[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

ATE402393T1 - Metrologische charakterisierung mikroelektronischer schaltungen - Google Patents

Metrologische charakterisierung mikroelektronischer schaltungen

Info

Publication number
ATE402393T1
ATE402393T1 AT05848201T AT05848201T ATE402393T1 AT E402393 T1 ATE402393 T1 AT E402393T1 AT 05848201 T AT05848201 T AT 05848201T AT 05848201 T AT05848201 T AT 05848201T AT E402393 T1 ATE402393 T1 AT E402393T1
Authority
AT
Austria
Prior art keywords
parameters
model object
data
phi
microelectronic circuits
Prior art date
Application number
AT05848201T
Other languages
English (en)
Inventor
Martino Antonello De
Bernard Drevillon
Original Assignee
Ecole Polytech
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ecole Polytech, Centre Nat Rech Scient filed Critical Ecole Polytech
Application granted granted Critical
Publication of ATE402393T1 publication Critical patent/ATE402393T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Chemical Treatment Of Fibers During Manufacturing Processes (AREA)
  • Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT05848201T 2004-12-24 2005-12-22 Metrologische charakterisierung mikroelektronischer schaltungen ATE402393T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0453231A FR2880129B1 (fr) 2004-12-24 2004-12-24 Caracterisation metrologique de circuits de microelectronique

Publications (1)

Publication Number Publication Date
ATE402393T1 true ATE402393T1 (de) 2008-08-15

Family

ID=34952178

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05848201T ATE402393T1 (de) 2004-12-24 2005-12-22 Metrologische charakterisierung mikroelektronischer schaltungen

Country Status (9)

Country Link
US (1) US7777880B2 (de)
EP (1) EP1828712B1 (de)
JP (1) JP5055518B2 (de)
KR (1) KR101221012B1 (de)
CN (1) CN100588898C (de)
AT (1) ATE402393T1 (de)
DE (1) DE602005008474D1 (de)
FR (1) FR2880129B1 (de)
WO (1) WO2006070161A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8525993B2 (en) * 2009-10-07 2013-09-03 Nanometrics Incorporated Scatterometry measurement of asymmetric structures
US8427645B2 (en) 2011-01-10 2013-04-23 Nanometrics Incorporated Mueller matrix spectroscopy using chiroptic
US8456639B2 (en) * 2011-07-01 2013-06-04 Kla-Tencor Corporation Measurement of critical dimension
US20130242303A1 (en) * 2012-03-13 2013-09-19 Nanometrics Incorporated Dual angles of incidence and azimuth angles optical metrology
US9115987B2 (en) 2013-12-04 2015-08-25 Nanometrics Incorporated Optical metrology with multiple angles of incidence and/or azimuth angles
CN107917665B (zh) * 2016-10-09 2020-02-11 睿励科学仪器（上海）有限公司 用于确定光斑位置的方法和设备
CN107490547B (zh) * 2017-07-26 2020-03-27 天津大学 一种Mueller矩阵型椭偏仪椭偏参数测量的优化方法
WO2022023005A1 (en) 2020-07-30 2022-02-03 BONASTRE, Sanchez A. Polarimetric microscope in reflection for the measurement of the refractive index and associated optical method
US11079220B1 (en) * 2020-09-11 2021-08-03 Onto Innovation Inc. Calibration of azimuth angle for optical metrology stage using grating-coupled surface plasmon resonance

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5956145A (en) * 1992-09-18 1999-09-21 J. A. Woollam Co. Inc. System and method for improving data acquisition capability in spectroscopic rotatable element, rotating element, modulation element, and other ellipsometer and polarimeter and the like systems
JP3285365B2 (ja) * 1997-04-04 2002-05-27 ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッド フォトアレイ検出器を備える回帰較正による回転補正器型分光エリプソメータシステム
US6804003B1 (en) * 1999-02-09 2004-10-12 Kla-Tencor Corporation System for analyzing surface characteristics with self-calibrating capability
DE60209672T2 (de) * 2002-10-15 2006-11-16 Centre National De La Recherche Scientifique (C.N.R.S.) Auf Flüssigkristallen basierendes polarimetrisches System, Verfahren zu seiner Kalibrierung, und polarimetrisches Messverfahren

Also Published As

Publication number Publication date
FR2880129B1 (fr) 2007-04-20
JP5055518B2 (ja) 2012-10-24
CN101107495A (zh) 2008-01-16
CN100588898C (zh) 2010-02-10
KR101221012B1 (ko) 2013-01-18
US20070263219A1 (en) 2007-11-15
JP2008525777A (ja) 2008-07-17
US7777880B2 (en) 2010-08-17
DE602005008474D1 (de) 2008-09-04
FR2880129A1 (fr) 2006-06-30
KR20070097047A (ko) 2007-10-02
EP1828712A1 (de) 2007-09-05
EP1828712B1 (de) 2008-07-23
WO2006070161A1 (fr) 2006-07-06

Similar Documents

Publication Publication Date Title
JP5095873B1 (ja) 線走向と線傾斜の測定装置、及び線走向と線傾斜の測定補助装置
JP6495444B2 (ja) 拡張カルマンフィルタベースの自律的磁力計校正
CN101886904B (zh) 坡面沟蚀测量器
ES2889124T3 (es) Aparato y método para aplicar una técnica de excitación por impacto
ATE402393T1 (de) Metrologische charakterisierung mikroelektronischer schaltungen
WO2005104806A3 (en) Noninvasive analyzer sample probe interface method and apparatus
ATE522831T1 (de) Verfahren und instrumente zur schätzung der zielbewegung
JP2004205500A5 (de)
CN112098981B (zh) 一种激光位移传感器动态幅值校准装置
RU2011126366A (ru) Калибровка гироскопических систем с вибрационными гироскопами
ES2365291A1 (es) Método para la determinación del espesor de un recubrimiento sobre un material compuesto.
DE602005005839D1 (de) Verwendung von oberflächenmesssonden
RU2688834C2 (ru) Способ определения дисбаланса масс полусферического резонатора твердотельного волнового гироскопа
JP2006284304A5 (de)
DE60233345D1 (de) Verfahren und vorrichtungen zur wiederherstellung der winkelinformation
JP2019211314A5 (de)
CN104964635B (zh) 安装偏差转臂测量装置及转轴偏差测量方法
JP2002243447A (ja) レーザ距離計
Caliano et al. A portable and autonomous system for the diagnosis of the structural health of cultural heritage (PICUS)
JP2009236664A (ja) 音響インピーダンス及び吸音率の測定方法
RU2546983C2 (ru) Способ определения динамических погрешностей микромеханических инерциальных датчиков и инерциальных измерительных модулей на их основе
CN204902763U (zh) 声光调制移相干涉仪
TW201514440A (zh) 雙線鐳射量測系統及方法
TWI431244B (zh) Through hole measurement method
Zhang et al. Remote attitude sensing based on high-speed Mueller matrix ellipsometry

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties