CN104966705B - A kind of solder distribution of semiconductor devices radiating module - Google Patents
A kind of solder distribution of semiconductor devices radiating module Download PDFInfo
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- CN104966705B CN104966705B CN201510409480.1A CN201510409480A CN104966705B CN 104966705 B CN104966705 B CN 104966705B CN 201510409480 A CN201510409480 A CN 201510409480A CN 104966705 B CN104966705 B CN 104966705B
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- 229910000679 solder Inorganic materials 0.000 title claims abstract description 53
- 239000004065 semiconductor Substances 0.000 title claims abstract description 42
- 238000009826 distribution Methods 0.000 title abstract description 7
- 238000000034 method Methods 0.000 claims abstract description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 32
- 229910052802 copper Inorganic materials 0.000 claims description 31
- 239000010949 copper Substances 0.000 claims description 31
- 229910052738 indium Inorganic materials 0.000 claims description 18
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 18
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 17
- 229910052737 gold Inorganic materials 0.000 claims description 13
- 239000010931 gold Substances 0.000 claims description 13
- 239000000919 ceramic Substances 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 4
- 238000001179 sorption measurement Methods 0.000 claims description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000002848 electrochemical method Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 241000218202 Coptis Species 0.000 claims 1
- 235000002991 Coptis groenlandica Nutrition 0.000 claims 1
- 229960004643 cupric oxide Drugs 0.000 claims 1
- 238000002242 deionisation method Methods 0.000 claims 1
- 230000005518 electrochemistry Effects 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 238000005245 sintering Methods 0.000 abstract description 10
- 230000017525 heat dissipation Effects 0.000 abstract description 7
- 230000000903 blocking effect Effects 0.000 abstract description 6
- 230000009194 climbing Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 description 10
- -1 AuSn Inorganic materials 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910017750 AgSn Inorganic materials 0.000 description 2
- 229910020220 Pb—Sn Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910007116 SnPb Inorganic materials 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910000962 AlSiC Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- WUUZKBJEUBFVMV-UHFFFAOYSA-N copper molybdenum Chemical compound [Cu].[Mo] WUUZKBJEUBFVMV-UHFFFAOYSA-N 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- SBYXRAKIOMOBFF-UHFFFAOYSA-N copper tungsten Chemical compound [Cu].[W] SBYXRAKIOMOBFF-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
一种半导体器件散热模块的焊料分布结构,该结构包括热沉、第一焊料层、第二焊料层、芯片;第一焊料层设置在热沉上方,第二焊料层设置在热沉的侧面并与第一焊料层连接,芯片设置在第一焊料层上方,为上下电极结构。通过在热沉一侧面也生长了一层第二焊料层,第二焊料层的作用主要是在烧结过程中引导隆起的第一焊料层向热沉一侧流动,从而有效的阻止了第一焊料层向管芯方向攀爬,这样便可以有效的防止由于第一焊料层向管芯方向攀爬造成管芯短路或者挡光的问题,提高了器件的成品率、可靠性和稳定性。
A solder distribution structure of a heat dissipation module of a semiconductor device, the structure includes a heat sink, a first solder layer, a second solder layer, and a chip; the first solder layer is arranged above the heat sink, the second solder layer is arranged on the side of the heat sink and It is connected with the first solder layer, and the chip is arranged above the first solder layer, which is an upper and lower electrode structure. By growing a layer of second solder layer on one side of the heat sink, the function of the second solder layer is mainly to guide the raised first solder layer to flow to the side of the heat sink during the sintering process, thereby effectively preventing the first solder layer from The layer climbs toward the die, so that the problem of short circuit or light blocking of the die caused by the first solder layer climbing toward the die can be effectively prevented, and the yield, reliability and stability of the device are improved.
Description
技术领域technical field
一种半导体器件散热模块的焊料分布,属于半导体器件制造领域,涉及一种半导体器件散热模块的制备工艺。The invention relates to solder distribution of a heat dissipation module of a semiconductor device, belongs to the field of semiconductor device manufacturing, and relates to a preparation process of a heat dissipation module of a semiconductor device.
背景技术Background technique
半导体器件是指利用半导体材料制备出来的分立器件。根据不同的半导体材料,不同的工艺和几何结构,科研人员已经研制出了各种各样功能各异的半导体器件。这些半导体器件广泛应用于信息存储、通信、军事和医疗等领域。这就要求半导体器件具有性能优异、体积小、重量轻和功耗低等特点。为了实现上述目标,对半导体器件散热模块的制备工艺提出了很高的要求。Semiconductor devices refer to discrete devices made of semiconductor materials. According to different semiconductor materials, different processes and geometric structures, researchers have developed a variety of semiconductor devices with different functions. These semiconductor devices are widely used in information storage, communication, military and medical fields. This requires semiconductor devices to have the characteristics of excellent performance, small size, light weight and low power consumption. In order to achieve the above goals, very high requirements are put forward for the manufacturing process of the semiconductor device heat dissipation module.
影响半导体器件制备工艺中最为主要的因素是烧结工艺。目前,半导体器件散热模块的制备工艺中最为主要的是对于半导体器件的烧结工艺,无论是回流焊技术或者其他的烧结方式,都是利用加热的原理将管芯烧结到热沉上,但是,在烧结过程中,由于焊料熔融后冷却会出现焊料隆起成球状的现象,容易攀爬至管芯的有源区从而造成芯片短路或者阻挡芯片出光的现象,这些都会严重影响半导体器件的成品率、可靠性和稳定性。The most important factor affecting the manufacturing process of semiconductor devices is the sintering process. At present, the most important part of the manufacturing process of semiconductor device cooling modules is the sintering process of semiconductor devices. Whether it is reflow soldering technology or other sintering methods, the core is sintered to the heat sink by the principle of heating. However, in During the sintering process, due to the melting and cooling of the solder, the solder will bulge into a spherical shape, and it is easy to climb to the active area of the die, resulting in a short circuit of the chip or blocking the light from the chip, which will seriously affect the yield and reliability of semiconductor devices. sex and stability.
发明内容Contents of the invention
为了解决上述由于热沉和管芯在烧结过程中容易引起的焊料隆起,向管芯攀爬从而造成管芯短路或者挡光的问题,本发明提供了一种半导体器件散热模块的焊料分布结构,可以有效地引导焊料在烧结时向热沉方向流动,防止焊料降温后冷却成球状,并攀爬至管芯造成挡光和芯片短路现象,有效地解决了现有半导体器件烧结过程中出现短路或者挡光的问题,提高了器件的成品率、可靠性和稳定性。In order to solve the above-mentioned problem that the solder bulges easily caused by the heat sink and the tube core during the sintering process, and climbs to the tube core to cause a short circuit or light blocking of the tube core, the present invention provides a solder distribution structure for a heat dissipation module of a semiconductor device. It can effectively guide the solder to flow toward the heat sink during sintering, prevent the solder from cooling into a ball after cooling down, and climb to the die to cause light blocking and chip short circuit, effectively solving the problem of short circuit or short circuit in the sintering process of existing semiconductor devices The problem of blocking light improves the yield, reliability and stability of the device.
为了实现上述目的,本发明提供了一种半导体器件散热模块的焊料分布结构,该结构包括热沉(1)、第一焊料层(2)、第二焊料层(3)、芯片(4);第一焊料层(2)设置在热沉(1)上方,第二焊料层(3)设置在热沉(1)的侧面并与第一焊料层(2)连接,芯片(4)设置在在第一焊料层(2)上方,为上下电极结构。In order to achieve the above object, the present invention provides a solder distribution structure of a heat dissipation module of a semiconductor device, the structure comprising a heat sink (1), a first solder layer (2), a second solder layer (3), and a chip (4); The first solder layer (2) is arranged above the heat sink (1), the second solder layer (3) is arranged on the side of the heat sink (1) and connected with the first solder layer (2), and the chip (4) is arranged on the Above the first solder layer (2), there are upper and lower electrode structures.
所述的热沉(1)为具有散热能力的热沉材料,热沉材料为铜或钨铜或钼铜或陶瓷材料或金刚石或Si或SiC或AlSiC或CuW90或CuW55;陶瓷材料为粘土或氧化铝或高岭土或氮化铝或氮化硅或碳化硅或六方氮化硼。The heat sink (1) is a heat sink material with heat dissipation capability, and the heat sink material is copper or tungsten copper or molybdenum copper or ceramic material or diamond or Si or SiC or AlSiC or CuW90 or CuW55; the ceramic material is clay or oxide Aluminum or kaolin or aluminum nitride or silicon nitride or silicon carbide or hexagonal boron nitride.
所述第一焊料层(2)为能够起到连接芯片与热沉作用的焊料材料,焊料材料为In或SnPb或AuSn或AgSn或SnAgCu或Pb-Sn合金或焊锡或导电银浆。The first solder layer (2) is a solder material capable of connecting the chip and a heat sink, and the solder material is In, SnPb, AuSn, AgSn, SnAgCu, or Pb-Sn alloy, solder, or conductive silver paste.
所述第二焊料层(3)为能够起到连接芯片与热沉作用的焊料材料,焊料材料为In或SnPb或AuSn或AgSn或SnAgCu或Pb-Sn合金或焊锡或导电银浆。The second solder layer (3) is a solder material capable of connecting the chip and a heat sink, and the solder material is In, SnPb, AuSn, AgSn, SnAgCu, or Pb-Sn alloy, solder, or conductive silver paste.
所述第一焊料层(2)和第二焊料层(3)为同一种材料或不同种材料。The first solder layer (2) and the second solder layer (3) are the same material or different materials.
所述芯片(4)是半导体器件,半导体器件是半导体发光二极管或光电探测器或半导体激光器或光电池或集成电路或其他半导体器件。The chip (4) is a semiconductor device, and the semiconductor device is a semiconductor light-emitting diode or a photodetector or a semiconductor laser or a photocell or an integrated circuit or other semiconductor devices.
所述第二焊料层(3)的形状是矩形或梯形或弧形或不规则形状。The shape of the second solder layer (3) is rectangle or trapezoid or arc or irregular shape.
所述第二焊料层(3)的竖直长度大于第一焊料层(2)的厚度。The vertical length of the second solder layer (3) is greater than the thickness of the first solder layer (2).
本发明的有益效果是:在热沉1一侧面也生长了一层第二焊料层3,第二焊料层3的作用主要是在烧结过程中引导隆起的第一焊料层2向热沉1一侧流动,从而有效的阻止了第一焊料层2向管芯4方向攀爬,实施效果对比如附图2所示,这样便可以有效的防止由于第一焊料层2向管芯4方向攀爬造成管芯4短路或者挡光的问题,提高了器件的成品率、可靠性和稳定性。The beneficial effects of the present invention are: a layer of second solder layer 3 is also grown on one side of the heat sink 1, and the function of the second solder layer 3 is mainly to guide the raised first solder layer 2 to the heat sink 1 in the sintering process. side flow, thereby effectively preventing the first solder layer 2 from climbing toward the die 4, the implementation effect is shown in Figure 2, which can effectively prevent the first solder layer 2 from climbing toward the die 4 The problem of short circuit or light blocking of the tube core 4 is caused, and the yield, reliability and stability of the device are improved.
附图说明Description of drawings
图1:烧结后管芯与热沉的侧视图。Figure 1: Side view of the die and heat sink after sintering.
图2:实施效果对比图。Figure 2: Comparison of implementation effects.
图3:采用本发明焊料分布的半导体激光器芯片。Figure 3: Semiconductor laser chip using the solder distribution of the present invention.
图中:1、热沉,2、第一焊料层,3、第二焊料层,4、管芯,5、合金过程中隆起的焊料,6、铜热沉,7、陶瓷片,8、铜带,9、陶瓷片上的金层,10、金线,11、半导体激光器芯片,12、第一铟层,13、第二铟层。In the figure: 1. Heat sink, 2. First solder layer, 3. Second solder layer, 4. Die core, 5. Solder raised during alloying process, 6. Copper heat sink, 7. Ceramic sheet, 8. Copper Tape, 9, gold layer on the ceramic chip, 10, gold wire, 11, semiconductor laser chip, 12, first indium layer, 13, second indium layer.
具体实施方式detailed description
本发明提供的改进的半导体器件的焊料分布结构,提供一种具体的实施方式,以半导体激光器为例,铟为焊料,在铜热沉上进行烧结,包括:The improved solder distribution structure of the semiconductor device provided by the present invention provides a specific implementation mode. Taking a semiconductor laser as an example, indium is used as solder and sintered on a copper heat sink, including:
S1对铜热沉(6)进行清洗处理,从而去除铜热沉(6)表面的氧化铜,清洗完后用去离子水冲洗;S1 cleans the copper heat sink (6), thereby removing the copper oxide on the surface of the copper heat sink (6), and rinses it with deionized water after cleaning;
S2将清洗处理完的铜热沉(6)放置蒸发台上,在铜热沉(6)的表面蒸镀一层金;S2 places the cleaned copper heat sink (6) on the evaporation table, and evaporates a layer of gold on the surface of the copper heat sink (6);
S3将表面蒸镀上金层的铜热沉(6)放置在镀铟液中,采用电化学的方法在镀金的铜热沉(6)上放置管芯一面蒸镀一层第一铟层(12);S3 places the copper heat sink (6) with a gold layer evaporated on its surface in the indium plating solution, and uses an electrochemical method to place a die on the gold-plated copper heat sink (6) while evaporating a layer of the first indium layer ( 12);
S4按上述S3所述的电化学方法,用特定的夹具在表面蒸镀上金层的铜热沉(6)靠近出光面一侧蒸镀一层第二铟层(13),第二铟层(13)的作用主要是为了在后续的合金过程中引导隆起的第一铟层(12)向铜热沉(6)一侧流动,从而有效的阻止了第一铟层(12)向半导体激光器芯片(11)方向攀爬;S4 According to the electrochemical method described in S3 above, use a specific fixture to vapor-deposit a second indium layer (13) on the copper heat sink (6) with a gold layer on the surface near the light-emitting surface, and the second indium layer The function of (13) is mainly to guide the raised first indium layer (12) to flow to the copper heat sink (6) side in the subsequent alloying process, thereby effectively preventing the first indium layer (12) from flowing to the semiconductor laser Chip (11) direction climbing;
S5利用磁控溅射将陶瓷片(7)的正反两面溅射厚金,从而形成陶瓷片上的金层(9)。陶瓷片上的金层(9)的作用主要是为了将半导体激光器芯片(11)的P极和N极引出到测试设备上进行测试;S5 uses magnetron sputtering to sputter thick gold on both sides of the ceramic sheet (7), thereby forming a gold layer (9) on the ceramic sheet. The role of the gold layer (9) on the ceramic sheet is mainly to lead the P pole and N pole of the semiconductor laser chip (11) to the test equipment for testing;
S6将蒸镀好铟层的铜热沉(6)放在夹具的固定槽里,用吸附机在显微镜下将半导体激光器芯片(11)放在铜热沉(6)上,在此处需要确保半导体激光器芯片(11)的出光面与铜热沉(6)边缘对齐;同时,用吸附机在显微镜下将陶瓷片(7)放在铜热沉(6)上,然后将夹具推到加热炉中,通入氮气将加热炉中的空气排空,将加热炉合金;S6 places the copper heat sink (6) with the evaporated indium layer in the fixed groove of the fixture, and puts the semiconductor laser chip (11) on the copper heat sink (6) under a microscope with an adsorption machine. The light-emitting surface of the semiconductor laser chip (11) is aligned with the edge of the copper heat sink (6); at the same time, the ceramic sheet (7) is placed on the copper heat sink (6) under a microscope with an adsorption machine, and then the fixture is pushed to the heating furnace In the process, feed nitrogen to evacuate the air in the heating furnace, and heat the furnace alloy;
S7合金结束后,将金线(10)从陶瓷片(7)引到半导体激光器芯片(11)上,然后在陶瓷片(7)上引出铜带(8),然后将器件装配到TO-3基座上,最后用半导体激光器测试仪进行测试。After the S7 alloy is finished, lead the gold wire (10) from the ceramic sheet (7) to the semiconductor laser chip (11), then lead the copper strip (8) on the ceramic sheet (7), and then assemble the device to the TO-3 On the base, finally test it with a semiconductor laser tester.
Claims (1)
- A kind of 1. preparation method of the solder distributed architecture of semiconductor devices radiating module, it is characterised in that:Semiconductor laser In, indium is solder, is sintered on copper is heat sink, its implementation process include it is as follows,S1 is heat sink to copper (6) carries out cleaning treatment, and so as to remove the cupric oxide on heat sink (6) surface of copper removal, deionization is used after having cleaned Water rinses;S2 places the complete copper of cleaning treatment heat sink (6) on evaporator, and one layer of gold is deposited on the surface of copper heat sink (6);The copper heat sink (6) that S3 surface is deposited upper layer gold is placed in plating indium liquid, using the method for electrochemistry in gold-plated copper heat Tube core one side is placed on heavy (6) one layer of first indium layer (12) is deposited;Electrochemical methods of the S4 as described in above-mentioned S3, with the copper heat sink (6) of fixture layer gold on the evaporation of surface close to exiting surface one One layer of second indium layer (13) is deposited in side, and the effect of the second indium layer (13) in follow-up alloy process primarily to guide grand The first indium layer (12) risen flows to heat sink (6) side of copper, so as to effectively prevent the first indium layer (12) to semiconductor laser Climb in device chip (11) direction;The tow sides of potsherd (7) are sputtered thick gold by S5 using magnetron sputtering, so as to form the layer gold on potsherd (9);Pottery The effect of layer gold (9) on ceramics is enterprising in order to which the P poles of semiconductor laser chip (11) and N poles are drawn out into test equipment Row test;The copper that indium layer has been deposited heat sink (6) is placed in the fixing groove of fixture by S6, is under the microscope swashed semiconductor with adsorption machine Light device chip (11) is placed on copper heat sink (6), is necessary to ensure that the exiting surface and copper heat of semiconductor laser chip (11) here Heavy (6) edge alignment;Meanwhile potsherd (7) is placed on copper heat sink (6) under the microscope with adsorption machine, then fixture is pushed away Into heating furnace, it is passed through nitrogen and empties the air in heating furnace, by heating furnace alloy;After S7 alloys terminate, gold thread (10) is guided on semiconductor laser chip (11) from potsherd (7), then in potsherd (7) copper strips (8) is drawn on, then device is assembled on TO-3 pedestals, finally tested with semiconductor laser tester.
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CN105880859A (en) * | 2016-04-19 | 2016-08-24 | 北京工业大学 | Heat sink with adjustable AuSn alloy compositions |
CN108063096A (en) * | 2017-11-15 | 2018-05-22 | 全球能源互联网研究院有限公司 | A kind of semiconductor power device submodule group and its production method and compression joint type IGBT module |
CN109873064A (en) * | 2017-12-05 | 2019-06-11 | 山东浪潮华光光电子股份有限公司 | A kind of vertical LED chip structure and preparation method thereof |
CN109917353B (en) * | 2019-04-23 | 2020-05-19 | 上海禾赛光电科技有限公司 | Laser emitting device of laser radar and laser radar |
CN114204407B (en) * | 2021-12-13 | 2024-08-30 | 中国科学院苏州纳米技术与纳米仿生研究所 | Packaging structure and packaging method of laser tube core |
CN114583549A (en) * | 2021-12-31 | 2022-06-03 | 深圳市柠檬光子科技有限公司 | Method for reducing temperature of light emitting surface of semiconductor laser |
CN116598884A (en) * | 2023-07-14 | 2023-08-15 | 中国科学院半导体研究所 | Semiconductor laser and method for manufacturing the same |
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Application publication date: 20151007 Assignee: Beijing Aerospace Hengxian Technology Co.,Ltd. Assignor: Beijing University of Technology Contract record no.: X2024980043462 Denomination of invention: Solder distribution of a semiconductor device heat dissipation module Granted publication date: 20171222 License type: Open License Record date: 20241230 |