Wang et al., 2012 - Google Patents
NO x storage and reduction with methane by plasma at ambient temperatureWang et al., 2012
- Document ID
- 15666182480519616188
- Author
- Wang H
- Yu Q
- Liu T
- Xiao L
- Zheng X
- Publication year
- Publication venue
- RSC advances
External Links
Snippet
NOx storage and reduction with CH4 by a plasma process was proposed for NOx removal at ambient temperature. The efficiency of this new process for NOx removal could achieve 95% at ambient temperature. NOx removal via cyclic operation has also been investigated …
- 210000002381 Plasma 0 title abstract description 33
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