AU2003272478A1 - Electrostatic chuck having a low level of particle generation and method of fabricating same - Google Patents
Electrostatic chuck having a low level of particle generation and method of fabricating sameInfo
- Publication number
- AU2003272478A1 AU2003272478A1 AU2003272478A AU2003272478A AU2003272478A1 AU 2003272478 A1 AU2003272478 A1 AU 2003272478A1 AU 2003272478 A AU2003272478 A AU 2003272478A AU 2003272478 A AU2003272478 A AU 2003272478A AU 2003272478 A1 AU2003272478 A1 AU 2003272478A1
- Authority
- AU
- Australia
- Prior art keywords
- low level
- electrostatic chuck
- particle generation
- fabricating same
- fabricating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/247,599 US6894211B2 (en) | 2001-09-21 | 2002-09-19 | Keyboard apparatus |
| US10/247,599 | 2002-09-19 | ||
| PCT/US2003/029212 WO2004027839A2 (en) | 2002-09-19 | 2003-09-18 | Electrostatic chuck having a low level of particle generation and method of fabricating same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2003272478A1 true AU2003272478A1 (en) | 2004-04-08 |
Family
ID=32028974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2003272478A Abandoned AU2003272478A1 (en) | 2002-09-19 | 2003-09-18 | Electrostatic chuck having a low level of particle generation and method of fabricating same |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR20050054950A (ko) |
| CN (1) | CN1685473A (ko) |
| AU (1) | AU2003272478A1 (ko) |
| WO (1) | WO2004027839A2 (ko) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100368591C (zh) * | 2004-11-19 | 2008-02-13 | 上海华虹Nec电子有限公司 | 一种用于化学气相沉淀装置的电子吸着盘 |
| TWI327761B (en) * | 2005-10-07 | 2010-07-21 | Rohm & Haas Elect Mat | Method for making semiconductor wafer and wafer holding article |
| JP5295515B2 (ja) | 2007-03-30 | 2013-09-18 | 東京エレクトロン株式会社 | 載置台の表面処理方法 |
| TWI475594B (zh) | 2008-05-19 | 2015-03-01 | Entegris Inc | 靜電夾頭 |
| US7884925B2 (en) * | 2008-05-23 | 2011-02-08 | Lam Research Corporation | Electrical and optical system and methods for monitoring erosion of electrostatic chuck edge bead materials |
| US8861170B2 (en) | 2009-05-15 | 2014-10-14 | Entegris, Inc. | Electrostatic chuck with photo-patternable soft protrusion contact surface |
| KR101680787B1 (ko) * | 2009-05-15 | 2016-11-29 | 엔테그리스, 아이엔씨. | 중합체 돌기들을 가지는 정전 척 |
| CN102986017B (zh) | 2010-05-28 | 2015-09-16 | 恩特格林斯公司 | 高表面电阻率静电吸盘 |
| CN105177519B (zh) * | 2010-10-29 | 2018-03-27 | 应用材料公司 | 用于物理气相沉积腔室的沉积环及静电夹盘 |
| JP6238996B2 (ja) * | 2012-11-02 | 2017-11-29 | インテグリス・インコーポレーテッド | 光パターン化可能な軟質突出部接触面を有する静電チャック |
| KR102200053B1 (ko) * | 2013-02-13 | 2021-01-08 | 엔테그리스, 아이엔씨. | 중합체 양각을 갖는 진공 척 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6117246A (en) * | 1997-01-31 | 2000-09-12 | Applied Materials, Inc. | Conductive polymer pad for supporting a workpiece upon a workpiece support surface of an electrostatic chuck |
| WO2002001611A2 (en) * | 2000-06-23 | 2002-01-03 | Applied Materials, Inc. | Electrostatic chuck and method of fabricating the same |
-
2003
- 2003-09-18 KR KR1020057004679A patent/KR20050054950A/ko not_active Application Discontinuation
- 2003-09-18 AU AU2003272478A patent/AU2003272478A1/en not_active Abandoned
- 2003-09-18 WO PCT/US2003/029212 patent/WO2004027839A2/en not_active Application Discontinuation
- 2003-09-18 CN CNA03823372XA patent/CN1685473A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN1685473A (zh) | 2005-10-19 |
| KR20050054950A (ko) | 2005-06-10 |
| WO2004027839A2 (en) | 2004-04-01 |
| WO2004027839A3 (en) | 2004-05-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |