ATE510935T1 - Vorrichtung und verfahren zur beschichtung von halbleitermaterial - Google Patents
Vorrichtung und verfahren zur beschichtung von halbleitermaterialInfo
- Publication number
- ATE510935T1 ATE510935T1 AT99903204T AT99903204T ATE510935T1 AT E510935 T1 ATE510935 T1 AT E510935T1 AT 99903204 T AT99903204 T AT 99903204T AT 99903204 T AT99903204 T AT 99903204T AT E510935 T1 ATE510935 T1 AT E510935T1
- Authority
- AT
- Austria
- Prior art keywords
- semiconductor layer
- permeable member
- glass sheet
- semiconductor material
- vapor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 8
- 239000000463 material Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 239000011521 glass Substances 0.000 abstract 3
- 239000012159 carrier gas Substances 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/287—Chalcogenides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Formation Of Insulating Films (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Electrostatic Spraying Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/026,139 US6037241A (en) | 1998-02-19 | 1998-02-19 | Apparatus and method for depositing a semiconductor material |
PCT/US1999/001149 WO1999042635A1 (en) | 1998-02-19 | 1999-01-20 | Apparatus and method for depositing a semiconductor material |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE510935T1 true ATE510935T1 (de) | 2011-06-15 |
Family
ID=21830125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99903204T ATE510935T1 (de) | 1998-02-19 | 1999-01-20 | Vorrichtung und verfahren zur beschichtung von halbleitermaterial |
Country Status (11)
Country | Link |
---|---|
US (1) | US6037241A (de) |
EP (1) | EP1060285B1 (de) |
JP (1) | JP3504613B2 (de) |
CN (1) | CN1130470C (de) |
AT (1) | ATE510935T1 (de) |
AU (1) | AU2328399A (de) |
CY (1) | CY1111737T1 (de) |
DK (1) | DK1060285T3 (de) |
ES (1) | ES2366662T3 (de) |
PT (1) | PT1060285E (de) |
WO (1) | WO1999042635A1 (de) |
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US7404862B2 (en) * | 2001-09-04 | 2008-07-29 | The Trustees Of Princeton University | Device and method for organic vapor jet deposition |
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US4083708A (en) * | 1976-09-15 | 1978-04-11 | Exxon Research & Engineering Co. | Forming a glass on a substrate |
US4401052A (en) * | 1979-05-29 | 1983-08-30 | The University Of Delaware | Apparatus for continuous deposition by vacuum evaporation |
US4997677A (en) * | 1987-08-31 | 1991-03-05 | Massachusetts Institute Of Technology | Vapor phase reactor for making multilayer structures |
DE3801147A1 (de) * | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
US5204314A (en) * | 1990-07-06 | 1993-04-20 | Advanced Technology Materials, Inc. | Method for delivering an involatile reagent in vapor form to a CVD reactor |
US5071678A (en) * | 1990-10-09 | 1991-12-10 | United Technologies Corporation | Process for applying gas phase diffusion aluminide coatings |
US5182567A (en) * | 1990-10-12 | 1993-01-26 | Custom Metallizing Services, Inc. | Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means |
JP2888026B2 (ja) * | 1992-04-30 | 1999-05-10 | 松下電器産業株式会社 | プラズマcvd装置 |
US5248349A (en) * | 1992-05-12 | 1993-09-28 | Solar Cells, Inc. | Process for making photovoltaic devices and resultant product |
FR2713666B1 (fr) * | 1993-12-15 | 1996-01-12 | Air Liquide | Procédé et dispositif de dépôt à basse température d'un film contenant du silicium sur un substrat métallique. |
US5596673A (en) * | 1994-11-18 | 1997-01-21 | Xerox Corporation | Evaporation crucible assembly |
JP2845773B2 (ja) * | 1995-04-27 | 1999-01-13 | 山形日本電気株式会社 | 常圧cvd装置 |
US5835687A (en) * | 1996-10-21 | 1998-11-10 | Vidar Systems Corporation | Methods and apparatus for providing digital halftone images with random error diffusion dithering |
US5882416A (en) * | 1997-06-19 | 1999-03-16 | Advanced Technology Materials, Inc. | Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer |
US5945163A (en) * | 1998-02-19 | 1999-08-31 | First Solar, Llc | Apparatus and method for depositing a material on a substrate |
-
1998
- 1998-02-19 US US09/026,139 patent/US6037241A/en not_active Expired - Lifetime
-
1999
- 1999-01-20 ES ES99903204T patent/ES2366662T3/es not_active Expired - Lifetime
- 1999-01-20 JP JP2000532572A patent/JP3504613B2/ja not_active Expired - Fee Related
- 1999-01-20 DK DK99903204.8T patent/DK1060285T3/da active
- 1999-01-20 AT AT99903204T patent/ATE510935T1/de active
- 1999-01-20 WO PCT/US1999/001149 patent/WO1999042635A1/en active Application Filing
- 1999-01-20 PT PT99903204T patent/PT1060285E/pt unknown
- 1999-01-20 AU AU23283/99A patent/AU2328399A/en not_active Abandoned
- 1999-01-20 EP EP99903204A patent/EP1060285B1/de not_active Expired - Lifetime
- 1999-01-20 CN CN99803138.0A patent/CN1130470C/zh not_active Expired - Fee Related
-
2011
- 2011-07-25 CY CY20111100729T patent/CY1111737T1/el unknown
Also Published As
Publication number | Publication date |
---|---|
EP1060285A4 (de) | 2009-01-07 |
AU2328399A (en) | 1999-09-06 |
PT1060285E (pt) | 2011-08-26 |
CY1111737T1 (el) | 2015-10-07 |
EP1060285B1 (de) | 2011-05-25 |
EP1060285A1 (de) | 2000-12-20 |
CN1291241A (zh) | 2001-04-11 |
DK1060285T3 (da) | 2011-08-15 |
JP2002504745A (ja) | 2002-02-12 |
WO1999042635A1 (en) | 1999-08-26 |
CN1130470C (zh) | 2003-12-10 |
JP3504613B2 (ja) | 2004-03-08 |
US6037241A (en) | 2000-03-14 |
ES2366662T3 (es) | 2011-10-24 |
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