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AU1612597A - Positional measurements - Google Patents

Positional measurements

Info

Publication number
AU1612597A
AU1612597A AU16125/97A AU1612597A AU1612597A AU 1612597 A AU1612597 A AU 1612597A AU 16125/97 A AU16125/97 A AU 16125/97A AU 1612597 A AU1612597 A AU 1612597A AU 1612597 A AU1612597 A AU 1612597A
Authority
AU
Australia
Prior art keywords
positional measurements
positional
measurements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU16125/97A
Inventor
Andrew Peter Keens
Nigel Peter Smith
Andrew Michael Christian Smout
Shimon Dov Yanowitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bio Rad Micromeasurements Ltd
Original Assignee
Bio Rad Micromeasurements Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bio Rad Micromeasurements Ltd filed Critical Bio Rad Micromeasurements Ltd
Publication of AU1612597A publication Critical patent/AU1612597A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/60—Analysis of geometric attributes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU16125/97A 1996-02-16 1997-02-07 Positional measurements Abandoned AU1612597A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9603262.8A GB9603262D0 (en) 1996-02-16 1996-02-16 Positional measurements
GB9603262 1996-02-16
PCT/GB1997/000341 WO1997030378A1 (en) 1996-02-16 1997-02-07 Positional measurements

Publications (1)

Publication Number Publication Date
AU1612597A true AU1612597A (en) 1997-09-02

Family

ID=10788863

Family Applications (1)

Application Number Title Priority Date Filing Date
AU16125/97A Abandoned AU1612597A (en) 1996-02-16 1997-02-07 Positional measurements

Country Status (3)

Country Link
AU (1) AU1612597A (en)
GB (1) GB9603262D0 (en)
WO (1) WO1997030378A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11325877A (en) * 1998-03-31 1999-11-26 Siemens Ag Method and apparatus for reducing measurement errors
TW494519B (en) * 2000-06-19 2002-07-11 Infineon Technologies Corp Method for determining overlay measurement uncertainty
FR2955654B1 (en) * 2010-01-25 2012-03-30 Soitec Silicon Insulator Technologies SYSTEM AND METHOD FOR EVALUATING INHOMOGENOUS DEFORMATIONS IN MULTILAYER PLATES
US9927718B2 (en) * 2010-08-03 2018-03-27 Kla-Tencor Corporation Multi-layer overlay metrology target and complimentary overlay metrology measurement systems
CN112631090B (en) * 2019-09-24 2022-09-27 长鑫存储技术有限公司 Overlay mark and overlay error testing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0356727A3 (en) * 1988-08-09 1991-06-05 Schlumberger Technologies Inc Symmetrie-based target position measurement
JPH0650534B2 (en) * 1988-11-30 1994-06-29 株式会社東芝 Mark detection method
JP3333568B2 (en) * 1993-01-12 2002-10-15 株式会社リコー Surface defect inspection equipment

Also Published As

Publication number Publication date
GB9603262D0 (en) 1996-04-17
WO1997030378A1 (en) 1997-08-21

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