CN105086836A - Cerium oxide polishing solution and preparation method thereof - Google Patents
Cerium oxide polishing solution and preparation method thereof Download PDFInfo
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- CN105086836A CN105086836A CN201510510778.1A CN201510510778A CN105086836A CN 105086836 A CN105086836 A CN 105086836A CN 201510510778 A CN201510510778 A CN 201510510778A CN 105086836 A CN105086836 A CN 105086836A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a cerium oxide polishing solution which comprises the following main components: 0.1-0.3 part of xanthan gum, 0.5-3 parts of sodium tripolyphosphate, 3-7 parts of sodium xylenesulfonate, 0.1-0.3 part of EDTA-2Na, 3-7 parts of glycerol, 2-5 parts of polyethylene glycol 400, 1-3 parts of aluminum magnesium silicate, 0.1-0.5 part of thiocarbamide, 1-5 parts of triethanolamine, 50-60 parts of cerium oxide polishing powder and 20-35 parts of water. The cerium oxide polishing solution has the advantages of high polishing speed, high polishing precision, fewer scratches and favorable suspension property. The polishing solution has favorable chemical and physical properties, is widely used in industrial product polishing, and can be used for polishing various optical glass devices, television kinescopes, optical spectacle lenses, oscilloscopes, plate glass, semiconductor chips, metal precision products and the like.
Description
Technical field
The present invention relates to a kind of rare earth polishing, belong to grinding and polishing field.
Technical background
Along with the development of rare-earth industry, polishing powder from rare earth is very fast to succeed in polishing precision optical instrument.Because polishing powder from rare earth has, polishing efficiency is high, quality good, pollute the advantages such as little, develops rapidly and becomes precise polishing materials most popular on market.Especially the most superior with cerium rouge, because cerium system polishing powder from rare earth has preferably chemistry and physicals, so obtain a wide range of applications in mechanicals polishing, as the polishing at various opticglass device, television picture tube, optical lens, oscillatron, sheet glass, semiconductor wafer and precision metal goods etc.In order to give polishing powder superior performance, the dispersing property of polishing powder in liquid medium and suspending stabilized performance are very important influence factors.
Polishing fluid commercially available at present adopts titanium oxide mostly, ferric oxide, and silicon-dioxide, as abrasive material, is aided with other dispersing auxiliaries and obtains polishing fluid, and such polishing fluid polishing precision is low, and grinding rate is slow, can not meet existing production technology demand far away.Ye You minority producer adopts rare earth cerium oxide to make polishing fluid as abrasive material, but because dispersion suspension performance is not good, ion is more easily reunited, workpiece is caused to scratch, simultaneously because suspension cleaning performance is bad, the loss of polishing fluid abrasive material is fast, easily sticks to workpiece and board surface, make abrasive material sink to the bottom caking, grinding and polishing efficiency reduces.After polishing, it is many that workpiece surface remains polishing powder, is difficult to cleaning, normally produces bring difficulty for back segment.Fail to reach stdn, seriation, the polishing requirement of various industrial circle can't be met completely.Therefore develop a grinding and polishing efficiency high, scratch few, the cerium oxide polishing slurry of dispersion suspension good stability is significant.
Summary of the invention
The object of the invention is to the many drawbacks overcoming existing polishing fluid, provide a kind of grinding and polishing efficiency high, scratch few, the cerium oxide polishing slurry of dispersion suspension good stability.
To achieve these goals, the present invention adopts following technical scheme:
A kind of cerium oxide polishing slurry, its bulk composition and consumption comprise: xanthan gum 0.1-0.3 part, tripoly phosphate sodium STPP 0.5-3 part, sodium xylene sulfonate 3-7 part, EDTA-2Na0.1-0.3 part, glycerine 3-7 part, poly(oxyethylene glycol) 400 2-5 part, neusilin 1-3 part, thiocarbamide 0.1-0.5 part, trolamine 1-5 part, cerium rouge 50-60 part, water 20-35 part.
The present invention adopts cerium oxide as polishing fluid abrasive material, and its key technical indexes is: w (REO)=90%, w (CeO2)=80% ~ 85%; , rare earth yield about 95%, average particle size D501.2-1.8 μm, D902.6-2.8 μm, D100≤3.2 μm.Rationally, polishing precision is high and polishing velocity is fast for the distribution of this abrasive grain.Crystal formation is intact, wear resistance, and mobility and suspension are all good, are applicable to high speed polishing.
The present invention, in order to realize the long-term suspension stability of polishing fluid, adopts xanthan gum and neusilin coordinated to improve suspension stability.Xanthan gum has good suspension effect to insoluble solid.Xanthan gum colloidal sol molecular energy forms the spiral interpolymer of superjunction crossed belt shape, forms the reticulated structure of fragile similar glue, so can support the form of solid particulate, demonstrates very strong stabilization and higher suspension ability.Xanthan gum solution has high viscosity under static or low shearing action, show as viscosity and sharply decline, but molecular structure is constant under high shear forces.And when shearing force is eliminated, then recover original viscosity immediately.The relation of shearing force and viscosity is completely plastic.Xanthan gum pseudo-plasticity is very outstanding, and this pseudo-plasticity is very effective to stable suspension.Neusilin is expandable into colloidal dispersion and has unique three-dimensional space chain structure and special pin, rhabdolith structure in water, thus has unusual colloid and absorption property.Shake melt performance with the thickening property of its excellence, suspension, colloid.In water medium, form the association networks of " card palace " formula, therefore the two is combined, greatly can improves the suspension stability of polishing fluid, improve the thinning ratio of polishing fluid, even if stoste dilutes more than 10 times, also can keep long suspension.
The present invention is uniformly dispersed to make abrasive material, and ion is not reunited, and does not sink to the bottom caking.Adopt tripoly phosphate sodium STPP and sodium xylene sulfonate as dispersion agent, this dispersant effect is good, almost non-foam.Polishing fluid in use long-time stably dispersing can be made.Board is excessive in circulating feeding liquid non-foam, and liquid-supplying system is stablized.
The present invention is in order to reduce polishing fluid in use, and the metal iron filings on board, to the pollution of system, adopt EDTA-2Na as sequestrant.Adopt thiocarbamide as inhibiter simultaneously, reduce the corrosion of board, to improve the stability of whole polishing process.
Present invention adds glycerine, have certain protective effect to the position that operator directly contact, adding of glycerine is that the dispersion of suspension agent xanthan gum is more even simultaneously, further increases suspension stability.The introducing of poly(oxyethylene glycol) 400, coordinate glycerine to use, serve lubrication, accelerate polishing velocity and precision in grinding and polishing process, poly(oxyethylene glycol) 400 also has certain cleanup action, is conducive to the polishing powder cleaning of polishing back segment.
The present invention adopts trolamine as synergistic agent and pH adjusting agent, and the long-time keeping system slight alkalinity of energy, show according to the study, slight alkalinity environment can improve the cutting force of polishing powder, accelerates polishing velocity.
The preparation method of described polishing fluid, comprises the steps:
1) by xanthan gum with glycerine dissolve dispersion, then add poly(oxyethylene glycol) 400 continue dispersed with stirring for subsequent use.
2) dissolve tripoly phosphate sodium STPP with half water gaging, sodium xylene sulfonate, EDTA-2Na, thiocarbamide, obtains solution for standby.
3) dissolve disperse silicic acid magnalium with second half water gaging, fully stir and obtain thick gel.
4) by above-mentioned steps 1) 2) 3) and in all materials mix, and it is even to add the abundant dispersed with stirring of cerium oxide.
5) to step 4) in add trolamine continue stir, obtain homogeneous cerium oxide suspension polishing liquid.
The present invention is a kind of cerium oxide polishing slurry, has following remarkable advantage compared with existing commercially available polishing fluid:
1. suspended dispersed excellent performance, the homogeneous suspended state of long-term maintenance, abrasive material is not reunited, and does not precipitate the knot end.
2. polishing efficiency is high, and cutting force is strong, and surface tear is few, and conventional polishing machine polishing 10 minutes just can thinning more than 3 μm.
3. polishing fluid surface of polished is residual few, polishing powder easy cleaning.
4. long service life, Dilution ratio is high, and this polishing fluid deionized water dilutes more than 10 times still can keep former result of use.
Embodiment
Embodiment 1
Xanthan gum 0.2 part, tripoly phosphate sodium STPP 2 parts, sodium xylene sulfonate 5 parts, EDTA-2Na0.2 part, glycerine 4 parts, poly(oxyethylene glycol) 400 2 parts, neusilin 2 parts, thiocarbamide 0.3 part, trolamine 3 parts, cerium rouge 55 parts, 26.3 parts, water.
Embodiment 2
Xanthan gum 0.1 part, tripoly phosphate sodium STPP 3 parts, sodium xylene sulfonate 4 parts, EDTA-2Na0.1 part, glycerine 3 parts, poly(oxyethylene glycol) 400 3 parts, neusilin 1.5 parts, thiocarbamide 0.1 part, trolamine 2 parts, cerium rouge 50 parts, 33.2 parts, water.
Embodiment 3
Xanthan gum 0.3 part, tripoly phosphate sodium STPP 1 part, sodium xylene sulfonate 7 parts, EDTA-2Na0.2 part, glycerine 7 parts, poly(oxyethylene glycol) 400 2 parts, neusilin 1 part, thiocarbamide 0.2 part, trolamine 5 parts, cerium rouge 51 parts, 25.3 parts, water.
Embodiment 4
Xanthan gum 0.2 part, tripoly phosphate sodium STPP 0.5 part, sodium xylene sulfonate 6 parts, EDTA-2Na0.3 part, glycerine 4 parts, poly(oxyethylene glycol) 400 3 parts, neusilin 3 parts, thiocarbamide 0.2 part, trolamine 3 parts, cerium rouge 53 parts, 26.8 parts, water.
Embodiment 5
Xanthan gum 0.2 part, tripoly phosphate sodium STPP 3 parts, sodium xylene sulfonate 3 parts, EDTA-2Na0.2 part, glycerine 5 parts, poly(oxyethylene glycol) 400 2 parts, neusilin 1 part, thiocarbamide 0.3 part, trolamine 5 parts, cerium rouge 60 parts, 20.3 parts, water.
The preparation method of above-described embodiment:
1) by xanthan gum with glycerine dissolve dispersion, then add poly(oxyethylene glycol) 400 continue dispersed with stirring for subsequent use.
2) dissolve tripoly phosphate sodium STPP with half water gaging, sodium xylene sulfonate, EDTA-2Na, thiocarbamide, obtains solution for standby.
3) dissolve disperse silicic acid magnalium with second half water gaging, fully stir and obtain thick gel.
4) by above-mentioned steps 1) 2) 3) and in all materials mix, and it is even to add the abundant dispersed with stirring of cerium oxide.
5) to step 4) in add trolamine continue stir, obtain homogeneous cerium oxide suspension polishing liquid.
The using method of above-described embodiment:
2 parts by volume cerium oxide polishing slurry stoste of the present invention is measured with measuring cup, dilute cerium oxide polishing slurry of the present invention with 8-15 parts by volume deionized water, stir, detect diluent proportion with specific gravity hydrometer, after reaching check index, join in polisher lapper and adopt recycle pump to follow the use of bad feed flow.Monitor diluent concentration with specific gravity hydrometer, when density loss is to certain index or obvious sensation grinding and polishing decrease in efficiency, in feed tank, adds a small amount of stoste, continue to use.
In order to verify result of use of the present invention, double-faced grinding and polishing machine carries out compliance test result to hand-set lid glass, and result is as follows:
Note: stoste stability rating scale (54 DEG C of thermostat container heat storage 14 days):
First class: stable homogeneous, bottom is without deposit clumps, and upper strata is without bleed;
Second class: stable homogeneous, bottom without obvious sediment, the slight bleed in top;
Third class: more stable, slightly lump in bottom, a small amount of water is separated out on top, rocks and can again be uniformly dispersed;
Fourth level: unstable, lump in bottom, abrasive material and water stratification, rocks and can not recover dispersion.
Working fluid stability rating scale (normal temperature leaves standstill 24h):
One-level: stable homogeneous, lower floor is without obvious sediment, and upper strata is without bleed, and slight wobble can recover homogeneous suspension;
Secondary: more stable, there is a small amount of precipitation in lower floor, and there is slight bleed on upper strata, rocks and can recover homogeneous suspension;
Three grades: there is more precipitation in lower floor, the more bleed in upper strata, rocks and can partly recover to suspend, and bottom has caking to be difficult to redispersion suspension;
Level Four: severe delamination, seriously luming in bottom, rocks and can not recover to suspend.
Thickness thinning adopts electronic microgauge to detect.
Surface tear detects and adopts touch LCD panel glass flaw (cut) automatic tester to measure.
Clean complexity after polishing to be detected as on automatic Cleaning Line and cullet residual for polishing powder and to remove difficulty, surface cleanliness is evaluated.
What finally illustrate is, above embodiment is only in order to illustrate technical scheme of the present invention and unrestricted, although with reference to preferred embodiment to invention has been detailed description, those of ordinary skill in the art is to be understood that, can modify to technical scheme of the present invention or equivalent replacement, and not departing from aim and the scope of technical solution of the present invention, it all should be encompassed in the middle of right of the present invention.
Claims (3)
1. a cerium oxide polishing slurry, is characterized in that, its bulk composition and consumption comprise: xanthan gum 0.1-0.3 part, tripoly phosphate sodium STPP 0.5-3 part, sodium xylene sulfonate 3-7 part, EDTA-2Na0.1-0.3 part, glycerine 3-7 part, poly(oxyethylene glycol) 400 2-5 part, neusilin 1-3 part, thiocarbamide 0.1-0.5 part, trolamine 1-5 part, cerium rouge 50-60 part, water 20-35 part.
2. cerium oxide polishing slurry according to claim 1, is characterized in that, the weight part of each raw material is xanthan gum 0.2 part, tripoly phosphate sodium STPP 2 parts, sodium xylene sulfonate 5 parts, EDTA-2Na0.2 part, glycerine 4 parts, poly(oxyethylene glycol) 400 2 parts, neusilin 2 parts, thiocarbamide 0.3 part, trolamine 3 parts, cerium rouge 55 parts, 26.3 parts, water.
3. a preparation method for cerium oxide polishing slurry, is characterized in that:
1) by xanthan gum with glycerine dissolve dispersion, then add poly(oxyethylene glycol) 400 continue dispersed with stirring for subsequent use;
2)dissolve tripoly phosphate sodium STPP with half water gaging, sodium xylene sulfonate, EDTA-2Na, thiocarbamide, obtains solution for standby;
3)dissolve disperse silicic acid magnalium with second half water gaging, fully stir and obtain thick gel;
4)by above-mentioned steps 1) 2) 3) and in all materials mix, and it is even to add the abundant dispersed with stirring of cerium oxide;
5)to step 4) in add trolamine continue stir, obtain homogeneous cerium oxide suspension polishing liquid.
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| CN201510510778.1A CN105086836A (en) | 2015-08-19 | 2015-08-19 | Cerium oxide polishing solution and preparation method thereof |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106584230A (en) * | 2016-09-30 | 2017-04-26 | 惠州市德莱仕科技有限公司 | Glass scratch polishing agent and use method thereof, as well as polishing head for polishing agent |
| CN106867413A (en) * | 2017-02-06 | 2017-06-20 | 包头市金杰稀土纳米材料有限公司 | A kind of high concentration cerium oxide polishing slurry and preparation method thereof |
| RU2624317C1 (en) * | 2016-06-29 | 2017-07-03 | Константин Борисович Голубев | Liquid polishing paste for processing of products based on aluminium |
| CN110499102A (en) * | 2018-05-20 | 2019-11-26 | 深圳市得益达电子科技有限公司 | A kind of cerium oxide liquid suspension polishing liquid for glass polishing |
| CN111718658A (en) * | 2020-07-29 | 2020-09-29 | 江西庞泰环保股份有限公司 | Semiconductor cerium dioxide grinding slurry |
| CN114892174A (en) * | 2022-05-20 | 2022-08-12 | 镇江纳润特高新科技发展有限公司 | Ferrous metal polishing solution with rust removal function and preparation method thereof |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106867413A (en) * | 2017-02-06 | 2017-06-20 | 包头市金杰稀土纳米材料有限公司 | A kind of high concentration cerium oxide polishing slurry and preparation method thereof |
| CN106867413B (en) * | 2017-02-06 | 2021-06-04 | 包头市杰明纳光电科技有限公司 | High-concentration cerium oxide polishing solution and preparation method thereof |
| CN110499102A (en) * | 2018-05-20 | 2019-11-26 | 深圳市得益达电子科技有限公司 | A kind of cerium oxide liquid suspension polishing liquid for glass polishing |
| CN111718658A (en) * | 2020-07-29 | 2020-09-29 | 江西庞泰环保股份有限公司 | Semiconductor cerium dioxide grinding slurry |
| CN114892174A (en) * | 2022-05-20 | 2022-08-12 | 镇江纳润特高新科技发展有限公司 | Ferrous metal polishing solution with rust removal function and preparation method thereof |
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Application publication date: 20151125 |