CN104181741A - Display device, array substrate and production method of array substrate - Google Patents
Display device, array substrate and production method of array substrate Download PDFInfo
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- CN104181741A CN104181741A CN201410379963.7A CN201410379963A CN104181741A CN 104181741 A CN104181741 A CN 104181741A CN 201410379963 A CN201410379963 A CN 201410379963A CN 104181741 A CN104181741 A CN 104181741A
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- photosensitive resin
- array base
- base palte
- resin layer
- diffuse reflector
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Abstract
The invention relates to the technical field of displays, in particular to a display device, an array substrate and a production method of the array substrate. The array substrate comprises a photosensitive resin layer arranged on a bottom lining substrate; a plurality of protrusions are formed on the photosensitive resin layer; diffuse reflection layers are arranged on the surfaces of the protrusions. The display device, the array substrate and the production method provided by the invention have the advantage that as the protrusions are arranged on the photosensitive resin layer, and the diffuse reflection layers are arranged on the protrusions, the diffuse reflection effect is favorable, and the display quality of a half-reflection half-transparent screen is improved.
Description
Technical field
The present invention relates to display technique field, particularly a kind of display device, array base palte and preparation method thereof.
Background technology
Along with the development of TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-LCD) technology, in Product Process is produced, the management and control of its quality is had higher requirement.
In recent years, half-reflection and half-transmission screen products is more and more subject to pursuing of consumer, its principal feature is the impact that can not be subject to outer light source, under high light environment, also can meet the normal demonstration of picture, clearly express needed picture, thereby realize the object using out of doors, while use out of doors, can also reduce backlight illumination and realize the object of saving power consumption simultaneously.
In the design of half-reflection and half-transmission screen products, reflecting part need to be made into rough surface, to realize high diffuse reflection, to prevent that light produces mirror-reflection to external world.
In prior art, the reflecting part of half-reflection and half-transmission screen adopts and superposes by retes such as grid line, source-drain electrode, active layers in array base palte side, form the surface of differing heights, the Al rete that one deck luminance factor is higher is finally set on surface, can form on the surface of Al rete so uneven, to realize irreflexive object.
But find in actual production, adopt the mode of rete stack to be easily exposed the restriction of machine precision and etching precision, requiring distance between each rete projection at least will reach 10um left and right just can realize, also need to ensure the positional precision between different layers simultaneously, under current technique, the diffuse effect of realization is poor.
Summary of the invention
(1) technical matters to be solved
The object of the present invention is to provide a kind of display device, array base palte and preparation method thereof, to solve, the diffuse effect of existing half-reflection and half-transmission product is poor, design is complicated, the more high defect of cost.
(2) technical scheme
For achieving the above object, the present invention adopts following technical scheme: the invention provides a kind of array base palte, comprising: be arranged on the photosensitive resin layer on underlay substrate, have multiple projections on described photosensitive resin layer, also have diffuse reflector at described protrusion surface.
Preferably, described diffuse reflector is made up of reflecting metal.
Preferably, described array base palte also comprises source leakage metal level and the first electrode layer, and described photosensitive resin layer leaks between metal level and the first electrode layer in described source.
Preferably, above described the first electrode layer, also comprise insulation course and the second electrode lay, described the second electrode lay is slit-shaped.
Preferably, described reflecting metal is aluminium.
Preferably, described projection undulate is arranged on described photosensitive resin layer equably.
On the other hand, the present invention also provides a kind of display device, comprises above-mentioned array base palte.
Again on the one hand, the invention provides a kind of method for making of array base palte, comprising:
Step S1, formation photosensitive resin layer form multiple projections on described photosensitive resin layer;
Step S2, in described projection, form diffuse reflector.
Preferably, described step S1 specifically comprises:
Step S11, on substrate, deposit photosensitive resin material;
The mask plate that step S12, employing have multiple pierced patterns, to the base board to explosure in step S11, finally makes to form multiple raised structures on described photosensitive resin layer.
Preferably, the size of described pierced pattern is less than the limiting resolution of exposure machine.
Preferably, the diameter of described pierced pattern is 2um, and the spacing between adjacent two pierced patterns is 1um.
Preferably, described step S2 specifically comprises: on raised structures, deposit reflective metal layer and form described diffuse reflector.
(3) beneficial effect
Display device provided by the invention, array base palte and preparation method thereof, by photosensitive resin layer being arranged to multiple projections, can form good diffuse effect in conjunction with diffuse reflector, improves the display quality of half-reflection and half-transmission screen.
Brief description of the drawings
Fig. 1 is array base-plate structure schematic diagram in the embodiment of the present invention;
Fig. 2 is the method for making process flow diagram of array base palte in the embodiment of the present invention;
Fig. 3 is the mask structure being schematic diagram in the embodiment of the present invention with pierced pattern;
Fig. 4 is the making step schematic diagram of array base palte in the embodiment of the present invention.
Embodiment
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples are used for illustrating the present invention, but are not for limiting the scope of the invention.
As shown in Figure 1, the embodiment of the present invention provides a kind of array base palte, comprising: be arranged on the photosensitive resin layer 1 on underlay substrate, have multiple projections 11 on described photosensitive resin layer, also have diffuse reflector 2 at described protrusion surface.Wherein, preferably, this diffuse reflector 2 is made up of reflecting metal.
In the present embodiment, in order to realize good light diffuse reflection and effectively to control cost, preferably adopt metal A l to make, certainly, except adopting metal A l, can also adopt other reflecting metals to make diffuse reflector 2.
Preferably, these projection 11 undulates are evenly distributed on photosensitive resin layer 1.In reality produces, adopt and with the mask plate of multiple pierced patterns, photosensitive resin is exposed, in exposure process, there is diffraction exposure, on photosensitive resin layer surface, form the waveform projection of light transmission capacity alternation.
Wherein, display mode is TN (Twisted Nematic, twisted nematic) concrete structure of the array base palte that comprises of the display device of pattern comprises: underlay substrate, be positioned at grid, gate insulation layer and active layer on underlay substrate, this active layer is provided with source and leaks metal level and the first electrode layer, this photosensitive resin layer leaks between metal level and the first electrode layer in source, and this first electrode layer is connected with leakage metal level by the via hole being arranged on photosensitive resin layer.
In addition, display mode is ADS (senior super dimension field switch, Advanced Super Dimension Switch) concrete structure of the array base palte that comprises of the display device of pattern comprises: underlay substrate, be positioned at grid, gate insulation layer and active layer on underlay substrate, this active layer is provided with source and leaks metal level and the first electrode layer, photosensitive resin layer leaks between metal level and the first electrode layer in source, and this first electrode layer is connected with leakage metal level by the via hole being arranged on photosensitive resin layer; Above this first electrode layer, be provided with insulation course and the second electrode lay, described the second electrode lay is slit-shaped.
In above-mentioned two kinds of structures, directly the photosensitive resin layer in array base palte is arranged to have multiple projections, and at described protrusion surface, diffuse reflector is set, utilize photosensitive resin raised structures and diffuse reflector can form good diffuse effect, not only can improve the display quality of half-reflection and half-transmission screen, and shortening process cycle, saves process costs.
In exposure process, on mask plate, mutually there is diffraction with hollow out figure, can form on photosensitive resin layer surface uniformly like this, transmitance alternation wavy, setting is coated in its lip-deep reflecting metal reflection horizon and is similarly wavy, and then form good diffuse reflector, improve the display quality of the bright screen of half-reflection and half-transmission.
As shown in Figure 2 and Figure 4, the present invention also provides a kind of method for making of array base palte, comprising:
Step S1, formation photosensitive resin layer form multiple projections on described photosensitive resin layer;
Concrete, this step comprises:
Step S11, on substrate, deposit photosensitive resin material;
The mask plate A that step S12, employing have multiple pierced patterns, to the base board to explosure in step S11, finally makes to present multiple raised structures on photosensitive resin layer.
Wherein, in order to make each projection that diffraction phenomena can occur, the size that pierced pattern is set is less than the limiting resolution of exposure machine (general product line exposing machine precision is 3.5-4um at present).Wherein, in actual production, the diameter that pierced pattern is set is 2um, and the spacing between adjacent two pierced patterns is 1um.With reference to figure 3.
Step S2, on the basis that completes above-mentioned steps, form diffuse reflector.
Wherein, step S2 specifically comprises: on raised structures, deposit reflective metal layer and form diffuse reflector.In this step, adopt plated metal Al.
The limiting resolution that the size of pierced pattern on mask plate is less than exposure machine is set in the present embodiment, so will there is diffraction phenomena in exposure process, in the technique of photosensitive resin by the management and control of exposure, realize the diverse location sensitive volume difference forming due to diffraction at resin surface, the glue thickness difference of the photoresist that final diverse location is exposed, form a kind of rough surface (thering is projection), on this surface, make reflective metal layer, form rough reflection horizon, realize diffuse reflection, its diffuse reflection loss is little, and the degree that becomes more meticulous is high.
The method for making of the array base palte that the embodiment of the present invention provides, forming section diffraction exposure in exposure process, on photosensitive resin layer, form the projection of surface irregularity, can form good diffuse effect in conjunction with diffuse reflector, improve the display quality of half-reflection and half-transmission screen.
On the other hand, the present invention also provides a kind of display device, comprises above-mentioned array base palte.
This display device includes but not limited to the equipment such as liquid crystal display, LCD TV, LCDs, can also need to show for digital album (digital photo frame), Electronic Paper, mobile phone etc. the display device of module.
The invention provides a kind of display device, comprising array base palte, by multiple projections are set on photosensitive resin layer, and the waveform that this projection is transmitance alternation is set, can form good diffuse effect in conjunction with diffuse reflector, improve the display quality of half-reflection and half-transmission screen.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, do not departing under the prerequisite of the technology of the present invention principle; can also make some improvement and modification, these improve and modification also should be considered as protection scope of the present invention.
Claims (12)
1. an array base palte, comprises the photosensitive resin layer being arranged on underlay substrate, it is characterized in that, has multiple projections on described photosensitive resin layer, also has diffuse reflector at described protrusion surface.
2. array base palte according to claim 1, is characterized in that, described diffuse reflector is made up of reflecting metal.
3. array base palte according to claim 1, is characterized in that, described array base palte also comprises source leakage metal level and the first electrode layer, and described photosensitive resin layer leaks between metal level and the first electrode layer in described source.
4. array base palte according to claim 3, is characterized in that, above described the first electrode layer, also comprises insulation course and the second electrode lay, and described the second electrode lay is slit-shaped.
5. array base palte according to claim 2, is characterized in that, described reflecting metal is aluminium.
6. array base palte according to claim 1, is characterized in that, described projection undulate is arranged on described photosensitive resin layer equably.
7. a display device, is characterized in that, comprises the array base palte described in claim 1-6 any one.
8. a method for making for array base palte, is characterized in that, comprising:
Step S1, formation photosensitive resin layer form multiple projections on described photosensitive resin layer;
Step S2, in described projection, form diffuse reflector.
9. method for making as claimed in claim 8, is characterized in that, described step S1 specifically comprises:
Step S11, on substrate, deposit photosensitive resin material;
The mask plate that step S12, employing have multiple pierced patterns, to the base board to explosure in step S11, finally makes to form multiple raised structures on described photosensitive resin layer.
10. method for making as claimed in claim 9, is characterized in that, the size of described pierced pattern is less than the limiting resolution of exposure machine.
11. method for makings as claimed in claim 10, is characterized in that, the diameter of described pierced pattern is 2um, and the spacing between adjacent two pierced patterns is 1um.
12. method for makings as claimed in claim 8, is characterized in that, described step S2 specifically comprises: on raised structures, deposit reflective metal layer and form described diffuse reflector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201410379963.7A CN104181741A (en) | 2014-08-04 | 2014-08-04 | Display device, array substrate and production method of array substrate |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410379963.7A CN104181741A (en) | 2014-08-04 | 2014-08-04 | Display device, array substrate and production method of array substrate |
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| CN111477764A (en) * | 2020-05-25 | 2020-07-31 | 京东方科技集团股份有限公司 | O L ED display panel and manufacturing method thereof |
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| JP2005275432A (en) * | 2005-06-08 | 2005-10-06 | Seiko Epson Corp | Electro-optic device and electronic equipment |
| JP2007225646A (en) * | 2006-02-21 | 2007-09-06 | Epson Imaging Devices Corp | Liquid crystal display device and method for manufacturing same |
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| CN105826249A (en) * | 2016-04-11 | 2016-08-03 | 京东方科技集团股份有限公司 | Metal layer manufacturing method, functional substrate and manufacturing method thereof, and display device |
| WO2017177725A1 (en) * | 2016-04-11 | 2017-10-19 | 京东方科技集团股份有限公司 | Manufacturing method for metal layer, functional substrate, and manufacturing method therefor and display apparatus |
| US10209584B2 (en) | 2016-04-11 | 2019-02-19 | Boe Technology Group Co., Ltd. | Manufacturing method of metal layer, functional substrate and manufacturing method thereof, and display device |
| CN111477764A (en) * | 2020-05-25 | 2020-07-31 | 京东方科技集团股份有限公司 | O L ED display panel and manufacturing method thereof |
| WO2021238439A1 (en) * | 2020-05-25 | 2021-12-02 | 京东方科技集团股份有限公司 | Oled display panel and manufacturing method therefor |
| CN111477764B (en) * | 2020-05-25 | 2022-12-23 | 京东方科技集团股份有限公司 | OLED display panel and manufacturing method thereof |
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Application publication date: 20141203 |