[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Mais et al., 2015 - Google Patents

Electrodeposition of Nb, Ta, Zr and Cu from ionic liquid for nanocomposites preparation

Mais et al., 2015

View PDF
Document ID
3648006430448894097
Author
Mais L
et al.
Publication year

External Links

Snippet

Multilayer metal materials with nanometric scale are important in modern engineering applications. Composite materials based on metals with different characteristics give rise to new materials with unique properties. Among the others, nanostructured composites …
Continue reading at iris.unica.it (PDF) (other versions)

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/66Electroplating: Baths therefor from melts
    • C25D3/665Electroplating: Baths therefor from melts from ionic liquids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25CPROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C3/00Electrolytic production, recovery or refining of metals by electrolysis of melts
    • C25C3/26Electrolytic production, recovery or refining of metals by electrolysis of melts of titanium, zirconium, hafnium, tantalum or vanadium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of work-pieces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating

Similar Documents

Publication Publication Date Title
Simka et al. Electrodeposition of metals from non-aqueous solutions
Mellors et al. Electrodeposition of Coherent Deposits of Refractory Metals: I. Niobium
Tsuda et al. Electrochemical surface finishing and energy storage technology with room-temperature haloaluminate ionic liquids and mixtures
Jiang et al. Electrodeposition of aluminium from ionic liquids: Part II-studies on the electrodeposition of aluminum from aluminum chloride (AICl3)-trimethylphenylammonium chloride (TMPAC) ionic liquids
El Abedin et al. Additive free electrodeposition of nanocrystalline aluminium in a water and air stable ionic liquid
Tsuda et al. Electrodeposition of Al-Zr alloys from lewis acidic aluminum chloride-1-ethyl-3-methylimidazolium chloride melt
Gibilaro et al. Investigation of Zr (IV) in LiF–CaF2: Stability with oxide ions and electroreduction pathway on inert and reactive electrodes
Deng et al. Electrochemical study and electrodeposition of manganese in the hydrophobic butylmethylpyrrolidinium bis ((trifluoromethyl) sulfonyl) imide room-temperature ionic liquid
CA2590080A1 (en) Electrochemical deposition of tantalum and/or copper in ionic liquids
Hsiu et al. Electrodeposition behaviour of cadmium telluride from 1-ethyl-3-methylimidazolium chloride tetrafluoroborate ionic liquid
Vacca et al. On the electrodeposition of Niobium from 1-butyl-1-methylpyrrolidinium bis (trifluoromethylsulfonyl) imide at conductive diamond substrates
Giridhar et al. Electrodeposition of niobium from 1-butyl-1-methylpyrrolidinium bis (trifluoromethylsulfonyl) amide ionic liquid
Mascia et al. Electrochemical deposition of Cu and Nb from pyrrolidinium based ionic liquid
Yang et al. Electrodeposition of indium antimonide from the water-stable 1-ethyl-3-methylimidazolium chloride/tetrafluoroborate ionic liquid
Malyshev et al. Titanium coating on carbon steel: direct-current and impulsive electrodeposition. Physicomechanical and chemical properties
Groult et al. Study of the electrochemical reduction of Zr4+ ions in molten alkali fluorides
DE10108893A1 (en) Production of metals and their alloys and compound semiconductors comprises galvanically depositing metals, alloys or compound semiconductors from an ionic liquid or suitable molten salt in an electrolysis device
Lee et al. Electrodeposition and nucleation of copper at nitrogen-incorporated tetrahedral amorphous carbon electrodes in basic ambient temperature chloroaluminate melts
Zein El Abedin Electrochemical behavior of aluminum and some of its alloys in chloroaluminate ionic liquids: electrolytic extraction and electrorefining
Bai et al. Effect of fluoride-ion on the electrochemical behavior of tantalum ion in NaCl-KCl molten salt
US20170107636A1 (en) Synthesis of superconducting nb-sn
Han et al. Electrochemical coreduction of Gd (III) with Pb (II) and recovery of Gd from LiCl-KCl eutectic assisted by Pb metal
Lantelme et al. Electrochemical behavior of solutions of niobium chlorides in fused alkali chlorides
Mais Electrodeposition of Nb, Ta, Zr and Cu from ionic liquid for nanocomposites preparation
Mais et al. Electrochemical deposition of Cu and Ta from pyrrolidinium based ionic liquid