co.,Ltd. Address before: 643030 No. 68, Fucang Road, Yantan District, Zigong City, Sichuan Province Patentee before: Xingchu Century Technology Co.,Ltd. |
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Address after: 643030 No. 68, Fucang Road, Yantan District, Zigong City, Sichuan Province Patentee after: Xingchu Century Technology Co.,Ltd. Address before: No.19, East Ring Road, Bancang Industrial Park, Yantan District, Zigong City, Sichuan Province, 643000 Patentee before: ZONERGY Co.,Ltd. |
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