CN104252269A - Touch screen, manufacturing method thereof and display device - Google Patents
Touch screen, manufacturing method thereof and display device Download PDFInfo
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- CN104252269A CN104252269A CN201410479017.XA CN201410479017A CN104252269A CN 104252269 A CN104252269 A CN 104252269A CN 201410479017 A CN201410479017 A CN 201410479017A CN 104252269 A CN104252269 A CN 104252269A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 55
- 239000000463 material Substances 0.000 claims abstract description 83
- 239000011248 coating agent Substances 0.000 claims abstract description 14
- 238000000576 coating method Methods 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 88
- 239000004020 conductor Substances 0.000 claims description 42
- 239000010410 layer Substances 0.000 claims description 41
- 229920001187 thermosetting polymer Polymers 0.000 claims description 34
- 239000011241 protective layer Substances 0.000 claims description 21
- 238000000059 patterning Methods 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 18
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 230000006698 induction Effects 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 abstract description 18
- 238000001029 thermal curing Methods 0.000 abstract description 13
- 230000003287 optical effect Effects 0.000 abstract description 6
- 239000002390 adhesive tape Substances 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 26
- 239000002042 Silver nanowire Substances 0.000 description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 18
- 239000002070 nanowire Substances 0.000 description 14
- 239000002041 carbon nanotube Substances 0.000 description 12
- 229910021393 carbon nanotube Inorganic materials 0.000 description 12
- 238000001312 dry etching Methods 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 229910021389 graphene Inorganic materials 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 239000003292 glue Substances 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 2
- -1 Polyethylene Terephthalate Polymers 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Position Input By Displaying (AREA)
Abstract
The invention discloses a touch screen, a manufacturing method thereof and a display device. The manufacturing method includes forming a first transparent insulating thin film on a cover plate of the touch screen; coating a nanoscale transparent electroconductive material on the first transparent insulating thin film to form a first transparent electroconductive thin film; thermocuring the first transparent insulating thin film coated by the nanoscale transparent electroconductive material; subjecting the first transparent electroconductive thin film on the first transparent insulating thin film after thermocuring to form a touch driving electrode and/or a touch sensing electrode. After the first transparent insulating thin film and the first transparent electroconductive thin film are formed sequentially on the cover plate by stacking, the first transparent insulating thin film is thermocured, so that the thin films can be fixed on the cover plate, the first transparent insulating thin film coated by the nanoscale transparent electroconductive material does not need to be pasted on the cover plate by utilizing an optical transparent adhesive tape, thickness of the touch screen can be reduced, and light transmittance of the touch screen can be improved.
Description
Technical Field
The invention relates to the technical field of display, in particular to a touch screen, a manufacturing method thereof and a display device.
Background
At present, the technology of the touch screen is rapidly developed and gradually developed into a common technology in the touch control field and the display field.
In the conventional touch screen, generally, a transparent conductive oxide material, such as Indium Tin Oxide (ITO), is used to fabricate a touch electrode on a cover plate attached to a display panel by using a vacuum sputtering apparatus, however, the cost of both the ITO material and the vacuum sputtering apparatus is high, which results in high fabrication cost of the touch screen.
In order to reduce the manufacturing cost of the touch screen, at present, a nano-scale transparent conductive material with lower cost is adopted, for example: the touch electrode is made of a material, such as a metal nanowire, a carbon nanotube and graphene, which does not need to be formed by vacuum sputtering equipment, instead of an ITO material. The following description will be made by taking an example of fabricating a touch electrode on a cover plate using a silver nanowire material: firstly, preparing a silver nanowire material into a dry film, wherein the preparation process of the dry film comprises the steps of forming a Polyethylene Terephthalate (PET) film on a substrate, coating the silver nanowire material on the PET film, and then covering a protective layer to form the dry film comprising the PET film, the silver nanowire film and the protective layer; then, removing the substrate base plate, and attaching the dry film to a cover plate of the touch screen by using an Optical Clear Adhesive (OCA) through a film attaching process; then, removing the protective layer; and finally, carrying out a composition process on the silver nanowire film exposed from the dry film to form a touch electrode.
In the manufacturing process of the touch screen, the dry film can be attached to the cover plate of the touch screen only by using the OCA glue, so that the thickness of the touch screen can be increased, and the light transmittance of the touch screen can be influenced.
Therefore, how to optimize the manufacturing process of the touch screen is a technical problem that needs to be solved urgently by those skilled in the art.
Disclosure of Invention
In view of this, embodiments of the present invention provide a touch screen, a manufacturing method thereof, and a display device, so as to optimize a manufacturing process of the touch screen.
Therefore, an embodiment of the present invention provides a method for manufacturing a touch screen, including:
forming a first transparent insulating film on a cover plate of the touch screen by using a thermosetting material;
coating a nano-scale transparent conductive material on the first transparent insulating film to form a first transparent conductive film;
performing a thermosetting process on the first transparent insulating film coated with the nanoscale transparent conductive material;
and carrying out a composition process on the first transparent conductive film on the first transparent insulating film subjected to the thermosetting treatment to form a touch driving electrode and/or a touch sensing electrode.
In a possible implementation manner, in the manufacturing method provided in the embodiment of the present invention, a patterning process is performed on the first transparent conductive film on the first transparent insulating film after the thermal curing process, and only the touch driving electrode is formed; the manufacturing method further comprises the following steps:
forming a second transparent insulating film above the film layer on which the touch driving electrode is positioned by adopting a thermosetting material;
coating a nano-scale transparent conductive material on the second transparent insulating film to form a second transparent conductive film;
performing a thermosetting process on the second transparent insulating film coated with the nanoscale transparent conductive material;
performing a composition process on the second transparent conductive film on the second transparent insulating film subjected to the thermosetting treatment to form a touch sensing electrode; or,
forming a transparent conductive oxide film insulated from the touch driving electrode above the film layer where the touch driving electrode is located by using vacuum sputtering equipment;
and carrying out a composition process on the transparent conductive oxide film to form a touch sensing electrode.
In a possible implementation manner, in the manufacturing method provided in the embodiment of the present invention, a patterning process is performed on the first transparent conductive film on the first transparent insulating film after the thermal curing process, and only the touch sensing electrode is formed; the manufacturing method further comprises the following steps:
forming a second transparent insulating film above the film layer on which the touch sensing electrode is positioned by adopting a thermosetting material;
coating a nano-scale transparent conductive material on the second transparent insulating film to form a second transparent conductive film;
performing a thermosetting process on the second transparent insulating film coated with the nanoscale transparent conductive material;
performing a composition process on the second transparent conductive film on the second transparent insulating film subjected to the thermosetting treatment to form a touch drive electrode; or,
forming a transparent conductive oxide film insulated from the touch sensing electrode above the film layer on which the touch sensing electrode is positioned by using vacuum sputtering equipment;
and carrying out a composition process on the transparent conductive oxide film to form a touch drive electrode.
In a possible implementation manner, in the manufacturing method provided in the embodiment of the present invention, the method further includes:
and forming a transparent protective layer above the touch driving electrode and the touch sensing electrode.
An embodiment of the present invention further provides a touch panel, including: the display panel and the cover plate attached to the display panel; further comprising: the touch control device comprises a first transparent insulating film positioned on the cover plate, and a touch control driving electrode and a touch control induction electrode which are positioned above the first transparent insulating film and are mutually insulated;
the touch driving electrode and/or the touch sensing electrode which is in contact with the first transparent insulating film is made of a nanoscale transparent conductive material.
In a possible implementation manner, in the touch screen provided in the embodiment of the present invention, only the touch driving electrode is in contact with the first transparent insulating film;
the touch screen further includes: the second transparent insulating film is positioned above the film layer where the touch driving electrode is positioned; the touch sensing electrode is positioned on the second transparent insulating film, and the touch sensing electrode is made of a nanoscale transparent conductive material; or,
the touch sensing electrode is located above the film layer where the touch driving electrode is located, and the touch sensing electrode is made of transparent conductive oxide.
In a possible implementation manner, in the touch screen provided in the embodiment of the present invention, only the touch sensing electrode is in contact with the first transparent insulating film;
the touch screen further includes: the second transparent insulating film is positioned above the film layer where the touch sensing electrode is positioned; the touch driving electrode is positioned on the second transparent insulating film, and the touch driving electrode is made of a nanoscale transparent conductive material; or,
the touch driving electrode is located above the film layer where the touch sensing electrode is located, and the touch driving electrode is made of transparent conductive oxide.
In a possible implementation manner, in the touch screen provided in the embodiment of the present invention, the touch driving electrode and the touch sensing electrode are disposed in the same layer and both contact the first transparent insulating film.
In a possible implementation manner, in the touch screen provided in the embodiment of the present invention, the touch screen further includes: and the transparent protective layer is positioned above the touch driving electrode and the touch sensing electrode.
An embodiment of the present invention further provides a display device, including: the touch screen provided by the embodiment of the invention.
The touch screen, the manufacturing method thereof and the display device provided by the embodiment of the invention have the following steps: forming a first transparent insulating film on a cover plate of the touch screen; coating a nano-scale transparent conductive material on the first transparent insulating film to form a first transparent conductive film; performing heat curing treatment on the first transparent insulating film coated with the nanoscale transparent conductive material; performing a composition process on the first transparent conductive film on the first transparent insulating film subjected to the thermosetting treatment to form a touch driving electrode and/or a touch sensing electrode; because stack gradually on the apron and form first transparent insulating film and first transparent conductive film after, carry out thermosetting to first transparent insulating film and handle and can stabilize two-layer film on the apron, and need not utilize optical transparent adhesive tape to glue the first transparent insulating film who has the transparent conductive layer material of nanometer on the apron, not only can reduce touch-sensitive screen's thickness, can also improve touch-sensitive screen's light transmissivity.
Drawings
Fig. 1 is a flowchart of a method for manufacturing a touch screen according to an embodiment of the present invention;
fig. 2-6 are schematic structural diagrams of a touch screen according to an embodiment of the present invention;
FIGS. 7a to 7e are schematic structural diagrams of a method for manufacturing a touch screen according to a first embodiment of the present invention after steps are performed;
FIGS. 8a to 8c are schematic structural diagrams of a touch screen manufacturing method according to a second embodiment of the present invention after steps are performed;
fig. 9a and 9b are schematic structural diagrams of a manufacturing method of a touch screen in the fifth embodiment of the present invention after steps are performed, respectively.
Detailed Description
The following describes in detail specific embodiments of a touch panel, a method for manufacturing the same, and a display device according to embodiments of the present invention with reference to the accompanying drawings.
The shapes and thicknesses of the various film layers in the drawings are not to be considered as true proportions, but are merely intended to illustrate the invention.
The manufacturing method of the touch screen provided by the embodiment of the invention, as shown in fig. 1, specifically comprises the following steps:
s101, forming a first transparent insulating film on a cover plate of the touch screen by adopting a thermosetting material; specifically, the material of the first transparent insulating film may be polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), or the like, which is not limited herein;
s102, coating a nano-scale transparent conductive material on the first transparent insulating film to form a first transparent conductive film; specifically, the material of the first transparent conductive film may be a metal nanowire material, for example: gold nanowire material, silver nanowire material, copper nanowire material, aluminum nanowire material, or the like; alternatively, the material may be a carbon nanotube material, a graphene material, or the like, which is not limited herein;
s103, performing thermal curing treatment on the first transparent insulating film coated with the nanoscale transparent conductive material; the thermal curing process can enable the first transparent insulating film to reach the hardness required by the process, and the first transparent insulating film can be stabilized on the cover plate of the touch screen without using Optical Clear Adhesive (OCA);
s104, carrying out a composition process on the first transparent conductive film on the first transparent insulating film subjected to the thermosetting treatment to form a touch driving electrode and/or a touch sensing electrode; certainly, the pattern of the touch electrode may be formed by a laser dry etching process, which is not limited herein;
according to the manufacturing method provided by the embodiment of the invention, after the first transparent insulating film and the first transparent conductive film are sequentially laminated on the cover plate, the first transparent insulating film is subjected to thermosetting treatment, so that two layers of films can be stabilized on the cover plate, and the first transparent insulating film coated with the nanoscale transparent conductive layer material is not required to be adhered on the cover plate by using the optical transparent adhesive, so that the thickness of the touch screen can be reduced, and the light transmittance of the touch screen can be improved.
In specific implementation, when step S104 of the manufacturing method provided by the embodiment of the present invention is executed, a patterning process is performed on the first transparent conductive film on the first transparent insulating film after the thermal curing process, so that only the touch driving electrode may be formed; alternatively, only the touch sensing electrode may be formed; alternatively, the touch driving electrode and the touch sensing electrode may be formed simultaneously, that is, the touch driving electrode and the touch sensing electrode are disposed in the same layer, which is not limited herein.
In specific implementation, in step S104 of the manufacturing method provided in the embodiment of the present invention, a patterning process is performed on the first transparent conductive film on the first transparent insulating film after the thermal curing process, and when only the touch driving electrode is formed, the touch sensing electrode may be manufactured by using the same method as that for forming the touch driving electrode; or, the touch sensing electrode is manufactured by using the existing method, which is not limited herein.
When the touch sensing electrode is manufactured by the same method as the method for forming the touch driving electrode, the manufacturing method provided by the embodiment of the invention may further include the following steps:
firstly, forming a second transparent insulating film above a film layer on which a touch drive electrode is positioned by adopting a thermosetting material; specifically, the material of the second transparent insulating film may be PET, PMMA, or the like, which is not limited herein; the material of the second transparent insulating film may be the same as or different from that of the first transparent insulating film, and is not limited herein;
then, coating a nano-scale transparent conductive material on the second transparent insulating film to form a second transparent conductive film; specifically, the material of the second transparent conductive film may be a metal nanowire material, for example: gold nanowire material, silver nanowire material, copper nanowire material, aluminum nanowire material, or the like; alternatively, the material may be a carbon nanotube material, a graphene material, or the like, which is not limited herein; the material of the second transparent conductive film may be the same as or different from that of the first transparent conductive film, and is not limited herein;
then, the second transparent insulating film coated with the nanoscale transparent conductive material is subjected to thermosetting treatment; the second transparent insulating film can reach the hardness required by the process through the thermal curing treatment;
finally, performing a composition process on the second transparent conductive film on the second transparent insulating film subjected to the thermosetting treatment to form a touch sensing electrode; certainly, the pattern of the touch electrode may be formed by a laser dry etching process, which is not limited herein; specifically, the specific implementation of forming the touch sensing electrodes by the steps is similar to the specific implementation of forming the touch driving electrodes by the steps S101 to S104, and is not repeated herein;
when the touch sensing electrode is manufactured by using the existing method, the manufacturing method provided by the embodiment of the invention can further include the following steps:
firstly, forming a transparent conductive oxide film insulated from a touch drive electrode above a film layer where the touch drive electrode is located by using vacuum sputtering equipment; specifically, the material of the transparent conductive oxide film may be Indium Tin Oxide (ITO), etc., which is not limited herein;
and then, carrying out a composition process on the transparent conductive oxide film to form a touch sensing electrode. Specifically, the specific implementation of forming the touch sensing electrode by using the above steps is similar to the conventional method of manufacturing the touch sensing electrode by using the transparent conductive oxide, and is not repeated herein.
In specific implementation, in step S104 of the manufacturing method provided in the embodiment of the present invention, a patterning process is performed on the first transparent conductive film on the first transparent insulating film after the thermal curing process, and when only the touch sensing electrode is formed, the touch driving electrode may be manufactured by using the same method as that for forming the touch sensing electrode; alternatively, the touch driving electrode is manufactured by using an existing method, which is not limited herein.
When the touch driving electrode is manufactured by the same method as the method for forming the touch sensing electrode, the manufacturing method provided by the embodiment of the invention may further include the following steps:
firstly, forming a second transparent insulating film above a film layer on which a touch sensing electrode is positioned by adopting a thermosetting material; specifically, the material of the second transparent insulating film may be PET, PMMA, or the like, which is not limited herein; the material of the second transparent insulating film may be the same as or different from that of the first transparent insulating film, and is not limited herein;
then, coating a nano-scale transparent conductive material on the second transparent insulating film to form a second transparent conductive film; specifically, the material of the second transparent conductive film may be a metal nanowire material, for example: gold nanowire material, silver nanowire material, copper nanowire material, aluminum nanowire material, or the like; alternatively, the material may be a carbon nanotube material, a graphene material, or the like, which is not limited herein; the material of the second transparent conductive film may be the same as or different from that of the first transparent conductive film, and is not limited herein;
then, the second transparent insulating film coated with the nanoscale transparent conductive material is subjected to thermosetting treatment; the second transparent insulating film can reach the hardness required by the process through the thermal curing treatment;
finally, performing a composition process on the second transparent conductive film on the second transparent insulating film subjected to the thermosetting treatment to form a touch drive electrode; certainly, the pattern of the touch electrode may be formed by a laser dry etching process, which is not limited herein; specifically, the specific implementation of forming the touch driving electrodes by the steps is similar to the specific implementation of forming the touch sensing electrodes by the steps S101 to S104, and is not repeated herein;
when the touch driving electrode is manufactured by using the existing method, the manufacturing method provided by the embodiment of the invention may further include the following steps:
firstly, forming a transparent conductive oxide film insulated from a touch sensing electrode above a film layer where the touch sensing electrode is located by using vacuum sputtering equipment; specifically, the material of the transparent conductive oxide film may be ITO, etc., and is not limited herein;
and then, carrying out a composition process on the transparent conductive oxide film to form a touch drive electrode. Specifically, the specific implementation of forming the touch driving electrode by using the above steps is similar to the conventional method of manufacturing the touch driving electrode by using the transparent conductive oxide, and is not described herein again.
In specific implementation, the manufacturing method provided in the embodiment of the present invention may further include: and forming a transparent protective layer above the touch driving electrode and the touch sensing electrode. The transparent protective layer can protect the touch driving electrodes and the touch sensing electrodes from being scratched by machinery.
In specific implementation, the manufacturing method provided in the embodiment of the present invention may further include: respectively forming a first lead wire electrically connected with the touch drive electrode and a second lead wire electrically connected with the touch induction electrode; specifically, a printing process or a patterning process and other methods are generally adopted to form a lead by using low-temperature cured conductive silver paste; in general, the first lead line is formed after the touch driving electrode is formed, and the second lead line is formed after the touch sensing electrode is formed.
Based on the same inventive concept, an embodiment of the present invention further provides a touch screen, as shown in fig. 2 to 6, including: a display panel and a cover plate 1 attached to the display panel; further comprising: a first transparent insulating film 2 positioned on the cover plate 1, and a touch driving electrode 3 and a touch sensing electrode 4 which are positioned above the first transparent insulating film 2 and are insulated from each other;
the touch driving electrode 3 and/or the touch sensing electrode 4 in contact with the first transparent insulating film 2 are made of nanoscale transparent conductive materials.
In a specific implementation, in the touch screen provided in the embodiment of the present invention, a material of the cover plate attached to the display panel may be tempered glass, common glass, plastic, or the like, which is not limited herein. The nanoscale transparent conductive material may be a metal nanowire material, such as: gold nanowire material, silver nanowire material, copper nanowire material, aluminum nanowire material, or the like; alternatively, the nanoscale transparent conductive material may be a carbon nanotube material, a graphene material, or the like, and is not limited herein.
In specific implementation, in the touch screen provided in the embodiment of the present invention, as shown in fig. 2 and fig. 3, only the touch driving electrode 3 may be in contact with the first transparent insulating film 2, and the touch driving electrode 3 is made of a nanoscale transparent conductive material; alternatively, as shown in fig. 4 and 5, only the touch sensing electrode 4 may be in contact with the first transparent insulating film 2, and the touch sensing electrode 4 is made of a nanoscale transparent conductive material; alternatively, as shown in fig. 6, the touch driving electrodes 3 and the touch sensing electrodes 4 (not shown in the figure) may be disposed on the same layer, both the touch driving electrodes 3 and the touch sensing electrodes 4 are in contact with the first transparent insulating film 2, and both the touch driving electrodes 3 and the touch sensing electrodes 4 are made of a nano-scale transparent conductive material, which is not limited herein.
In specific implementation, in the touch screen provided in the embodiment of the present invention, as shown in fig. 2 and 3, when only the touch driving electrode 3 is in contact with the first transparent insulating film 2, as shown in fig. 2, the touch sensing electrode 4 may have the same structure as the touch driving electrode 3; alternatively, as shown in fig. 3, the touch sensing electrode 4 may also adopt an existing structure, which is not limited herein.
Specifically, as shown in fig. 2, when the touch sensing electrode 4 has the same structure as the touch driving electrode 3, the touch screen provided in the embodiment of the present invention may further include: the second transparent insulating film 5 is located above the film layer where the touch driving electrode 3 is located, the touch sensing electrode 4 is located above the second transparent insulating film 5, the material of the touch sensing electrode 4 is a nanoscale transparent conductive material, and thus, the touch driving electrode 3 and the touch sensing electrode 4 both adopt the nanoscale transparent conductive material with lower cost and higher light transmittance, so that the manufacturing cost of the touch screen can be reduced, the light transmittance of the touch screen can be improved, moreover, the OCA adhesive between the first transparent insulating film 2 and the cover plate 1 is omitted, the thickness of the touch screen can be reduced, and the light transmittance of the touch screen can be further improved.
Specifically, as shown in fig. 3, when the touch sensing electrode 4 adopts an existing structure, the touch sensing electrode 4 is located above the film layer where the touch driving electrode 3 is located, and is insulated from the touch driving electrode 3 by the insulating layer 6, the material of the touch sensing electrode 4 is a transparent conductive oxide, such as ITO, and thus, the touch driving electrode 3 adopts a nanoscale transparent conductive material with lower cost and higher light transmittance, which not only can reduce the manufacturing cost of the touch screen, but also can improve the light transmittance of the touch screen, and furthermore, the OCA adhesive between the first transparent insulating film 2 and the cover plate 1 is omitted, not only can reduce the thickness of the touch screen, but also can further improve the light transmittance of the touch screen.
In specific implementation, in the touch screen provided in the embodiment of the present invention, as shown in fig. 4 and 5, when only the touch sensing electrode 4 is in contact with the first transparent insulating film 2, as shown in fig. 4, the touch driving electrode 3 may have the same structure as the touch sensing electrode 4; alternatively, as shown in fig. 5, the touch driving electrode 3 may also adopt a conventional structure, which is not limited herein.
Specifically, as shown in fig. 4, when the touch driving electrode 3 has the same structure as the touch sensing electrode 4, the touch screen provided in the embodiment of the present invention may further include: the second transparent insulating film 5 is located above the film layer where the touch sensing electrode 4 is located, the touch driving electrode 3 is located on the second transparent insulating film 5, the material of the touch driving electrode 3 is a nanoscale transparent conductive material, and thus, the touch driving electrode 3 and the touch sensing electrode 4 are both made of the nanoscale transparent conductive material with lower cost and higher light transmittance, so that the manufacturing cost of the touch screen can be reduced, the light transmittance of the touch screen can be provided, moreover, the OCA glue between the first transparent insulating film 2 and the cover plate 1 is omitted, the thickness of the touch screen can be reduced, and the light transmittance of the touch screen can be further improved.
Specifically, as shown in fig. 5, when the touch driving electrode 3 adopts the existing structure, the touch driving electrode 3 is located above the film layer where the touch sensing electrode 4 is located, and is insulated from the touch sensing electrode 4 by the insulating layer 6, the material of the touch driving electrode 3 is a transparent conductive oxide, such as ITO, and thus, the touch sensing electrode 4 adopts a nanoscale transparent conductive material with lower cost and higher light transmittance, which not only can reduce the manufacturing cost of the touch screen, but also can provide the light transmittance of the touch screen, and omits the OCA adhesive between the first transparent insulating film 2 and the cover plate 1, not only can reduce the thickness of the touch screen, but also can further improve the light transmittance of the touch screen.
In specific implementation, as shown in fig. 6, in the touch screen provided in the embodiment of the present invention, the touch driving electrode 3 and the touch sensing electrode 4 (not shown in the figure) may also be disposed in the same layer and both contact with the first transparent insulating film 2, so that the touch driving electrode 3 and the touch sensing electrode 4 both use nano-scale transparent conductive materials with lower cost and higher light transmittance, which not only reduces the manufacturing cost of the touch screen, but also improves the light transmittance of the touch screen, and moreover, the OCA glue between the first transparent insulating film 2 and the cover plate 1 is omitted, which not only reduces the thickness of the touch screen, but also further improves the light transmittance of the touch screen.
It should be noted that, in the structure in which the touch driving electrode 3 and the touch sensing electrode 4 are disposed on the same layer as shown in fig. 6, it is required to satisfy that the sheet resistance of the nanoscale transparent conductive film before the touch driving electrode 3 and the touch sensing electrode 4 are formed by the patterning process is low, and the sheet resistance of the nanoscale transparent conductive film is required to be controlled to 50 Ω/m2The following.
In a specific implementation, the touch screen provided in the embodiment of the present invention may further include: and the transparent protective layer 7 is positioned above the touch driving electrodes 3 and the touch sensing electrodes 4, and the transparent protective layer 7 can protect the touch driving electrodes 3 and the touch sensing electrodes 4 from being mechanically scratched.
The following describes in detail the method for manufacturing the touch screen shown in fig. 2 to 6 according to the embodiment of the present invention by using five specific examples.
Example one: as shown in fig. 2, both the touch driving electrode 3 and the touch sensing electrode 4 are made of silver nanowire material, and only the touch driving electrode 3 is in contact with the first transparent insulating film 2, and the manufacturing method specifically includes the following steps:
(1) forming a black matrix 8 with the thickness of 1-20 mu m on the cover plate 1 of the touch screen by adopting a printing process, as shown in FIG. 7 a; specifically, the black matrix can also be formed by adopting a patterning process, and the optimal thickness of the black matrix is 1.5 μm;
(2) forming a first transparent insulating film 2 having a thickness of 3-50 μm on the cover plate 1 on which the black matrix 8 is formed, as shown in fig. 7 b; wherein the optimal thickness of the first transparent insulating film is 10 μm;
(3) coating silver nanowire material on the first transparent insulating film 2 to form a thick filmA silver nanowire transparent conductive film with a thickness of 40-120nm, as shown in fig. 7 c; the optimal thickness of the silver nanowire transparent conductive film is 100 nm; and the sheet resistance of the formed silver nanowire transparent conductive film is 10-200 omega/m2Wherein the optimum sheet resistance is 50 Ω/m2；
(4) Performing thermosetting treatment on the first transparent insulating film 2 coated with the silver nanowire material; specifically, the curing temperature is 100-; and the curing time is 20-120min, wherein the optimal curing time is 60 min;
(5) performing a patterning process on the silver nanowire transparent conductive film on the first transparent insulating film 2 after the thermal curing process to form a touch driving electrode 3, as shown in fig. 7 d; of course, the pattern of the touch driving electrode can also be formed by adopting a laser dry etching process, and specifically, the laser energy is generally controlled within the range of 1-20W, and the laser dry etching speed is controlled within the range of 0.1-15m/s, wherein the optimal laser energy is 4W, and the optimal laser dry etching speed is 1 m/s; specifically, the spacing between the touch driving electrodes is generally controlled to be 10-70 μm, wherein the optimal spacing is 30 μm;
(6) forming a first lead 9 by using low-temperature cured conductive silver paste by adopting a printing process; specifically, the first lead may also be formed using a patterning process;
(7) repeating the steps (2) to (6), and forming a second transparent insulating film 5, a touch sensing electrode 4 and a second lead 10 on the cover plate 1 on which the black matrix 8, the first transparent insulating film 2, the touch driving electrode 3 and the first lead 9 are formed, as shown in fig. 7 e;
(8) forming a transparent protective layer 7 with the thickness of 1-30 μm by adopting a printing process, as shown in FIG. 2; wherein, the optimal thickness of the transparent protective layer is 10 μm; specifically, the transparent protective layer may also be formed using a patterning process to expose the first and second leads.
Example two: as shown in fig. 3, the touch driving electrode 3 is made of a silver nanowire material, the touch sensing electrode 4 is made of ITO, and only the touch driving electrode 3 is in contact with the first transparent insulating film 2, and the manufacturing method specifically includes the following steps:
after repeating steps (1) - (6) in example one, the following steps are performed:
(7) forming an insulating layer 6, as shown in fig. 8 a; the insulating layer is used for insulating the touch driving electrode and the touch sensing electrode to be formed from each other;
(8) forming an ITO film by using vacuum sputtering equipment;
(9) patterning the ITO film to form a touch sensing electrode 4, as shown in FIG. 8 b; specifically, the spacing between the touch sensing electrodes is generally controlled to be 10-70 μm, wherein the optimal spacing is 30 μm; the specific implementation of steps (7) - (9) is similar to the existing manufacturing method, and is not described herein;
(10) forming a second lead 10 by using the low-temperature cured conductive silver paste through a printing process, as shown in fig. 8 c; specifically, the second lead may also be formed using a patterning process;
(11) forming a transparent protective layer 7 with the thickness of 1-30 μm by adopting a printing process, as shown in FIG. 3; wherein, the optimal thickness of the transparent protective layer is 10 μm; specifically, the transparent protective layer may also be formed using a patterning process, which is required to expose the first and second leads.
Example three: as shown in fig. 4, both the touch driving electrode 3 and the touch sensing electrode 4 are made of silver nanowire material, and only the touch sensing electrode 4 is in contact with the first transparent insulating film 2.
The specific implementation of the third embodiment is similar to that of the first embodiment, and is not described herein again.
Example four: as shown in fig. 5, the touch sensing electrode 4 is made of a silver nanowire material, the touch driving electrode 3 is made of ITO, and only the touch sensing electrode 4 is in contact with the first transparent insulating film 2.
The specific implementation of the fourth embodiment is similar to that of the second embodiment, and is not described herein.
Example five: as shown in fig. 6, the touch driving electrode 3 and the touch sensing electrode 4 are both made of silver nanowire materials and are in contact with the first transparent insulating film 2, and the manufacturing method specifically includes the following steps:
after repeating steps (1) - (4) in example one, the following steps are performed:
(5) performing a patterning process on the silver nanowire transparent conductive film on the first transparent insulating film 2 after the thermal curing process to form a touch driving electrode 3 and a touch sensing electrode 4 (not shown in the figure) which are insulated from each other, as shown in fig. 9 a; for example: a bridge spanning structure in an existing structure; specifically, the spacing between the touch driving electrodes is generally controlled to be 10-70 μm, wherein the optimal spacing is 30 μm; moreover, the spacing between the touch sensing electrodes is generally controlled to be 10-70 μm, wherein the optimal spacing is 30 μm;
(6) respectively forming a first lead 9 and a second lead 10 (not shown in the figure) by using low-temperature cured conductive silver paste through a printing process, as shown in fig. 9 b; specifically, the first and second wirings may also be formed using a patterning process;
(7) forming a transparent protective layer 7 with the thickness of 1-30 μm by adopting a printing process, as shown in FIG. 6; wherein, the optimal thickness of the transparent protective layer is 10 μm; specifically, the transparent protective layer may also be formed using a patterning process to expose the first and second leads.
It should be noted that, in the method for manufacturing the touch screen provided in the embodiment of the present invention, the touch electrode is not limited to be made of a silver nanowire material, or may be made of other metal nanowire materials, or may be made of a carbon nanotube material or a graphene material, which is not limited herein.
In the specific implementation, when the touch electrode is made of the carbon nanotube material, the carbon nanotube is generally usedThe thickness of the transparent conductive film is controlled within the range of 20-120 mu m, wherein the optimal thickness of the carbon nano tube transparent conductive film is 35 mu m; and the sheet resistance of the formed carbon nanotube transparent conductive film is 100-300 omega/m2Wherein the optimal sheet resistance is 150 Ω/m2(ii) a In addition, a laser dry etching process is generally adopted to pattern the carbon nanotube transparent conductive film to form touch electrodes, specifically, the spacing between the touch electrodes is generally controlled to be 10-70 μm, wherein the optimal spacing is 25 μm; and, the laser energy is generally controlled in the range of 1-20W, wherein the optimal laser energy is 4W; generally, the laser dry etching speed is controlled within the range of 0.1-15m/s, wherein the optimal laser dry etching speed is 1 m/s; the thickness of the first transparent protective layer formed over the touch electrode made of a carbon nanotube material is generally controlled to be 2-30 μm, wherein the optimal thickness is 10 μm.
Based on the same inventive concept, an embodiment of the present invention further provides a display device, including the touch screen provided in the embodiment of the present invention, where the display device may be: any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like. The implementation of the display device can be referred to the above embodiment of the touch screen, and repeated details are not repeated.
The embodiment of the invention provides a touch screen, a manufacturing method thereof and a display device, wherein the manufacturing method comprises the following steps: forming a first transparent insulating film on a cover plate of the touch screen; coating a nano-scale transparent conductive material on the first transparent insulating film to form a first transparent conductive film; performing heat curing treatment on the first transparent insulating film coated with the nanoscale transparent conductive material; performing a composition process on the first transparent conductive film on the first transparent insulating film subjected to the thermosetting treatment to form a touch driving electrode and/or a touch sensing electrode; because stack gradually on the apron and form first transparent insulating film and first transparent conductive film after, carry out thermosetting to first transparent insulating film and handle and can stabilize two-layer film on the apron, and need not utilize optical transparent adhesive tape to glue the first transparent insulating film who has the transparent conductive layer material of nanometer on the apron, not only can reduce touch-sensitive screen's thickness, can also improve touch-sensitive screen's light transmissivity.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (10)
1. A method for manufacturing a touch screen is characterized by comprising the following steps:
forming a first transparent insulating film on a cover plate of the touch screen by using a thermosetting material;
coating a nano-scale transparent conductive material on the first transparent insulating film to form a first transparent conductive film;
performing a thermosetting process on the first transparent insulating film coated with the nanoscale transparent conductive material;
and carrying out a composition process on the first transparent conductive film on the first transparent insulating film subjected to the thermosetting treatment to form a touch driving electrode and/or a touch sensing electrode.
2. The manufacturing method according to claim 1, wherein the first transparent conductive film on the first transparent insulating film after the thermosetting process is subjected to a patterning process to form only the touch driving electrode; the manufacturing method further comprises the following steps:
forming a second transparent insulating film above the film layer on which the touch driving electrode is positioned by adopting a thermosetting material;
coating a nano-scale transparent conductive material on the second transparent insulating film to form a second transparent conductive film;
performing a thermosetting process on the second transparent insulating film coated with the nanoscale transparent conductive material;
performing a composition process on the second transparent conductive film on the second transparent insulating film subjected to the thermosetting treatment to form a touch sensing electrode; or,
forming a transparent conductive oxide film insulated from the touch driving electrode above the film layer where the touch driving electrode is located by using vacuum sputtering equipment;
and carrying out a composition process on the transparent conductive oxide film to form a touch sensing electrode.
3. The manufacturing method according to claim 1, wherein the first transparent conductive film on the first transparent insulating film after the thermosetting process is subjected to a patterning process to form only the touch sensing electrode; the manufacturing method further comprises the following steps:
forming a second transparent insulating film above the film layer on which the touch sensing electrode is positioned by adopting a thermosetting material;
coating a nano-scale transparent conductive material on the second transparent insulating film to form a second transparent conductive film;
performing a thermosetting process on the second transparent insulating film coated with the nanoscale transparent conductive material;
performing a composition process on the second transparent conductive film on the second transparent insulating film subjected to the thermosetting treatment to form a touch drive electrode; or,
forming a transparent conductive oxide film insulated from the touch sensing electrode above the film layer on which the touch sensing electrode is positioned by using vacuum sputtering equipment;
and carrying out a composition process on the transparent conductive oxide film to form a touch drive electrode.
4. The method of manufacturing of any of claims 1-3, further comprising:
and forming a transparent protective layer above the touch driving electrode and the touch sensing electrode.
5. A touch screen, comprising: the display panel and the cover plate attached to the display panel; it is characterized by also comprising: the touch control device comprises a first transparent insulating film positioned on the cover plate, and a touch control driving electrode and a touch control induction electrode which are positioned above the first transparent insulating film and are mutually insulated;
the touch driving electrode and/or the touch sensing electrode which is in contact with the first transparent insulating film is made of a nanoscale transparent conductive material.
6. The touch panel according to claim 5, wherein only the touch driving electrode is in contact with the first transparent insulating film;
the touch screen further includes: the second transparent insulating film is positioned above the film layer where the touch driving electrode is positioned; the touch sensing electrode is positioned on the second transparent insulating film, and the touch sensing electrode is made of a nanoscale transparent conductive material; or,
the touch sensing electrode is located above the film layer where the touch driving electrode is located, and the touch sensing electrode is made of transparent conductive oxide.
7. The touch screen of claim 5, wherein only the touch sensing electrode is in contact with the first transparent insulating film;
the touch screen further includes: the second transparent insulating film is positioned above the film layer where the touch sensing electrode is positioned; the touch driving electrode is positioned on the second transparent insulating film, and the touch driving electrode is made of a nanoscale transparent conductive material; or,
the touch driving electrode is located above the film layer where the touch sensing electrode is located, and the touch driving electrode is made of transparent conductive oxide.
8. The touch screen of claim 5, wherein the touch driving electrodes and the touch sensing electrodes are disposed on the same layer and are in contact with the first transparent insulating film.
9. The touch screen of any of claims 5-8, further comprising: and the transparent protective layer is positioned above the touch driving electrode and the touch sensing electrode.
10. A display device, comprising: a touch screen as claimed in any one of claims 5 to 9.
Priority Applications (2)
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| CN201410479017.XA CN104252269A (en) | 2014-09-18 | 2014-09-18 | Touch screen, manufacturing method thereof and display device |
| PCT/CN2014/093108 WO2016041259A1 (en) | 2014-09-18 | 2014-12-05 | Touch screen and manufacturing method therefor and display device |
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| CN201410479017.XA CN104252269A (en) | 2014-09-18 | 2014-09-18 | Touch screen, manufacturing method thereof and display device |
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| CN201410479017.XA Pending CN104252269A (en) | 2014-09-18 | 2014-09-18 | Touch screen, manufacturing method thereof and display device |
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| WO (1) | WO2016041259A1 (en) |
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| CN105955530A (en) * | 2016-04-29 | 2016-09-21 | 信利光电股份有限公司 | Touch screen manufacturing method, touch screen and touch display device |
| CN106020571A (en) * | 2016-07-13 | 2016-10-12 | 信利光电股份有限公司 | Touch screen and manufacturing method thereof |
| CN107957818A (en) * | 2017-12-26 | 2018-04-24 | 信利光电股份有限公司 | A kind of touch-screen module, touch-screen and electronic display unit |
| CN108196733A (en) * | 2017-12-28 | 2018-06-22 | 苏州柏特瑞新材料有限公司 | A kind of dry film type preparation method of capacitive touch screen |
| CN109901737A (en) * | 2017-12-11 | 2019-06-18 | 宸鸿科技(厦门)有限公司 | Touch sensing, touch panel and preparation method thereof |
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| CN107153477A (en) * | 2016-06-14 | 2017-09-12 | 上海科比斯光学科技有限公司 | The application of PVB film, contact panel, touch-screen and preparation method thereof |
| CN106293225B (en) * | 2016-08-09 | 2023-09-01 | 厦门天马微电子有限公司 | Touch display panel and display device |
| CN110058732A (en) * | 2019-01-18 | 2019-07-26 | 东旭（昆山）显示材料有限公司 | Touch panel component and its manufacturing method |
| CN111596809B (en) * | 2020-04-28 | 2022-09-09 | 北京载诚科技有限公司 | Touch screen and preparation method thereof |
| CN111524883B (en) * | 2020-04-29 | 2022-09-20 | 业成科技（成都）有限公司 | In-film electronic assembly and preparation method thereof |
| CN111930261A (en) * | 2020-09-01 | 2020-11-13 | 湖南兴威新材料有限公司 | Touch display screen |
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| US20110304571A1 (en) * | 2010-06-10 | 2011-12-15 | Kim Tae-Hwan | Liquid crystal display device associated with touch panel and method for fabricating the same |
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| CN109901737A (en) * | 2017-12-11 | 2019-06-18 | 宸鸿科技(厦门)有限公司 | Touch sensing, touch panel and preparation method thereof |
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| CN108196733A (en) * | 2017-12-28 | 2018-06-22 | 苏州柏特瑞新材料有限公司 | A kind of dry film type preparation method of capacitive touch screen |
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| WO2016041259A1 (en) | 2016-03-24 |
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