Zhang et al., 2019 - Google Patents
Study of attenuation characteristics of electromagnetic waves in multilayer plasma slabsZhang et al., 2019
- Document ID
- 18006088893371071650
- Author
- Zhang Q
- Tian Z
- Tang W
- Tang N
- Zhao H
- Lin H
- Publication year
- Publication venue
- Journal of Applied Physics
External Links
Snippet
Stealth technology plays an important role in modern military conflicts, and because of its many practical advantages, plasma stealth technology has gained a lot of attention. In this paper, we describe our study of the reflection and absorption characteristics of waves …
- 210000002381 Plasma 0 title abstract description 197
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
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