CN104841665B - Gas circuit cleaning device and gas circuit cleaning method - Google Patents
Gas circuit cleaning device and gas circuit cleaning method Download PDFInfo
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- CN104841665B CN104841665B CN201510115044.3A CN201510115044A CN104841665B CN 104841665 B CN104841665 B CN 104841665B CN 201510115044 A CN201510115044 A CN 201510115044A CN 104841665 B CN104841665 B CN 104841665B
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- gas
- source
- gas circuit
- purge
- flow
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
- B08B9/027—Cleaning the internal surfaces; Removal of blockages
- B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
The present invention provides a kind of gas circuit cleaning device, for being cleaned to the gas circuit of spectral detection equipment, it is characterised in that including：Source of purge gas；Pressure maintaining valve, it is connected with source of purge gas；Gas flow control device, it is connected with pressure maintaining valve；Flow-limiting valve, one end are connected with pressure maintaining valve, and the other end is connected with the gas circuit outlet of spectral detection equipment, and when opening source of purge gas is cleaned, air-flow caused by source of purge gas enters gas circuit along the direction opposite with carrier gas traffic direction during detection.Scavenging period can be greatly decreased in the gas circuit cleaning device of the present invention, scavenging period can be reduced into original 1/2 to 1/3.The scavenging period in analysis interval is shortened, therefore improves analyze speed on the whole.
Description
Technical field
The present invention relates to a kind of gas circuit cleaning device, the invention further relates to a kind of gas circuit cleaning method, belongs to analytical instrument
Field.
Background technology
Spectral class detecting instrument, such as gas phase molecular absorption spectrometer, generally its after a sample is determined, it is necessary to clean
Pipeline, to carry out next sample analysis, the method for generally use cleaning is：Carried according to used by raw sample assay method
Throughput, carrier gas flux is increased, or keep flow constant, the gas of residual is taken away, until by gas circuit, includes colorimetric pipe portion
Point, clean up.
Above method shortcoming first is that cleaning is time-consuming very long, is unfavorable for analysis efficiency raising.Second is to consume pure water amount very
Greatly so that many steam is produced in instrument, and then causes detector to be produced analytical error by moisture contamination.
The content of the invention
It is an object of the invention to provide a kind of Quick cleaning device, to solve the above problems.
Present invention employs following technical scheme：
A kind of gas circuit cleaning device, for being cleaned to the gas circuit of spectral detection equipment, it is characterised in that including：Clearly
Gas washing source；Pressure maintaining valve, it is connected with the source of purge gas；Gas flow control device, it is connected with the pressure maintaining valve；Current limliting
Valve, one end are connected with the pressure maintaining valve, and the other end is connected with the gas circuit outlet of the spectral detection equipment, when described in opening
When source of purge gas is cleaned, air-flow caused by the source of purge gas enters along the direction opposite with carrier gas traffic direction during detection
The gas circuit.
In addition, the gas circuit cleaning device of the present invention, can also have the feature that：Wherein, source of purge gas is nitrogen, argon
Gas or other inert gases or pure air.
In addition, the gas circuit cleaning device of the present invention, can also have the feature that：Wherein, gas flow control device
Used for any one in pressure maintaining valve, flow-limiting valve, mass flow controller or spinner flowmeter or multiple combinations.
In addition, the gas circuit cleaning device of the present invention, can also have the feature that：Also there is the second triple valve, be located at
The gas circuit end of spectral detection equipment, for discharging the air-flow in gas circuit.
In addition, the gas circuit cleaning device of the present invention, can also have the feature that：Wherein, the source of purge gas produces
Air pressure be more than the air pressure after the carrier gas is entered in colorimetric cylinder.
The present invention also provides a kind of method of gas circuit cleaning, a kind of gas circuit cleaning method, using gas circuit cleaning device to light
The gas circuit of spectrometer device is cleaned, it is characterised in that is comprised the following steps：
Step 1, while source of purge gas and carrier gas source of the gas are opened, the release carrier gas of carrier gas source of the gas, carrier gas forward direction from reaction chamber
Gas circuit entrance into spectral detection equipment is cleaned, and source of purge gas release purge gas, purge gas is by pressure maintaining valve, limit
Inversely cleaned after stream valve from the gas circuit exit of the spectral detection equipment into gas circuit；
Step 2: discharged after two-way gas mixing from the air bleeding valve of gas circuit porch,
Wherein, the air pressure of the purge gas is more than the air pressure after the carrier gas is entered in colorimetric cylinder.
The beneficial effect of invention
Scavenging period can be greatly decreased in the gas circuit cleaning device of the present invention, and scavenging period can be reduced to original 1/2
To 1/3.The scavenging period in analysis interval is shortened, therefore improves analyze speed on the whole.It can subtract in addition, the present invention opens
Few aggregation on colorimetric inside pipe wall such as foreign gas or steam, keeps colorimetric cylinder to be chronically at clean state.
Brief description of the drawings
Fig. 1 is the structural representation of the gas circuit cleaning device of the present invention；
Airflow direction schematic diagram when Fig. 2 is cleaning.
Embodiment
Illustrate the embodiment of the present invention below in conjunction with accompanying drawing.
As shown in figure 1, gas circuit cleaning device includes：Source of purge gas, in the present embodiment source of purge gas use air pump 11；
Pressure maintaining valve 12；Gas flow control device, flow-limiting valve 13 is used in present embodiment；First triple valve 15；And second threeway
Valve 16.
It is described below so that gas circuit cleaning device is applied to gas phase molecular absorption spectrometer as an example.As shown in figure 1, gas phase
Molecular absorption spectrometer includes colorimetric cylinder 21, light source 22, detector 23, reaction chamber 24, drier 25, and carrier gas source of the gas 26.
Air pump 11, pressure maintaining valve 12, the triple valve 15 of flow-limiting valve 13 and first are sequentially connected.Air pump 11 is used to produce purgative gas
Body.First triple valve 15 is connected to the exit of the original detection gas circuit of gas phase molecular absorption spectrometer.Second triple valve 16 is pacified
Mounted in the exit of reaction chamber 24.Drier 25 is arranged on the top in reaction chamber, and the gas flowed out from reaction chamber is done
It is dry.
The use process of gas circuit cleaning device：
Introduce traditional normal wash pattern first, the chemical reagent in reaction chamber is carried out using pure water during normal wash
Rinse, while open carrier gas source of the gas 26 and blow out the gas remained in reaction chamber.Carrier gas is from reaction chamber 24 after drier 25
Outwards blowout, while the rear end of gas circuit is cleaned, the flow direction of carrier gas is the direction in figure shown in black arrow.
When being cleaned using cleaning device, keep above-mentioned normal wash pattern constant, close the first triple valve 15
Towards the outlet 15a in the external world, air pump 11 is opened.Open carrier gas source of the gas 26 and air pump 11 simultaneously.Cleaning is empty caused by air pump 11
Gas first passes through pressure maintaining valve 12, then by flow-limiting valve 13, then the gas inversely entered where colorimetric cylinder 21 by the first triple valve 15
Cleaning is rinsed in road.The direct of travel of the clean air and the flow direction of carrier gas are on the contrary, the flowing side of this two-way gas
To as shown in figure 1, when filled black arrows are normal wash in Fig. 1 carrier gas flow direction, the flow direction of carrier gas and sample
Carrier gas direction is identical during measure, and hollow white arrow is the flow direction of purge gas.
The big I of throughput of purge gas is adjusted by gas flow control device, under cleaning state, purge gas
Air pressure should be set greater than air pressure of the carrier gas into after in colorimetric cylinder so that purge gas can be from being redirected back into gas circuit
Row cleaning.Airflow direction schematic diagram when Fig. 2 is cleaning, as shown in Fig. 2 because the flow of purge gas is more than the stream of carrier gas
Amount, therefore carrier gas and purge gas this two-way gas will converge and discharge at the second triple valve 16.
It is while being cleaned using carrier gas source of the gas to gas circuit, it is necessary to clear using pure water under traditional cleaning way
Wash reaction chamber.Now, carrier gas enters by reaction chamber and drier in the gas circuits such as the colorimetric cylinder of top, carrier gas in this process
The vapor that can be brought into pure water, even across the drying of drier, vapor can be also attached in colorimetric cylinder unavoidably, or even is entered
In the other parts for entering instrument internal, detector is caused to be produced analytical error by moisture contamination.Further, since reacted in cleaning
Carrier gas is constantly being entered in gas circuit by reaction chamber while chamber, and therefore, the gas remained in reaction chamber can also enter with carrier gas
Enter in gas circuit, not only extend the time of cleaning, also foreign gas is assembled on colorimetric inside pipe wall.And the gas circuit of the present invention
Cleaning device, because the direction of purge flow and the direction of motion of carrier gas are opposite so that carrier gas will not enter colorimetric cylinder, but
Discharged at second triple valve 16, it is therefore prevented that vapor or other foreign gases in carrier gas are gathered in colorimetric cylinder.While by
It is bigger for the cleaning dynamics of tube wall in the traffic direction of the direction of purge flow and carrier gas on the contrary, therefore, can be to normal carrier gas
Rinse direction punching less than position also cleaned.Simultaneously as carrier gas will not enter among colorimetric cylinder, thus it is residual in reaction chamber
The gas stayed will not enter in the gas circuit behind colorimetric cylinder with carrier gas so that the washing time of purge flow shortens.
In addition, when the location of second triple valve 16 just has relief hole to some instruments originally in Fig. 1, can save
Slightly the second triple valve 16.
In addition, installing the cleaning device of the present invention on existing equipment, the repacking to existing equipment is very easy, it is only necessary to
At the gas outlet of existing equipment and reaction chamber exit respectively installation one triple valve, without the gas circuit to existing equipment
Or internal structure is changed on a large scale.Existing equipment just has pressure release originally in the exit of reaction chamber under normal circumstances
Hole, now only need that a triple valve is installed at the gas outlet of existing equipment.
Purge gas in addition to pure air caused by the air pump employed in the present embodiment, can with can think nitrogen,
Argon gas, or other inert gases, but should ensure that the cleaning of gas.
By gas flow control device adjusting gas flow size, gas flow control device can be flow-limiting valve, matter
Measure flow controller, spinner flowmeter etc., or this several device is applied in combination.
Claims (5)
- A kind of 1. gas circuit cleaning device, for being cleaned to the gas circuit of spectral detection equipment, it is characterised in that including：Source of purge gas；Pressure maintaining valve, it is connected with the source of purge gas；Gas flow control device, one end are connected with the pressure maintaining valve, and the other end and the gas circuit of the spectral detection equipment go out Mouth is connected,Carrier gas source of the gas, carrier gas is discharged,When opening the source of purge gas and being cleaned, air-flow caused by the source of purge gas along and carrier gas traffic direction during detection Opposite direction enters the gas circuit, and the carrier gas is positive to enter spectral detection equipment reaction chamber, and carrier gas is follow-up by reaction chamber Continuous positive operation until with the source of purge gas caused by air-flow meet after discharge,Wherein, air pressure caused by the source of purge gas is more than the air pressure after the carrier gas is entered in colorimetric cylinder.
- 2. gas circuit cleaning device according to claim 1, it is characterised in that：Wherein, the gas of the source of purge gas outflow is nitrogen, argon gas or other inert gases or pure air.
- 3. gas circuit cleaning device according to claim 1, it is characterised in that：Wherein, the gas flow control device is any one in flow-limiting valve, mass flow controller or spinner flowmeter Or multiple combinations use.
- 4. gas circuit cleaning device according to claim 3, it is characterised in that：Also there is triple valve, positioned at the gas circuit entrance upper end of the spectral detection equipment, for discharging the air-flow in the gas circuit.
- 5. a kind of gas circuit cleaning method, the gas circuit using gas circuit cleaning device as claimed in claim 4 to spectral detection equipment Cleaned, it is characterised in that comprise the following steps：Step 1, while source of purge gas and carrier gas source of the gas are opened,Carrier gas source of the gas discharges carrier gas, and carrier gas positive gas circuit entrance for entering spectral detection equipment from reaction chamber is cleaned,Source of purge gas discharges purge gas, and purge gas is after pressure maintaining valve, flow-limiting valve from the gas circuit of the spectral detection equipment Exit is inversely cleaned into gas circuit；Step 2: discharged after two-way gas mixing from the triple valve of gas circuit entrance upper end,Wherein, the air pressure of the purge gas is more than the air pressure after the carrier gas is entered in colorimetric cylinder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510115044.3A CN104841665B (en) | 2015-03-16 | 2015-03-16 | Gas circuit cleaning device and gas circuit cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510115044.3A CN104841665B (en) | 2015-03-16 | 2015-03-16 | Gas circuit cleaning device and gas circuit cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104841665A CN104841665A (en) | 2015-08-19 |
| CN104841665B true CN104841665B (en) | 2017-11-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510115044.3A Active CN104841665B (en) | 2015-03-16 | 2015-03-16 | Gas circuit cleaning device and gas circuit cleaning method |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105665377B (en) * | 2016-01-14 | 2018-04-03 | 上海交通大学 | A kind of gas circuit purging system and cleaning method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1908623B (en) * | 2005-08-02 | 2010-05-05 | 德菲电气（北京）有限公司 | Multi-component infrared online gas analyzer |
| CN201522479U (en) * | 2009-10-23 | 2010-07-07 | 万运帆 | Automatic gas sample injector |
| CN102062767B (en) * | 2009-11-16 | 2013-02-27 | 中国科学院大连化学物理研究所 | Online sampling, enriching, thermal desorption and chromatographic sample injection device combined device for atmospheric sample |
| CN202547998U (en) * | 2012-03-28 | 2012-11-21 | 上海北裕分析仪器有限公司 | Dehydration device for gaseous molecular absorption spectrometer |
| GB201305411D0 (en) * | 2013-03-25 | 2013-05-08 | Hrh Ltd | System and method |
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| CN104841665A (en) | 2015-08-19 |
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Address after: 201900 building 799, No. 13, Hulan Road, Shanghai, Baoshan District Applicant after: Shanghai Beiyu Analytical Instruments Co., Ltd. Address before: 200941, room 822, 230 Xin Nan Lu, Shanghai, Baoshan District Applicant before: Shanghai Beiyu Analytical Instruments Co., Ltd. |
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