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MX2011008787A - Composicion limpiadora microelectronica basada en solvente organico acido multiproposito. - Google Patents

Composicion limpiadora microelectronica basada en solvente organico acido multiproposito.

Info

Publication number
MX2011008787A
MX2011008787A MX2011008787A MX2011008787A MX2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A
Authority
MX
Mexico
Prior art keywords
cleaning composition
multipurpose
acidic
organic solvent
solvent based
Prior art date
Application number
MX2011008787A
Other languages
English (en)
Inventor
Chien-Pin S Hsu
Glenn Westwood
William R Gemmill
Original Assignee
Avantor Performance Mat Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Avantor Performance Mat Inc filed Critical Avantor Performance Mat Inc
Publication of MX2011008787A publication Critical patent/MX2011008787A/es

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • C11D7/08Acids
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/34Organic compounds containing sulfur
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02057Cleaning during device manufacture
    • H01L21/0206Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02057Cleaning during device manufacture
    • H01L21/02068Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/36Organic compounds containing phosphorus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

Una composición limpiadora para limpiar dispositivos microelectrónicos o nanoelectrónicos, la composición limpiadora que tiene HF como el único ácido y el único compuesto de fluoruro en la composición, al menos un solvente primario seleccionado del grupo que consiste de sulfonas y selenonas, al menos un co-solvente de alcohol polihidroxil-alquílico o -arílico que tiene sitios de unión o formación de complejos de iones metálicos, y agua, y opcionalmente al menos un compuesto inhibidor de corrosión de ácido fosfónico y en donde la composición limpiadora está libre de aminas, bases y otras sales.
MX2011008787A 2009-02-25 2010-01-14 Composicion limpiadora microelectronica basada en solvente organico acido multiproposito. MX2011008787A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15530909P 2009-02-25 2009-02-25
PCT/US2010/020974 WO2010098899A1 (en) 2009-02-25 2010-01-14 Multipurpose acidic, organic solvent based microelectronic cleaning composition

Publications (1)

Publication Number Publication Date
MX2011008787A true MX2011008787A (es) 2011-09-29

Family

ID=42077359

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2011008787A MX2011008787A (es) 2009-02-25 2010-01-14 Composicion limpiadora microelectronica basada en solvente organico acido multiproposito.

Country Status (16)

Country Link
US (1) US8557757B2 (es)
EP (1) EP2401655B1 (es)
JP (1) JP2014132094A (es)
KR (1) KR101831452B1 (es)
CN (1) CN102334069B (es)
AU (1) AU2010218426A1 (es)
BR (1) BRPI1007989A2 (es)
CA (1) CA2753399A1 (es)
IL (1) IL214728A (es)
MX (1) MX2011008787A (es)
MY (1) MY152051A (es)
RU (1) RU2011139104A (es)
SG (1) SG173834A1 (es)
TW (1) TWI500760B (es)
WO (1) WO2010098899A1 (es)
ZA (1) ZA201106933B (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8754021B2 (en) 2009-02-27 2014-06-17 Advanced Technology Materials, Inc. Non-amine post-CMP composition and method of use
JP5868155B2 (ja) * 2010-12-13 2016-02-24 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 半導体の電気化学エッチング
EP2768920A4 (en) * 2011-10-21 2015-06-03 Advanced Tech Materials AMIN FREE POST-KMP COMPOSITION AND METHOD OF USE THEREOF
US8951950B2 (en) * 2012-03-12 2015-02-10 Ekc Technology Aluminum post-etch residue removal with simultaneous surface passivation
TW201713751A (zh) * 2015-10-06 2017-04-16 聯華電子股份有限公司 酸槽補酸系統與方法
CN108251895A (zh) * 2016-12-29 2018-07-06 江苏鲁汶仪器有限公司 一种氟化氢气相腐蚀设备及方法
KR20230052123A (ko) * 2021-10-12 2023-04-19 삼성전자주식회사 반도체 패키지 제조 방법
CN115799063A (zh) * 2023-01-31 2023-03-14 广州粤芯半导体技术有限公司 一种氧化物层的刻蚀方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3629124A (en) * 1969-08-27 1971-12-21 Monsanto Co Bleaching sterilizing disinfecting and deterging compositions
US4215005A (en) 1978-01-30 1980-07-29 Allied Chemical Corporation Organic stripping compositions and method for using same
US6368421B1 (en) 1998-07-10 2002-04-09 Clariant Finance (Bvi) Limited Composition for stripping photoresist and organic materials from substrate surfaces
US6562726B1 (en) 1999-06-29 2003-05-13 Micron Technology, Inc. Acid blend for removing etch residue
US6531436B1 (en) 2000-02-25 2003-03-11 Shipley Company, L.L.C. Polymer removal
ATE330250T1 (de) * 2000-04-24 2006-07-15 Nitto Denko Corp Flüssigkristallanzeige mit o- und e-typ polarisatoren
WO2001081525A1 (fr) * 2000-04-26 2001-11-01 Daikin Industries, Ltd. Composition de detergent
JP4959095B2 (ja) * 2000-07-10 2012-06-20 イーケイシー テクノロジー インコーポレーテッド 半導体デバイスの有機及びプラズマエッチング残さの洗浄用組成物
US6799589B2 (en) * 2000-11-08 2004-10-05 Sony Corporation Method and apparatus for wet-cleaning substrate
CN1659481A (zh) * 2002-06-07 2005-08-24 马林克罗特贝克公司 包含氧化剂和有机溶剂的微电子清洁组合物
CN1659480A (zh) * 2002-06-07 2005-08-24 马林克罗特贝克公司 用于微电子基底的清洁组合物
JP2004029346A (ja) 2002-06-25 2004-01-29 Mitsubishi Gas Chem Co Inc レジスト剥離液組成物
US7166419B2 (en) * 2002-09-26 2007-01-23 Air Products And Chemicals, Inc. Compositions substrate for removing etching residue and use thereof
EP1664935B1 (en) * 2003-08-19 2007-10-17 Mallinckrodt Baker, Inc. Stripping and cleaning compositions for microelectronics
JP4620680B2 (ja) * 2003-10-29 2011-01-26 マリンクロッド・ベイカー・インコーポレイテッド ハロゲン化金属の腐食阻害剤を含有するアルカリ性のプラズマエッチング/灰化後の残渣の除去剤およびフォトレジスト剥離組成物
BRPI0418529A (pt) * 2004-02-11 2007-05-15 Mallinckrodt Baker Inc composições de limpeza para microeletrÈnicos contendo ácidos de halogênio oxigenados, sais e derivados dos mesmos
JP4633785B2 (ja) * 2004-03-01 2011-02-16 アバンター・パフォーマンス・マテリアルズ・インコーポレイテッド ナノエレクトロニクスおよびマイクロエレクトロニクスの洗浄組成物
US7825078B2 (en) * 2004-07-15 2010-11-02 Mallinckrodt Baker, Inc. Non-aqueous microelectronic cleaning compositions containing fructose
JP2006041446A (ja) * 2004-07-30 2006-02-09 Sumitomo Chemical Co Ltd 電子部品洗浄液
US8178482B2 (en) * 2004-08-03 2012-05-15 Avantor Performance Materials, Inc. Cleaning compositions for microelectronic substrates
KR20060064441A (ko) * 2004-12-08 2006-06-13 말린크로트 베이커, 인코포레이티드 비수성 비부식성 마이크로전자 세정 조성물
BRPI0518420A2 (pt) * 2004-12-10 2008-11-25 Mallinckrodt Baker Inc composiÇÕes de limpeza de microeletrânicos nço-aquosas, nço-corrosivas, contendo inibidores de corrosço polimÉricos
US7659203B2 (en) 2005-03-18 2010-02-09 Applied Materials, Inc. Electroless deposition process on a silicon contact
KR101251594B1 (ko) * 2006-03-23 2013-04-08 주식회사 동진쎄미켐 레지스트 스트리퍼 제거용 케미칼 린스 조성물
WO2009032460A1 (en) * 2007-08-02 2009-03-12 Advanced Technology Materials, Inc. Non-fluoride containing composition for the removal of residue from a microelectronic device

Also Published As

Publication number Publication date
RU2011139104A (ru) 2013-04-10
US20110306534A1 (en) 2011-12-15
KR20110136820A (ko) 2011-12-21
US8557757B2 (en) 2013-10-15
BRPI1007989A2 (pt) 2016-03-01
MY152051A (en) 2014-08-15
EP2401655B1 (en) 2014-03-12
KR101831452B1 (ko) 2018-02-22
IL214728A (en) 2015-10-29
ZA201106933B (en) 2012-05-30
WO2010098899A1 (en) 2010-09-02
JP5730790B2 (ja) 2015-06-10
JP2014132094A (ja) 2014-07-17
TWI500760B (zh) 2015-09-21
EP2401655A1 (en) 2012-01-04
JP2012518715A (ja) 2012-08-16
AU2010218426A1 (en) 2011-10-20
TW201035308A (en) 2010-10-01
CA2753399A1 (en) 2010-09-02
CN102334069B (zh) 2013-07-10
CN102334069A (zh) 2012-01-25
IL214728A0 (en) 2011-11-30
SG173834A1 (en) 2011-09-29

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