MY154860A - Adhesive sheet for wafer bonding and method of processing a wafer by using the same - Google Patents
Adhesive sheet for wafer bonding and method of processing a wafer by using the sameInfo
- Publication number
- MY154860A MY154860A MYPI2012000033A MYPI2012000033A MY154860A MY 154860 A MY154860 A MY 154860A MY PI2012000033 A MYPI2012000033 A MY PI2012000033A MY PI2012000033 A MYPI2012000033 A MY PI2012000033A MY 154860 A MY154860 A MY 154860A
- Authority
- MY
- Malaysia
- Prior art keywords
- wafer
- adhesive sheet
- processing
- same
- wafer bonding
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/24—Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/50—Additional features of adhesives in the form of films or foils characterized by process specific features
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2453/00—Presence of block copolymer
- C09J2453/006—Presence of block copolymer in the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
Abstract
AN ADHESIVE SHEET FOR WAFER BONDING, HAVING A BASE MATERIAL RESIN FILM AND A REMOVABLE ADHESIVE LAYER PROVIDED ON THE BASE MATERIAL RESIN FILM, IN WHICH A MINIMUM VALUE OF A LOSS FACTOR IS 0.20 OR MORE, WHICH IS MEASURED BY: USING A SPECIMEN PREPARED BY PROCESSING THE ADHESIVE SHEET TO HAVE A WIDTH OF 5 MM; AND APPLYING A TENSILE STRESS AT A FREQUENCY OF 400 TO 900 HZ AT A TEMPERATURE OF 23°C BY A DYNAMIC VISCOELASTICITY MEASUREMENT APPARATUS, AND A MINIMUM VALUE OF A LOSS FACTOR IS 0.20 OR MORE, WHICH IS MEASURED BY: USING THE SPECIMEN; AND APPLYING A TENSILE STRESS AT A FREQUENCY OF 650 HZ AT A TEMPERATURE OF 15°C TO 40°C BY THE DYNAMIC VISCOELASTICITY MEASUREMENT APPARATUS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009162009 | 2009-07-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY154860A true MY154860A (en) | 2015-08-14 |
Family
ID=43429249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2012000033A MY154860A (en) | 2009-07-08 | 2010-07-06 | Adhesive sheet for wafer bonding and method of processing a wafer by using the same |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPWO2011004825A1 (en) |
KR (1) | KR101336430B1 (en) |
CN (1) | CN102473617B (en) |
MY (1) | MY154860A (en) |
TW (1) | TWI447202B (en) |
WO (1) | WO2011004825A1 (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101883648B1 (en) * | 2011-05-17 | 2018-07-31 | 린텍 코포레이션 | Film and adhesive sheet |
JP5546518B2 (en) * | 2011-09-28 | 2014-07-09 | 古河電気工業株式会社 | Adhesive tape for grinding brittle wafer back surface and grinding method using the same |
KR101424401B1 (en) * | 2012-08-03 | 2014-07-28 | 주식회사 엘지화학 | Adhesive Film and Encapsulation Method of Organic Electronic Device Using the Same |
JP6373251B2 (en) * | 2013-02-22 | 2018-08-15 | デンカ株式会社 | Method for manufacturing electronic component using adhesive sheet |
KR101659057B1 (en) * | 2013-09-30 | 2016-09-22 | 주식회사 엘지화학 | Semiconductor wafer dicing film and dicing die bonding film |
JP6264126B2 (en) * | 2014-03-20 | 2018-01-24 | 日立化成株式会社 | Wafer processing tape |
JP6068386B2 (en) * | 2014-03-31 | 2017-01-25 | 日東電工株式会社 | Thermosetting die bond film, dicing die bond film, and semiconductor device manufacturing method |
JP6280459B2 (en) * | 2014-06-27 | 2018-02-14 | 株式会社ディスコ | Tape expansion unit |
JP6436593B2 (en) * | 2014-10-20 | 2018-12-12 | 積水化成品工業株式会社 | Adhesive gel sheet having adhesive application, method for producing the same, method for fixing a pair of adherends, and composite material |
JP6445315B2 (en) * | 2014-12-12 | 2018-12-26 | 日東電工株式会社 | Dicing sheet, dicing die-bonding film, and semiconductor device manufacturing method |
JP6623639B2 (en) * | 2015-09-18 | 2019-12-25 | 住友ベークライト株式会社 | Temporary fixing tape |
CN107995997B (en) * | 2016-03-31 | 2023-11-14 | 古河电气工业株式会社 | Adhesive sheet for semiconductor processing |
JP6310492B2 (en) * | 2016-03-31 | 2018-04-11 | 古河電気工業株式会社 | Electronic device packaging tape |
KR102355077B1 (en) * | 2016-03-31 | 2022-01-25 | 후루카와 덴키 고교 가부시키가이샤 | Adhesive sheet for semiconductor processing |
EP3533852A4 (en) * | 2016-10-27 | 2020-06-17 | Mitsui Chemicals Tohcello, Inc. | Electronic device production method, adhesive film for electronic device production, and electronic component testing device |
CN109906385A (en) | 2016-10-27 | 2019-06-18 | 三井化学东赛璐株式会社 | The manufacturing method of electronic device, electronic device manufacture adherence film and apparatus for electronic device test |
CN110036459B (en) * | 2016-12-07 | 2023-07-14 | 古河电气工业株式会社 | Semiconductor processing tape |
JP6800062B2 (en) * | 2017-03-28 | 2020-12-16 | 古河電気工業株式会社 | Adhesive tape |
JP6535047B2 (en) * | 2017-05-12 | 2019-06-26 | 古河電気工業株式会社 | Adhesive tape for semiconductor processing |
JP7400263B2 (en) * | 2018-08-23 | 2023-12-19 | 東レ株式会社 | Film and film manufacturing method |
JP7430853B2 (en) * | 2019-05-28 | 2024-02-14 | シーカ テクノロジー アクチェンゲゼルシャフト | Methods for selecting adhesives, adhesive composites, and methods for manufacturing adhesive composites |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4780828B2 (en) | 2000-11-22 | 2011-09-28 | 三井化学株式会社 | Adhesive tape for wafer processing, method for producing the same and method for using the same |
JP2003092273A (en) * | 2001-09-19 | 2003-03-28 | Mitsubishi Plastics Ind Ltd | Dicing film for semiconductor wafer |
JP4851246B2 (en) * | 2006-06-12 | 2012-01-11 | 古河電気工業株式会社 | A dicing tape for laser dicing based on a composition having a phase separation structure obtained by adding a hydrogenated styrene / butadiene copolymer to polypropylene. |
JP2008066688A (en) * | 2006-08-11 | 2008-03-21 | Furukawa Electric Co Ltd:The | Tape for wafer processing |
JP5019580B2 (en) * | 2006-09-20 | 2012-09-05 | 古河電気工業株式会社 | Wafer sticking sheet and wafer processing method |
WO2009063793A1 (en) * | 2007-11-15 | 2009-05-22 | The Furukawa Electric Co., Ltd. | Adhesive tape for processing semiconductor wafer |
WO2009078440A1 (en) * | 2007-12-18 | 2009-06-25 | The Furukawa Electric Co., Ltd. | Adhesive sheet for bonding wafer and wafer processing method |
-
2010
- 2010-07-06 MY MYPI2012000033A patent/MY154860A/en unknown
- 2010-07-06 KR KR1020117030393A patent/KR101336430B1/en active IP Right Grant
- 2010-07-06 WO PCT/JP2010/061485 patent/WO2011004825A1/en active Application Filing
- 2010-07-06 CN CN201080030584.7A patent/CN102473617B/en active Active
- 2010-07-06 JP JP2011521930A patent/JPWO2011004825A1/en active Pending
- 2010-07-07 TW TW099122289A patent/TWI447202B/en active
Also Published As
Publication number | Publication date |
---|---|
WO2011004825A1 (en) | 2011-01-13 |
TW201118146A (en) | 2011-06-01 |
TWI447202B (en) | 2014-08-01 |
JPWO2011004825A1 (en) | 2012-12-20 |
KR101336430B1 (en) | 2013-12-04 |
CN102473617A (en) | 2012-05-23 |
CN102473617B (en) | 2015-04-29 |
KR20120023811A (en) | 2012-03-13 |
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