CA1024667A - Lens and deflection unit arrangement for electron beam columns - Google Patents

Lens and deflection unit arrangement for electron beam columns

Info

Publication number: CA1024667A
Authority: CA; Canada
Prior art keywords: lens; electron beam; deflection unit; unit arrangement; beam columns
Prior art date: 1973-12-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA213,224A

Other languages

French (fr)

Inventor

Hans C. Pfeiffer

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

International Business Machines Corp

Original Assignee

International Business Machines Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1973-12-28

Filing date

1974-11-07

Publication date

1978-01-17

1974-11-07 Application filed by International Business Machines Corp filed Critical International Business Machines Corp

1978-01-17 Application granted granted Critical

1978-01-17 Publication of CA1024667A publication Critical patent/CA1024667A/en

Status Expired legal-status Critical Current

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1475—Scanning means magnetic
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electron Beam Exposure (AREA)

CA213,224A 1973-12-28 1974-11-07 Lens and deflection unit arrangement for electron beam columns Expired CA1024667A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US429410A US3930181A (en)	1973-12-28	1973-12-28	Lens and deflection unit arrangement for electron beam columns

Publications (1)

Publication Number	Publication Date
CA1024667A true CA1024667A (en)	1978-01-17

Family

ID=23703121

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA213,224A Expired CA1024667A (en)	1973-12-28	1974-11-07	Lens and deflection unit arrangement for electron beam columns

Country Status (6)

Country	Link
US (1)	US3930181A (en)
JP (1)	JPS5099464A (en)
CA (1)	CA1024667A (en)
DE (1)	DE2449000A1 (en)
FR (1)	FR2256526A1 (en)
IT (1)	IT1026651B (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FR2386109A1 (en) *	1977-04-01	1978-10-27	Cgr Mev	G-RAY IRRADIATION HEAD FOR PANORAMIC IRRADIATION AND G-RAY GENERATOR INCLUDING SUCH IRRADIATION HEAD
US4475044A (en) *	1979-04-23	1984-10-02	Hitachi, Ltd.	Apparatus for focus-deflecting a charged particle beam
JPS5760647A (en) *	1980-09-26	1982-04-12	Jeol Ltd	Magnetic field intensity control method
US4376249A (en) *	1980-11-06	1983-03-08	International Business Machines Corporation	Variable axis electron beam projection system
JPS57206173A (en) *	1981-06-15	1982-12-17	Nippon Telegr & Teleph Corp <Ntt>	Focusing deflecting device for charged corpuscule beam
US4395691A (en) *	1982-03-04	1983-07-26	Hughes Aircraft Company	Beam deflection system
US4544846A (en) *	1983-06-28	1985-10-01	International Business Machines Corporation	Variable axis immersion lens electron beam projection system
DE3521464A1 (en) *	1985-06-14	1986-12-18	Siemens AG, 1000 Berlin und 8000 München	SPECTROMETER LENS FOR ELECTRON BEAM MEASUREMENT TECHNOLOGY
EP0236807A3 (en) *	1986-03-07	1990-05-16	Siemens Aktiengesellschaft	Spectrometer objective for the corpuscular beam measuring technique
US6090528A (en) *	1999-10-27	2000-07-18	Gordon; Michael S.	Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge
WO2001045136A1 (en) *	1999-12-14	2001-06-21	Applied Materials, Inc.	Method and system for the examination of specimen using a charged particle beam
US7800062B2 (en) *	2002-06-11	2010-09-21	Applied Materials, Inc.	Method and system for the examination of specimen
US7528614B2 (en)	2004-12-22	2009-05-05	Applied Materials, Inc.	Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam
US8461526B2 (en)	2010-12-01	2013-06-11	Kla-Tencor Corporation	Electron beam column and methods of using same
US8362425B2 (en)	2011-03-23	2013-01-29	Kla-Tencor Corporation	Multiple-beam system for high-speed electron-beam inspection
US8664594B1 (en)	2011-04-18	2014-03-04	Kla-Tencor Corporation	Electron-optical system for high-speed and high-sensitivity inspections
US9848778B2 (en)	2011-04-29	2017-12-26	Medtronic, Inc.	Method and device to monitor patients with kidney disease
US9302036B2 (en)	2011-04-29	2016-04-05	Medtronic, Inc.	Blood fluid removal system performance monitoring
JP6002428B2 (en)	2012-04-24	2016-10-05	株式会社日立ハイテクノロジーズ	Charged particle beam equipment
US10010663B2 (en)	2013-02-01	2018-07-03	Medtronic, Inc.	Fluid circuit for delivery of renal replacement therapies
US10543052B2 (en)	2013-02-01	2020-01-28	Medtronic, Inc.	Portable dialysis cabinet
US9623164B2 (en)	2013-02-01	2017-04-18	Medtronic, Inc.	Systems and methods for multifunctional volumetric fluid control
US9884145B2 (en)	2013-11-26	2018-02-06	Medtronic, Inc.	Parallel modules for in-line recharging of sorbents using alternate duty cycles
US9713665B2 (en)	2014-12-10	2017-07-25	Medtronic, Inc.	Degassing system for dialysis

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2803770A (en) *	1950-09-18	1957-08-20	Fernseh Gmbh	Electron discharge tube apparatus
BE620211A (en) *	1961-08-23
US3158774A (en) *	1962-06-08	1964-11-24	Joel F Fleming	Image orthicon focusing coil and field flaring ring
GB1044090A (en) *	1963-12-06	1966-09-28	Tokyo Shibaura Electric Co	Television pickup tubes and methods of operating the same
US3471741A (en) *	1967-04-07	1969-10-07	Rca Corp	Television camera including an image isocon tube
GB1188417A (en) *	1968-04-03	1970-04-15	John Robert Garrood	Electron Beam Apparatus
US3714422A (en) *	1970-04-06	1973-01-30	Hitachi Ltd	Scanning stereoscopic electron microscope
US3801784A (en) *	1972-04-14	1974-04-02	Research Corp	Scanning electron microscope operating in area scan and angle scan modes

1973
- 1973-12-28 US US429410A patent/US3930181A/en not_active Expired - Lifetime
1974
- 1974-10-15 DE DE19742449000 patent/DE2449000A1/en active Pending
- 1974-11-07 CA CA213,224A patent/CA1024667A/en not_active Expired
- 1974-11-26 FR FR7441919A patent/FR2256526A1/fr not_active Withdrawn
- 1974-11-29 IT IT29998/74A patent/IT1026651B/en active
- 1974-12-03 JP JP49137809A patent/JPS5099464A/ja active Pending

Also Published As

Publication number	Publication date
US3930181A (en)	1975-12-30
DE2449000A1 (en)	1975-07-03
FR2256526A1 (en)	1975-07-25
IT1026651B (en)	1978-10-20
JPS5099464A (en)	1975-08-07

Publication	Publication Date	Title
CA1024667A (en)	1978-01-17	Lens and deflection unit arrangement for electron beam columns
CA980400A (en)	1975-12-23	Electron beam deflection system
CA979062A (en)	1975-12-02	Electron beam controller
CA940189A (en)	1974-01-15	Electron beam deflection apparatus
CA980851A (en)	1975-12-30	Deflection yoke
CA982858A (en)	1976-02-03	Light beam deflection system
CA1013479A (en)	1977-07-05	Deflection system
AU474023B2 (en)	1976-07-08	Scanning electron microscope
CA1007744A (en)	1977-03-29	Vertical deflection circuits for electron beam scanning
CA1011074A (en)	1977-05-31	Structural beam
AU501917B2 (en)	1979-07-05	Scanning beam system
CA995727A (en)	1976-08-24	Electron beam control system
CA943261A (en)	1974-03-05	High contrast display for electron beam scanner
CA1017856A (en)	1977-09-20	Centering circuits employed for beam deflection circuits
AU479462B2 (en)	1976-12-15	Electron beam deflection circuit
CA1035981A (en)	1978-08-08	Light beam deflection means
CA1003970A (en)	1977-01-18	Electron beam deflection circuits
AU493340B2 (en)	1978-05-24	Structural beam
CA909307A (en)	1972-09-05	Electron beam deflection system
CA913536A (en)	1972-10-31	Light beam deflection
CA893377A (en)	1972-02-15	Electron beam focusing system
CA1027237A (en)	1978-02-28	Dynamic electron beam convergence apparatus
CA916298A (en)	1972-12-05	Television deflection system
CA812987A (en)	1969-05-13	Beam deflection apparatus
CA907115A (en)	1972-08-08	Electrode configuration for electron beam scanner