CA2496467A1 - Stabilized, aqueous silicon dioxide dispersion - Google Patents
Stabilized, aqueous silicon dioxide dispersion Download PDFInfo
- Publication number
- CA2496467A1 CA2496467A1 CA002496467A CA2496467A CA2496467A1 CA 2496467 A1 CA2496467 A1 CA 2496467A1 CA 002496467 A CA002496467 A CA 002496467A CA 2496467 A CA2496467 A CA 2496467A CA 2496467 A1 CA2496467 A1 CA 2496467A1
- Authority
- CA
- Canada
- Prior art keywords
- silicon dioxide
- stabilized
- dioxide dispersion
- aqueous silicon
- cation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3045—Treatment with inorganic compounds
- C09C1/3054—Coating
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
- C01B33/149—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
- C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Composite Materials (AREA)
- Dispersion Chemistry (AREA)
- Silicon Compounds (AREA)
- Colloid Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Aqueous dispersion containing silicon dioxide powder, which is stable in a pH
range of 2 to 6, which contains a cation-providing compound that is at least partially soluble in this pH range and the zeta potential of which is less than or equal to zero. It is produced by bringing silicon dioxide powder and at least one cation-providing compound into contact whilst moving in an aqueous medium. The dispersion can be used for chemical-mechanical polishing of metal surfaces.
range of 2 to 6, which contains a cation-providing compound that is at least partially soluble in this pH range and the zeta potential of which is less than or equal to zero. It is produced by bringing silicon dioxide powder and at least one cation-providing compound into contact whilst moving in an aqueous medium. The dispersion can be used for chemical-mechanical polishing of metal surfaces.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10238463.0 | 2002-08-22 | ||
DE10238463A DE10238463A1 (en) | 2002-08-22 | 2002-08-22 | Stabilized, aqueous silicon dioxide dispersion |
PCT/EP2003/008333 WO2004018359A1 (en) | 2002-08-22 | 2003-07-29 | Stabilized, aqueous silicon dioxide dispersion |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2496467A1 true CA2496467A1 (en) | 2004-03-04 |
CA2496467C CA2496467C (en) | 2008-12-09 |
Family
ID=31197230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002496467A Expired - Fee Related CA2496467C (en) | 2002-08-22 | 2003-07-29 | Stabilized, aqueous silicon dioxide dispersion |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP1529014A1 (en) |
JP (1) | JP4448030B2 (en) |
KR (1) | KR100772258B1 (en) |
CN (1) | CN100447082C (en) |
AU (1) | AU2003250188A1 (en) |
CA (1) | CA2496467C (en) |
DE (1) | DE10238463A1 (en) |
NO (1) | NO20051492L (en) |
PL (1) | PL203972B1 (en) |
WO (1) | WO2004018359A1 (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200613485A (en) * | 2004-03-22 | 2006-05-01 | Kao Corp | Polishing composition |
DE102004021092A1 (en) * | 2004-04-29 | 2005-11-24 | Degussa Ag | Use of a cationic silica dispersion as a textile finishing agent |
AT500776B1 (en) * | 2004-08-18 | 2008-12-15 | Wagner Friedrich | USE OF A COMPOSITION FOR APPLYING A RECESSIBLE, HEIGHT-BUILDING STRUCTURAL COATING |
AT502282B1 (en) * | 2005-07-26 | 2008-12-15 | Friedrich Wagner | SLIP-RESISTANT SPRAYER FOR MOBILE FLOORING |
WO2006046463A1 (en) * | 2004-10-28 | 2006-05-04 | Konica Minolta Photo Imaging, Inc. | Cationic fine particle dispersions and ink-jet recording papaers |
DE102005012409A1 (en) | 2005-03-17 | 2006-09-21 | Wacker Chemie Ag | Aqueous dispersions of partially hydrophobic silicic acids |
DE102005062606A1 (en) * | 2005-12-23 | 2007-07-05 | Deutsche Institute Für Textil- Und Faserforschung Denkendorf | New nano-scale primary particle based on silicon oxide/mixed oxide of silicon oxide and other metal oxide, useful e.g. for hydrophilic coating of hydrophobic textile materials |
JP2007258606A (en) * | 2006-03-24 | 2007-10-04 | Fujifilm Corp | Polishing solution for chemical-mechanical polishing |
CN101490200B (en) | 2006-07-12 | 2012-09-05 | 卡伯特微电子公司 | Cmp method for metal-containing substrates |
DE102006049526A1 (en) * | 2006-10-20 | 2008-04-24 | Evonik Degussa Gmbh | Stable aqueous dispersions of silica |
CN101918500B (en) * | 2007-11-19 | 2015-05-20 | 格雷斯股份有限两合公司 | Submicron anti-corrosive particles |
DE102007059861A1 (en) * | 2007-12-12 | 2009-06-18 | Evonik Degussa Gmbh | Process for the preparation of silica dispersions |
DE102008041466A1 (en) | 2008-08-22 | 2010-02-25 | Wacker Chemie Ag | Aqueous dispersions of hydrophobic silicic acids |
CN101838479B (en) * | 2010-03-19 | 2013-11-20 | 福建师范大学 | Method for preparing dispersible ultra-fine silicon dioxide |
KR102205327B1 (en) * | 2013-06-10 | 2021-01-19 | 닛산 가가쿠 가부시키가이샤 | Silica sol and method for producing silica sol |
CN105778775B (en) * | 2014-12-23 | 2021-03-02 | 安集微电子(上海)有限公司 | Preparation method of neutral colloidal silicon dioxide |
CN104830300A (en) * | 2015-04-30 | 2015-08-12 | 河南大学 | Small-particle size nanometer polysilicon emulsion and preparation method thereof |
CN108751204A (en) * | 2018-05-14 | 2018-11-06 | 江苏联瑞新材料股份有限公司 | A kind of preparation method of submicron silicon dioxide dispersion liquid |
CN111777949A (en) * | 2020-07-13 | 2020-10-16 | 长沙金硅地环保科技有限公司 | High-molecular nano-silicon and hydrosol polymer and application thereof |
JP2022067800A (en) * | 2020-10-21 | 2022-05-09 | 山口精研工業株式会社 | Silica dispersion, and polishing agent composition |
CN114044520B (en) * | 2021-11-29 | 2024-06-28 | 苏州西丽卡电子材料有限公司 | Preparation method of high-aluminum ultrapure synthetic quartz sand |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2892797A (en) * | 1956-02-17 | 1959-06-30 | Du Pont | Process for modifying the properties of a silica sol and product thereof |
US3007878A (en) * | 1956-11-01 | 1961-11-07 | Du Pont | Aquasols of positively-charged coated silica particles and their production |
SE501214C2 (en) * | 1992-08-31 | 1994-12-12 | Eka Nobel Ab | Silica sol and process for making paper using the sun |
US6420039B1 (en) * | 1998-10-02 | 2002-07-16 | Cabot Corporation | Recording medium |
-
2002
- 2002-08-22 DE DE10238463A patent/DE10238463A1/en not_active Ceased
-
2003
- 2003-07-29 CA CA002496467A patent/CA2496467C/en not_active Expired - Fee Related
- 2003-07-29 KR KR1020057002730A patent/KR100772258B1/en active IP Right Grant
- 2003-07-29 AU AU2003250188A patent/AU2003250188A1/en not_active Abandoned
- 2003-07-29 JP JP2004530060A patent/JP4448030B2/en not_active Expired - Fee Related
- 2003-07-29 CN CNB038198096A patent/CN100447082C/en not_active Expired - Lifetime
- 2003-07-29 EP EP03792235A patent/EP1529014A1/en not_active Withdrawn
- 2003-07-29 PL PL373839A patent/PL203972B1/en unknown
- 2003-07-29 WO PCT/EP2003/008333 patent/WO2004018359A1/en active Application Filing
-
2005
- 2005-03-21 NO NO20051492A patent/NO20051492L/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP4448030B2 (en) | 2010-04-07 |
AU2003250188A1 (en) | 2004-03-11 |
WO2004018359A1 (en) | 2004-03-04 |
DE10238463A1 (en) | 2004-03-04 |
CN1675128A (en) | 2005-09-28 |
KR20050050646A (en) | 2005-05-31 |
PL373839A1 (en) | 2005-09-19 |
JP2005536426A (en) | 2005-12-02 |
NO20051492L (en) | 2005-05-13 |
EP1529014A1 (en) | 2005-05-11 |
KR100772258B1 (en) | 2007-11-01 |
PL203972B1 (en) | 2009-11-30 |
CN100447082C (en) | 2008-12-31 |
CA2496467C (en) | 2008-12-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |
Effective date: 20220301 |
|
MKLA | Lapsed |
Effective date: 20200831 |