AU2001263809A1 - Method and facility for producing silane - Google Patents
Method and facility for producing silaneInfo
- Publication number
- AU2001263809A1 AU2001263809A1 AU2001263809A AU6380901A AU2001263809A1 AU 2001263809 A1 AU2001263809 A1 AU 2001263809A1 AU 2001263809 A AU2001263809 A AU 2001263809A AU 6380901 A AU6380901 A AU 6380901A AU 2001263809 A1 AU2001263809 A1 AU 2001263809A1
- Authority
- AU
- Australia
- Prior art keywords
- sih4
- reaction
- product mixture
- facility
- mixture containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 2
- 229910000077 silane Inorganic materials 0.000 title abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 2
- 238000007323 disproportionation reaction Methods 0.000 abstract 2
- 238000004821 distillation Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 abstract 1
- 229910003910 SiCl4 Inorganic materials 0.000 abstract 1
- 229910003822 SiHCl3 Inorganic materials 0.000 abstract 1
- 230000003197 catalytic effect Effects 0.000 abstract 1
- 238000010924 continuous production Methods 0.000 abstract 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 abstract 1
- 239000005049 silicon tetrachloride Substances 0.000 abstract 1
- 239000011949 solid catalyst Substances 0.000 abstract 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 abstract 1
- 239000005052 trichlorosilane Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
- B01J8/0496—Heating or cooling the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
- B01J8/0446—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical
- B01J8/0449—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical beds
- B01J8/0453—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical beds the beds being superimposed one above the other
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
- B01J2208/00106—Controlling the temperature by indirect heat exchange
- B01J2208/00168—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
- B01J2208/00203—Coils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
- B01J2208/00106—Controlling the temperature by indirect heat exchange
- B01J2208/00168—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
- B01J2208/00256—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles in a heat exchanger for the heat exchange medium separate from the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
- B01J2208/00106—Controlling the temperature by indirect heat exchange
- B01J2208/00265—Part of all of the reactants being heated or cooled outside the reactor while recycling
- B01J2208/00274—Part of all of the reactants being heated or cooled outside the reactor while recycling involving reactant vapours
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00002—Chemical plants
- B01J2219/00004—Scale aspects
- B01J2219/00006—Large-scale industrial plants
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
In the continuous production of silane SiH4 by catalytic disproportionation of trichlorosilane SiHCl3 to SiH4 and silicon tetrachloride SiCl4, disproportionation is carried out in not less than 2 reaction/distillation zones containing solid catalyst at 500 mbar to 50 bar; the lighter product mixture containing SiH4 produced in the first zone is condensed at -40 to 50[deg]C; and the uncondensed product mixture containing SiH4 is passed into other reaction/distillation zone(s). An independent claim is also included for the plant used in this process.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10017168A DE10017168A1 (en) | 2000-04-07 | 2000-04-07 | Continuous production of silane, useful in production of silicon for semiconductors, involves catalytic disproportionation of trichlorosilane over solid catalyst in 2 or more zones with intermediate condensation |
DE10017168 | 2000-04-07 | ||
PCT/EP2001/003393 WO2001077017A1 (en) | 2000-04-07 | 2001-03-26 | Method and facility for producing silane |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001263809A1 true AU2001263809A1 (en) | 2001-10-23 |
Family
ID=7637815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001263809A Abandoned AU2001263809A1 (en) | 2000-04-07 | 2001-03-26 | Method and facility for producing silane |
Country Status (8)
Country | Link |
---|---|
US (1) | US6942844B2 (en) |
EP (1) | EP1268343B1 (en) |
JP (1) | JP2003530290A (en) |
AT (1) | ATE285377T1 (en) |
AU (1) | AU2001263809A1 (en) |
DE (2) | DE10017168A1 (en) |
UA (1) | UA72597C2 (en) |
WO (1) | WO2001077017A1 (en) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10153795A1 (en) * | 2001-10-31 | 2003-05-22 | Degussa | Production of 3-functionalized organosilanes, e.g. trichloro(3-chloropropyl)silane, from allyl compound and (un)substituted silane in presence of heterogeneous platinum catalyst, is carried out in reaction column |
US20050054211A1 (en) * | 2003-09-04 | 2005-03-10 | Mindi Xu | Purification of silicon-containing materials |
DE102004045245B4 (en) | 2004-09-17 | 2007-11-15 | Degussa Gmbh | Apparatus and process for the production of silanes |
DE102005046105B3 (en) * | 2005-09-27 | 2007-04-26 | Degussa Gmbh | Process for the preparation of monosilane |
WO2008047553A1 (en) * | 2006-09-27 | 2008-04-24 | Denki Kagaku Kogyo Kabushiki Kaisha | Process for continuously producing monosilane |
DE102007059170A1 (en) | 2007-12-06 | 2009-06-10 | Evonik Degussa Gmbh | Catalyst and process for dismutating hydrogen halosilanes |
JP5316290B2 (en) * | 2008-08-05 | 2013-10-16 | 三菱マテリアル株式会社 | Trichlorosilane production apparatus and production method |
ES2350559B1 (en) * | 2009-05-28 | 2011-11-18 | Centro De Tecnologia Del Silicio Solar, S.L. (Centesil) | PROCEDURE FOR THE USE OF LIGHT WASTE IN A HIGH PURITY SILICON PRODUCTION PLANT. |
DE102009032833A1 (en) * | 2009-07-08 | 2011-01-13 | Schmid Silicon Technology Gmbh | Process and plant for the production of monosilane |
DE102009037154B3 (en) * | 2009-08-04 | 2010-12-09 | Schmid Silicon Technology Gmbh | Process for the preparation of monosilane |
US8298490B2 (en) * | 2009-11-06 | 2012-10-30 | Gtat Corporation | Systems and methods of producing trichlorosilane |
EP2426088A1 (en) | 2010-09-03 | 2012-03-07 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process for producing monosilane from dichlorosilane |
US8551298B2 (en) * | 2010-10-05 | 2013-10-08 | Memc Electronic Materials, Inc. | Processes for purifying silane |
US8524048B2 (en) * | 2010-10-05 | 2013-09-03 | Memc Electronic Materials, Inc. | Processes for recovering silane from heavy-ends separation operations |
US8524044B2 (en) * | 2010-10-05 | 2013-09-03 | Memc Electronic Materials, Inc. | Systems for recovering silane from heavy-ends separation operations |
DE102010043649A1 (en) | 2010-11-09 | 2012-05-10 | Evonik Degussa Gmbh | Process for cleaving higher silanes |
DE102010043648A1 (en) | 2010-11-09 | 2012-05-10 | Evonik Degussa Gmbh | Process for the selective cleavage of higher silanes |
US8956584B2 (en) | 2010-12-20 | 2015-02-17 | Sunedison, Inc. | Production of polycrystalline silicon in substantially closed-loop processes that involve disproportionation operations |
RU2457178C1 (en) * | 2011-01-11 | 2012-07-27 | ФГУП "Российский научный центр "Прикладная химия" | Method of producing high-purity monosilane and silicon tetrachloride |
DE102011004058A1 (en) | 2011-02-14 | 2012-08-16 | Evonik Degussa Gmbh | Monochlorosilane, process and apparatus for its preparation |
US8834825B2 (en) * | 2011-06-28 | 2014-09-16 | Sunedison, Inc. | Processes for producing silane in a bubble column |
WO2013101431A1 (en) | 2011-12-30 | 2013-07-04 | Memc Electronic Materials, Inc. | Processes and systems for purifying silane |
CN102951646A (en) * | 2012-11-22 | 2013-03-06 | 覃攀 | Production method of silane |
CN103172071B (en) * | 2013-03-27 | 2015-06-03 | 天津大学 | Device and method for preparing high-purity silane through disproportionation reactive distillation of trichlorosilane |
CN103214508B (en) * | 2013-03-28 | 2015-09-23 | 青岛科技大学 | The dechlorination method of hydrolyzate in organochlorosilane Concentrated acid hydrolysis process |
US9352971B2 (en) | 2013-06-14 | 2016-05-31 | Rec Silicon Inc | Method and apparatus for production of silane and hydrohalosilanes |
CN103979544B (en) * | 2013-12-13 | 2017-10-17 | 江苏中能硅业科技发展有限公司 | The method that silane and trichlorosilane are produced using reactive distillation |
DE102015203618A1 (en) | 2015-02-27 | 2016-09-01 | Schmid Silicon Technology Gmbh | Column and process for the disproportionation of chlorosilanes to monosilane and tetrachlorosilane and plant for the production of monosilane |
CN104925813B (en) * | 2015-05-18 | 2017-12-01 | 中国化学赛鼎宁波工程有限公司 | A kind of device and method thereof of preparing silane with trichlorosilane |
CN107311183A (en) * | 2017-08-31 | 2017-11-03 | 许文 | A kind of method and device of hydrogen plasma method synthesizing silane |
CN110694293A (en) * | 2019-10-30 | 2020-01-17 | 新疆东方希望新能源有限公司 | Reaction rectifying tower for recovering DCS through side line extraction |
CN113797568B (en) * | 2021-08-20 | 2022-12-23 | 洛阳中硅高科技有限公司 | Synthesis device and synthesis method of electronic grade tri (dimethylamino) silane |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA988275A (en) * | 1970-12-17 | 1976-05-04 | Carl J. Litteral | Disproportionation of chlorosilicon hydrides |
US3968199A (en) | 1974-02-25 | 1976-07-06 | Union Carbide Corporation | Process for making silane |
US4676967A (en) | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
US4340574A (en) * | 1980-08-28 | 1982-07-20 | Union Carbide Corporation | Process for the production of ultrahigh purity silane with recycle from separation columns |
FR2503125A1 (en) | 1981-04-03 | 1982-10-08 | Rhone Poulenc Spec Chim | PROCESS FOR PRODUCING SILANE |
FR2526003A1 (en) * | 1982-05-03 | 1983-11-04 | Rhone Poulenc Spec Chim | PROCESS FOR PRODUCING SILANE FROM TRICHLOROSILANE |
JPS60145907A (en) | 1984-01-11 | 1985-08-01 | Denki Kagaku Kogyo Kk | Continuous production of silane compound |
US4701430A (en) * | 1984-05-17 | 1987-10-20 | Korea Advance Institute Of Science & Technology | Hydrogenation catalyst and methods for its preparation and use to convert silicon tetrachloride to chlorosilane and silane |
JPS61191513A (en) * | 1985-02-19 | 1986-08-26 | Denki Kagaku Kogyo Kk | Continuous production of silane compounds |
DE3711444A1 (en) * | 1987-04-04 | 1988-10-13 | Huels Troisdorf | METHOD AND DEVICE FOR PRODUCING DICHLORSILANE |
JP2648615B2 (en) | 1988-06-14 | 1997-09-03 | 三井東圧化学株式会社 | Simple production method of monosilane |
-
2000
- 2000-04-07 DE DE10017168A patent/DE10017168A1/en not_active Withdrawn
-
2001
- 2001-03-26 UA UA2002107882A patent/UA72597C2/en unknown
- 2001-03-26 WO PCT/EP2001/003393 patent/WO2001077017A1/en active IP Right Grant
- 2001-03-26 US US10/240,995 patent/US6942844B2/en not_active Expired - Fee Related
- 2001-03-26 EP EP01938045A patent/EP1268343B1/en not_active Expired - Lifetime
- 2001-03-26 AU AU2001263809A patent/AU2001263809A1/en not_active Abandoned
- 2001-03-26 JP JP2001575500A patent/JP2003530290A/en active Pending
- 2001-03-26 DE DE50104884T patent/DE50104884D1/en not_active Expired - Lifetime
- 2001-03-26 AT AT01938045T patent/ATE285377T1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2003530290A (en) | 2003-10-14 |
UA72597C2 (en) | 2005-03-15 |
ATE285377T1 (en) | 2005-01-15 |
EP1268343A1 (en) | 2003-01-02 |
US20040091412A1 (en) | 2004-05-13 |
US6942844B2 (en) | 2005-09-13 |
DE10017168A1 (en) | 2001-10-11 |
DE50104884D1 (en) | 2005-01-27 |
EP1268343B1 (en) | 2004-12-22 |
WO2001077017A1 (en) | 2001-10-18 |
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