BE744002A - LITHOGRAPHIC PRINTING PLATES, - Google Patents
LITHOGRAPHIC PRINTING PLATES,Info
- Publication number
- BE744002A BE744002A BE744002DA BE744002A BE 744002 A BE744002 A BE 744002A BE 744002D A BE744002D A BE 744002DA BE 744002 A BE744002 A BE 744002A
- Authority
- BE
- Belgium
- Prior art keywords
- lithographic printing
- printing plates
- plates
- lithographic
- printing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB37485/67A GB1243963A (en) | 1967-08-15 | 1967-08-15 | Improvements in or relating to light sensitive lithographic plates |
AT1206369A AT294139B (en) | 1967-08-15 | 1969-12-29 | Positive working photosensitive planographic printing plate |
CH1944269A CH533322A (en) | 1967-08-15 | 1969-12-30 | Positive working photosensitive planographic printing plate and process for making same |
NL6919546A NL166135C (en) | 1967-08-15 | 1969-12-30 | POSITIVELY OPERATING LIGHT-SENSITIVE PLATE FOR THE MANUFACTURE OF A PRESSURE PLATE. |
BE744002 | 1970-01-02 | ||
FR7000950A FR2076347A5 (en) | 1967-08-15 | 1970-01-12 | |
US00167438A US3802885A (en) | 1967-08-15 | 1971-07-29 | Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base |
Publications (1)
Publication Number | Publication Date |
---|---|
BE744002A true BE744002A (en) | 1970-06-15 |
Family
ID=27560463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE744002D BE744002A (en) | 1967-08-15 | 1970-01-02 | LITHOGRAPHIC PRINTING PLATES, |
Country Status (6)
Country | Link |
---|---|
AT (1) | AT294139B (en) |
BE (1) | BE744002A (en) |
CH (1) | CH533322A (en) |
FR (1) | FR2076347A5 (en) |
GB (1) | GB1243963A (en) |
NL (1) | NL166135C (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
JPS5280022A (en) * | 1975-12-26 | 1977-07-05 | Fuji Photo Film Co Ltd | Light solubilizable composition |
US5212043A (en) * | 1988-02-17 | 1993-05-18 | Tosho Corporation | Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent |
CA2097791A1 (en) * | 1992-08-28 | 1994-03-01 | Sunit S. Dixit | High aspect ratio, flexible thick film positive photoresist |
EP1388759A1 (en) * | 2002-08-06 | 2004-02-11 | Shin-Etsu Chemical Co., Ltd. | Positive photoresist composition |
-
1967
- 1967-08-15 GB GB37485/67A patent/GB1243963A/en not_active Expired
-
1969
- 1969-12-29 AT AT1206369A patent/AT294139B/en not_active IP Right Cessation
- 1969-12-30 NL NL6919546A patent/NL166135C/en not_active IP Right Cessation
- 1969-12-30 CH CH1944269A patent/CH533322A/en not_active IP Right Cessation
-
1970
- 1970-01-02 BE BE744002D patent/BE744002A/en not_active IP Right Cessation
- 1970-01-12 FR FR7000950A patent/FR2076347A5/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2076347A5 (en) | 1971-10-15 |
NL6919546A (en) | 1971-07-02 |
NL166135B (en) | 1981-01-15 |
CH533322A (en) | 1973-01-31 |
AT294139B (en) | 1971-11-10 |
NL166135C (en) | 1981-06-15 |
GB1243963A (en) | 1971-08-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: HOWSON ALGRAPHY LTD Effective date: 19860131 |