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Kimura et al., 2009 - Google Patents

Wavefront control system for phase compensation in hard X-ray optics

Kimura et al., 2009

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Document ID
3696284859297383282
Author
Kimura T
Handa S
Mimura H
Yumoto H
Yamakawa D
Matsuyama S
Inagaki K
Sano Y
Tamasaku K
Nishino Y
Yabashi M
Ishikawa T
Yamauchi K
Publication year
Publication venue
Japanese journal of applied physics

External Links

Snippet

A highly precise adaptive optical system that can be used in the hard X-ray region was developed. To achieve highly precise control of the wavefront shape, we discussed an optical system with a bendable mirror of deformation accuracy better than 0.4 nm RMS …
Continue reading at citeseerx.ist.psu.edu (PDF) (other versions)

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70258Projection system adjustment, alignment during assembly of projection system
    • G03F7/70266Adaptive optics, e.g. deformable optical elements for wavefront control
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings

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