CN105487352B - The replacing options of exposure machine and Exposing Lamp - Google Patents
The replacing options of exposure machine and Exposing Lamp Download PDFInfo
- Publication number
- CN105487352B CN105487352B CN201610087845.8A CN201610087845A CN105487352B CN 105487352 B CN105487352 B CN 105487352B CN 201610087845 A CN201610087845 A CN 201610087845A CN 105487352 B CN105487352 B CN 105487352B
- Authority
- CN
- China
- Prior art keywords
- exposing lamp
- collecting lens
- air jet
- lamp
- several air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Nonlinear Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides the replacing options of a kind of exposure machine and Exposing Lamp, and the exposure machine includes shell, collecting lens, Exposing Lamp and several air jet systems；Several air jet systems can be stretched above the collecting lens；When exposure machine normal work, the trend of light source when several air jet systems are retracted to the periphery of cover top portion without influence normal exposure；When needing to change Exposing Lamp, after closing Exposing Lamp, the top of the collecting lens fringe region is located at by the gas outlet that several air jet systems are extend out to its end, inside and Exposing Lamp to collecting lens carry out jet, so that Exposing Lamp realizes fast cooling, the replacing construction of Exposing Lamp is effectively reduced, equipment mobility is improved；The replacing options of Exposing Lamp of the invention, can make Exposing Lamp realize fast cooling, and can avoid causing to adhere to foreign matter or dust on collecting lens during changing Exposing Lamp.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of exposure machine and Exposing Lamp replacing options.
Background technology
Liquid crystal display device (Liquid Crystal Display, LCD) has thin fuselage, power saving, radiationless etc. numerous
Advantage, is widely used, such as：Mobile phone, personal digital assistant (PDA), digital camera, computer screen or notes
This computer screen etc..
It is backlight liquid crystal display device that liquid crystal display device on existing market is most of, and it includes housing, located at shell
Internal liquid crystal display panel and the backlight module (Backlight module) in housing.The structure of liquid crystal display panel
It is by a colored filter substrate (Color Filter Substrate), a thin-film transistor array base-plate (Thin Film
Transistor Array Substrate, TFT Array Substrate) and one it is configured at liquid crystal layer between two substrates
(Liquid Crystal Layer) is constituted, wherein being placed with many vertical data wire (Data on array base palte
Line) and level controlling grid scan line (Gate Line).The operation principle of liquid crystal display panel is by two panels glass substrate
It is upper to apply driving voltage to control the rotation of the liquid crystal molecule of liquid crystal layer, the light of backlight module is reflected into generation picture.
In the manufacturing process of liquid crystal display panel, exposure technology can be repeatedly utilized.Specifically, scribbling the base of photoresist
Light shield is placed in plate top, and substrate is exposed using exposure machine then.Fig. 1 is referred to, is a kind of knot of existing exposure machine
Structure schematic diagram, including shell 100, the collecting lens 200 in the shell 100 and the exposure in the collecting lens 200
Lamp 300.The cardinal principle of exposure technology is exactly the irradiation by Exposing Lamp 300, and the figure on light shield (Mask) is transferred into glass
On glass substrate.Therefore, the lamp source of exposure machine is extremely important, and usually used Exposing Lamp is high-pressure mercury-vapor lamp, and Exposing Lamp has necessarily
Service life, when regulation use time or luminance reduction is reached, it is necessary to change Exposing Lamp.Change the basic step of Exposing Lamp
For：Turn off the light-wait lamp of lowering the temperature-change-turn on light-wait intensification-measurement illumination-parameter setting.Whole process probably needs
The 3h times.Wherein wait cooling and wait the time heated up, offer 40min is just respectively required for, so that changing lamp overlong time, shadow
The equipment of sound mobility.
In addition, the collecting lens of exposure machine is a very important part in whole optical system, Exposing Lamp is to be placed on
In collecting lens, because the reason for changing lamp, easily foreign matter or dust are speckled with collecting lens, can influence Exposing Lamp light collecting effect and
One property, can impact to product.But the cleaning of collecting lens is extremely difficult, (such as non-dust cloth is wiped the cleaning of direct contact type
Deng) easily scratched because grasping bad dynamics or damages collecting lens surface, cause collecting lens to scrap, loss is huge.
Therefore, it is necessary to the replacing options of a kind of exposure machine and Exposing Lamp are provided, to solve the above problems.
The content of the invention
It is an object of the invention to provide a kind of exposure machine, Exposing Lamp can be made to realize fast prompt drop when needing and changing Exposing Lamp
Temperature, and can avoid causing to adhere to foreign matter or dust on collecting lens during changing Exposing Lamp.
The present invention also aims to provide a kind of replacing options of Exposing Lamp, Exposing Lamp can be made to realize fast cooling, and
Can avoid causing to adhere to foreign matter or dust on collecting lens during changing Exposing Lamp.
To achieve the above object, the present invention provides a kind of exposure machine, including shell, the upper end open in the shell
Collecting lens, the Exposing Lamp in the collecting lens and located at the cover top portion periphery and end venthole down
Several air jet systems；Several air jet systems can be stretched above the collecting lens；
When exposure machine normal work, several air jet systems are retracted to the periphery of the cover top portion without influenceing just
The trend of light source when often exposing；
When needing to change Exposing Lamp, after closing Exposing Lamp, its end is extend out to by by several air jet systems
Venthole is located at the top of the collecting lens fringe region, and inside and Exposing Lamp to the collecting lens carry out jet, so that
The Exposing Lamp realizes fast cooling.
Several air jet systems spray compressed air.
It is flexible that several air jet systems are driven realization by cylinder.
The jet amount of several air jet systems can adjust.
The bottom of the collecting lens is provided with dust exhausting hole；It is described when the air jet system is to collecting lens inside jet
The foreign matter or dust adhered on collecting lens are expelled to outside the collecting lens after being blown afloat by the dust exhausting hole.
The upper end open of the collecting lens is rounded；The inside shape in curved surface of the collecting lens.
The quantity of the air jet system is 8, and is uniformly distributed around the collecting lens.
The Exposing Lamp is mercury vapor lamp.
The present invention also provides a kind of replacing options of Exposing Lamp, comprises the following steps：
Step 1, offer exposure machine, the collecting lens of upper end open of the exposure machine including shell, in the shell,
Exposing Lamp in the collecting lens and the venthole several jets directed downwardly located at the peripheral and end of the cover top portion
Device；Several air jet systems can be stretched above the collecting lens；Close the Exposing Lamp；
Step 2, the venthole that several air jet systems extend out to its end are located at the collecting lens fringe region
Top, inside and Exposing Lamp to the collecting lens carry out jet, so that the Exposing Lamp realizes fast cooling；
Step 3, the new Exposing Lamp of offer, change to the Exposing Lamp after cooling.
The bottom of the collecting lens is provided with dust exhausting hole；By the air jet system in the collecting lens in the step 2
During portion's jet, the foreign matter or dust adhered on the collecting lens are expelled to outside the collecting lens after being blown afloat by the dust exhausting hole
Portion.
Beneficial effects of the present invention：The replacing options of exposure machine of the invention and Exposing Lamp, outside exposure machine cover top portion
Enclose and be provided with end venthole several air jet systems directed downwardly；Several air jet systems can be stretched above collecting lens；
When exposure machine normal work, when several air jet systems are retracted to the periphery of the cover top portion without influence normal exposure
The trend of light source；When needing to change Exposing Lamp, after closing Exposing Lamp, its end is extend out to by by several air jet systems
Venthole be located at the top of the collecting lens fringe region, inside and Exposing Lamp to the collecting lens carries out jet so that
The Exposing Lamp is realized fast cooling, effectively reduce the replacing construction of Exposing Lamp, improve equipment mobility；Additionally,
During by the air jet system to collecting lens inside jet, may be such that the dust adhered on the collecting lens leads to after being blown afloat
The dust exhausting hole crossed on collecting lens is expelled to outside the collecting lens, and collecting lens is caused during effectively prevent replacing Exposing Lamp
It is upper adhesion foreign matter or dust, it is ensured that the light collecting effect and homogeneity of Exposing Lamp, improve the yield of exposure, while with existing skill
Art is compared and causes to be more prone to the cleaning of collecting lens, and collecting lens will not be caused to damage, and reduces cost.
Brief description of the drawings
In order to be able to be further understood that feature of the invention and technology contents, refer to below in connection with of the invention detailed
Illustrate and accompanying drawing, however accompanying drawing only provide with reference to and explanation use, not for being any limitation as to the present invention.
In accompanying drawing,
Fig. 1 is a kind of structural representation of existing exposure machine；
Fig. 2 is the structural representation of exposure machine of the invention；
Fig. 3 is the schematic top plan view of exposure machine of the invention；
Fig. 4 is the flow chart of the replacing options of Exposing Lamp of the invention；
The schematic diagram of the step of Fig. 5 is the replacing options of Exposing Lamp of the invention 2.
Specific embodiment
Further to illustrate technological means and its effect that the present invention is taken, it is preferable to carry out below in conjunction with of the invention
Example and its accompanying drawing are described in detail.
Refer to Fig. 2, the present invention provides a kind of exposure machine, including shell 1, upper end open in the shell 1
The venthole court of collecting lens 2, the Exposing Lamp 3 in the collecting lens 2 and the periphery located at the top of the shell 1 and end
Under several air jet systems 4；Several air jet systems 4 can be stretched in the top of the collecting lens 2.
When exposure machine normal work, several air jet systems 4 are retracted to the periphery at the top of the shell 1 without influence
The trend of light source during normal exposure.
When needing to change Exposing Lamp 3, after closing Exposing Lamp 3, by by several air jet systems 4 towards the light harvesting
The top of mirror 2 extend out to the top of the venthole positioned at the fringe region of the collecting lens 2 of its end, in the collecting lens 2
Portion and Exposing Lamp 3 carry out jet, so that the Exposing Lamp 3 realizes fast cooling, effectively reduce the replacing construction of Exposing Lamp,
Improve equipment mobility.
Specifically, several air jet systems 4 spray compressed air (Compressed air, CDA).
Specifically, several air jet systems 4 are driven realization and stretch by cylinder.
Specifically, the jet amount of several air jet systems 4 can adjust, and to control the cooling rate of Exposing Lamp 3, adjustment exposes
The temperature fall time of light lamp 3.
Specifically, the bottom of the collecting lens 2 is provided with dust exhausting hole 21.Inside the air jet system 4 is to the collecting lens 2
During jet, the foreign matter or dust adhered on the collecting lens 2 are expelled to the collecting lens 2 after being blown afloat by the dust exhausting hole 21
Outside, causes to adhere to foreign matter or dust on collecting lens, it is ensured that the collection of Exposing Lamp during effectively prevent replacing Exposing Lamp
Light effect and homogeneity, improve the yield of exposure, while cause to be more prone to the cleaning of collecting lens compared with prior art,
And collecting lens will not be caused to damage, reduce cost.
Specifically, the upper end open of the collecting lens 2 is rounded；The inside shape in curved surface of the collecting lens 2.
In the present embodiment, the quantity of the air jet system 4 is 8, and is uniformly distributed around the collecting lens 2.
Specifically, the Exposing Lamp 3 is mercury vapor lamp.
Fig. 4 is referred to, and combines Fig. 2 to Fig. 3, the present invention also provides a kind of replacing options of Exposing Lamp, including following step
Suddenly：
Step 1, offer exposure machine, the light harvesting of upper end open of the exposure machine including shell 1, in the shell 1
The venthole of mirror 2, the Exposing Lamp 3 in the collecting lens 2 and the periphery located at the top of the shell 1 and end is directed downwardly
Several air jet systems 4；Several air jet systems 4 can be stretched in the top of the collecting lens 2.Close the Exposing Lamp 3.
Step 2, as shown in figure 5, several air jet systems 4 are extend out into its end towards the top of the collecting lens 2
Venthole be located at the top of the fringe region of the collecting lens 2, inside and Exposing Lamp 3 to the collecting lens 2 carries out jet, from
And the Exposing Lamp 3 is realized fast cooling, and the replacing construction of Exposing Lamp is effectively reduced, improve equipment mobility.
Specifically, the bottom of the collecting lens 2 is provided with dust exhausting hole 21.By the air jet system 4 to institute in the step 2
When stating 2 inside jet of collecting lens, the foreign matter or dust adhered on the collecting lens 2 are discharged after being blown afloat by the dust exhausting hole 21
Outside to the collecting lens 2, cause to adhere to foreign matter or dust on collecting lens during effectively prevent replacing Exposing Lamp, it is ensured that
The light collecting effect and homogeneity of Exposing Lamp, improve the yield of exposure, while causing to collecting lens compared with prior art
Cleaning is more prone to, and collecting lens will not be caused to damage, and reduces cost.
Step 3, the new Exposing Lamp of offer, change to the Exposing Lamp 3 after cooling, afterwards can be complete successively using prior art
Into steps such as intensification of turning on light, wait, measurement illumination, parameter settings, and it is finally completed the replacing to Exposing Lamp.
In sum, the replacing options of exposure machine of the invention and Exposing Lamp, the periphery of exposure machine cover top portion is provided with end
Venthole several air jet systems directed downwardly at end；Several air jet systems can be stretched above collecting lens；Work as exposure
During machine normal work, light source when several air jet systems are retracted to the periphery of the cover top portion without influence normal exposure
Trend；When needing to change Exposing Lamp, after closing Exposing Lamp, by the outlet that several air jet systems are extend out to its end
In the top of the collecting lens fringe region, inside and Exposing Lamp to the collecting lens carry out jet to hole position, so that described
Exposing Lamp realizes fast cooling, effectively reduces the replacing construction of Exposing Lamp, improves equipment mobility；Additionally, by institute
When stating air jet system to collecting lens inside jet, may be such that the dust adhered on the collecting lens after being blown afloat by light harvesting
Dust exhausting hole on mirror is expelled to outside the collecting lens, causes to be adhered on collecting lens during effectively prevent replacing Exposing Lamp
Foreign matter or dust, it is ensured that the light collecting effect and homogeneity of Exposing Lamp, improve the yield of exposure, while compared with prior art
So that being more prone to the cleaning of collecting lens, and collecting lens will not be caused to damage, reduce cost.
The above, for the person of ordinary skill of the art, can be with technology according to the present invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to appended right of the invention
It is required that protection domain.
Claims (2)
1. a kind of replacing options of Exposing Lamp, it is characterised in that comprise the following steps：
Step 1, offer exposure machine, the light harvesting of upper end open of the exposure machine including shell (1), in the shell (1)
Mirror (2), the Exposing Lamp (3) in the collecting lens (2) and the outlet of the periphery at the top of the shell (1) and end
Hole several air jet systems (4) directed downwardly；Several air jet systems (4) can be stretched above the collecting lens (2)；Close
Close the Exposing Lamp (3)；
Step 2, several air jet systems (4) are extend out to its end venthole be located at the collecting lens (2) fringe region
Top, inside and Exposing Lamp (3) to the collecting lens (2) carry out jet, so that the Exposing Lamp (3) realizes fast prompt drop
Temperature；
Step 3, the new Exposing Lamp of offer, change to the Exposing Lamp (3) after cooling.
2. replacing options of Exposing Lamp as claimed in claim 1, it is characterised in that the bottom of the collecting lens (2) is provided with row
Dirt hole (21)；In the step 2 during jet internal to the collecting lens (2) by the air jet system (4), the collecting lens
(2) foreign matter or dust adhered on are expelled to the collecting lens (2) outside after being blown afloat by the dust exhausting hole (21).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610087845.8A CN105487352B (en) | 2016-02-16 | 2016-02-16 | The replacing options of exposure machine and Exposing Lamp |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610087845.8A CN105487352B (en) | 2016-02-16 | 2016-02-16 | The replacing options of exposure machine and Exposing Lamp |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105487352A CN105487352A (en) | 2016-04-13 |
| CN105487352B true CN105487352B (en) | 2017-06-27 |
Family
ID=55674416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610087845.8A Active CN105487352B (en) | 2016-02-16 | 2016-02-16 | The replacing options of exposure machine and Exposing Lamp |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105487352B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106054539B (en) * | 2016-06-13 | 2018-10-30 | 京东方科技集团股份有限公司 | Carry workbench |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3525482C1 (en) * | 1985-07-17 | 1987-02-05 | Klimsch & Co | Exposure device |
| US7222388B2 (en) * | 2003-04-10 | 2007-05-29 | Canon Kabushiki Kaisha | Imaging-device cleaning apparatus |
| JP4424296B2 (en) * | 2005-10-13 | 2010-03-03 | ウシオ電機株式会社 | UV irradiation equipment |
| JP4811000B2 (en) * | 2005-12-07 | 2011-11-09 | ウシオ電機株式会社 | Light irradiation device |
| JP2011204957A (en) * | 2010-03-26 | 2011-10-13 | Ushio Inc | Light irradiation device |
| JP2012195266A (en) * | 2011-03-18 | 2012-10-11 | Ushio Inc | Light irradiation device and long arc metal halide lamp |
| JP5056991B1 (en) * | 2012-02-02 | 2012-10-24 | ウシオ電機株式会社 | Polarized light irradiation device |
-
2016
- 2016-02-16 CN CN201610087845.8A patent/CN105487352B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105487352A (en) | 2016-04-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104965333B (en) | COA type liquid crystal display panels and preparation method thereof | |
| US20150357384A1 (en) | Oled display panel and method for manufacturing the same | |
| US9927648B2 (en) | Manufacturing methods of display panel and display device | |
| US20120132829A1 (en) | Robotic arm and transporting device with the same | |
| CN102799014B (en) | Method for producing liquid crystal display panel | |
| CN104950541A (en) | BOA-type liquid crystal display panel and manufacturing method thereof | |
| CN105467777A (en) | Exposure machine and photomask cleaning device | |
| CN105487284A (en) | LTPS (low temperature poly silicon) display panel and manufacturing method thereof | |
| CN106707572A (en) | Ultra-violet curing device and box adhesive curing method | |
| WO2016000374A1 (en) | Light-emitting diode display panel and manufacturing method therefor, and display device | |
| JP2018056560A (en) | Semiconductor device manufacturing method | |
| CN105629679B (en) | Edge exposure machine and edge exposure region code printing method | |
| CN105487352B (en) | The replacing options of exposure machine and Exposing Lamp | |
| CN109407359A (en) | Manipulator | |
| CN103399468A (en) | Method and device for stripping photoresist layer | |
| CN105068375B (en) | Light shield and light alignment method for light orientation | |
| CN106200275B (en) | Exposure method | |
| CN105652608B (en) | Exposure machine and exposure method | |
| CN102269897A (en) | Color film substrate and manufacturing method thereof, liquid crystal panel and liquid crystal display (LCD) | |
| CN107390395A (en) | Display panel bright spot restorative procedure | |
| CN101692439A (en) | Manufacturing method for a plurality of groups of substrates of thin-film transistor | |
| WO2018196193A1 (en) | Array substrate, manufacturing method therefor and display panel | |
| TWI290267B (en) | Mask supporting apparatus using vacuum and light exposing system, and method using the same | |
| CN104934439A (en) | Manufacture method and structure of TFT substrate | |
| CN101943867A (en) | Proximity exposure device, its exposing light beam formation method and display panel substrate manufacture method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |