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AU2003229023A1 - Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate - Google Patents

Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate

Info

Publication number
AU2003229023A1
AU2003229023A1 AU2003229023A AU2003229023A AU2003229023A1 AU 2003229023 A1 AU2003229023 A1 AU 2003229023A1 AU 2003229023 A AU2003229023 A AU 2003229023A AU 2003229023 A AU2003229023 A AU 2003229023A AU 2003229023 A1 AU2003229023 A1 AU 2003229023A1
Authority
AU
Australia
Prior art keywords
substrate
apparatus utilizing
conformable contact
masking methods
contact masking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003229023A
Inventor
Gang Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Southern California USC
Original Assignee
University of Southern California USC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Southern California USC filed Critical University of Southern California USC
Publication of AU2003229023A1 publication Critical patent/AU2003229023A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/38—Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
    • C25D5/40—Nickel; Chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
    • H01L21/76879—Filling of holes, grooves or trenches, e.g. vias, with conductive material by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electroplating Methods And Accessories (AREA)
AU2003229023A 2002-05-07 2003-05-07 Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate Abandoned AU2003229023A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37912902P 2002-05-07 2002-05-07
US60/379,129 2002-05-07
PCT/US2003/014857 WO2003095713A1 (en) 2002-05-07 2003-05-07 Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate

Publications (1)

Publication Number Publication Date
AU2003229023A1 true AU2003229023A1 (en) 2003-11-11

Family

ID=29420490

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003229023A Abandoned AU2003229023A1 (en) 2002-05-07 2003-05-07 Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate

Country Status (3)

Country Link
US (3) US20040065555A1 (en)
AU (1) AU2003229023A1 (en)
WO (1) WO2003095713A1 (en)

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WO2003049514A2 (en) * 2001-12-03 2003-06-12 Memgen Corporation Miniature rf and microwave components and methods for fabricating such components
US7195989B2 (en) * 2003-05-07 2007-03-27 Microfabrica Inc. Electrochemical fabrication methods using transfer plating of masks
US9614266B2 (en) 2001-12-03 2017-04-04 Microfabrica Inc. Miniature RF and microwave components and methods for fabricating such components
US7239219B2 (en) 2001-12-03 2007-07-03 Microfabrica Inc. Miniature RF and microwave components and methods for fabricating such components
US20050184748A1 (en) * 2003-02-04 2005-08-25 Microfabrica Inc. Pin-type probes for contacting electronic circuits and methods for making such probes
US20070045121A1 (en) * 2002-05-07 2007-03-01 Microfabrica Inc. Electrochemically fabricated hermetically sealed microstructures and methods of and apparatus for producing such structures
US20050104609A1 (en) * 2003-02-04 2005-05-19 Microfabrica Inc. Microprobe tips and methods for making
WO2003095711A2 (en) * 2002-05-07 2003-11-20 Memgen Corporation Electrochemically fabricated structures having dielectric or active bases
WO2003095712A2 (en) * 2002-05-07 2003-11-20 University Of Southern California Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitry
US20060108678A1 (en) * 2002-05-07 2006-05-25 Microfabrica Inc. Probe arrays and method for making
US9919472B1 (en) 2002-05-07 2018-03-20 Microfabrica Inc. Stacking and bonding methods for forming multi-layer, three-dimensional, millimeter scale and microscale structures
US20050067292A1 (en) * 2002-05-07 2005-03-31 Microfabrica Inc. Electrochemically fabricated structures having dielectric or active bases and methods of and apparatus for producing such structures
US8070931B1 (en) 2002-05-07 2011-12-06 Microfabrica Inc. Electrochemical fabrication method including elastic joining of structures
WO2003095707A2 (en) * 2002-05-07 2003-11-20 Memgen Corporation Method of and apparatus for forming three-dimensional structures
WO2003095710A2 (en) 2002-05-07 2003-11-20 Memgen Corporation Methods of and apparatus for electrochemically fabricating structures
US20050142739A1 (en) * 2002-05-07 2005-06-30 Microfabrica Inc. Probe arrays and method for making
US20060006888A1 (en) * 2003-02-04 2006-01-12 Microfabrica Inc. Electrochemically fabricated microprobes
US8454652B1 (en) 2002-10-29 2013-06-04 Adam L. Cohen Releasable tissue anchoring device, methods for using, and methods for making
US20100094320A1 (en) * 2002-10-29 2010-04-15 Microfabrica Inc. Atherectomy and Thrombectomy Devices, Methods for Making, and Procedures for Using
US20110092988A1 (en) * 2002-10-29 2011-04-21 Microfabrica Inc. Microdevices for Tissue Approximation and Retention, Methods for Using, and Methods for Making
US20080211524A1 (en) * 2003-02-04 2008-09-04 Microfabrica Inc. Electrochemically Fabricated Microprobes
US10416192B2 (en) 2003-02-04 2019-09-17 Microfabrica Inc. Cantilever microprobes for contacting electronic components
US20080106280A1 (en) * 2003-02-04 2008-05-08 Microfabrica Inc. Vertical Microprobes for Contacting Electronic Components and Method for Making Such Probes
US10297421B1 (en) 2003-05-07 2019-05-21 Microfabrica Inc. Plasma etching of dielectric sacrificial material from reentrant multi-layer metal structures
TWI232843B (en) 2003-05-07 2005-05-21 Microfabrica Inc Electrochemical fabrication methods including use of surface treatments to reduce overplating and/or planarization during formation of multi-layer three-dimensional structures
US20080105355A1 (en) * 2003-12-31 2008-05-08 Microfabrica Inc. Probe Arrays and Method for Making
US8633097B2 (en) 2009-06-09 2014-01-21 International Business Machines Corporation Single-junction photovoltaic cell
US8703521B2 (en) * 2009-06-09 2014-04-22 International Business Machines Corporation Multijunction photovoltaic cell fabrication
US8802477B2 (en) * 2009-06-09 2014-08-12 International Business Machines Corporation Heterojunction III-V photovoltaic cell fabrication
US20100310775A1 (en) * 2009-06-09 2010-12-09 International Business Machines Corporation Spalling for a Semiconductor Substrate
US20110048517A1 (en) * 2009-06-09 2011-03-03 International Business Machines Corporation Multijunction Photovoltaic Cell Fabrication
US8262916B1 (en) 2009-06-30 2012-09-11 Microfabrica Inc. Enhanced methods for at least partial in situ release of sacrificial material from cavities or channels and/or sealing of etching holes during fabrication of multi-layer microscale or millimeter-scale complex three-dimensional structures
US10961967B1 (en) 2017-12-12 2021-03-30 Microfabrica Inc. Fuel injector systems, fuel injectors, fuel injector nozzles, and methods for making fuel injector nozzles
US11262383B1 (en) 2018-09-26 2022-03-01 Microfabrica Inc. Probes having improved mechanical and/or electrical properties for making contact between electronic circuit elements and methods for making
US11867721B1 (en) 2019-12-31 2024-01-09 Microfabrica Inc. Probes with multiple springs, methods for making, and methods for using

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GB727789A (en) * 1952-06-23 1955-04-06 Champion Paper & Fibre Co Improvements in electro-deposition of chromium
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JPS59140388A (en) * 1983-01-31 1984-08-11 Furukawa Electric Co Ltd:The Pretreatment of stainless steel to be plated
JPS61253384A (en) * 1985-01-07 1986-11-11 Masami Kobayashi Method for plating amorphous alloy
JPS6217196A (en) * 1985-07-12 1987-01-26 Hitachi Cable Ltd Method for plating stainless steel
JPH0273991A (en) * 1988-09-08 1990-03-13 Mitsubishi Heavy Ind Ltd Pretreatment for metal plating of material having layer containing ni at least on its surface
US5011580A (en) * 1989-10-24 1991-04-30 Microelectronics And Computer Technology Corporation Method of reworking an electrical multilayer interconnect
US5456819A (en) * 1991-12-26 1995-10-10 The United States Of America As Represented By The Secretary Of Commerce Process for electrodepositing metal and metal alloys on tungsten, molybdenum and other difficult to plate metals
US5190637A (en) * 1992-04-24 1993-03-02 Wisconsin Alumni Research Foundation Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers
FR2696478B1 (en) * 1992-10-05 1994-10-28 Commissariat Energie Atomique Process for the electrolytic deposition of a metal on a flexible weakly conductive substrate, device for electrolytic deposition allowing the carrying out of this process and product obtained by this process.
CA2202633C (en) * 1994-10-14 2002-11-12 Seiichi Shimamura Peptide mixture and products thereof
JP3269827B2 (en) * 1997-04-04 2002-04-02 ユニバーシティ・オブ・サザン・カリフォルニア Articles, methods and apparatus for electrochemical manufacturing

Also Published As

Publication number Publication date
US20040065555A1 (en) 2004-04-08
US20070163888A1 (en) 2007-07-19
WO2003095713A1 (en) 2003-11-20
US20080210563A1 (en) 2008-09-04

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 18, NO 2, PAGE(S) 606 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAME UNIVERSITY OF SOUTHERN CALIFORNIA, APPLICATION NO. 2003229023, UNDER INID (43) CORRECT THE PUBLICATION DATE TO READ 24.11.2003