AU2001286860A1 - Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization - Google Patents
Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerizationInfo
- Publication number
- AU2001286860A1 AU2001286860A1 AU2001286860A AU8686001A AU2001286860A1 AU 2001286860 A1 AU2001286860 A1 AU 2001286860A1 AU 2001286860 A AU2001286860 A AU 2001286860A AU 8686001 A AU8686001 A AU 8686001A AU 2001286860 A1 AU2001286860 A1 AU 2001286860A1
- Authority
- AU
- Australia
- Prior art keywords
- cationic polymerization
- storage medium
- oligomer
- polyfunctional epoxy
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000178 monomer Substances 0.000 title abstract 4
- 238000010538 cationic polymerization reaction Methods 0.000 title abstract 3
- 239000004593 Epoxy Substances 0.000 title abstract 2
- 239000002253 acid Substances 0.000 abstract 3
- 150000002118 epoxides Chemical class 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Holo Graphy (AREA)
- Epoxy Resins (AREA)
Abstract
Disclosed is a holographic recording medium. The novel holographic recording mediums disclosed herein comprises: a) at least one polyfunctional epoxide monomer or oligomer which undergoes acid initiated cationic polymerization. Each epoxide in the monomer or oligomer is linked by group comprising a siloxane to a silicon atom and each monomer or oligomer has an epoxy equivalent weight of greater than about 300 grams/mole epoxide; b) a binder which is capable of supporting cationic polymerization; c) an acid generator capable of producing an acid upon exposure to actinic radiation; and optionally d) a sensitizer.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22812100P | 2000-08-28 | 2000-08-28 | |
US60/228,121 | 2000-08-28 | ||
PCT/US2001/026828 WO2002019040A2 (en) | 2000-08-28 | 2001-08-28 | Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001286860A1 true AU2001286860A1 (en) | 2002-03-13 |
Family
ID=22855887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001286860A Abandoned AU2001286860A1 (en) | 2000-08-28 | 2001-08-28 | Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
Country Status (10)
Country | Link |
---|---|
US (4) | US6784300B2 (en) |
EP (1) | EP1317498B1 (en) |
JP (1) | JP2004507513A (en) |
KR (1) | KR100749304B1 (en) |
AT (1) | ATE328939T1 (en) |
AU (1) | AU2001286860A1 (en) |
CA (1) | CA2424366A1 (en) |
DE (1) | DE60120432T2 (en) |
TW (1) | TWI251000B (en) |
WO (1) | WO2002019040A2 (en) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ATE300757T1 (en) * | 2000-05-23 | 2005-08-15 | Aprilis Inc | DATA STORAGE MEDIUM CONTAINING A COLLOIDAL METAL AND METHOD FOR PRODUCING |
AU2001286860A1 (en) * | 2000-08-28 | 2002-03-13 | Aprilis, Inc. | Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
US20060128822A1 (en) * | 2002-07-30 | 2006-06-15 | Toagosei Co., Ltd. | Composition for holography, method of curing the same, and cured article |
WO2004038515A2 (en) | 2002-10-22 | 2004-05-06 | Zebra Imaging, Inc. | Active digital hologram display |
WO2004059389A2 (en) | 2002-12-23 | 2004-07-15 | Aprilis, Inc. | Sensitizer dyes for photoacid generating systems |
US20050187308A1 (en) * | 2004-02-20 | 2005-08-25 | Korea Advanced Institute Of Science And Technology | Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same |
US20070260089A1 (en) * | 2004-03-26 | 2007-11-08 | Albemarle Corporation | Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof |
JP4629367B2 (en) * | 2004-05-31 | 2011-02-09 | 東レ・ダウコーニング株式会社 | Active energy ray-curable organopolysiloxane resin composition, optical transmission member and method for producing the same |
US7122290B2 (en) * | 2004-06-15 | 2006-10-17 | General Electric Company | Holographic storage medium |
US7897296B2 (en) | 2004-09-30 | 2011-03-01 | General Electric Company | Method for holographic storage |
US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
US20060199081A1 (en) * | 2005-03-04 | 2006-09-07 | General Electric Company | Holographic storage medium, article and method |
US8034514B2 (en) * | 2005-03-08 | 2011-10-11 | Nippon Steel Chemical Co., Ltd. | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same |
US20070092804A1 (en) * | 2005-10-18 | 2007-04-26 | Kolb Eric S | Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
US20070167407A1 (en) * | 2005-12-20 | 2007-07-19 | Albemarle Corporation | Quaternary ammonium borate compositions and substrate preservative solutions containing them |
US7964693B2 (en) * | 2005-12-29 | 2011-06-21 | The University Of Akron | Photocurable polymers for ophthalmic applications |
US8163443B2 (en) * | 2006-03-09 | 2012-04-24 | Nippon Steel Chemical Co., Ltd. | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same |
WO2007120628A2 (en) * | 2006-04-11 | 2007-10-25 | Dow Corning Corporation | A composition including a siloxane and a method of forming the same |
US20070248890A1 (en) * | 2006-04-20 | 2007-10-25 | Inphase Technologies, Inc. | Index Contrasting-Photoactive Polymerizable Materials, and Articles and Methods Using Same |
JP2008195616A (en) | 2007-02-08 | 2008-08-28 | Fujifilm Corp | Polymerizable compound, optical recording composition, holographic recording medium and information-recording method |
JP5495238B2 (en) | 2007-04-11 | 2014-05-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | Advantageous recording medium for holographic applications |
JP2010202801A (en) * | 2009-03-04 | 2010-09-16 | Nitto Denko Corp | Composition for thermosetting silicone resin |
WO2010107784A1 (en) | 2009-03-16 | 2010-09-23 | Stx Aprilis, Inc. | Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths |
US8323854B2 (en) * | 2009-04-23 | 2012-12-04 | Akonia Holographics, Llc | Photopolymer media with enhanced dynamic range |
JP2011132208A (en) * | 2009-11-25 | 2011-07-07 | Dainichiseika Color & Chem Mfg Co Ltd | Five-membered cyclocarbonate polysiloxane compound, and method for producing the same |
CN102666655B (en) | 2009-11-25 | 2014-07-09 | 大日精化工业株式会社 | Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same and the preparation thereof |
CN102666654B (en) | 2009-11-26 | 2014-05-28 | 大日精化工业株式会社 | Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same |
GB2476275A (en) | 2009-12-17 | 2011-06-22 | Dublin Inst Of Technology | Photosensitive holographic recording medium comprising glycerol |
US10066048B2 (en) | 2010-06-24 | 2018-09-04 | Dainichiseika Color & Chemicals Mfg. Co., Ltd. | Self-crosslinkable polyhydroxy polyurethane resin, resinaceous material that contains the resin, process for production of the resin, and imitation leather, surfacing material and weatherstrip material, using the resin |
CN103270071B (en) | 2010-08-26 | 2014-11-26 | 大日精化工业株式会社 | Self-crosslinking polysiloxane-odified polyhydroxy polyurethane resin, resin material containing same, method for producing same, artificial leather comprising same, and thermoplastic polyolefin skin material comprising same |
US9359719B2 (en) | 2011-04-04 | 2016-06-07 | Dainichiseika Color & Chemicals Mfg. Co., Ltd. | Self-crosslinkable polysiloxane-modified polyhydroxy polyurethane resin, process for producing said resin, resin material comprising said resin, and artificial leather produced utilizing said resin |
EP3153516A4 (en) | 2014-05-30 | 2018-03-07 | Dow Corning Toray Co., Ltd. | Organic silicon compound, curable silicone composition, and semiconductor device |
US10150842B2 (en) * | 2014-12-19 | 2018-12-11 | Dow Silicones Corporation | Method of preparing condensation cross-linked particles |
Family Cites Families (19)
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BE655303A (en) * | 1963-11-12 | 1965-03-01 | ||
JPS6017377B2 (en) * | 1979-07-31 | 1985-05-02 | 信越化学工業株式会社 | Method for producing polymerizable organopolysiloxane |
US5037861A (en) | 1989-08-09 | 1991-08-06 | General Electric Company | Novel highly reactive silicon-containing epoxides |
US5075154A (en) * | 1990-03-23 | 1991-12-24 | General Electric Company | UV-curable silphenylene-containing epoxy functional silicones |
DE4023556A1 (en) * | 1990-07-25 | 1992-01-30 | Goldschmidt Ag Th | ORGANOPOLYSILOXANES HAVING CURABLE EPOXY GROUPS, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE AS CURABLE COATING AGENTS WITH ABHAESIVE PROPERTIES |
JP3015139B2 (en) * | 1991-04-23 | 2000-03-06 | 東レ・ダウコーニング・シリコーン株式会社 | Organopolysiloxane and method for producing the same |
TW268969B (en) * | 1992-10-02 | 1996-01-21 | Minnesota Mining & Mfg | |
US5484950A (en) | 1992-12-21 | 1996-01-16 | Polyset Company, Inc. | Process for selective monoaddition to silanes containing two silicon-hydrogen bonds and products thereof |
US5292827A (en) * | 1993-02-25 | 1994-03-08 | General Electric Company | Epoxy-capped branched silicones and copolymers thereof |
JP3532675B2 (en) * | 1994-10-03 | 2004-05-31 | 日本ペイント株式会社 | Photosensitive composition for volume hologram recording, recording medium using the same, and method for forming volume hologram |
DE69616813T2 (en) | 1995-10-06 | 2002-07-18 | Polaroid Corp., Cambridge | HALOGRAPHIC RECORDING MATERIAL AND METHOD |
US5863970A (en) * | 1995-12-06 | 1999-01-26 | Polyset Company, Inc. | Epoxy resin composition with cycloaliphatic epoxy-functional siloxane |
US5874187A (en) | 1996-08-15 | 1999-02-23 | Lucent Technologies Incorporated | Photo recording medium |
DE19648283A1 (en) | 1996-11-21 | 1998-05-28 | Thera Ges Fuer Patente | Polymerizable compositions based on epoxides |
US20030157414A1 (en) * | 1997-11-13 | 2003-08-21 | Pradeep K. Dhal | Holographic medium and process for use thereof |
US6391999B1 (en) * | 1998-02-06 | 2002-05-21 | Rensselaer Polytechnic Institute | Epoxy alkoxy siloxane oligomers |
ATE300757T1 (en) * | 2000-05-23 | 2005-08-15 | Aprilis Inc | DATA STORAGE MEDIUM CONTAINING A COLLOIDAL METAL AND METHOD FOR PRODUCING |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
AU2001286860A1 (en) | 2000-08-28 | 2002-03-13 | Aprilis, Inc. | Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
-
2001
- 2001-08-28 AU AU2001286860A patent/AU2001286860A1/en not_active Abandoned
- 2001-08-28 DE DE60120432T patent/DE60120432T2/en not_active Expired - Lifetime
- 2001-08-28 EP EP01966336A patent/EP1317498B1/en not_active Expired - Lifetime
- 2001-08-28 AT AT01966336T patent/ATE328939T1/en not_active IP Right Cessation
- 2001-08-28 WO PCT/US2001/026828 patent/WO2002019040A2/en active IP Right Grant
- 2001-08-28 KR KR1020037003021A patent/KR100749304B1/en not_active IP Right Cessation
- 2001-08-28 CA CA002424366A patent/CA2424366A1/en not_active Abandoned
- 2001-08-28 US US09/941,166 patent/US6784300B2/en not_active Expired - Fee Related
- 2001-08-28 JP JP2002523098A patent/JP2004507513A/en active Pending
- 2001-08-28 TW TW090121147A patent/TWI251000B/en not_active IP Right Cessation
-
2004
- 2004-07-13 US US10/890,425 patent/US7070886B2/en not_active Expired - Fee Related
-
2006
- 2006-03-20 US US11/385,979 patent/US7332249B2/en not_active Expired - Fee Related
-
2007
- 2007-12-27 US US12/005,652 patent/US20100280260A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2002019040A2 (en) | 2002-03-07 |
ATE328939T1 (en) | 2006-06-15 |
DE60120432D1 (en) | 2006-07-20 |
KR20030045790A (en) | 2003-06-11 |
TWI251000B (en) | 2006-03-11 |
US7332249B2 (en) | 2008-02-19 |
WO2002019040A9 (en) | 2002-07-25 |
DE60120432T2 (en) | 2007-01-04 |
KR100749304B1 (en) | 2007-08-14 |
CA2424366A1 (en) | 2002-03-07 |
US6784300B2 (en) | 2004-08-31 |
US7070886B2 (en) | 2006-07-04 |
WO2002019040A3 (en) | 2002-05-30 |
US20100280260A1 (en) | 2010-11-04 |
US20040249181A1 (en) | 2004-12-09 |
US20020068223A1 (en) | 2002-06-06 |
JP2004507513A (en) | 2004-03-11 |
EP1317498A2 (en) | 2003-06-11 |
US20070293637A1 (en) | 2007-12-20 |
EP1317498B1 (en) | 2006-06-07 |
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