AU2002220500A1 - Leadfree chemical nickel alloy - Google Patents
Leadfree chemical nickel alloyInfo
- Publication number
- AU2002220500A1 AU2002220500A1 AU2002220500A AU2050002A AU2002220500A1 AU 2002220500 A1 AU2002220500 A1 AU 2002220500A1 AU 2002220500 A AU2002220500 A AU 2002220500A AU 2050002 A AU2050002 A AU 2050002A AU 2002220500 A1 AU2002220500 A1 AU 2002220500A1
- Authority
- AU
- Australia
- Prior art keywords
- nickel alloy
- leadfree
- chemical nickel
- bismuth
- antimony
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
- C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/936—Chemical deposition, e.g. electroless plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Connection Of Batteries Or Terminals (AREA)
- Contacts (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
Abstract
Lead-free chemically produced nickel alloy containing nickel, phosphorus, bismuth and antimony, process for the production of such a nickel alloy by externally electroless metal deposition in an aqueous electrolyte and articles plated therewith.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10052960A DE10052960C9 (en) | 2000-10-25 | 2000-10-25 | Lead-free nickel alloy |
DE10052960 | 2000-10-25 | ||
PCT/DE2001/004014 WO2002034964A1 (en) | 2000-10-25 | 2001-10-25 | Leadfree chemical nickel alloy |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002220500A1 true AU2002220500A1 (en) | 2002-05-06 |
Family
ID=7661055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002220500A Abandoned AU2002220500A1 (en) | 2000-10-25 | 2001-10-25 | Leadfree chemical nickel alloy |
Country Status (9)
Country | Link |
---|---|
US (1) | US6911269B2 (en) |
EP (1) | EP1330558B1 (en) |
JP (1) | JP4023796B2 (en) |
AT (1) | ATE350511T1 (en) |
AU (1) | AU2002220500A1 (en) |
CA (1) | CA2432333A1 (en) |
DE (2) | DE10052960C9 (en) |
HU (1) | HUP0301340A3 (en) |
WO (1) | WO2002034964A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7491445B2 (en) * | 2004-09-02 | 2009-02-17 | Sekisui Chemical Co., Ltd. | Electroconductive fine particle and anisotropically electroconductive material comprising non-crystal and crystal nickel plating layers and method of making thereof |
DE102004047423C5 (en) * | 2004-09-28 | 2011-04-21 | AHC-Oberflächentechnik GmbH & Co. OHG | Externally applied Nickel alloy and its use |
JP4430570B2 (en) * | 2005-03-15 | 2010-03-10 | 荏原ユージライト株式会社 | Electroless nickel composite plating bath and electroless nickel alloy composite plating bath |
US20090011136A1 (en) * | 2005-05-06 | 2009-01-08 | Thomas Steven Lancsek | Composite electroless plating |
KR101058635B1 (en) * | 2008-12-23 | 2011-08-22 | 와이엠티 주식회사 | Electroless Nickel Plating Solution Composition, Flexible Printed Circuit Board and Manufacturing Method Thereof |
JP6061369B2 (en) * | 2012-01-30 | 2017-01-18 | 凸版印刷株式会社 | WIRING BOARD AND ITS MANUFACTURING METHOD, AND SOLDERED WIRING BOARD MANUFACTURING METHOD |
US8936672B1 (en) * | 2012-06-22 | 2015-01-20 | Accu-Labs, Inc. | Polishing and electroless nickel compositions, kits, and methods |
EP4166695A1 (en) * | 2015-12-18 | 2023-04-19 | Rolex Sa | Method for manufacturing a timepiece component |
DE102017125954A1 (en) | 2017-11-07 | 2019-05-09 | RIAG Oberflächentechnik AG | External electroless process for producing a nickel alloy and corresponding electrolyte |
CN113355618A (en) * | 2021-03-26 | 2021-09-07 | 中国科学院金属研究所 | Research method and application of trace element phosphorus in deformation high-temperature alloy |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB845648A (en) | 1957-10-07 | 1960-08-24 | Reynolds Metals Co | Nickel plating |
US2884344A (en) * | 1957-10-07 | 1959-04-28 | Reynolds Metals Co | Nickel plating |
US3764380A (en) * | 1971-06-03 | 1973-10-09 | Gates Rubber Co | Electrode having a coated positive contact surface |
US4483711A (en) * | 1983-06-17 | 1984-11-20 | Omi International Corporation | Aqueous electroless nickel plating bath and process |
US4600609A (en) * | 1985-05-03 | 1986-07-15 | Macdermid, Incorporated | Method and composition for electroless nickel deposition |
US4699811A (en) * | 1986-09-16 | 1987-10-13 | Macdermid, Incorporated | Chromium mask for electroless nickel or copper plating |
JPH0258729A (en) * | 1988-08-24 | 1990-02-27 | Nec Corp | Magnetic disk substrate and its production |
JP3182934B2 (en) | 1992-10-15 | 2001-07-03 | 上村工業株式会社 | Manufacturing method of memory hard disk |
US5437887A (en) * | 1993-12-22 | 1995-08-01 | Enthone-Omi, Inc. | Method of preparing aluminum memory disks |
US6800121B2 (en) * | 2002-06-18 | 2004-10-05 | Atotech Deutschland Gmbh | Electroless nickel plating solutions |
-
2000
- 2000-10-25 DE DE10052960A patent/DE10052960C9/en not_active Expired - Lifetime
-
2001
- 2001-10-25 AU AU2002220500A patent/AU2002220500A1/en not_active Abandoned
- 2001-10-25 HU HU0301340A patent/HUP0301340A3/en unknown
- 2001-10-25 EP EP01988508A patent/EP1330558B1/en not_active Revoked
- 2001-10-25 WO PCT/DE2001/004014 patent/WO2002034964A1/en active IP Right Grant
- 2001-10-25 US US10/399,464 patent/US6911269B2/en not_active Expired - Fee Related
- 2001-10-25 JP JP2002537928A patent/JP4023796B2/en not_active Expired - Fee Related
- 2001-10-25 DE DE50111820T patent/DE50111820D1/en not_active Expired - Lifetime
- 2001-10-25 CA CA002432333A patent/CA2432333A1/en not_active Abandoned
- 2001-10-25 AT AT01988508T patent/ATE350511T1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE50111820D1 (en) | 2007-02-15 |
DE10052960C5 (en) | 2007-10-31 |
CA2432333A1 (en) | 2002-05-02 |
US20040007472A1 (en) | 2004-01-15 |
HUP0301340A3 (en) | 2007-05-02 |
DE10052960A1 (en) | 2002-05-16 |
WO2002034964A1 (en) | 2002-05-02 |
HUP0301340A2 (en) | 2003-09-29 |
EP1330558B1 (en) | 2007-01-03 |
JP4023796B2 (en) | 2007-12-19 |
JP2004512429A (en) | 2004-04-22 |
EP1330558A1 (en) | 2003-07-30 |
DE10052960B4 (en) | 2004-11-18 |
DE10052960C9 (en) | 2008-07-03 |
ATE350511T1 (en) | 2007-01-15 |
US6911269B2 (en) | 2005-06-28 |
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