NO20076030L - Process for the preparation of hydrochlorosilanes - Google Patents
Process for the preparation of hydrochlorosilanesInfo
- Publication number
- NO20076030L NO20076030L NO20076030A NO20076030A NO20076030L NO 20076030 L NO20076030 L NO 20076030L NO 20076030 A NO20076030 A NO 20076030A NO 20076030 A NO20076030 A NO 20076030A NO 20076030 L NO20076030 L NO 20076030L
- Authority
- NO
- Norway
- Prior art keywords
- hydrochlorosilanes
- preparation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/42—Platinum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/06—Halogens; Compounds thereof
- B01J27/08—Halides
- B01J27/122—Halides of copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/16—Reducing
- B01J37/18—Reducing with gases containing free hydrogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2005/008204 WO2006098722A1 (en) | 2005-03-09 | 2005-03-09 | Process for the production of hydrochlorosilanes |
Publications (1)
Publication Number | Publication Date |
---|---|
NO20076030L true NO20076030L (en) | 2007-12-07 |
Family
ID=36991997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20076030A NO20076030L (en) | 2005-03-09 | 2007-11-23 | Process for the preparation of hydrochlorosilanes |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP1861408A4 (en) |
JP (1) | JP4813545B2 (en) |
KR (1) | KR101176088B1 (en) |
CN (1) | CN101189245B (en) |
DE (1) | DE112005003497T5 (en) |
NO (1) | NO20076030L (en) |
TW (1) | TWI454424B (en) |
WO (1) | WO2006098722A1 (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101279734B (en) * | 2008-05-30 | 2010-06-02 | 广州吉必盛科技实业有限公司 | Method for synthesizing polysilicon raw material trichlorosilane |
DE102008002537A1 (en) * | 2008-06-19 | 2009-12-24 | Evonik Degussa Gmbh | Process for the removal of boron-containing impurities from halosilanes and plant for carrying out the process |
US7927984B2 (en) * | 2008-11-05 | 2011-04-19 | Hemlock Semiconductor Corporation | Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition |
US8178051B2 (en) * | 2008-11-05 | 2012-05-15 | Stephen Michael Lord | Apparatus and process for hydrogenation of a silicon tetrahalide and silicon to the trihalosilane |
EP2429693A1 (en) * | 2009-05-12 | 2012-03-21 | Procedyne Corporation | Fluidized bed process for synthesizing trichlorosilane and a trichlorosilane synthesizer |
KR101672796B1 (en) * | 2009-11-10 | 2016-11-07 | 주식회사 케이씨씨 | Method for producing high purity trichlorosilane for poly-silicon using chlorine gas or hydrogen chloride |
JP5542026B2 (en) | 2010-10-27 | 2014-07-09 | 信越化学工業株式会社 | Purification method of chlorosilanes |
KR101987396B1 (en) * | 2011-10-20 | 2019-06-10 | 알이씨 실리콘 인코포레이티드 | Fouling reduction in hydrochlorosilane production |
KR20140136985A (en) * | 2012-03-14 | 2014-12-01 | 센트로섬 포토볼타익스 유에스에이, 인크. | Trichlorosilane production |
KR101462634B1 (en) * | 2013-03-07 | 2014-11-17 | 한화케미칼 주식회사 | Method for preparing trichlorosilane |
WO2014172102A1 (en) * | 2013-04-19 | 2014-10-23 | Rec Silicon Inc | Corrosion and fouling reduction in hydrochlorosilane production |
KR101519498B1 (en) * | 2013-06-19 | 2015-05-12 | 한화케미칼 주식회사 | Method for preparing trichlorosilane |
CN105080434B (en) * | 2014-04-18 | 2018-02-27 | 新特能源股份有限公司 | A kind of catalytic reactor, system, the method for silicon tetrachloride catalytic hydrogenation |
KR101616043B1 (en) * | 2014-07-22 | 2016-04-27 | 한화케미칼 주식회사 | Method for preparing trichlorosilane |
US20180265367A1 (en) * | 2014-12-18 | 2018-09-20 | Hemlock Semiconductor Operations Llc | Methods of hydrogenating a halosilane |
KR102407612B1 (en) * | 2017-10-05 | 2022-06-10 | 와커 헤미 아게 | Method for preparing chlorosilanes |
CN113651844B (en) * | 2021-08-20 | 2023-09-12 | 唐山偶联硅业有限公司 | Process for preparing dimethylhydrochlorosilane by continuous method |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2499009A (en) * | 1947-02-15 | 1950-02-28 | Linde Air Prod Co | Chlorosilanes |
US4676967A (en) * | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
US4314908A (en) * | 1979-10-24 | 1982-02-09 | Union Carbide Corporation | Preparation of reaction mass for the production of methylchlorosilane |
JPS58161915A (en) * | 1982-03-17 | 1983-09-26 | Shin Etsu Chem Co Ltd | Manufacture of trichlorosilane |
US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
JPS62288109A (en) * | 1986-06-05 | 1987-12-15 | Mitsubishi Metal Corp | Production of trichlorosilane |
JPH0788214B2 (en) * | 1986-10-15 | 1995-09-27 | 三井東圧化学株式会社 | Method for producing trichlorosilane |
JP2613259B2 (en) * | 1988-06-09 | 1997-05-21 | 三井東圧化学株式会社 | Method for producing trichlorosilane |
JP2613260B2 (en) * | 1988-06-09 | 1997-05-21 | 三井東圧化学株式会社 | Method for producing trichlorosilane |
JPH01313318A (en) * | 1988-06-10 | 1989-12-18 | Mitsui Toatsu Chem Inc | Production of trichlorosilane |
US4973725A (en) * | 1988-06-28 | 1990-11-27 | Union Carbide Chemicals And Plastics Company Inc. | Direct synthesis process for organohalohydrosilanes |
US5051248A (en) * | 1990-08-15 | 1991-09-24 | Dow Corning Corporation | Silane products from reaction of silicon monoxide with hydrogen halides |
CA2055304A1 (en) * | 1990-12-06 | 1992-06-07 | Roland L. Halm | Metal catalyzed production of tetrachlorosilanes |
US5250716A (en) * | 1992-05-28 | 1993-10-05 | Mui Jeffrey Y P | Method for making a silicon/copper contact mass suitable for direct reaction |
US5329038A (en) * | 1993-12-29 | 1994-07-12 | Dow Corning Corporation | Process for hydrogenation of chlorosilane |
DE19654154A1 (en) * | 1995-12-25 | 1997-06-26 | Tokuyama Corp | Tri:chloro:silane production for high purity silicon@ precursor |
JP3708649B2 (en) * | 1995-12-25 | 2005-10-19 | 株式会社トクヤマ | Method for producing metal silicon particles having copper silicide |
JP3708648B2 (en) * | 1995-12-25 | 2005-10-19 | 株式会社トクヤマ | Method for producing trichlorosilane |
KR100210261B1 (en) * | 1997-03-13 | 1999-07-15 | 이서봉 | Method of production for poly crystal silicon |
US6057469A (en) | 1997-07-24 | 2000-05-02 | Pechiney Electrometallurgie | Process for manufacturing active silicon powder for the preparation of alkyl- or aryl-halosilanes |
DE10045367A1 (en) * | 2000-09-14 | 2002-03-28 | Bayer Ag | Process for the preparation of trichlorosilane |
DE10049963B4 (en) * | 2000-10-10 | 2009-04-09 | Evonik Degussa Gmbh | Process for the preparation of trichlorosilane |
-
2005
- 2005-03-09 JP JP2008500692A patent/JP4813545B2/en not_active Expired - Fee Related
- 2005-03-09 CN CN2005800497460A patent/CN101189245B/en active Active
- 2005-03-09 WO PCT/US2005/008204 patent/WO2006098722A1/en active Application Filing
- 2005-03-09 KR KR1020077023115A patent/KR101176088B1/en not_active IP Right Cessation
- 2005-03-09 DE DE112005003497T patent/DE112005003497T5/en not_active Withdrawn
- 2005-03-09 EP EP05725398A patent/EP1861408A4/en not_active Withdrawn
-
2006
- 2006-03-09 TW TW095107967A patent/TWI454424B/en active
-
2007
- 2007-11-23 NO NO20076030A patent/NO20076030L/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR101176088B1 (en) | 2012-08-22 |
CN101189245B (en) | 2012-06-13 |
TWI454424B (en) | 2014-10-01 |
TW200704589A (en) | 2007-02-01 |
EP1861408A4 (en) | 2011-08-03 |
JP4813545B2 (en) | 2011-11-09 |
KR20080008323A (en) | 2008-01-23 |
EP1861408A1 (en) | 2007-12-05 |
JP2008532907A (en) | 2008-08-21 |
CN101189245A (en) | 2008-05-28 |
WO2006098722A1 (en) | 2006-09-21 |
DE112005003497T5 (en) | 2008-01-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |