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AU2001233290A1 - Organic polymeric antireflective coatings deposited by chemical vapor deposition - Google Patents

Organic polymeric antireflective coatings deposited by chemical vapor deposition

Info

Publication number
AU2001233290A1
AU2001233290A1 AU2001233290A AU3329001A AU2001233290A1 AU 2001233290 A1 AU2001233290 A1 AU 2001233290A1 AU 2001233290 A AU2001233290 A AU 2001233290A AU 3329001 A AU3329001 A AU 3329001A AU 2001233290 A1 AU2001233290 A1 AU 2001233290A1
Authority
AU
Australia
Prior art keywords
vapor deposition
chemical vapor
organic polymeric
antireflective coatings
coatings deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001233290A
Inventor
Terry Brewer
Douglas Guerrero
Ram W. Sabnis
Mary J. Spencer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brewer Science Inc
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/745,350 external-priority patent/US6936405B2/en
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Publication of AU2001233290A1 publication Critical patent/AU2001233290A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
AU2001233290A 2000-02-22 2001-02-02 Organic polymeric antireflective coatings deposited by chemical vapor deposition Abandoned AU2001233290A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US51142100A 2000-02-22 2000-02-22
US09511421 2000-02-22
US09/745,350 US6936405B2 (en) 2000-02-22 2000-12-21 Organic polymeric antireflective coatings deposited by chemical vapor deposition
US09745350 2000-12-21
PCT/US2001/003568 WO2001063358A1 (en) 2000-02-22 2001-02-02 Organic polymeric antireflective coatings deposited by chemical vapor deposition

Publications (1)

Publication Number Publication Date
AU2001233290A1 true AU2001233290A1 (en) 2001-09-03

Family

ID=27057217

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001233290A Abandoned AU2001233290A1 (en) 2000-02-22 2001-02-02 Organic polymeric antireflective coatings deposited by chemical vapor deposition

Country Status (9)

Country Link
US (3) US6869747B2 (en)
EP (1) EP1269258B1 (en)
JP (1) JP3759456B2 (en)
KR (1) KR100610406B1 (en)
CN (1) CN100451830C (en)
AU (1) AU2001233290A1 (en)
CA (1) CA2400157A1 (en)
TW (1) TWI224150B (en)
WO (1) WO2001063358A1 (en)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP2003502449A (en) * 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド Spin-on glass anti-reflective coating for photolithography
WO2003044600A1 (en) 2001-11-15 2003-05-30 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US7261997B2 (en) * 2002-01-17 2007-08-28 Brewer Science Inc. Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
US6852474B2 (en) * 2002-04-30 2005-02-08 Brewer Science Inc. Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
CN1669130A (en) * 2002-09-20 2005-09-14 霍尼韦尔国际公司 Interlayer adhesion promoter for low K material
US6933227B2 (en) 2003-10-23 2005-08-23 Freescale Semiconductor, Inc. Semiconductor device and method of forming the same
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US20050255410A1 (en) * 2004-04-29 2005-11-17 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
US20070207406A1 (en) * 2004-04-29 2007-09-06 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
JP4563076B2 (en) * 2004-05-26 2010-10-13 東京応化工業株式会社 Antireflection film forming composition, antireflection film comprising antireflection film forming composition, and resist pattern forming method using the antireflection film forming composition
US20060255315A1 (en) * 2004-11-19 2006-11-16 Yellowaga Deborah L Selective removal chemistries for semiconductor applications, methods of production and uses thereof
DE102005004596B4 (en) * 2005-02-01 2011-09-15 Austriamicrosystems Ag Process for producing rounded polysilicon electrodes on semiconductor devices
US7431788B2 (en) * 2005-07-19 2008-10-07 Lam Research Corporation Method of protecting a bond layer in a substrate support adapted for use in a plasma processing system
US7576361B2 (en) * 2005-08-03 2009-08-18 Aptina Imaging Corporation Backside silicon wafer design reducing image artifacts from infrared radiation
US7354779B2 (en) * 2006-03-10 2008-04-08 International Business Machines Corporation Topography compensated film application methods
US7914974B2 (en) 2006-08-18 2011-03-29 Brewer Science Inc. Anti-reflective imaging layer for multiple patterning process
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
CN101641390B (en) * 2007-04-02 2013-05-01 第一毛织株式会社 Hardmask composition having antireflective property and method of patterning materials using the same
US20090096106A1 (en) * 2007-10-12 2009-04-16 Air Products And Chemicals, Inc. Antireflective coatings
KR101647158B1 (en) 2008-01-29 2016-08-09 브레우어 사이언스 인코포레이션 On-track process for patterning hardmask by multiple dark field exposures
US9640396B2 (en) 2009-01-07 2017-05-02 Brewer Science Inc. Spin-on spacer materials for double- and triple-patterning lithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
CN102925858B (en) * 2011-10-23 2014-11-19 碳元科技股份有限公司 Carbon layer materials with protection layer structure
CN102321867B (en) * 2011-10-23 2013-03-27 常州碳元科技发展有限公司 Carbon layer material with protective layer structure and preparation method thereof
US9958579B2 (en) * 2013-09-06 2018-05-01 Corning Incorporated UV protective coating for lens assemblies having protective layer between light absorber and adhesive
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
CN105037106B (en) * 2015-05-20 2016-08-17 中节能万润股份有限公司 A kind of connection pyrene phenol and its production and use
ES2686136B1 (en) * 2017-03-29 2019-08-14 Univ Castilla La Mancha 9,10-BIS SYNTHESIS PROCEDURE (CHLOROME) ANTRACENE

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3896133A (en) * 1971-03-05 1975-07-22 Smithkline Corp Substituted 10-heterocyclicaminoalkyl-9,10-dihydroanthracenes
US3900600A (en) * 1973-06-29 1975-08-19 Ibm Paraxylylene-silane dielectric films
US4187318A (en) * 1975-09-26 1980-02-05 Eli Lilly And Company Rodenticidal N-alkyldiphenylamines
JP2557898B2 (en) 1987-07-31 1996-11-27 株式会社東芝 Semiconductor device
US5137780A (en) * 1987-10-16 1992-08-11 The Curators Of The University Of Missouri Article having a composite insulative coating
US4921723A (en) * 1987-10-16 1990-05-01 The Curators Of The University Of Missouri Process for applying a composite insulative coating to a substrate
US5169494A (en) * 1989-03-27 1992-12-08 Matsushita Electric Industrial Co., Ltd. Fine pattern forming method
US5198153A (en) 1989-05-26 1993-03-30 International Business Machines Corporation Electrically conductive polymeric
US5110903A (en) * 1990-12-20 1992-05-05 Union Carbide Chemicals & Plastics Technology Corporation Process for the preparation of mixed parylene dimers free of alpha-halogens
US5153986A (en) * 1991-07-17 1992-10-13 International Business Machines Method for fabricating metal core layers for a multi-layer circuit board
GB9126677D0 (en) * 1991-12-16 1992-02-12 Johnson Matthey Plc Improvements in chemical compounds
US5443941A (en) 1993-03-01 1995-08-22 National Semiconductor Corporation Plasma polymer antireflective coating
JP3457372B2 (en) 1993-12-28 2003-10-14 日本写真印刷株式会社 Lens with aperture function and method of manufacturing the same
JPH07211616A (en) 1994-01-21 1995-08-11 Matsushita Electric Ind Co Ltd Formation of fine pattern
JPH0864492A (en) * 1994-08-18 1996-03-08 Sony Corp Antireeflection film and pattern forming method using this film
TW388083B (en) * 1995-02-20 2000-04-21 Hitachi Ltd Resist pattern-forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
US5545588A (en) 1995-05-05 1996-08-13 Taiwan Semiconductor Manufacturing Company Method of using disposable hard mask for gate critical dimension control
US5968324A (en) * 1995-12-05 1999-10-19 Applied Materials, Inc. Method and apparatus for depositing antireflective coating
KR100235235B1 (en) * 1997-01-10 1999-12-15 김환규 Organosilicone and the preparing method thereof
WO1998033077A2 (en) * 1997-01-27 1998-07-30 Haaland Peter D Coatings, methods and apparatus for reducing reflection from optical substrates
US6150010A (en) * 1997-03-04 2000-11-21 Texas Instruments Incorporated Integrated circuit insulator
US6198153B1 (en) * 1997-04-21 2001-03-06 Lsi Logic Corporation Capacitors with silicized polysilicon shielding in digital CMOS process
US6063547A (en) * 1998-06-11 2000-05-16 Chartered Semiconductor Manufacturing, Ltd. Physical vapor deposition poly-p-phenylene sulfide film as a bottom anti-reflective coating on polysilicon
US6300672B1 (en) * 1998-07-22 2001-10-09 Siemens Aktiengesellschaft Silicon oxynitride cap for fluorinated silicate glass film in intermetal dielectric semiconductor fabrication

Also Published As

Publication number Publication date
US20030031957A1 (en) 2003-02-13
KR100610406B1 (en) 2006-08-09
JP2003524210A (en) 2003-08-12
US20030049548A1 (en) 2003-03-13
CN1404584A (en) 2003-03-19
EP1269258A1 (en) 2003-01-02
US20030049566A1 (en) 2003-03-13
KR20030008209A (en) 2003-01-24
US6900000B2 (en) 2005-05-31
US6869747B2 (en) 2005-03-22
CA2400157A1 (en) 2001-08-30
JP3759456B2 (en) 2006-03-22
CN100451830C (en) 2009-01-14
TWI224150B (en) 2004-11-21
EP1269258A4 (en) 2010-03-10
WO2001063358A1 (en) 2001-08-30
EP1269258B1 (en) 2012-01-11

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