Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
  • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
  • B41N1/00—Printing plates or foils; Materials therefor
  • B41N1/04—Printing plates or foils; Materials therefor metallic
  • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
  • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/26—Processing photosensitive materials; Apparatus therefor
  • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Architecture (AREA)
• Structural Engineering (AREA)
• Photosensitive Polymer And Photoresist Processing (AREA)
• Printing Plates And Materials Therefor (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Applications Claiming Priority (1)

Publications (3)

Family

ID=5833139

Family Applications (1)

Country Status (12)

Families Citing this family (13)

Family Cites Families (2)

• 0
  • BE BE793979D patent/BE793979A/xx unknown
• 1972
  • 1972-01-15 DE DE19722201936 patent/DE2201936C2/de not_active Expired
  • 1972-12-21 IT IT5491972A patent/IT974226B/it active
• 1973
  • 1973-01-05 NL NL7300181A patent/NL179514C/xx not_active IP Right Cessation
  • 1973-01-10 SE SE7300291A patent/SE384586B/xx unknown
  • 1973-01-11 BR BR22073A patent/BR7300220D0/pt unknown
  • 1973-01-12 JP JP653073A patent/JPS5548296B2/ja not_active Expired
  • 1973-01-12 DK DK17773A patent/DK133314C/da active
  • 1973-01-12 AT AT27573*#A patent/AT331272B/de not_active IP Right Cessation
  • 1973-01-12 GB GB174473A patent/GB1413374A/en not_active Expired
  • 1973-01-12 CH CH48573A patent/CH569990A5/xx not_active IP Right Cessation
  • 1973-01-15 FR FR7301268A patent/FR2168782A5/fr not_active Expired

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