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Vos et al., 2016 - Google Patents

Atomic layer deposition of molybdenum oxide from (NtBu) 2 (NMe2) 2Mo and O2 plasma

Vos et al., 2016

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Document ID
15699621220091732751
Author
Vos M
Macco B
Thissen N
Bol A
Kessels W
Publication year
Publication venue
Journal of Vacuum Science & Technology A

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Molybdenum oxide (MoO x) films have been deposited by atomic layer deposition using bis (tert-butylimido)-bis (dimethylamido) molybdenum and oxygen plasma, within a temperature range of 50–350 C. Amorphous film growth was observed between 50 and 200 C at a …
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