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AU2001232188A1 - An atmospheric pressure plasma system - Google Patents

An atmospheric pressure plasma system

Info

Publication number
AU2001232188A1
AU2001232188A1 AU2001232188A AU3218801A AU2001232188A1 AU 2001232188 A1 AU2001232188 A1 AU 2001232188A1 AU 2001232188 A AU2001232188 A AU 2001232188A AU 3218801 A AU3218801 A AU 3218801A AU 2001232188 A1 AU2001232188 A1 AU 2001232188A1
Authority
AU
Australia
Prior art keywords
gases
atmospheric pressure
enclosure housing
ambient
plasma region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001232188A
Inventor
Jules Braddell
Peter Dobbyn
Anthony Herbert
Fergal O'reilly
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Corning Ireland Ltd
Original Assignee
REILLY FERGAL O
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by REILLY FERGAL O filed Critical REILLY FERGAL O
Publication of AU2001232188A1 publication Critical patent/AU2001232188A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32825Working under atmospheric pressure or higher
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32743Means for moving the material to be treated for introducing the material into processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32788Means for moving the material to be treated for extracting the material from the process chamber

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)

Abstract

An atmospheric pressure plasma system (1) sharing electrodes (4) defining a plasma region (5) mounted in an enclosure housing (2). The enclosure housing has an open to atmosphere entry port assembly (10) and exit port assembly (11) for the continuous transfer of work-pieces through the plasma region (5). The embodiment illustrated is for precursor process gases having a relative density less than that of the ambient air so that the precursor gases rise in the enclosure housing (2) expelling the heavier ambient and exhaust gases. Where the gases have a relative density greater than ambient the port assemblies (10 and 11) are sited above the plasma region (5).
AU2001232188A 2000-02-11 2001-02-12 An atmospheric pressure plasma system Abandoned AU2001232188A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IE2000/0123 2000-02-11
IE20000123 2000-02-11
PCT/IE2001/000023 WO2001059809A1 (en) 2000-02-11 2001-02-12 An atmospheric pressure plasma system

Publications (1)

Publication Number Publication Date
AU2001232188A1 true AU2001232188A1 (en) 2001-08-20

Family

ID=11042563

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001232188A Abandoned AU2001232188A1 (en) 2000-02-11 2001-02-12 An atmospheric pressure plasma system

Country Status (11)

Country Link
US (1) US20030116281A1 (en)
EP (1) EP1259975B1 (en)
JP (1) JP2003523053A (en)
KR (1) KR100819352B1 (en)
CN (1) CN1233018C (en)
AT (1) ATE265089T1 (en)
AU (1) AU2001232188A1 (en)
DE (1) DE60102903T2 (en)
ES (1) ES2220711T3 (en)
IE (1) IES20010113A2 (en)
WO (1) WO2001059809A1 (en)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE257412T1 (en) 2000-10-04 2004-01-15 Dow Corning Ireland Ltd METHOD AND DEVICE FOR PRODUCING A COATING
TW200409669A (en) 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
GB0208261D0 (en) * 2002-04-10 2002-05-22 Dow Corning An atmospheric pressure plasma assembly
KR100415271B1 (en) * 2002-05-27 2004-01-16 주식회사 래디언테크 Cleaning apparatus using the atmospheric pressure plasma
WO2004035879A1 (en) * 2002-10-18 2004-04-29 Sumitomo Mitsubishi Silicon Corporation Method of measuring point defect distribution of silicon single crystal ingot
US7355184B2 (en) * 2003-04-07 2008-04-08 Canon Kabushiki Kaisha Radiation detecting apparatus and method for manufacturing the same
US8586149B2 (en) * 2003-06-18 2013-11-19 Ford Global Technologies, Llc Environmentally friendly reactive fixture to allow localized surface engineering for improved adhesion to coated and non-coated substrates
KR101009682B1 (en) * 2003-12-18 2011-01-19 엘지디스플레이 주식회사 Apparatus for Processing under Atmosphere Pressure Plasma
US8227051B1 (en) * 2004-06-24 2012-07-24 UT-Battle, LLC Apparatus and method for carbon fiber surface treatment
DE102004048411A1 (en) * 2004-10-01 2006-05-04 Institut für Niedertemperatur-Plasmaphysik e.V. Arrangement for surface processing of particles in a plasma zone at atmospheric pressure has plasma generator connected to transporting unit
DE102004048410A1 (en) * 2004-10-01 2006-05-04 Institut für Niedertemperatur-Plasmaphysik e.V. Set-up for surface treatment of bulk goods in plasma zone at atmospheric pressure, used in reactor technology, has conveyor base plate simultaneously as component of plasma producer and coated with oxide or glass layer
GB0509648D0 (en) 2005-05-12 2005-06-15 Dow Corning Ireland Ltd Plasma system to deposit adhesion primer layers
US7375039B2 (en) * 2005-05-24 2008-05-20 International Business Machines Corporation Local plasma processing
JP2006331763A (en) * 2005-05-25 2006-12-07 Ngk Insulators Ltd Plasma processing device and plasma processing method using the same
DE102005029360B4 (en) * 2005-06-24 2011-11-10 Softal Corona & Plasma Gmbh Two methods for continuous atmospheric pressure Plasma treatment of workpieces, in particular material plates or sheets
US7517561B2 (en) * 2005-09-21 2009-04-14 Ford Global Technologies, Llc Method of coating a substrate for adhesive bonding
US20070154650A1 (en) * 2005-12-30 2007-07-05 Atomic Energy Council - Institute Of Nuclear Energy Research Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure
DE102006003940A1 (en) * 2006-01-26 2007-08-02 Volkswagen Ag Bonding of seals onto structures (especially vehicle bodywork) involves pretreatment of the structure with a warm medium such as air or a plasma
WO2007128947A1 (en) * 2006-05-02 2007-11-15 Dow Corning Ireland Limited Fluid replacement system
KR101244674B1 (en) * 2006-05-02 2013-03-25 다우 코닝 아일랜드 리미티드 Web sealing device
US7744984B2 (en) * 2006-06-28 2010-06-29 Ford Global Technologies, Llc Method of treating substrates for bonding
US20090045168A1 (en) * 2007-08-17 2009-02-19 Jacob Hanson Surface Treater for Elongated Articles
US9217066B2 (en) * 2008-03-31 2015-12-22 Ford Global Technologies, Llc Structural polymer insert and method of making the same
US8778080B2 (en) * 2008-05-21 2014-07-15 Institute Of Nuclear Energy Research, Atomic Energy Council Apparatus for double-plasma graft polymerization at atmospheric pressure
DE102008042237B4 (en) * 2008-09-19 2010-07-15 Airbus Deutschland Gmbh Metallic coating
US20100151236A1 (en) * 2008-12-11 2010-06-17 Ford Global Technologies, Llc Surface treatment for polymeric part adhesion
DE102009000639A1 (en) * 2009-02-05 2010-08-12 Voith Patent Gmbh Method for coating a strip, in particular a papermachine fabric
US8749053B2 (en) 2009-06-23 2014-06-10 Intevac, Inc. Plasma grid implant system for use in solar cell fabrications
EP2326151A1 (en) 2009-11-24 2011-05-25 AGC Glass Europe Method and device for polarising a DBD electrode
KR20140110851A (en) 2011-11-08 2014-09-17 인테벡, 인코포레이티드 Substrate processing system and method
US8778462B2 (en) 2011-11-10 2014-07-15 E I Du Pont De Nemours And Company Method for producing metalized fibrous composite sheet with olefin coating
US8741393B2 (en) 2011-12-28 2014-06-03 E I Du Pont De Nemours And Company Method for producing metalized fibrous composite sheet with olefin coating
US10626546B2 (en) 2012-06-24 2020-04-21 Gates Corporation Carbon cord for reinforced rubber products and the products
CN104603345A (en) 2012-08-09 2015-05-06 纳幕尔杜邦公司 Improved barrier fabrics
DK2906739T3 (en) * 2012-10-09 2017-03-13 Europlasma Nv DEVICE AND PROCEDURE FOR APPLYING SURFACE COATINGS
CN103103493B (en) * 2012-11-07 2015-05-06 山东鑫汇铜材有限公司 Production device of graphene copper wire
WO2014100506A1 (en) 2012-12-19 2014-06-26 Intevac, Inc. Grid for plasma ion implant
CN103074596B (en) * 2012-12-25 2014-12-31 王奉瑾 CVD equipment adopting electromagnetic heating
US9435028B2 (en) * 2013-05-06 2016-09-06 Lotus Applied Technology, Llc Plasma generation for thin film deposition on flexible substrates
US9988536B2 (en) 2013-11-05 2018-06-05 E I Du Pont De Nemours And Company Compositions for surface treatments
CN103594320A (en) * 2013-11-27 2014-02-19 苏州市奥普斯等离子体科技有限公司 Surface plasma treatment device applied to normal pressure ecomaterial
WO2015095019A1 (en) 2013-12-17 2015-06-25 E. I. Du Pont De Nemours And Company Nonwoven fabric with low ice adhesion
WO2015171727A1 (en) 2014-05-07 2015-11-12 E. I. Du Pont De Nemours And Company Polyimide web separator for use in an electrochemical cell
US10399128B2 (en) * 2014-06-05 2019-09-03 Illinois Tool Works Inc. System and method for cleaning an object
US10613005B2 (en) * 2016-10-31 2020-04-07 Agilent Technologies, Inc. Deparaffinization of tissue by electric field generation and ionization
US10821464B2 (en) * 2017-06-19 2020-11-03 The Boeing Company Common feed system for surface treatment and adhesive application
US11525759B2 (en) 2018-04-24 2022-12-13 Agilent Technologies, Inc. Deparaffinization of tissue utilizing electric field
US11651942B2 (en) * 2019-12-18 2023-05-16 Ontos Equipment Systems, Inc. System and method for plasma head helium measurement
CN111299253B (en) * 2020-03-10 2022-02-22 北京烁科精微电子装备有限公司 Plasma cleaning device
CN115332035A (en) * 2022-07-04 2022-11-11 吉林农业科技学院 Plasma equipment for material treatment
KR102552049B1 (en) * 2022-12-02 2023-07-06 이상주 Vapor-phase synthesis production device using plasma

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3069283A (en) * 1959-02-02 1962-12-18 Radiation Res Corp Polymerizing method and apparatus for carrying out the same
JPS6011150B2 (en) * 1982-01-06 1985-03-23 株式会社山東鉄工所 Continuous low-temperature plasma treatment equipment for fabrics
US4501766A (en) * 1982-02-03 1985-02-26 Tokyo Shibaura Denki Kabushiki Kaisha Film depositing apparatus and a film depositing method
JPS5939649A (en) * 1982-08-30 1984-03-05 Shimadzu Corp Film band continuous type processing device
JP2811820B2 (en) * 1989-10-30 1998-10-15 株式会社ブリヂストン Continuous surface treatment method and apparatus for sheet material
JP3036181B2 (en) * 1991-11-27 2000-04-24 東レ株式会社 Method for producing high-strength polyvinylidene fluoride monofilament
WO1995008182A1 (en) * 1993-09-17 1995-03-23 Isis Innovation Limited Rf plasma reactor
US5472509A (en) * 1993-11-30 1995-12-05 Neomecs Incorporated Gas plasma apparatus with movable film liners
US5743966A (en) * 1996-05-31 1998-04-28 The Boc Group, Inc. Unwinding of plastic film in the presence of a plasma
GB2324196B (en) * 1997-04-09 2001-10-24 Aea Technology Plc Plasma processing
KR100257903B1 (en) * 1997-12-30 2000-08-01 윤종용 Plasma etching apparatus capable of in-situ monitoring, its in-situ monitoring method and in-situ cleaning method for removing residues in plasma etching chamber
JP3335304B2 (en) * 1998-01-28 2002-10-15 宇部興産株式会社 Method for producing surface-modified polyimide film
FR2774400B1 (en) * 1998-02-04 2000-04-28 Physiques Et Chimiques ELECTRIC DEVICE FOR DEGREASING, STRIPPING OR PLASMACHIMIC PASSIVATION OF METALS
JP2000026632A (en) * 1998-07-13 2000-01-25 Sekisui Chem Co Ltd Thin film formation on film substrate using normal pressure plasma
JP2000063546A (en) * 1998-08-24 2000-02-29 Toppan Printing Co Ltd Surface-treating apparatus

Also Published As

Publication number Publication date
IES20010113A2 (en) 2001-09-19
CN1233018C (en) 2005-12-21
EP1259975B1 (en) 2004-04-21
ATE265089T1 (en) 2004-05-15
DE60102903D1 (en) 2004-05-27
KR20020092952A (en) 2002-12-12
CN1404619A (en) 2003-03-19
US20030116281A1 (en) 2003-06-26
WO2001059809A1 (en) 2001-08-16
DE60102903T2 (en) 2005-05-12
KR100819352B1 (en) 2008-04-04
EP1259975A1 (en) 2002-11-27
ES2220711T3 (en) 2004-12-16
JP2003523053A (en) 2003-07-29

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