Gaiaschi et al., 2017 - Google Patents
Real-time depth measurement in glow discharge optical emission spectrometry via differential interferometric profilingGaiaschi et al., 2017
- Document ID
- 17089360185476439060
- Author
- Gaiaschi S
- Richard S
- Chapon P
- Acher O
- Publication year
- Publication venue
- Journal of Analytical Atomic Spectrometry
External Links
Snippet
We developed an in situ measurement technique implemented on a Glow Discharge Optical Emission Spectrometry (GD-OES) instrument, which provides the depth information during the profiling process. The setup is based on a differential interferometer, and we show that a …
- 238000001336 glow discharge atomic emission spectroscopy 0 title abstract description 32
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/636—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited using an arrangement of pump beam and probe beam; using the measurement of optical non-linear properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6402—Atomic fluorescence; Laser induced fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/396—Type of laser source
- G01N2021/399—Diode laser
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical means
- G01B11/02—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness, e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colour
- G01J3/28—Investigating the spectrum
- G01J3/447—Polarisation spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colour
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry
- G01J5/0003—Radiation pyrometry for sensing the radiant heat transfer of samples, e.g. emittance meter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of wave or particle radiation
- G01B15/02—Measuring arrangements characterised by the use of wave or particle radiation for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechnical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation not covered by G01N21/00 or G01N22/00, e.g. X-rays or neutrons
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Gaiaschi et al. | Real-time depth measurement in glow discharge optical emission spectrometry via differential interferometric profiling | |
US6532068B2 (en) | Method and apparatus for depth profile analysis by laser induced plasma spectros copy | |
Li et al. | A simplified spectrum standardization method for laser-induced breakdown spectroscopy measurements | |
CN106662531B (en) | Glow discharge spectroscopy method and system for in situ measurement of etch depth of a sample | |
De Giacomo et al. | Spatial distribution of hydrogen and other emitters in aluminum laser-induced plasma in air and consequences on spatially integrated Laser-Induced Breakdown Spectroscopy measurements | |
Shakeel et al. | Quantitative analysis of Ge/Si alloys using double-pulse calibration-free laser-induced breakdown spectroscopy | |
JP4165797B2 (en) | Method and apparatus for real-time determination of the composition of a solid sample as a function of depth within the sample | |
CN103884692B (en) | The LIBS solid phase isotope measure device and method of superelevation spatial resolution | |
US8774359B1 (en) | Gate stack metrology | |
Hou et al. | Investigation on spatial distribution of optically thin condition in laser-induced aluminum plasma and its relationship with temporal evolution of plasma characteristics | |
Weeks et al. | Multi-species temperature and number density analysis of a laser-produced plasma using dual-comb spectroscopy | |
Voronov et al. | Glow discharge imaging spectroscopy with a novel acousto-optical imaging spectrometer | |
Hegazy | Oxygen spectral lines for diagnostics of atmospheric laser-induced plasmas | |
Bredice et al. | A new method for determination of self-absorption coefficients of emission lines in laser-induced breakdown spectroscopy experiments | |
KR102501986B1 (en) | A method and apparatus for measuring etching depth using a differential polarization interferometer, and a glow discharge spectroscopy apparatus including such a measurement apparatus | |
Mal et al. | Time and space-resolved laser-induced breakdown spectroscopy on molybdenum in air | |
JP4031712B2 (en) | Spectroscopic measurement method and spectroscopic measurement apparatus for semiconductor multilayer film | |
Diao et al. | Influence of distances between the lens and the target on the characteristic of laser induced lead plasma | |
He et al. | The self-absorption temporal evolution of spectral lines emitted from laser-induced plasmas | |
Hoffmann et al. | Interference phenomena at transparent layers in glow discharge optical emission spectrometry | |
WO2003006967A1 (en) | Method and apparatus for depth profile analysis by laser induced plasma spectroscopy | |
Valledor et al. | Direct chemical in-depth profile analysis and thickness quantification of nanometer multilayers using pulsed-rf-GD-TOFMS | |
Bowden et al. | Detection limit of laser thomson scattering for low density discharge plasmas | |
Tao et al. | Cavity ring-down spectroscopy sensor for ion beam etch monitoring and end-point detection of multilayer structures | |
Dorka et al. | Investigation of SiO2 layers by glow discharge optical emission spectroscopy including layer thickness determination by an optical interference effect |