[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Masuda et al., 2003 - Google Patents

Nano/micro-patterning of anatase TiO2 thin film from an aqueous solution by site-selective elimination method

Masuda et al., 2003

View PDF
Document ID
2886953874995239191
Author
Masuda Y
Saito N
Hoffmann R
De Guire M
Koumoto K
Publication year
Publication venue
Science and Technology of Advanced Materials

External Links

Snippet

We proposed a novel method to fabricate nano/micro-scaled patterns of thin films and successfully fabricated patterns of anatase TiO 2 thin films in an aqueous solution at 50 C. The patterned self-assembled monolayer (SAM) having octadecyltrichlorosilane (OTS) …
Continue reading at www.tandfonline.com (PDF) (other versions)

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y30/00—Nano-technology for materials or surface science, e.g. nano-composites

Similar Documents

Publication Publication Date Title
Masuda et al. Nano/micro-patterning of anatase TiO2 thin film from an aqueous solution by site-selective elimination method
Masuda et al. Selective deposition and micropatterning of titanium dioxide thin film on self-assembled monolayers
Masuda et al. Templated site-selective deposition of titanium dioxide on self-assembled monolayers
Masuda et al. Micropatterning of anatase TiO 2 thin films from an aqueous solution by a site-selective immersion method
Lee et al. Coating BaTiO3 nanolayers on spherical Ni powders for multilayer ceramic capacitors
Pizem et al. Effects of substrate surface functionality on solution-deposited titania films
Shin et al. Synthesis and characterization of TiO2 thin films on organic self-assembled monolayers: Part I. Film formation from aqueous solutions
Masuda et al. Deposition mechanism of anatase TiO2 on self-assembled monolayers from an aqueous solution
Paz Self-assembled monolayers and titanium dioxide: From surface patterning to potential applications
Gao et al. Site-selective deposition and micropatterning of SrTiO3 thin film on self-assembled monolayers by the liquid phase deposition method
Masuda et al. Site-selective deposition of anatase TiO2 in an aqueous solution using a seed layer
Chen et al. Silver sulfide nanoparticle assembly obtained by reacting an assembled silver nanoparticle template with hydrogen sulfide gas
Masuda et al. Selective deposition and micropatterning of titanium dioxide on self-assembled monolayers from a gas phase
Gao et al. Microstructure-controlled deposition of SrTiO3 thin film on self-assembled monolayers in an aqueous solution of (NH4) 2TiF6− Sr (NO3) 2− H3BO3
JP4065962B2 (en) Fabrication method and utilization of self-assembled monolayer
KR101175633B1 (en) Method of preparing superhydrophobic surface capable of reversible switching
Nishimoto et al. Underwater superoleophobicity of Nb2O5 photocatalyst surface
Masuda et al. Anatase TiO2 films crystallized on SnO2: F substrates in an aqueous solution
Masuda et al. Deposition mechanism of anatase TiO2 from an aqueous solution and its site-selective deposition
JP2000096212A (en) Photocatalyst film coated member and its production
US20080075939A1 (en) Method for preparing layered nanostructures and layered nanostructures prepared thereby
Badre et al. Tailoring the wetting behavior of zinc oxide films by using alkylsilane self-assembled monolayers
Dhanabalan et al. Structure of CdS nanoparticles containing cadmium arachidate LB films
Markovic et al. ‘Sandwich’-like hybrid ZnO thin films produced by a combination of atomic layer deposition and wet-chemistry using a mercapto silane as single organic precursor
George et al. Micro and nanopatterning of functional materials on flexible plastic substrates via site-selective surface modification using oxygen plasma