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AU2001228987A1 - A mold for nano imprinting - Google Patents

A mold for nano imprinting

Info

Publication number
AU2001228987A1
AU2001228987A1 AU2001228987A AU2898701A AU2001228987A1 AU 2001228987 A1 AU2001228987 A1 AU 2001228987A1 AU 2001228987 A AU2001228987 A AU 2001228987A AU 2898701 A AU2898701 A AU 2898701A AU 2001228987 A1 AU2001228987 A1 AU 2001228987A1
Authority
AU
Australia
Prior art keywords
mold
layer
nano imprinting
reaction
nano
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001228987A
Inventor
Babak Heidari
Torbjorn Ling
Lars Montelius
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obducat AB
Original Assignee
Obducat AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0000173A external-priority patent/SE517093C2/en
Application filed by Obducat AB filed Critical Obducat AB
Publication of AU2001228987A1 publication Critical patent/AU2001228987A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.
AU2001228987A 2000-01-21 2001-01-19 A mold for nano imprinting Abandoned AU2001228987A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US17728400P 2000-01-21 2000-01-21
US60177284 2000-01-21
SE0000173 2000-01-21
SE0000173A SE517093C2 (en) 2000-01-21 2000-01-21 Metal mold for use in nano-imprint lithography, comprises monomolecular non-sticking layer obtained by subjecting mold to reaction with fluoroalkyl compound having mercapto group
PCT/SE2001/000087 WO2001053889A1 (en) 2000-01-21 2001-01-19 A mold for nano imprinting

Publications (1)

Publication Number Publication Date
AU2001228987A1 true AU2001228987A1 (en) 2001-07-31

Family

ID=26654958

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001228987A Abandoned AU2001228987A1 (en) 2000-01-21 2001-01-19 A mold for nano imprinting

Country Status (6)

Country Link
US (1) US6923930B2 (en)
EP (1) EP1257878B1 (en)
AT (1) ATE332517T1 (en)
AU (1) AU2001228987A1 (en)
DE (1) DE60121302T2 (en)
WO (1) WO2001053889A1 (en)

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AU2001277907A1 (en) 2000-07-17 2002-01-30 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
JP2004523906A (en) 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム Templates for room-temperature and low-pressure micro and nano-transfer lithography
SE519573C2 (en) * 2001-07-05 2003-03-11 Obducat Ab Stamp with anti-adhesive layer as well as ways of making and ways to repair such a stamp
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
EP1513688B1 (en) * 2002-06-20 2006-11-29 Obducat AB Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
CN100473535C (en) * 2002-11-21 2009-04-01 科学和工业研究协会 Colored nanolithography on glass and plastic substrates
US8268446B2 (en) * 2003-09-23 2012-09-18 The University Of North Carolina At Chapel Hill Photocurable perfluoropolyethers for use as novel materials in microfluidic devices
ATE501464T1 (en) * 2003-11-21 2011-03-15 Obducat Ab NANOIMPRINT LITHOGRAPHY IN A MULTI-LAYER SYSTEM
JP6067954B2 (en) * 2003-12-19 2017-01-25 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルＴｈｅ Ｕｎｉｖｅｒｓｉｔｙ Ｏｆ Ｎｏｒｔｈ Ｃａｒｏｌｉｎａ Ａｔ Ｃｈａｐｅｌ Ｈｉｌｌ Nano-sized article and nano-sized article manufactured by a method for producing a separation structure using soft lithography or imprint lithography
US9040090B2 (en) * 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
KR100595515B1 (en) * 2003-12-31 2006-07-03 엘지전자 주식회사 Micro-structure patterned mold and a method for coating monolayer release therein
DE102004002851A1 (en) * 2004-01-19 2005-08-11 Maschinenfabrik Rieter Ag Fleece guiding device of a combing machine
US20070275193A1 (en) * 2004-02-13 2007-11-29 Desimone Joseph M Functional Materials and Novel Methods for the Fabrication of Microfluidic Devices
WO2007021762A2 (en) 2005-08-09 2007-02-22 The University Of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
WO2005119360A1 (en) 2004-05-28 2005-12-15 Obducat Ab Modified metal mold for use in imprinting processes
EP1600811A1 (en) * 2004-05-28 2005-11-30 Obducat AB Modified metal molds for use in imprinting processes
US20050272599A1 (en) * 2004-06-04 2005-12-08 Kenneth Kramer Mold release layer
JP2005353725A (en) * 2004-06-09 2005-12-22 Shinko Electric Ind Co Ltd Method for forming active element on substrate, and substrate
TWI240328B (en) * 2004-08-27 2005-09-21 Univ Nat Cheng Kung Pretreatment process of substrate in micro-nano imprinting technology
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
WO2006084202A2 (en) * 2005-02-03 2006-08-10 The University Of North Carolina At Chapel Hill Low surface energy polymeric material for use in liquid crystal displays
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7767129B2 (en) * 2005-05-11 2010-08-03 Micron Technology, Inc. Imprint templates for imprint lithography, and methods of patterning a plurality of substrates
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
WO2007133235A2 (en) * 2005-08-08 2007-11-22 Liquidia Technologies, Inc. Micro and nano-structure metrology
KR100693992B1 (en) 2005-08-20 2007-03-12 이헌 Nickel stamp structure for providing easy formation of self-assembled monolayer as anti-stiction layer, and manufacturing method thereof
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US7388661B2 (en) * 2006-10-20 2008-06-17 Hewlett-Packard Development Company, L.P. Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS)
US7391511B1 (en) 2007-01-31 2008-06-24 Hewlett-Packard Development Company, L.P. Raman signal-enhancing structures and Raman spectroscopy systems including such structures
WO2008118861A2 (en) * 2007-03-23 2008-10-02 The University Of North Carolina At Chapel Hill Discrete size and shape specific organic nanoparticles designed to elicit an immune response
WO2008149544A1 (en) * 2007-06-04 2008-12-11 Scivax Corporation Form, microprocessed article, and their manufacturing methods
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
JP5871907B2 (en) 2010-04-28 2016-03-01 キンバリー クラーク ワールドワイド インコーポレイテッド Nanopatterned medical device with enhanced cell-cell interaction
US8945688B2 (en) 2011-01-03 2015-02-03 General Electric Company Process of forming a material having nano-particles and a material having nano-particles
EP2771058B1 (en) 2011-10-27 2019-05-01 Sorrento Therapeutics, Inc. Implantable devices for delivery of bioactive agents

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JPH0580530A (en) 1991-09-24 1993-04-02 Hitachi Ltd Production of thin film pattern
US5358604A (en) * 1992-09-29 1994-10-25 Microelectronics And Computer Technology Corp. Method for producing conductive patterns
US5512131A (en) 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
DE19815130A1 (en) 1998-04-03 1999-10-14 Bosch Gmbh Robert Electroformed metal stamp, for defining nanostructures, is produced
US6656398B2 (en) * 2001-06-19 2003-12-02 Corning Incorporated Process of making a pattern in a film
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique
US6829988B2 (en) * 2003-05-16 2004-12-14 Suss Microtec, Inc. Nanoimprinting apparatus and method

Also Published As

Publication number Publication date
EP1257878A1 (en) 2002-11-20
WO2001053889A1 (en) 2001-07-26
DE60121302D1 (en) 2006-08-17
DE60121302T2 (en) 2007-06-28
US6923930B2 (en) 2005-08-02
US20030127580A1 (en) 2003-07-10
ATE332517T1 (en) 2006-07-15
EP1257878B1 (en) 2006-07-05

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