CN104991427A - Exposure device and method - Google Patents
Exposure device and method Download PDFInfo
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- CN104991427A CN104991427A CN201510494605.5A CN201510494605A CN104991427A CN 104991427 A CN104991427 A CN 104991427A CN 201510494605 A CN201510494605 A CN 201510494605A CN 104991427 A CN104991427 A CN 104991427A
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Abstract
The invention relates to the technical field of photoetching, and discloses an exposure device and method. The exposure device comprises a rack and a metal pattern plate and further comprises a substrate bearing platform arranged on the rack so as to be used for bearing substrates, an interval measuring module and a drive module. The substrate bearing platform is manufactured through a deformable material so that the substrate bearing platform can have set deformation; the interval measuring module is used for measuring the exposure interval between the substrates and the metal pattern plate and working out the exposure interval compensation quantity according to the measured exposure interval and the preset interval value. The drive module is used for driving the substrate bearing platform to deform when the drive module acts, the drive module is connected with the interval measuring module through signals and drives the substrate bearing platform to deform according to the exposure interval compensation quantity so as to adjust the exposure interval between the substrate and the metal pattern plate to be in the set range. According to the exposure device, when the drive module acts, the distance between the substrates and the metal pattern plate is adjusted so as to adjust the exposure interval, so that the exposure device can conduct exposure compensation, the exposure interval is made to be close to the set value, and exposure quality is improved.
Description
Technical field
The present invention relates to technical field of lithography, particularly relate to a kind of exposure device and exposure method.
Background technology
At present, pursue the background of high resolving power, large scale and high-quality in liquid crystal display under, substrate is as the main composition device of liquid crystal display, the resolution of exposure to liquid crystal display of substrate has material impact, in the manufacturing process of substrate, exposure sources is used for base station and exposes, and the exposure sources used at present is exposure machine, especially proximity printing machine.
Exposure machine exposure gap is the most important parameters that proximity printing ensures resolution and critical size, and existing proximity printing machine ensures to be controlled by baseplate carrier flatness and mask plate flexibility two aspect to the homogeneity of exposure gap, but in existing proximity printing machine, the rare special control relating to exposure gap homogeneity, the flatness of baseplate carrier and the flexibility of mask plate are as a basic technology condition of proximity printing machine under normal circumstances, certain level to be reached before exposure starts, and baseplate carrier and mask plate supporting part are once fabrication and installation complete, the flatness of exposure machine baseplate carrier and the flexibility of mask plate cannot change, now, exposure machine cannot change exposure gap in real time in exposure process, namely exposure compensating cannot be carried out, affect the exposure quality of substrate.
Summary of the invention
The invention provides a kind of exposure device and exposure method, utilize that have can the baseplate carrier of deformation and distance measurement module, carry out exposure compensating, make exposure gap all close to setting value, to improve exposure quality.
For achieving the above object, the invention provides following technical scheme:
A kind of exposure device, comprises frame and mask plate, also comprises:
Be installed on described frame, for the baseplate carrier taking up substrate, described baseplate carrier by can deformation material prepare, with the deflection making described baseplate carrier have setting;
Distance measurement module, for measuring exposure gap between described substrate and described mask plate and calculating exposure gap compensation rate according to the exposure gap measured and the distance values preset;
For the driver module driving described baseplate carrier to be out of shape, described driver module is connected with described distance measurement module by signal and drives described baseplate carrier to be out of shape according to described exposure gap compensation rate, to adjust the exposure gap between described substrate and described mask plate.
In above-mentioned exposure device, exposure gap between the substrate of distance measurement module measure setup on baseplate carrier and mask plate according to the exposure gap measured and preset distance values and calculate exposure gap compensation rate, driver module action after the actuating signal receiving distance measurement module, baseplate carrier distortion is driven according to exposure gap compensation rate, the distance be arranged between substrate on baseplate carrier and mask plate can be adjusted, thus adjustment exposure gap, until exposure gap within the acceptable range, to realize the compensation to exposure gap, the exposure gap compensation rate in a certain region of baseplate carrier is timing, now, distance between the substrate that this region of baseplate carrier is corresponding and mask plate is excessive, therefore, driver module drives baseplate carrier to deform, to make this region of baseplate carrier towards distance measurement block motion, and then the distance in reduction substrate between the position corresponding with this region of baseplate carrier and mask plate, until exposure gap is in tolerance interval, when exposure gap compensation rate is reduced to zero, driver module action stops, and driver module keeps position when resting on stopping action, when the exposure gap compensation rate in a certain region of baseplate carrier is for time negative, now, distance between substrate this region and mask plate is too small, over-exposed, driver module first drives baseplate carrier overall to the direction action away from distance measurement module, and then the distance between substrate and mask plate is increased, exposure gap increases, when the exposure gap compensation rate in this region is zero, driver module drives baseplate carrier to deform again, be that positive region is towards distance measurement block motion to make baseplate carrier in exposure gap compensation rate, until exposure gap is in tolerance interval, when exposure gap compensation rate is decreased to zero, driver module action stops, driver module keeps position when resting on stopping action.
Therefore, above-mentioned exposure device can carry out exposure compensating, makes exposure gap all close to setting value, to improve exposure quality.
Preferably, described distance measurement module comprises:
For measuring the distance measurement unit of exposure gap between described substrate and described mask plate;
The distance computation unit of exposure gap compensation rate is calculated according to the exposure gap measured and the distance values preset;
Described distance measurement unit is connected with described distance computation cell signal.
Preferably, described driver module comprises:
Drive the first drive division of described baseplate carrier integral elevating when being installed on described frame, action, described first drive division is connected with described distance computation cell signal;
Drive the second drive division that described baseplate carrier is out of shape when being installed on described frame, action, described second drive division is connected with described distance computation cell signal.
Preferably, described first driving part deviates from the side of substrate in described baseplate carrier, and in four of described baseplate carrier bights, bight described in each is provided with described first drive division.
Preferably, described second drive division is multiple, and each described second driving part deviates from the side of substrate in described baseplate carrier and is array distribution.
Preferably, described second drive division comprises:
Be fixed on the wedge that described baseplate carrier deviates from substrate side, the one side that described wedge deviates from described baseplate carrier is inclined-plane;
Relatively described frame can be installed on described frame slidably along the direction perpendicular to described exposure gap and the slide block offseted with the inclined-plane of described wedge towards the one side of described baseplate carrier, when described slide block moves along described exposure gap direction relative to driving described wedge during described housing slide;
Drive the driving mechanism of described slide block movement.
Preferably, described driving mechanism is servo motor.
Preferably, described distance measurement unit be multiple and with described second drive division one_to_one corresponding, the exposure gap of region upper substrate of the described baseplate carrier that distance measurement unit described in each drives for the second drive division detecting its correspondence.
Preferably, described baseplate carrier has the scope of the deflection of setting is 10 μm ~ 100 μm.
Preferably, described distance measurement unit is displacement transducer.
An exposure method for exposure device, comprising:
Described distance measurement unit measures exposure gap between described substrate and described mask plate, described distance computation unit calculates exposure gap compensation rate according to the exposure gap measured and the distance values preset, and exposure gap compensation rate Signal transmissions to driver module;
Described driver module to drive described baseplate carrier action and distortion, carries out exposure gap compensation according to the exposure gap compensation rate action received, with the exposure gap range of control making the exposure gap value in all regions of the substrate on baseplate carrier meet setting;
Remove described exposure gap measuring unit;
Exposure-processed is carried out to substrate;
Control driver module resets, and recovers to make baseplate carrier deformation.
Preferably, when described driver module comprises the first drive division and the second drive division, described first drive division drives described baseplate carrier to move integrally, described second drive division drives described baseplate carrier to be out of shape, until when the exposure gap in all regions of substrate meets the exposure gap range of control of setting, described second drive division action stops, and described second drive division remains on described second drive division action stop position.
Preferably, before exposure-processed is carried out to substrate, also comprise:
Gather the Illumination Distribution information of exposure machine on exposure plane;
According to the amount of pre-compensation of Illumination Distribution information determination baseplate carrier deflection, meet exposure demand to make the Illumination Distribution information of exposure machine on plane of exposure.
Preferably, the described amount of pre-compensation according to Illumination Distribution information determination baseplate carrier deflection, specifically comprises:
By the Illumination Distribution information of collection and the Illumination Distribution information comparison of setting, an amount of pre-compensation is arranged to the exposure gap of illumination region correspondence position bigger than normal, makes baseplate carrier carry out being out of shape after adjustment the Illumination Distribution information comparison again to the Illumination Distribution information gathered and setting according to above-mentioned amount of pre-compensation:
When the Illumination Distribution information gathered meets exposure demand, determine that amount of pre-compensation is now final amount of pre-compensation;
When the Illumination Distribution information gathered does not meet exposure demand, repeat above-mentioned steps until the Illumination Distribution information gathered meets exposure demand, and the amount of pre-compensation determining to make the Illumination Distribution information of collection to meet exposure demand is final amount of pre-compensation.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of exposure device provided by the invention;
Fig. 2 is the structural representation of the driver module of a kind of exposure device provided by the invention;
Fig. 3 is the distribution plan of the distance measurement unit of a kind of exposure device provided by the invention, the second drive division and baseplate carrier;
Fig. 4 is a kind of distribution plan preferably of the second drive division of a kind of exposure device provided by the invention;
Fig. 5 is the another kind of distribution plan preferably of the second drive division of a kind of exposure device provided by the invention;
Fig. 6 is the structural representation of the second drive division preferred embodiment of a kind of exposure device provided by the invention;
Fig. 7 is the spacing control flow chart of all positions in the exposure method of a kind of exposure device provided by the invention;
Fig. 8 is the spacing control flow chart of single position in the exposure method of a kind of exposure device provided by the invention;
Fig. 9 is the process flow diagram of the exposure method of a kind of exposure device provided by the invention;
Figure 10 is a kind of method for compensating critical dimension process flow diagram provided by the invention.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.
As shown in Figure 1, a kind of exposure device that the embodiment of the present invention provides, comprises frame and mask plate 1, also comprises:
Be installed on frame, for the baseplate carrier 3 taking up substrate 2, baseplate carrier 3 by can deformation material prepare, with the deflection making baseplate carrier 3 have setting;
Distance measurement module 5, for measuring exposure gap between substrate 2 and mask plate 1 and calculating exposure gap compensation rate according to the exposure gap measured and the distance values preset;
The driver module 4 be out of shape for driving baseplate carrier 3, driver module 4 is connected with distance measurement module 5 signal and drives baseplate carrier 3 to be out of shape according to exposure gap compensation rate, to adjust the exposure gap between substrate 2 and mask plate 1.
In above-mentioned exposure device, exposure gap between the substrate 2 of distance measurement module 5 measure setup on baseplate carrier 3 and mask plate 1, and according to the exposure gap measured and preset distance values and calculate exposure gap compensation rate, driver module 4 action after the actuating signal receiving distance measurement module 5, baseplate carrier 3 is driven to be out of shape according to exposure gap compensation rate, the distance be arranged between substrate 2 on baseplate carrier 3 and mask plate 1 can be adjusted, thus adjustment exposure gap, until exposure gap within the acceptable range, to realize the compensation to exposure gap, the exposure gap compensation rate in a certain region of baseplate carrier 3 is timing, now, distance between the substrate 2 that this region of baseplate carrier 3 is corresponding and mask plate 1 is excessive, therefore, driver module 4 drives baseplate carrier 3 to deform, move towards distance measurement module 5 to make this region of baseplate carrier 3, and then the distance reduced in substrate 2 between the position corresponding with this region of baseplate carrier 3 and mask plate 1, until exposure gap is in tolerance interval, when exposure gap compensation rate is reduced to zero, driver module 4 action stops, driver module 4 keeps position when resting on stopping action, when the exposure gap compensation rate in a certain region of baseplate carrier 3 is for time negative, now, distance between this region of substrate 2 and mask plate 1 is too small, over-exposed, driver module 4 first drives baseplate carrier 3 entirety to the direction action away from distance measurement module 5, and then the distance between substrate 2 and mask plate 1 is increased, exposure gap increases, when the exposure gap compensation rate in this region is zero, driver module 4 drives baseplate carrier 3 to deform, be move towards distance measurement module 5 in positive region to make baseplate carrier 3 in exposure gap compensation rate, until exposure gap is in tolerance interval, when exposure gap compensation rate is decreased to zero, driver module 4 action stops, driver module 4 keeps position when resting on stopping action.
Therefore, above-mentioned exposure device can carry out exposure compensating, makes exposure gap all close to setting value, to improve exposure quality.
In a kind of preferred implementation, in order to obtain exposure gap compensation rate, as shown in Figure 1, distance measurement module 5 comprises:
For measuring the distance measurement unit 51 of exposure gap between substrate 2 and mask plate 1, because substrate 2 has thickness deviation in certain face, and there is certain flexibility, bend with baseplate carrier 3 surface topography, therefore distance between substrate 2 and mask plate 1 is not etc., distance measurement unit 51 is positioned at above mask plate 1, exposure gap between substrate 2 and mask plate 1 when can measure diverse location;
The distance computation unit 52 of exposure gap compensation rate is calculated according to the exposure gap measured and the distance values preset, in distance computation unit 52, preset distance values and exposure gap scope, exposure gap compensation rate is exposure gap and the difference presetting distance values;
Distance measurement unit 51 is connected with distance computation unit 52 signal, distance measurement unit 51 is sent to exposure gap between the substrate 2 measured and mask plate 1 in distance computation unit 52, and distance computation unit 52 calculates exposure gap compensation rate according to the exposure gap measured and the distance values preset.
Above-mentioned obtain exposure gap compensation rate after, in order to adjust exposure gap between substrate 2 and mask plate 1, make exposure gap all close to setting value, in a kind of preferred implementation, as described in Figure 2, driver module 4 comprises:
The first drive division 41, first drive division 41 of baseplate carrier 3 integral elevating is driven to be connected with distance computation unit 52 signal when being installed on frame, action;
The second drive division 42, second drive division 42 driving baseplate carrier 3 to be out of shape when being installed on frame, action is connected with distance computation unit 52 signal.
It is timing that distance computation unit 52 calculates exposure gap compensation rate, when spacing amount is all excessive, first drive division 41 drives baseplate carrier 3 to rise overally, move towards distance measurement unit 51 to make baseplate carrier 3, and then the distance reduced in substrate 2 and between mask plate 1, when exposure compensation amount be decreased to close to zero time, second drive division 42 drives baseplate carrier 3 to deform, and then the distance reduced in substrate 2 between the position corresponding with this region of baseplate carrier 3 and mask plate 1, until exposure gap is in tolerance interval, first drive division 41 and the second drive division 42 action stop, and keep position when resting on stopping action, when exposure gap compensation rate is just, and exposure compensation amount close to zero time, second drive division 42 drives baseplate carrier 3 to deform, and then the distance reduced in substrate 2 between the position corresponding with this region of baseplate carrier 3 and mask plate 1, until exposure gap is in tolerance interval, second drive division 42 action stops, and keeps position when resting on stopping action.
Distance computation unit 52 is when the exposure gap compensation rate calculating a certain region of baseplate carrier 3 is negative, first drive division 41 drives baseplate carrier 3 entire lowering, move towards the direction away from distance measurement unit 51 to make baseplate carrier 3, and then the distance added in large substrates 2 and between mask plate 1, exposure gap increases, exposure gap compensation rate in this region for just or be zero time, second drive division 42 drives baseplate carrier 3 to the direction action away from distance measurement module 5, be move towards distance measurement unit 51 in positive region to make baseplate carrier exposure gap compensation rate between substrate 2 and mask plate 1, until exposure gap is in tolerance interval, first drive division 41 and the second drive division 42 action stop, and keep position when resting on stopping action.Therefore, baseplate carrier 3 integral elevating is driven during the first drive division 41 action, carry out entirety to exposure gap between substrate 2 and mask plate 1 tentatively to regulate, drive baseplate carrier 3 to be out of shape during the second drive division 42 action, local is carried out to exposure gap between substrate 2 and mask plate 1 and precisely regulates.
Particularly, as shown in Figure 2, first drive division 41 is positioned at the side that baseplate carrier 3 deviates from substrate 2, and in four of baseplate carrier 3 bights, each bight is provided with first drive division 41, this distribution mode, can ensure that the first drive division 41 is after receiving the exposure gap compensation rate that distance computation unit 52 draws, move integrally baseplate carrier 3, realize moving integrally on the direction perpendicular to baseplate carrier 3 of baseplate carrier 3.
Particularly, as shown in Figure 3, second drive division 42 is multiple, each second drive division 42 be positioned at baseplate carrier 3 deviate from substrate 2 side and in array distribution, can obtain spacing everywhere in exposure plane, provide measurement data for overall spacing correction, the second drive division 42 position 6 can also distribute as Fig. 4, when exposure device is multiple, the second drive division 42 position 6 can also distribute as Fig. 5.
In order to drive baseplate carrier 3 to be out of shape when realizing the second drive division 42 action, in a kind of preferred implementation, as shown in Figure 6, the second drive division 42 comprises:
Be fixed on the wedge 7 that baseplate carrier 3 deviates from substrate 2 side, the one side that wedge 7 deviates from baseplate carrier 3 is inclined-plane, and wedge 7 is fixed on baseplate carrier 3, and baseplate carrier 3 moves along with the motion of wedge 7;
Can relatively frame along being installed on frame slidably perpendicular to the direction of exposure gap and towards the one side of baseplate carrier 3 and the slide block 8 offseted, when slide block 8 moves along exposure gap direction relative to driving wedge 7 during housing slide, and wedge 7 is fixed on baseplate carrier 3, baseplate carrier 3 moves along exposure gap direction, realize baseplate carrier 3 to be out of shape, between regulating and exposing between substrate 2 and mask plate 1;
Drive the driving mechanism 9 that slide block 8 moves, driving mechanism 9 drives slide block 8 relative to housing slide, because the inclined-plane of wedge 7 and slide block 8 offset, wedge 7 is driven to move along exposure gap direction during slide block 8 action, and wedge 7 is fixed on baseplate carrier 3, baseplate carrier 3 moves along exposure gap direction, realizes baseplate carrier 3 and is out of shape, to regulate exposure gap between substrate 2 and mask plate 1.
Particularly, described driving mechanism 9 is servo motor, and servo motor can realize accurate control, carries out local precisely regulate to realize exposure gap between substrate 2 and mask plate 1.
In a kind of preferred implementation, as shown in Figure 3, distance measurement unit 51 be multiple and with the second drive division 42 one_to_one corresponding, the exposure gap of the region upper substrate 2 of the baseplate carrier 3 that each distance measurement unit 51 drives for the second drive division 42 detecting its correspondence, the measurement feedback data of multiple positions that the second drive division 42 is measured according to distance measurement unit 51 drives baseplate carrier 3 to be out of shape, until the distance values of regional is all in tolerance interval.
In a kind of preferred implementation, the scope that baseplate carrier 3 has the deflection of setting is 10 μm ~ 100 μm, deformation is there is in baseplate carrier 3 under the effect of external force, baseplate carrier 3 is driven to be elevated to regulate exposure gap between substrate 2 and mask plate 1, when driver module 4 action stops, driver module 4 keeps position when resting on stopping action, and after driver module 4 leaves baseplate carrier 3, baseplate carrier 3 surface configuration is restored.
In a kind of preferred implementation, distance measurement unit 51 be displacement transducer, by measuring the displacement between distance measurement unit 51 and mask plate 1, substrate 2, to reach the object of exposure gap between measurement substrate 2 and mask plate 1.
As shown in Fig. 7, Fig. 8, Fig. 9, the exposure method of a kind of exposure device that the embodiment of the present invention provides, comprising:
Distance measurement unit 51 measures exposure gap between substrate 2 and mask plate 1, and distance computation unit 52 calculates exposure gap compensation rate according to the exposure gap measured and the distance values preset, and exposure gap compensation rate Signal transmissions to driver module 4;
Driver module 4 to drive baseplate carrier 3 action and distortion, carries out exposure gap compensation according to the exposure gap compensation rate action received, with the exposure gap range of control making the exposure gap value in all regions of the substrate on baseplate carrier 3 meet setting;
Remove exposure gap measuring unit 51;
Exposure-processed is carried out to substrate 2;
Control driver module 4 to reset, recover to make baseplate carrier 3 deformation.
In the exposure method of above-mentioned exposure device, exposure gap between substrate 2 and mask plate 1 is measured by distance measurement unit 51 and is obtained, spacing draws exposure gap compensation rate according to calculating unit 52 according to exposure gap and the distance values preset, driver module 4 drives baseplate carrier 3 action, to regulate the exposure gap between substrate 2 and mask plate 1, when exposure gap is in range of control, the action of driver module 4 stops, expose, after end exposure, driver module 4 leaves baseplate carrier 3, and baseplate carrier 3 recovers original shape.
Therefore, can exposure compensating be carried out to the true above-mentioned exposure method of exposure device, make exposure gap all close to setting value, to improve exposure quality.
In order to regulate exposure gap between substrate 2 and mask plate 1 more accurately, in a kind of preferred implementation, as Fig. 7, shown in Fig. 8, when driver module 4 comprises the first drive division 41 and the second drive division 42, first drive division 41 drives baseplate carrier 3 to move integrally, until exposure gap is in tolerance interval, carry out entirety to exposure gap between substrate 2 and mask plate 1 tentatively to regulate, second drive division 42 drives baseplate carrier 3 to be out of shape, exposure gap between substrate 2 and mask plate 1 is precisely regulated, until when the exposure gap in all regions of substrate 2 meets the exposure gap range of control of setting, second drive division 42 action stops, and the second drive division 42 remains on the second drive division 42 action stop position, carry out exposure-processed, after end exposure, first drive division 41 and the second drive division 42 leave baseplate carrier 3, baseplate carrier 3 recovers original shape.
In a kind of preferred implementation, as shown in Figure 10, before exposure-processed is carried out to substrate 2, also comprise:
Gather the Illumination Distribution information of exposure machine on exposure plane;
According to the amount of pre-compensation of Illumination Distribution information determination baseplate carrier 3 deflection, meet exposure demand to make the Illumination Distribution information of exposure machine on plane of exposure.
Particularly, by compensating partial exposure spacing, reaching and offsetting the effect that Illumination Distribution brings key size deviation, as shown in Figure 10, according to the amount of pre-compensation of Illumination Distribution information determination baseplate carrier 3 deflection, comprising:
By the Illumination Distribution information of collection and the Illumination Distribution information comparison of setting, an amount of pre-compensation is arranged to the exposure gap of illumination region correspondence position bigger than normal, makes baseplate carrier 3 carry out being out of shape after adjustment the Illumination Distribution information comparison again to the Illumination Distribution information gathered and setting according to above-mentioned amount of pre-compensation:
When the Illumination Distribution information gathered meets exposure demand, determine that amount of pre-compensation is now final amount of pre-compensation;
When the Illumination Distribution information gathered does not meet exposure demand, repeat above-mentioned steps until the Illumination Distribution information gathered meets exposure demand, and the amount of pre-compensation determining to make the Illumination Distribution information of collection to meet exposure demand is final amount of pre-compensation.
If under normal condition, first drive division 41 or the second drive division 42 need the actuating quantity of movement to be the exposure gap compensation rate that distance computation unit 52 calculates in theory, then actual first drive division 41 or the second drive division 42 need the actuating quantity of movement to be the amount of pre-compensation of exposure gap compensation rate+final.Each Partial controll portion initial position of baseplate carrier 3 can be set to final amount of pre-compensation position, when substrate 2 occurs, only need moving exposure spacing.Also each Partial controll portion initial position of baseplate carrier 3 can be set to origin position, i.e. undeformed position, when substrate 2 occurs, exposure gap compensation rate+final amount of pre-compensation is carried out simultaneously.
Obviously, those skilled in the art can carry out various change and modification to the embodiment of the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (14)
1. an exposure device, comprises frame and mask plate, it is characterized in that, also comprise:
Be installed on described frame, for the baseplate carrier taking up substrate, described baseplate carrier by can deformation material prepare, with the deflection making described baseplate carrier have setting;
Distance measurement module, for measuring exposure gap between described substrate and described mask plate and calculating exposure gap compensation rate according to the exposure gap measured and the distance values preset;
For the driver module driving described baseplate carrier to be out of shape, described driver module is connected with described distance measurement module by signal and drives described baseplate carrier to be out of shape according to described exposure gap compensation rate, to adjust the exposure gap between described substrate and described mask plate.
2. exposure device according to claim 1, is characterized in that, described distance measurement module comprises:
For measuring the distance measurement unit of exposure gap between described substrate and described mask plate;
The distance computation unit of exposure gap compensation rate is calculated according to the exposure gap measured and the distance values preset;
Described distance measurement unit is connected with described distance computation cell signal.
3. exposure device according to claim 2, is characterized in that, described driver module comprises:
Drive the first drive division of described baseplate carrier integral elevating when being installed on described frame, action, described first drive division is connected with described distance computation cell signal;
Drive the second drive division that described baseplate carrier is out of shape when being installed on described frame, action, described second drive division is connected with described distance computation cell signal.
4. exposure device according to claim 3, is characterized in that, described first driving part deviates from the side of substrate in described baseplate carrier, and in four of described baseplate carrier bights, bight described in each is provided with described first drive division.
5. exposure device according to claim 3, is characterized in that, described second drive division is multiple, and each described second driving part deviates from the side of substrate in described baseplate carrier and is array distribution.
6. exposure device according to claim 5, is characterized in that, described second drive division comprises:
Be fixed on the wedge that described baseplate carrier deviates from substrate side, the one side that described wedge deviates from described baseplate carrier is inclined-plane;
Relatively described frame can be installed on described frame slidably along the direction perpendicular to described exposure gap and the slide block offseted with the inclined-plane of described wedge towards the one side of described baseplate carrier, when described slide block moves along described exposure gap direction relative to driving described wedge during described housing slide;
Drive the driving mechanism of described slide block movement.
7. exposure device according to claim 6, is characterized in that, described driving mechanism is servo motor.
8. exposure device according to claim 5, it is characterized in that, described distance measurement unit be multiple and with described second drive division one_to_one corresponding, the exposure gap of region upper substrate of the described baseplate carrier that distance measurement unit described in each drives for the second drive division detecting its correspondence.
9. exposure device according to claim 1, is characterized in that, the scope that described baseplate carrier has the deflection of setting is 10 μm ~ 100 μm.
10. exposure device according to claim 1, is characterized in that, described distance measurement unit is displacement transducer.
The exposure method of 11. 1 kinds of exposure devices as described in any one of claim 1-10, is characterized in that, comprising:
Described distance measurement unit measures exposure gap between described substrate and described mask plate, described distance computation unit calculates exposure gap compensation rate according to the exposure gap measured and the distance values preset, and exposure gap compensation rate Signal transmissions to driver module;
Described driver module to drive described baseplate carrier action and distortion, carries out exposure gap compensation according to the exposure gap compensation rate action received, with the exposure gap range of control making the exposure gap value in all regions of the substrate on baseplate carrier meet setting;
Remove described exposure gap measuring unit;
Exposure-processed is carried out to substrate;
Control driver module resets, and recovers to make baseplate carrier deformation.
12. exposure methods according to claim 11, it is characterized in that, when described driver module comprises the first drive division and the second drive division, described first drive division drives described baseplate carrier to move integrally, described second drive division drives described baseplate carrier to be out of shape, until when the exposure gap in all regions of substrate meets the exposure gap range of control of setting, described second drive division action stops, and described second drive division remains on described second drive division action stop position.
13. exposure methods according to claim 11, is characterized in that, before carrying out exposure-processed to substrate, also comprise:
Gather the Illumination Distribution information of exposure machine on exposure plane;
According to the amount of pre-compensation of Illumination Distribution information determination baseplate carrier deflection, meet exposure demand to make the Illumination Distribution information of exposure machine on plane of exposure.
14. exposure methods according to claim 13, is characterized in that, the described amount of pre-compensation according to Illumination Distribution information determination baseplate carrier deflection, specifically comprises:
By the Illumination Distribution information of collection and the Illumination Distribution information comparison of setting, an amount of pre-compensation is arranged to the exposure gap of illumination region correspondence position bigger than normal, makes baseplate carrier carry out being out of shape after adjustment the Illumination Distribution information comparison again to the Illumination Distribution information gathered and setting according to above-mentioned amount of pre-compensation:
When the Illumination Distribution information gathered meets exposure demand, determine that amount of pre-compensation is now final amount of pre-compensation;
When the Illumination Distribution information gathered does not meet exposure demand, repeat above-mentioned steps until the Illumination Distribution information gathered meets exposure demand, and the amount of pre-compensation determining to make the Illumination Distribution information of collection to meet exposure demand is final amount of pre-compensation.
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| WO2018129933A1 (en) * | 2017-01-11 | 2018-07-19 | 惠科股份有限公司 | Exposure machine, and method and system for preventing same from causing image offset |
| WO2018205339A1 (en) * | 2017-05-09 | 2018-11-15 | 深圳市华星光电半导体显示技术有限公司 | Method and device for releasing film stress of array substrate |
| CN109581828A (en) * | 2019-01-23 | 2019-04-05 | 深圳市华星光电技术有限公司 | Exposure device and exposure method |
| CN112981329A (en) * | 2021-02-07 | 2021-06-18 | 京东方科技集团股份有限公司 | Adjusting device, evaporator and adjusting method |
| CN113442099A (en) * | 2021-06-29 | 2021-09-28 | Tcl华星光电技术有限公司 | Substrate processing carrying platform |
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| US4475223A (en) * | 1981-06-12 | 1984-10-02 | Hitachi, Ltd. | Exposure process and system |
| US6381002B1 (en) * | 1998-07-09 | 2002-04-30 | Ushiodenki Kabushiki Kaisha | Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| CN101136353A (en) * | 2006-08-31 | 2008-03-05 | 东京毅力科创株式会社 | Substrate carrying mechanism and connecting method |
| CN101546134A (en) * | 2008-03-25 | 2009-09-30 | 纽富来科技股份有限公司 | Electron beam writing apparatus and method |
| CN101833246A (en) * | 2008-12-31 | 2010-09-15 | Asml控股股份有限公司 | Optically compensated unidirectional reticle bender |
| CN102033067A (en) * | 2009-09-24 | 2011-04-27 | 株式会社日立高新技术 | Inspection apparatus for glass substrate |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018129933A1 (en) * | 2017-01-11 | 2018-07-19 | 惠科股份有限公司 | Exposure machine, and method and system for preventing same from causing image offset |
| WO2018205339A1 (en) * | 2017-05-09 | 2018-11-15 | 深圳市华星光电半导体显示技术有限公司 | Method and device for releasing film stress of array substrate |
| CN109581828A (en) * | 2019-01-23 | 2019-04-05 | 深圳市华星光电技术有限公司 | Exposure device and exposure method |
| CN112981329A (en) * | 2021-02-07 | 2021-06-18 | 京东方科技集团股份有限公司 | Adjusting device, evaporator and adjusting method |
| CN113442099A (en) * | 2021-06-29 | 2021-09-28 | Tcl华星光电技术有限公司 | Substrate processing carrying platform |
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|---|---|
| CN104991427B (en) | 2017-12-08 |
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