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NL160952B - Werkwijze voor het bereiden van lichtgevoelige in organi- sche oplosmiddelen oplosbare als foto-reserve dienende filmvormende polymeren en werkwijze voor het onder toe- passing van deze polymeren vervaardigen van drukplaten en dergelijke. - Google Patents

Werkwijze voor het bereiden van lichtgevoelige in organi- sche oplosmiddelen oplosbare als foto-reserve dienende filmvormende polymeren en werkwijze voor het onder toe- passing van deze polymeren vervaardigen van drukplaten en dergelijke.

Info

Publication number
NL160952B
NL160952B NL7112070.A NL7112070A NL160952B NL 160952 B NL160952 B NL 160952B NL 7112070 A NL7112070 A NL 7112070A NL 160952 B NL160952 B NL 160952B
Authority
NL
Netherlands
Prior art keywords
vinyl
procedure
polymers
units
chloride
Prior art date
Application number
NL7112070.A
Other languages
English (en)
Other versions
NL160952C (nl
NL7112070A (nl
Original Assignee
Powers Chemco Incorporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Powers Chemco Incorporation filed Critical Powers Chemco Incorporation
Publication of NL7112070A publication Critical patent/NL7112070A/xx
Publication of NL160952B publication Critical patent/NL160952B/nl
Application granted granted Critical
Publication of NL160952C publication Critical patent/NL160952C/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
NL7112070.A 1971-01-07 1971-09-02 Werkwijze voor het bereiden van lichtgevoelige in organi- sche oplosmiddelen oplosbare als foto-reserve dienende filmvormende polymeren en werkwijze voor het onder toe- passing van deze polymeren vervaardigen van drukplaten en dergelijke. NL160952C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10480371A 1971-01-07 1971-01-07

Publications (3)

Publication Number Publication Date
NL7112070A NL7112070A (nl) 1972-07-11
NL160952B true NL160952B (nl) 1979-07-16
NL160952C NL160952C (nl) 1979-12-17

Family

ID=22302482

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7112070.A NL160952C (nl) 1971-01-07 1971-09-02 Werkwijze voor het bereiden van lichtgevoelige in organi- sche oplosmiddelen oplosbare als foto-reserve dienende filmvormende polymeren en werkwijze voor het onder toe- passing van deze polymeren vervaardigen van drukplaten en dergelijke.

Country Status (5)

Country Link
US (1) US3749699A (nl)
DE (1) DE2141948A1 (nl)
FR (1) FR2121497B1 (nl)
GB (1) GB1353506A (nl)
NL (1) NL160952C (nl)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3960685A (en) * 1973-11-12 1976-06-01 Sumitomo Chemical Company, Limited Photosensitive resin composition containing pullulan or esters thereof
US4152159A (en) 1977-06-03 1979-05-01 Eastman Kodak Company Acid-resistant copolymer and photographic element incorporating same
EP0231922A3 (en) * 1986-02-07 1987-11-11 American Cyanamid Company Electron beam and x-ray resists
US5331045A (en) * 1993-02-12 1994-07-19 E. I. Du Pont De Nemours And Company Polyvinyl alcohol esterified with lactic acid and process therefor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE682303A (nl) * 1965-06-09 1966-11-14

Also Published As

Publication number Publication date
FR2121497A1 (nl) 1972-08-25
NL160952C (nl) 1979-12-17
DE2141948A1 (de) 1972-07-20
US3749699A (en) 1973-07-31
GB1353506A (en) 1974-05-22
FR2121497B1 (nl) 1975-07-18
NL7112070A (nl) 1972-07-11

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: POWERS CHEMCO