[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Gallas et al., 2002 - Google Patents

SiO 2–TiO 2 Interfaces studied by ellipsometry and X-ray photoemission spectroscopy

Gallas et al., 2002

Document ID
17053099431099027878
Author
Gallas B
Brunet-Bruneau A
Fisson S
Vuye G
Rivory J
Publication year
Publication venue
Journal of applied physics

External Links

Snippet

We present an in situ study of the formation of the interfaces between TiO 2 and SiO 2 evaporated thin films using spectroscopic ellipsometry and x-ray photoemission spectroscopy (XPS). The growth of TiO 2 on SiO 2 was studied previously, but the reverse …
Continue reading at pubs.aip.org (other versions)

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

Similar Documents

Publication Publication Date Title
Martinet et al. Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating
Patsalas et al. Optical performance of nanocrystalline transparent ceria films
Kim et al. Measurement and calculation of optical band gap of chromium aluminum oxide films
Won et al. Effects of thermally induced anatase-to-rutile phase transition in MOCVD-grown TiO2 films on structural and optical properties
Fox et al. Pt/ti/sio2/si substrates
Mosaddeq-ur-Rahman et al. Refractive index and degree of inhomogeneity of nanocrystalline TiO 2 thin films: Effects of substrate and annealing temperature
Gallas et al. SiO 2–TiO 2 Interfaces studied by ellipsometry and X-ray photoemission spectroscopy
Adachi et al. Optical properties of TiN films deposited by direct current reactive sputtering
Schüler et al. Structural and optical properties of titanium aluminum nitride films (Ti 1− x Al x N)
Vergöhl et al. Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
Sullivan et al. Optical properties and microstructure of reactively sputtered indium nitride thin films
Tompkins et al. Spectroscopic ellipsometry measurements of thin metal films
Logothetidis et al. New approach in the monitoring and characterization of titanium nitride thin films
Ichiki et al. Initial stage of cubic boron nitride film growth from vapor phase
Logothetidis et al. Amorphous carbon films rich in diamond deposited by magnetron sputtering
Bryan et al. Propagation distance of surface electromagnetic waves on two metal-oxide-air systems
Ahmad et al. Optical properties of ZnO related to the dc sputtering power
Rebien et al. Interband optical properties of higher manganese silicide thin films
Stadler et al. Sputter-deposited yttria–alumina thin films for optical waveguiding
Turner et al. Molecular structure of interfaces formed with plasma-polymerized silica-like primer films: Part I. Characterization of the primer/metal interface using infrared spectroscopy in situ
Collart et al. Deep surface damage of SiO2 by sputtering with low energy Ar-ions
Logothetidis et al. Oxidation and structural changes in fcc TiNx thin films studied with X-ray reflectivity
Mahmoud Structure and optical properties of thin titanium films deposited on different substrates
Rivera et al. Al-Si-N thin films deposited by laser ablation: Effect of plasma parameters on mechanical and optical properties
Tomsah Ellipsometric evaluation of the optical constants of zirconium oxynitride thin films deposited by reactive pulsed magnetron sputtering