[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

CA921620A - Method of forming buried layers by ion implantation - Google Patents

Method of forming buried layers by ion implantation

Info

Publication number
CA921620A
CA921620A CA129402A CA129402A CA921620A CA 921620 A CA921620 A CA 921620A CA 129402 A CA129402 A CA 129402A CA 129402 A CA129402 A CA 129402A CA 921620 A CA921620 A CA 921620A
Authority
CA
Canada
Prior art keywords
ion implantation
buried layers
forming buried
forming
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA129402A
Other versions
CA129402S (en
Inventor
Simpson John
U. Macrae Alfred
Miller Paul
A. Moline Robert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA921620A publication Critical patent/CA921620A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02255Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Bipolar Transistors (AREA)
CA129402A 1971-05-24 1971-12-06 Method of forming buried layers by ion implantation Expired CA921620A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14625271A 1971-05-24 1971-05-24

Publications (1)

Publication Number Publication Date
CA921620A true CA921620A (en) 1973-02-20

Family

ID=22516512

Family Applications (1)

Application Number Title Priority Date Filing Date
CA129402A Expired CA921620A (en) 1971-05-24 1971-12-06 Method of forming buried layers by ion implantation

Country Status (11)

Country Link
JP (1) JPS5138582B1 (en)
BE (1) BE783709A (en)
CA (1) CA921620A (en)
CH (1) CH535494A (en)
DE (1) DE2224467B2 (en)
FR (1) FR2138932B1 (en)
GB (1) GB1397338A (en)
HK (1) HK36076A (en)
IT (1) IT959298B (en)
NL (1) NL159531B (en)
SE (1) SE372137B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2206994A (en) * 1987-06-08 1989-01-18 Philips Electronic Associated Semiconductor device

Also Published As

Publication number Publication date
SE372137B (en) 1974-12-09
CH535494A (en) 1973-03-31
HK36076A (en) 1976-06-18
IT959298B (en) 1973-11-10
JPS5138582B1 (en) 1976-10-22
GB1397338A (en) 1975-06-11
NL7206913A (en) 1972-11-28
FR2138932B1 (en) 1975-08-29
BE783709A (en) 1972-09-18
DE2224467B2 (en) 1974-03-07
DE2224467A1 (en) 1972-12-07
FR2138932A1 (en) 1973-01-05
NL159531B (en) 1979-02-15

Similar Documents

Publication Publication Date Title
AU465553B2 (en) Composite rolland method of forming thesame
AU466787B2 (en) Method of production of hybrid seed-grain
CA960828A (en) Method for the manufacture of twist-free yarn
CA1032659A (en) Method of producing multi-layer structures
CA972115A (en) Method of making shoes
AU470969B2 (en) Method of manufacturing yoke assemblies
CA991069A (en) Method of fabricating structures
CA1008847A (en) Method of producing dl-methionyl-dl-methionine
CA980768A (en) Method of treating lactose
CA980408A (en) Method of fabricating magnetomotive devices
CA1010069A (en) Method of telomerizing
CA921620A (en) Method of forming buried layers by ion implantation
AU460064B2 (en) Method for improving soil
CA981390A (en) Method of accelerating the cure of polyurethanes
CA1007347A (en) Method of making a photoconductive layer
CA996737A (en) Treatment of an underground formation
CA957695A (en) Method of making imidatosilanes
CA845651A (en) Method of manufacturing photoconductive layers
CA927526A (en) Method of prospecting
CA867555A (en) Method of fabricating shoes
CA911518A (en) Method of making transparencies
CA905612A (en) Method of manufacturing moccasins
CA862150A (en) Method of making glycine
CA953469A (en) Method of making shoes
CA863386A (en) Method of making alkylidendithiobisphenols