Goehlich et al., 1999 - Google Patents
Determination of angle resolved velocity distributions of sputtered tungsten atomsGoehlich et al., 1999
- Document ID
- 197299479080063451
- Author
- Goehlich A
- Niemöller N
- Döbele H
- Publication year
- Publication venue
- Journal of nuclear materials
External Links
Snippet
Angle resolved velocity distributions of tungsten atoms sputtered by bombardment of argon ions in the energy range between 0.2 and 5 keV are reported. The velocity distribution is determined using Doppler-shifted laser induced fluorescence spectroscopy (DSLF) in …
- 229910052721 tungsten 0 title description 6
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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