[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

NL7100073A - - Google Patents

Info

Publication number
NL7100073A
NL7100073A NL7100073A NL7100073A NL7100073A NL 7100073 A NL7100073 A NL 7100073A NL 7100073 A NL7100073 A NL 7100073A NL 7100073 A NL7100073 A NL 7100073A NL 7100073 A NL7100073 A NL 7100073A
Authority
NL
Netherlands
Application number
NL7100073A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7100073A publication Critical patent/NL7100073A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
    • H01L23/485Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes) consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
    • H01L23/4855Overhang structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/043Dual dielectric
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/051Etching
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/106Masks, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/114Nitrides of silicon

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Transistors (AREA)
NL7100073A 1970-01-05 1971-01-05 NL7100073A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68070A 1970-01-05 1970-01-05

Publications (1)

Publication Number Publication Date
NL7100073A true NL7100073A (xx) 1971-07-07

Family

ID=21692579

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7100073A NL7100073A (xx) 1970-01-05 1971-01-05

Country Status (3)

Country Link
US (1) US3681153A (xx)
DE (2) DE7100215U (xx)
NL (1) NL7100073A (xx)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3977920A (en) * 1970-10-30 1976-08-31 Hitachi, Ltd. Method of fabricating semiconductor device using at least two sorts of insulating films different from each other
US4012763A (en) * 1971-01-29 1977-03-15 Hitachi, Ltd. Semiconductor device having insulator film with different prescribed thickness portions
US3910804A (en) * 1973-07-02 1975-10-07 Ampex Manufacturing method for self-aligned mos transistor
US3951693A (en) * 1974-01-17 1976-04-20 Motorola, Inc. Ion-implanted self-aligned transistor device including the fabrication method therefor
US4038110A (en) * 1974-06-17 1977-07-26 Ibm Corporation Planarization of integrated circuit surfaces through selective photoresist masking
US3966514A (en) * 1975-06-30 1976-06-29 Ibm Corporation Method for forming dielectric isolation combining dielectric deposition and thermal oxidation
US4149307A (en) * 1977-12-28 1979-04-17 Hughes Aircraft Company Process for fabricating insulated-gate field-effect transistors with self-aligned contacts
KR950010041B1 (ko) * 1992-03-28 1995-09-06 현대전자산업주식회사 콘택 홀(contact hole) 구조 및 그 제조방법

Also Published As

Publication number Publication date
DE7100215U (de) 1971-04-22
DE2100292A1 (de) 1972-07-13
US3681153A (en) 1972-08-01

Similar Documents

Publication Publication Date Title
AU1473870A (xx)
AU2044470A (xx)
AU2130570A (xx)
AU1326870A (xx)
AU1336970A (xx)
AU1517670A (xx)
AU1716970A (xx)
AU1833270A (xx)
AU2017870A (xx)
AU2085370A (xx)
AU1832970A (xx)
AU1943370A (xx)
AU1918570A (xx)
AU1328670A (xx)
AU1343870A (xx)
AU1581370A (xx)
AU2144270A (xx)
AU2131570A (xx)
AU2130770A (xx)
AU1591370A (xx)
AU2119370A (xx)
AU2115870A (xx)
AU2112570A (xx)
AU1064870A (xx)
AU2061170A (xx)