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AU2003286795A1 - Removing silicon oxide from a substrate - Google Patents

Removing silicon oxide from a substrate

Info

Publication number
AU2003286795A1
AU2003286795A1 AU2003286795A AU2003286795A AU2003286795A1 AU 2003286795 A1 AU2003286795 A1 AU 2003286795A1 AU 2003286795 A AU2003286795 A AU 2003286795A AU 2003286795 A AU2003286795 A AU 2003286795A AU 2003286795 A1 AU2003286795 A1 AU 2003286795A1
Authority
AU
Australia
Prior art keywords
substrate
silicon oxide
removing silicon
oxide
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003286795A
Inventor
James B. Craigo
Ravindranath Droopad
John L. Edwards Jr.
Xiaoming Hu
Yong Liang
Yi Wei
Zhiyi Yu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP USA Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of AU2003286795A1 publication Critical patent/AU2003286795A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046—Dry cleaning only

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
AU2003286795A 2002-12-03 2003-10-31 Removing silicon oxide from a substrate Abandoned AU2003286795A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/309,500 2002-12-03
US10/309,500 US6806202B2 (en) 2002-12-03 2002-12-03 Method of removing silicon oxide from a surface of a substrate
PCT/US2003/034637 WO2004051723A1 (en) 2002-12-03 2003-10-31 Removing silicon oxide from a substrate

Publications (1)

Publication Number Publication Date
AU2003286795A1 true AU2003286795A1 (en) 2004-06-23

Family

ID=32392893

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003286795A Abandoned AU2003286795A1 (en) 2002-12-03 2003-10-31 Removing silicon oxide from a substrate

Country Status (4)

Country Link
US (1) US6806202B2 (en)
AU (1) AU2003286795A1 (en)
TW (1) TW200425326A (en)
WO (1) WO2004051723A1 (en)

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US20100297854A1 (en) * 2009-04-22 2010-11-25 Applied Materials, Inc. High throughput selective oxidation of silicon and polysilicon using plasma at room temperature
US8993458B2 (en) 2012-02-13 2015-03-31 Applied Materials, Inc. Methods and apparatus for selective oxidation of a substrate

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Also Published As

Publication number Publication date
WO2004051723A1 (en) 2004-06-17
US20040106296A1 (en) 2004-06-03
TW200425326A (en) 2004-11-16
US6806202B2 (en) 2004-10-19

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase