Ivanov et al., 2021 - Google Patents
Confined-plume chemical depositionIvanov et al., 2021
View PDF- Document ID
- 15836738996450270337
- Author
- Ivanov B
- Beam J
- Harris A
- Wellons M
- Kozub J
- Lukehart C
- Publication year
- Publication venue
- Handbook of Modern Coating Technologies
External Links
Snippet
Confined-plume chemical deposition (CPCD) is a single-step process for preparing microtextured coatings of ceramics, semiconductors, or metals on hard, soft, or biological tissue substrates. Pulsed-laser irradiation, generated by a free-electron laser or …
- 238000005234 chemical deposition 0 title abstract description 37
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B31/00—Carbon; Compounds thereof
- C01B31/02—Preparation of carbon; Purification; After-treatment
- C01B31/04—Graphite, including modified graphite, e.g. graphitic oxides, intercalated graphite, expanded graphite or graphene
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