AU2001241098A1 - Composition - Google Patents
CompositionInfo
- Publication number
- AU2001241098A1 AU2001241098A1 AU2001241098A AU4109801A AU2001241098A1 AU 2001241098 A1 AU2001241098 A1 AU 2001241098A1 AU 2001241098 A AU2001241098 A AU 2001241098A AU 4109801 A AU4109801 A AU 4109801A AU 2001241098 A1 AU2001241098 A1 AU 2001241098A1
- Authority
- AU
- Australia
- Prior art keywords
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/36—Amides or imides
- C08F22/40—Imides, e.g. cyclic imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/404—Imides, e.g. cyclic imides substituted imides comprising oxygen other than the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000092489A JP4505933B2 (en) | 2000-03-29 | 2000-03-29 | Composition |
JP2000-92489 | 2000-03-29 | ||
PCT/JP2001/001905 WO2001072858A1 (en) | 2000-03-29 | 2001-03-12 | Composition |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001241098A1 true AU2001241098A1 (en) | 2001-10-08 |
Family
ID=18607816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001241098A Abandoned AU2001241098A1 (en) | 2000-03-29 | 2001-03-12 | Composition |
Country Status (9)
Country | Link |
---|---|
US (1) | US6730763B1 (en) |
EP (1) | EP1270611B1 (en) |
JP (1) | JP4505933B2 (en) |
KR (1) | KR100791917B1 (en) |
CN (1) | CN1325522C (en) |
AU (1) | AU2001241098A1 (en) |
DE (1) | DE60116858T2 (en) |
TW (1) | TWI282348B (en) |
WO (1) | WO2001072858A1 (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7399574B2 (en) * | 2001-09-28 | 2008-07-15 | Dai Nippon Printing Co., Ltd. | Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel |
KR100447935B1 (en) * | 2001-11-15 | 2004-09-08 | 한솔제지주식회사 | Water based Components for Over Printing Varnish |
WO2004086145A1 (en) * | 2003-03-24 | 2004-10-07 | Dai Nippon Printing Co. Ltd. | Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel |
US8513375B2 (en) * | 2003-05-05 | 2013-08-20 | Designer Molecules, Inc. | Imide-linked maleimide and polymaleimide compounds |
EP1673413B1 (en) * | 2003-08-22 | 2007-02-14 | Sartomer Technology Co., Inc. | High temperature stabilization of uv systems |
US7030201B2 (en) * | 2003-11-26 | 2006-04-18 | Az Electronic Materials Usa Corp. | Bottom antireflective coatings |
US8043534B2 (en) * | 2005-10-21 | 2011-10-25 | Designer Molecules, Inc. | Maleimide compositions and methods for use thereof |
KR20080096592A (en) * | 2006-02-17 | 2008-10-30 | 도요 잉키 세이조 가부시끼가이샤 | Active energy ray curable inkjet ink composition |
JP4702204B2 (en) * | 2006-06-30 | 2011-06-15 | 東洋インキScホールディングス株式会社 | Active energy ray-curable composition |
US8637611B2 (en) | 2008-08-13 | 2014-01-28 | Designer Molecules, Inc. | Amide-extended crosslinking compounds and methods for use thereof |
US8530546B2 (en) * | 2008-12-12 | 2013-09-10 | Toagosei Co., Ltd. | Curable composition comprising inorganic oxide microparticles that are surface-modified with maleimide groups |
FR2951110B1 (en) * | 2009-10-14 | 2011-11-25 | Herve Hollard | DECORATION OR MARKING PROCESS ON PLASTIC AND METAL MATERIAL WITH SPECIAL EFFECT PIGMENTS |
JP5615600B2 (en) * | 2010-06-09 | 2014-10-29 | 富士フイルム株式会社 | Ink composition for ink jet recording, ink jet recording method, and ink jet printed matter |
CN107400448A (en) * | 2017-08-30 | 2017-11-28 | 合肥敏喆信息科技有限公司 | A kind of coating used for blades of wind driven generator and preparation method thereof |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3069448D1 (en) | 1979-05-18 | 1984-11-22 | Ciba Geigy Ag | Photocrosslinkable copolymers, photosensitive recording material containing them, its utilisation in the production of photographic pictures and process for the production of photographic pictures |
JPH0233041B2 (en) | 1982-01-21 | 1990-07-25 | Johnson & Son Inc S C | |
US4529787A (en) | 1982-06-15 | 1985-07-16 | S. C. Johnson & Son, Inc. | Bulk polymerization process for preparing high solids and uniform copolymers |
US4546160A (en) | 1984-02-29 | 1985-10-08 | S. C. Johnson & Son, Inc. | Bulk polymerization process for preparing high solids and uniform copolymers |
JPS62205108A (en) | 1986-03-03 | 1987-09-09 | Hitachi Chem Co Ltd | Production of vinyl polymer |
DE3809418A1 (en) * | 1988-03-21 | 1989-10-12 | Henkel Kgaa | COPOLYMERS OF LONG-CHAIN ALKYL ACRYLATES WITH N-CONTAINING OLEFINS, METHODS FOR THE PRODUCTION THEREOF AND THEIR USE AS A FLOW ENHANCER FOR RAW OILS |
DE3828876A1 (en) | 1988-08-25 | 1990-03-08 | Henkel Kgaa | USE OF COPOLYMERS OF LONG-CHAINED ALKYL ACRYLATES WITH N-CONTAINING OLEFINES AS EXPERIMENTS FOR POWDER LACQUERS |
JP2667550B2 (en) * | 1989-05-30 | 1997-10-27 | 旭化成工業株式会社 | Method for producing thermoplastic copolymer |
US5200462A (en) | 1991-01-25 | 1993-04-06 | Eastman Kodak Company | Succinimide containing polymers and lattices prepared from same |
FR2735480B1 (en) | 1995-06-15 | 1997-07-18 | Atochem Elf Sa | CONTINUOUS ANIONIC POLYMERIZATION PROCESS OF AT LEAST ONE (METH) ACRYLIC MONOMER FOR THE OBTAINING OF POLYMERS WITH A HIGH SOLID RATE |
EP2111876B1 (en) * | 1995-12-18 | 2011-09-07 | AngioDevice International GmbH | Crosslinked polymer compositions and methods for their use |
AU4648697A (en) * | 1996-09-23 | 1998-04-14 | Chandrashekar Pathak | Methods and devices for preparing protein concentrates |
DE69830515T2 (en) | 1997-06-20 | 2006-03-16 | Toagosei Co., Ltd. | Actinically curable acrylate compounds |
US6388026B1 (en) * | 1997-08-05 | 2002-05-14 | S. C. Johnson Commercial Markets, Inc. | Process for the preparation of macromers |
JPH11198552A (en) | 1998-01-20 | 1999-07-27 | Oji Paper Co Ltd | Image receiving sheet for thermal transfer recording |
US6255403B1 (en) * | 1998-07-10 | 2001-07-03 | S. C. Johnson Commercial Markets, Inc. | Process for producing polymers by free radical polymerization and condensation reaction, and apparatus and products related thereto |
-
2000
- 2000-03-29 JP JP2000092489A patent/JP4505933B2/en not_active Expired - Fee Related
- 2000-03-29 US US10/239,995 patent/US6730763B1/en not_active Expired - Fee Related
-
2001
- 2001-03-05 TW TW090105050A patent/TWI282348B/en not_active IP Right Cessation
- 2001-03-12 DE DE60116858T patent/DE60116858T2/en not_active Expired - Lifetime
- 2001-03-12 EP EP01912264A patent/EP1270611B1/en not_active Expired - Lifetime
- 2001-03-12 KR KR1020027012667A patent/KR100791917B1/en not_active Expired - Fee Related
- 2001-03-12 AU AU2001241098A patent/AU2001241098A1/en not_active Abandoned
- 2001-03-12 CN CNB018075487A patent/CN1325522C/en not_active Expired - Fee Related
- 2001-03-12 WO PCT/JP2001/001905 patent/WO2001072858A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US6730763B1 (en) | 2004-05-04 |
KR20020086700A (en) | 2002-11-18 |
TWI282348B (en) | 2007-06-11 |
KR100791917B1 (en) | 2008-01-04 |
EP1270611A4 (en) | 2004-09-08 |
CN1422288A (en) | 2003-06-04 |
DE60116858D1 (en) | 2006-04-13 |
EP1270611A1 (en) | 2003-01-02 |
JP2001278917A (en) | 2001-10-10 |
EP1270611B1 (en) | 2006-01-25 |
JP4505933B2 (en) | 2010-07-21 |
WO2001072858A1 (en) | 2001-10-04 |
DE60116858T2 (en) | 2006-08-10 |
CN1325522C (en) | 2007-07-11 |
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