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BR0307616A - Composição sensìvel à radiação visìvel - Google Patents

Composição sensìvel à radiação visìvel

Info

Publication number
BR0307616A
BR0307616A BR0307616-4A BR0307616A BR0307616A BR 0307616 A BR0307616 A BR 0307616A BR 0307616 A BR0307616 A BR 0307616A BR 0307616 A BR0307616 A BR 0307616A
Authority
BR
Brazil
Prior art keywords
visible radiation
composition
sensitive
composition sensitive
initiator
Prior art date
Application number
BR0307616-4A
Other languages
English (en)
Inventor
Harald Baumann
Michael Flugel
Original Assignee
Kodak Polychrome Graphics Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Gmbh filed Critical Kodak Polychrome Graphics Gmbh
Publication of BR0307616A publication Critical patent/BR0307616A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

"COMPOSIçãO SENSìVEL à RADIAçãO VISìVEL". A presente invenção refere-se a uma composição sensível à radiação visível. A composição compreende pelo menos um monómero etilenicamente insaturado, capaz de polimerização de adição iniciada por radical livre; opcionalmente, pelo menos um aglutinante e um sistema fotoiniciador compreendendo um co-iniciador e um sensibilizador de cianopiridona. O co-iniciador compreende, preferivelmente, um metaloceno e um composto ónio.
BR0307616-4A 2002-02-12 2003-02-12 Composição sensìvel à radiação visìvel BR0307616A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/074,791 US6664025B2 (en) 2002-02-12 2002-02-12 Visible radiation sensitive composition
PCT/EP2003/001380 WO2003069411A1 (en) 2002-02-12 2003-02-12 Visible radiation sensitive composition

Publications (1)

Publication Number Publication Date
BR0307616A true BR0307616A (pt) 2004-12-21

Family

ID=27732387

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0307616-4A BR0307616A (pt) 2002-02-12 2003-02-12 Composição sensìvel à radiação visìvel

Country Status (5)

Country Link
US (1) US6664025B2 (pt)
EP (1) EP1476787A1 (pt)
JP (1) JP2005517979A (pt)
BR (1) BR0307616A (pt)
WO (1) WO2003069411A1 (pt)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6936384B2 (en) * 2002-08-01 2005-08-30 Kodak Polychrome Graphics Llc Infrared-sensitive composition containing a metallocene derivative
WO2004074253A1 (en) * 2003-02-22 2004-09-02 Merck Patent Gmbh Cyanopyridone derivatives as liquid crystals
JP4418725B2 (ja) * 2004-09-24 2010-02-24 富士フイルム株式会社 平版印刷版原版
JP4460986B2 (ja) * 2004-09-24 2010-05-12 富士フイルム株式会社 平版印刷版の作製方法
GB0610606D0 (en) 2006-05-30 2006-07-05 Photocentric Ltd Process and apparatus
GB2451431A (en) * 2007-07-27 2009-02-04 Photocentric Ltd Photopolymer composition curable by ambient light
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
EP2284005B1 (en) 2009-08-10 2012-05-02 Eastman Kodak Company Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
JP5551255B2 (ja) * 2009-09-28 2014-07-16 コーロン インダストリーズ インク ドライフィルムフォトレジスト
KR101262448B1 (ko) 2009-12-28 2013-05-08 코오롱인더스트리 주식회사 드라이필름 포토레지스트
WO2011040749A2 (ko) * 2009-09-30 2011-04-07 코오롱인더스트리 주식회사 드라이필름 포토레지스트
WO2020218297A1 (ja) * 2019-04-26 2020-10-29 株式会社Adeka ポリメチン化合物
JP7402616B2 (ja) * 2019-04-26 2023-12-21 東友ファインケム株式会社 着色樹脂組成物、カラーフィルタ及び表示装置
US12174540B2 (en) * 2021-03-10 2024-12-24 Taiwan Semiconductor Manufacturing Company, Ltd. Method of manufacturing a semiconductor device

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US4175963A (en) 1974-05-02 1979-11-27 General Electric Company Method of exposing and curing an epoxy composition containing an aromatic onium salt
US4069054A (en) 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4590287A (en) 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
US4713401A (en) 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
DE3784199D1 (de) 1986-08-01 1993-03-25 Ciba Geigy Ag Titanocene und deren verwendung.
DE3768919D1 (en) 1986-11-26 1991-05-02 Ciba Geigy Ag Fluessige photoinitiatorgemische.
CA1308852C (en) 1987-01-22 1992-10-13 Masami Kawabata Photopolymerizable composition
EP0277915B1 (de) 1987-02-02 1991-09-04 Ciba-Geigy Ag Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin
DE3832032A1 (de) 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US4921827A (en) 1988-11-23 1990-05-01 Minnesota Mining And Manufacturing Company Sensitized photoinitiator system for addition polymerization
US4971892A (en) 1988-11-23 1990-11-20 Minnesota Mining And Manufacturing Company High sensitivity photopolymerizable composition
DE4007428A1 (de) 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
GB9109948D0 (en) * 1991-05-08 1991-07-17 Minnesota Mining & Mfg Negative-acting thermographic materials
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Also Published As

Publication number Publication date
JP2005517979A (ja) 2005-06-16
EP1476787A1 (en) 2004-11-17
WO2003069411A1 (en) 2003-08-21
US6664025B2 (en) 2003-12-16
US20030180635A1 (en) 2003-09-25

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Legal Events

Date Code Title Description
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]