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NL1025016A1 - Werkwijze voor inspecteren van periodieke roosterstructuren op lithografiemaskers. - Google Patents

Werkwijze voor inspecteren van periodieke roosterstructuren op lithografiemaskers.

Info

Publication number
NL1025016A1
NL1025016A1 NL1025016A NL1025016A NL1025016A1 NL 1025016 A1 NL1025016 A1 NL 1025016A1 NL 1025016 A NL1025016 A NL 1025016A NL 1025016 A NL1025016 A NL 1025016A NL 1025016 A1 NL1025016 A1 NL 1025016A1
Authority
NL
Netherlands
Prior art keywords
lattice structures
periodic lattice
lithography masks
inspecting
inspecting periodic
Prior art date
Application number
NL1025016A
Other languages
English (en)
Other versions
NL1025016C2 (nl
Inventor
Wolfgang Dettmann
Roderick Koehle
Martin Verbeek
Original Assignee
Infineon Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag filed Critical Infineon Technologies Ag
Publication of NL1025016A1 publication Critical patent/NL1025016A1/nl
Application granted granted Critical
Publication of NL1025016C2 publication Critical patent/NL1025016C2/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
NL1025016A 2002-12-12 2003-12-12 Werkwijze voor inspecteren van periodieke roosterstructuren op lithografiemaskers. NL1025016C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10258371A DE10258371B4 (de) 2002-12-12 2002-12-12 Verfahren zur Inspektion von periodischen Gitterstrukturen auf Lithographiemasken
DE10258371 2002-12-12

Publications (2)

Publication Number Publication Date
NL1025016A1 true NL1025016A1 (nl) 2004-09-09
NL1025016C2 NL1025016C2 (nl) 2008-06-17

Family

ID=32477624

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1025016A NL1025016C2 (nl) 2002-12-12 2003-12-12 Werkwijze voor inspecteren van periodieke roosterstructuren op lithografiemaskers.

Country Status (3)

Country Link
US (1) US7262850B2 (nl)
DE (1) DE10258371B4 (nl)
NL (1) NL1025016C2 (nl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006000946B4 (de) * 2006-01-07 2007-11-15 Isra Vision Systems Ag Verfahren und System zur Inspektion einer periodischen Struktur
US8335369B2 (en) * 2007-02-28 2012-12-18 Taiwan Semiconductor Manufacturing Company, Ltd. Mask defect analysis
US8965102B2 (en) * 2012-11-09 2015-02-24 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for defect analysis of a substrate
DE102017203879B4 (de) * 2017-03-09 2023-06-07 Carl Zeiss Smt Gmbh Verfahren zum Analysieren einer defekten Stelle einer photolithographischen Maske
US10753729B2 (en) 2018-10-02 2020-08-25 Saudi Arabian Oil Company Photonic sensing analytical device

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3658420A (en) * 1969-12-10 1972-04-25 Bell Telephone Labor Inc Photomask inspection by spatial filtering
US3743423A (en) * 1972-05-03 1973-07-03 Westinghouse Electric Corp Intensity spatial filter having uniformly spaced filter elements
US3787117A (en) * 1972-10-02 1974-01-22 Western Electric Co Methods and apparatus for inspecting workpieces by spatial filtering subtraction
JPS5324301B2 (nl) * 1974-09-09 1978-07-20
US4595289A (en) * 1984-01-25 1986-06-17 At&T Bell Laboratories Inspection system utilizing dark-field illumination
US4633504A (en) * 1984-06-28 1986-12-30 Kla Instruments Corporation Automatic photomask inspection system having image enhancement means
US5091963A (en) * 1988-05-02 1992-02-25 The Standard Oil Company Method and apparatus for inspecting surfaces for contrast variations
JP2796316B2 (ja) * 1988-10-24 1998-09-10 株式会社日立製作所 欠陥または異物の検査方法およびその装置
JPH0834544B2 (ja) * 1990-08-14 1996-03-29 株式会社東芝 画像の復元処理方法
US5537669A (en) * 1993-09-30 1996-07-16 Kla Instruments Corporation Inspection method and apparatus for the inspection of either random or repeating patterns
AU3152795A (en) * 1994-07-28 1996-02-22 Victor B. Kley Scanning probe microscope assembly
US5838433A (en) * 1995-04-19 1998-11-17 Nikon Corporation Apparatus for detecting defects on a mask
US5905572A (en) * 1997-08-21 1999-05-18 Li; Ming-Chiang Sample inspection using interference and/or correlation of scattered superbroad radiation
US6879391B1 (en) * 1999-05-26 2005-04-12 Kla-Tencor Technologies Particle detection method and apparatus
US6268093B1 (en) * 1999-10-13 2001-07-31 Applied Materials, Inc. Method for reticle inspection using aerial imaging
WO2002040970A1 (en) * 2000-11-15 2002-05-23 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
KR100492153B1 (ko) * 2002-10-30 2005-06-02 삼성전자주식회사 고속 퓨리에 변환 기법을 이용한 분석 방법 및 장치

Also Published As

Publication number Publication date
NL1025016C2 (nl) 2008-06-17
US7262850B2 (en) 2007-08-28
DE10258371A1 (de) 2004-07-08
US20040165763A1 (en) 2004-08-26
DE10258371B4 (de) 2004-12-16

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20080415

PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20090701