AU2001232188A1 - An atmospheric pressure plasma system - Google Patents
An atmospheric pressure plasma systemInfo
- Publication number
- AU2001232188A1 AU2001232188A1 AU2001232188A AU3218801A AU2001232188A1 AU 2001232188 A1 AU2001232188 A1 AU 2001232188A1 AU 2001232188 A AU2001232188 A AU 2001232188A AU 3218801 A AU3218801 A AU 3218801A AU 2001232188 A1 AU2001232188 A1 AU 2001232188A1
- Authority
- AU
- Australia
- Prior art keywords
- gases
- atmospheric pressure
- enclosure housing
- ambient
- plasma region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000007789 gas Substances 0.000 abstract 4
- 239000002243 precursor Substances 0.000 abstract 2
- 239000012080 ambient air Substances 0.000 abstract 1
- 230000000712 assembly Effects 0.000 abstract 1
- 238000000429 assembly Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32825—Working under atmospheric pressure or higher
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32788—Means for moving the material to be treated for extracting the material from the process chamber
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Abstract
An atmospheric pressure plasma system (1) sharing electrodes (4) defining a plasma region (5) mounted in an enclosure housing (2). The enclosure housing has an open to atmosphere entry port assembly (10) and exit port assembly (11) for the continuous transfer of work-pieces through the plasma region (5). The embodiment illustrated is for precursor process gases having a relative density less than that of the ambient air so that the precursor gases rise in the enclosure housing (2) expelling the heavier ambient and exhaust gases. Where the gases have a relative density greater than ambient the port assemblies (10 and 11) are sited above the plasma region (5).
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IE2000/0123 | 2000-02-11 | ||
IE20000123 | 2000-02-11 | ||
PCT/IE2001/000023 WO2001059809A1 (en) | 2000-02-11 | 2001-02-12 | An atmospheric pressure plasma system |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001232188A1 true AU2001232188A1 (en) | 2001-08-20 |
Family
ID=11042563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001232188A Abandoned AU2001232188A1 (en) | 2000-02-11 | 2001-02-12 | An atmospheric pressure plasma system |
Country Status (11)
Country | Link |
---|---|
US (1) | US20030116281A1 (en) |
EP (1) | EP1259975B1 (en) |
JP (1) | JP2003523053A (en) |
KR (1) | KR100819352B1 (en) |
CN (1) | CN1233018C (en) |
AT (1) | ATE265089T1 (en) |
AU (1) | AU2001232188A1 (en) |
DE (1) | DE60102903T2 (en) |
ES (1) | ES2220711T3 (en) |
IE (1) | IES20010113A2 (en) |
WO (1) | WO2001059809A1 (en) |
Families Citing this family (51)
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ATE257412T1 (en) | 2000-10-04 | 2004-01-15 | Dow Corning Ireland Ltd | METHOD AND DEVICE FOR PRODUCING A COATING |
TW200409669A (en) | 2002-04-10 | 2004-06-16 | Dow Corning Ireland Ltd | Protective coating composition |
GB0208261D0 (en) * | 2002-04-10 | 2002-05-22 | Dow Corning | An atmospheric pressure plasma assembly |
KR100415271B1 (en) * | 2002-05-27 | 2004-01-16 | 주식회사 래디언테크 | Cleaning apparatus using the atmospheric pressure plasma |
WO2004035879A1 (en) * | 2002-10-18 | 2004-04-29 | Sumitomo Mitsubishi Silicon Corporation | Method of measuring point defect distribution of silicon single crystal ingot |
US7355184B2 (en) * | 2003-04-07 | 2008-04-08 | Canon Kabushiki Kaisha | Radiation detecting apparatus and method for manufacturing the same |
US8586149B2 (en) * | 2003-06-18 | 2013-11-19 | Ford Global Technologies, Llc | Environmentally friendly reactive fixture to allow localized surface engineering for improved adhesion to coated and non-coated substrates |
KR101009682B1 (en) * | 2003-12-18 | 2011-01-19 | 엘지디스플레이 주식회사 | Apparatus for Processing under Atmosphere Pressure Plasma |
US8227051B1 (en) * | 2004-06-24 | 2012-07-24 | UT-Battle, LLC | Apparatus and method for carbon fiber surface treatment |
DE102004048411A1 (en) * | 2004-10-01 | 2006-05-04 | Institut für Niedertemperatur-Plasmaphysik e.V. | Arrangement for surface processing of particles in a plasma zone at atmospheric pressure has plasma generator connected to transporting unit |
DE102004048410A1 (en) * | 2004-10-01 | 2006-05-04 | Institut für Niedertemperatur-Plasmaphysik e.V. | Set-up for surface treatment of bulk goods in plasma zone at atmospheric pressure, used in reactor technology, has conveyor base plate simultaneously as component of plasma producer and coated with oxide or glass layer |
GB0509648D0 (en) | 2005-05-12 | 2005-06-15 | Dow Corning Ireland Ltd | Plasma system to deposit adhesion primer layers |
US7375039B2 (en) * | 2005-05-24 | 2008-05-20 | International Business Machines Corporation | Local plasma processing |
JP2006331763A (en) * | 2005-05-25 | 2006-12-07 | Ngk Insulators Ltd | Plasma processing device and plasma processing method using the same |
DE102005029360B4 (en) * | 2005-06-24 | 2011-11-10 | Softal Corona & Plasma Gmbh | Two methods for continuous atmospheric pressure Plasma treatment of workpieces, in particular material plates or sheets |
US7517561B2 (en) * | 2005-09-21 | 2009-04-14 | Ford Global Technologies, Llc | Method of coating a substrate for adhesive bonding |
US20070154650A1 (en) * | 2005-12-30 | 2007-07-05 | Atomic Energy Council - Institute Of Nuclear Energy Research | Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure |
DE102006003940A1 (en) * | 2006-01-26 | 2007-08-02 | Volkswagen Ag | Bonding of seals onto structures (especially vehicle bodywork) involves pretreatment of the structure with a warm medium such as air or a plasma |
WO2007128947A1 (en) * | 2006-05-02 | 2007-11-15 | Dow Corning Ireland Limited | Fluid replacement system |
KR101244674B1 (en) * | 2006-05-02 | 2013-03-25 | 다우 코닝 아일랜드 리미티드 | Web sealing device |
US7744984B2 (en) * | 2006-06-28 | 2010-06-29 | Ford Global Technologies, Llc | Method of treating substrates for bonding |
US20090045168A1 (en) * | 2007-08-17 | 2009-02-19 | Jacob Hanson | Surface Treater for Elongated Articles |
US9217066B2 (en) * | 2008-03-31 | 2015-12-22 | Ford Global Technologies, Llc | Structural polymer insert and method of making the same |
US8778080B2 (en) * | 2008-05-21 | 2014-07-15 | Institute Of Nuclear Energy Research, Atomic Energy Council | Apparatus for double-plasma graft polymerization at atmospheric pressure |
DE102008042237B4 (en) * | 2008-09-19 | 2010-07-15 | Airbus Deutschland Gmbh | Metallic coating |
US20100151236A1 (en) * | 2008-12-11 | 2010-06-17 | Ford Global Technologies, Llc | Surface treatment for polymeric part adhesion |
DE102009000639A1 (en) * | 2009-02-05 | 2010-08-12 | Voith Patent Gmbh | Method for coating a strip, in particular a papermachine fabric |
US8749053B2 (en) | 2009-06-23 | 2014-06-10 | Intevac, Inc. | Plasma grid implant system for use in solar cell fabrications |
EP2326151A1 (en) | 2009-11-24 | 2011-05-25 | AGC Glass Europe | Method and device for polarising a DBD electrode |
KR20140110851A (en) | 2011-11-08 | 2014-09-17 | 인테벡, 인코포레이티드 | Substrate processing system and method |
US8778462B2 (en) | 2011-11-10 | 2014-07-15 | E I Du Pont De Nemours And Company | Method for producing metalized fibrous composite sheet with olefin coating |
US8741393B2 (en) | 2011-12-28 | 2014-06-03 | E I Du Pont De Nemours And Company | Method for producing metalized fibrous composite sheet with olefin coating |
US10626546B2 (en) | 2012-06-24 | 2020-04-21 | Gates Corporation | Carbon cord for reinforced rubber products and the products |
CN104603345A (en) | 2012-08-09 | 2015-05-06 | 纳幕尔杜邦公司 | Improved barrier fabrics |
DK2906739T3 (en) * | 2012-10-09 | 2017-03-13 | Europlasma Nv | DEVICE AND PROCEDURE FOR APPLYING SURFACE COATINGS |
CN103103493B (en) * | 2012-11-07 | 2015-05-06 | 山东鑫汇铜材有限公司 | Production device of graphene copper wire |
WO2014100506A1 (en) | 2012-12-19 | 2014-06-26 | Intevac, Inc. | Grid for plasma ion implant |
CN103074596B (en) * | 2012-12-25 | 2014-12-31 | 王奉瑾 | CVD equipment adopting electromagnetic heating |
US9435028B2 (en) * | 2013-05-06 | 2016-09-06 | Lotus Applied Technology, Llc | Plasma generation for thin film deposition on flexible substrates |
US9988536B2 (en) | 2013-11-05 | 2018-06-05 | E I Du Pont De Nemours And Company | Compositions for surface treatments |
CN103594320A (en) * | 2013-11-27 | 2014-02-19 | 苏州市奥普斯等离子体科技有限公司 | Surface plasma treatment device applied to normal pressure ecomaterial |
WO2015095019A1 (en) | 2013-12-17 | 2015-06-25 | E. I. Du Pont De Nemours And Company | Nonwoven fabric with low ice adhesion |
WO2015171727A1 (en) | 2014-05-07 | 2015-11-12 | E. I. Du Pont De Nemours And Company | Polyimide web separator for use in an electrochemical cell |
US10399128B2 (en) * | 2014-06-05 | 2019-09-03 | Illinois Tool Works Inc. | System and method for cleaning an object |
US10613005B2 (en) * | 2016-10-31 | 2020-04-07 | Agilent Technologies, Inc. | Deparaffinization of tissue by electric field generation and ionization |
US10821464B2 (en) * | 2017-06-19 | 2020-11-03 | The Boeing Company | Common feed system for surface treatment and adhesive application |
US11525759B2 (en) | 2018-04-24 | 2022-12-13 | Agilent Technologies, Inc. | Deparaffinization of tissue utilizing electric field |
US11651942B2 (en) * | 2019-12-18 | 2023-05-16 | Ontos Equipment Systems, Inc. | System and method for plasma head helium measurement |
CN111299253B (en) * | 2020-03-10 | 2022-02-22 | 北京烁科精微电子装备有限公司 | Plasma cleaning device |
CN115332035A (en) * | 2022-07-04 | 2022-11-11 | 吉林农业科技学院 | Plasma equipment for material treatment |
KR102552049B1 (en) * | 2022-12-02 | 2023-07-06 | 이상주 | Vapor-phase synthesis production device using plasma |
Family Cites Families (15)
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US3069283A (en) * | 1959-02-02 | 1962-12-18 | Radiation Res Corp | Polymerizing method and apparatus for carrying out the same |
JPS6011150B2 (en) * | 1982-01-06 | 1985-03-23 | 株式会社山東鉄工所 | Continuous low-temperature plasma treatment equipment for fabrics |
US4501766A (en) * | 1982-02-03 | 1985-02-26 | Tokyo Shibaura Denki Kabushiki Kaisha | Film depositing apparatus and a film depositing method |
JPS5939649A (en) * | 1982-08-30 | 1984-03-05 | Shimadzu Corp | Film band continuous type processing device |
JP2811820B2 (en) * | 1989-10-30 | 1998-10-15 | 株式会社ブリヂストン | Continuous surface treatment method and apparatus for sheet material |
JP3036181B2 (en) * | 1991-11-27 | 2000-04-24 | 東レ株式会社 | Method for producing high-strength polyvinylidene fluoride monofilament |
WO1995008182A1 (en) * | 1993-09-17 | 1995-03-23 | Isis Innovation Limited | Rf plasma reactor |
US5472509A (en) * | 1993-11-30 | 1995-12-05 | Neomecs Incorporated | Gas plasma apparatus with movable film liners |
US5743966A (en) * | 1996-05-31 | 1998-04-28 | The Boc Group, Inc. | Unwinding of plastic film in the presence of a plasma |
GB2324196B (en) * | 1997-04-09 | 2001-10-24 | Aea Technology Plc | Plasma processing |
KR100257903B1 (en) * | 1997-12-30 | 2000-08-01 | 윤종용 | Plasma etching apparatus capable of in-situ monitoring, its in-situ monitoring method and in-situ cleaning method for removing residues in plasma etching chamber |
JP3335304B2 (en) * | 1998-01-28 | 2002-10-15 | 宇部興産株式会社 | Method for producing surface-modified polyimide film |
FR2774400B1 (en) * | 1998-02-04 | 2000-04-28 | Physiques Et Chimiques | ELECTRIC DEVICE FOR DEGREASING, STRIPPING OR PLASMACHIMIC PASSIVATION OF METALS |
JP2000026632A (en) * | 1998-07-13 | 2000-01-25 | Sekisui Chem Co Ltd | Thin film formation on film substrate using normal pressure plasma |
JP2000063546A (en) * | 1998-08-24 | 2000-02-29 | Toppan Printing Co Ltd | Surface-treating apparatus |
-
2001
- 2001-02-12 AU AU2001232188A patent/AU2001232188A1/en not_active Abandoned
- 2001-02-12 AT AT01904276T patent/ATE265089T1/en not_active IP Right Cessation
- 2001-02-12 US US10/204,894 patent/US20030116281A1/en not_active Abandoned
- 2001-02-12 ES ES01904276T patent/ES2220711T3/en not_active Expired - Lifetime
- 2001-02-12 DE DE60102903T patent/DE60102903T2/en not_active Expired - Lifetime
- 2001-02-12 KR KR1020027010369A patent/KR100819352B1/en not_active IP Right Cessation
- 2001-02-12 EP EP01904276A patent/EP1259975B1/en not_active Expired - Lifetime
- 2001-02-12 IE IE20010113A patent/IES20010113A2/en not_active IP Right Cessation
- 2001-02-12 CN CNB018047351A patent/CN1233018C/en not_active Expired - Fee Related
- 2001-02-12 JP JP2001559037A patent/JP2003523053A/en not_active Ceased
- 2001-02-12 WO PCT/IE2001/000023 patent/WO2001059809A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
IES20010113A2 (en) | 2001-09-19 |
CN1233018C (en) | 2005-12-21 |
EP1259975B1 (en) | 2004-04-21 |
ATE265089T1 (en) | 2004-05-15 |
DE60102903D1 (en) | 2004-05-27 |
KR20020092952A (en) | 2002-12-12 |
CN1404619A (en) | 2003-03-19 |
US20030116281A1 (en) | 2003-06-26 |
WO2001059809A1 (en) | 2001-08-16 |
DE60102903T2 (en) | 2005-05-12 |
KR100819352B1 (en) | 2008-04-04 |
EP1259975A1 (en) | 2002-11-27 |
ES2220711T3 (en) | 2004-12-16 |
JP2003523053A (en) | 2003-07-29 |
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